KR100668359B1 - A n-based hardened film for high superiority of surface intensity - Google Patents
A n-based hardened film for high superiority of surface intensity Download PDFInfo
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- KR100668359B1 KR100668359B1 KR1020040117986A KR20040117986A KR100668359B1 KR 100668359 B1 KR100668359 B1 KR 100668359B1 KR 1020040117986 A KR1020040117986 A KR 1020040117986A KR 20040117986 A KR20040117986 A KR 20040117986A KR 100668359 B1 KR100668359 B1 KR 100668359B1
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- 239000010409 thin film Substances 0.000 claims abstract description 101
- 238000005520 cutting process Methods 0.000 claims abstract description 29
- 239000010408 film Substances 0.000 claims abstract description 14
- 238000005240 physical vapour deposition Methods 0.000 claims abstract description 6
- 150000004767 nitrides Chemical class 0.000 claims description 10
- 229910010037 TiAlN Inorganic materials 0.000 claims description 9
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 8
- 230000003746 surface roughness Effects 0.000 abstract description 37
- 238000000576 coating method Methods 0.000 abstract description 11
- 239000011248 coating agent Substances 0.000 abstract description 7
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 239000000956 alloy Substances 0.000 abstract 1
- 229910045601 alloy Inorganic materials 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 18
- 238000004381 surface treatment Methods 0.000 description 18
- 238000000151 deposition Methods 0.000 description 13
- 238000001704 evaporation Methods 0.000 description 13
- 230000008020 evaporation Effects 0.000 description 12
- 239000003086 colorant Substances 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 229910010038 TiAl Inorganic materials 0.000 description 7
- 238000005299 abrasion Methods 0.000 description 6
- 230000008021 deposition Effects 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 238000010586 diagram Methods 0.000 description 3
- 238000002474 experimental method Methods 0.000 description 3
- 238000001755 magnetron sputter deposition Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 238000009499 grossing Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000001883 metal evaporation Methods 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000000427 thin-film deposition Methods 0.000 description 2
- 230000000007 visual effect Effects 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- 229910001315 Tool steel Inorganic materials 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000011195 cermet Substances 0.000 description 1
- 239000011362 coarse particle Substances 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
- 238000009501 film coating Methods 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23P—METAL-WORKING NOT OTHERWISE PROVIDED FOR; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS
- B23P15/00—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass
- B23P15/28—Making specific metal objects by operations not covered by a single other subclass or a group in this subclass cutting tools
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0664—Carbonitrides
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D17/00—Radial-flow pumps, e.g. centrifugal pumps; Helico-centrifugal pumps
- F04D17/08—Centrifugal pumps
- F04D17/16—Centrifugal pumps for displacing without appreciable compression
- F04D17/168—Pumps specially adapted to produce a vacuum
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
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Abstract
본 발명은 절삭 공구용 경질 피막을 물리증착 코팅법을 이용하여 세라믹 피복경질층을 절삭공구에 코팅함에 있어 기존 경질 피막 보다 표면 조도 및 색상이 우수한 피복 경질층의 제조방법이 개시되어 있다. 본 발명에 따르면, 절삭공구 또는 내마모성 공구의 표면에 피복경질합금을 코팅함에 있어서 절삭을 위한 내부 박막으로 N계 박막을 증착후 일정 시간 동안 이온 표면 처리후 육안상 내부 박막과 색상이 상이한 최외각 박막을 1㎛이하로 증착하였을 때 표면 조도가 우수하며 색상이 독특한 경질 피막을 얻을 수 있다.The present invention discloses a method for producing a coated hard layer having better surface roughness and color than a conventional hard film in coating a hard coating film for cutting tools on a cutting tool using a physical vapor deposition coating method. According to the present invention, in coating a coated hard alloy on a surface of a cutting tool or a wear resistant tool, an N-based thin film is deposited as an inner thin film for cutting, and after treatment with ion surface for a predetermined time, the outermost thin film having a different color from the inner thin film visually. When deposited to less than 1㎛ excellent surface roughness and a unique color unique hard film can be obtained.
Description
도 1a는 이온 표면 처리후의 개략도이고,1A is a schematic diagram after ion surface treatment,
도 1b는 외부박막 증착후의 개략도이며, 그리고1B is a schematic diagram after external thin film deposition, and
도 2는 외부 박막의 두께가 1.0㎛ 이상 증착후의 개략도이다.2 is a schematic diagram of the thickness of the outer thin film after deposition over 1.0 mu m.
본 발명은 경질 박막에 관한 것으로서, 보다 상세하게는 드릴, 엔드밀, 인써트 등의 절삭공구의 내마모성과 표면 조도를 향상시키기 위한 질화계 경질 박막에 관한 것이다.The present invention relates to a hard thin film, and more particularly, to a nitride based hard thin film for improving wear resistance and surface roughness of cutting tools such as drills, end mills and inserts.
종래부터 초경합금, 써메트, 고속도 공구강을 모재로 하는 절삭 공구의 내마모성을 향상시키는 것을 목적으로 TiN, TiCN, TiAlN등의 경질 피막을 코팅하는 것이 실시되어왔다.Conventionally, coating of hard films, such as TiN, TiCN, TiAlN, for the purpose of improving the abrasion resistance of cutting tools based on cemented carbide, cermet, and high speed tool steel.
그러나 최근의 피삭재 고경도화나 절삭 속도의 고속화, 공구 사용자들의 편리함 추구로 기존 박막에서 성능이 개선된 박막이 요구되고 있다.공구 사용자들의 편리함이란 일반적으로 가공물의 외부를 작업하는 황삭용 공구와 최종적으로 치수 와 가공물의 표면 조도를 위한 사상용 공구를 한가지공구로 해결하려는 것으로 내마모성과 함께 박막의 표면조도가 요구되고 있다. 일반적으로 황삭작업과 사상 작업은 요구되는 공구의 성질이 틀려 황삭 작업에서는 공구의 절삭 성능(내마모성 및 인성)이 요구되지만 사상 작업에서는 절삭 성능과 함께 가공물의 면조도를 양호하게 하는 성질이 요구된다.However, in recent years, due to the high hardness of the workpiece, the high cutting speed, and the convenience of the tool users, a thin film having improved performance in the existing thin film is required. In order to solve the finishing tool for the dimension and the surface roughness of the workpiece with one tool, the surface roughness of the thin film is required along with the wear resistance. In general, roughing and finishing operations are required to be different in the properties of the tools required, so roughing operations require cutting performance (abrasion resistance and toughness) of the tools, but in finishing operations, the roughness of the workpiece is required along with the cutting performance.
그러나 일반적으로 이러한 성질들은 서로 반대되는 경향이 있어 공구하나에 이 2가지 기술을 모두 적용시키기는 기술적으로 다소 어려운 부분이 있다.In general, however, these properties tend to be opposed to each other, which makes it somewhat technically difficult to apply both techniques to a single tool.
독특한 색상으로 상품성을 높이기 위해서 외관 색상을 다양하게 개선하는 노력이 공구 메이커를 중심으로 진행되어 왔다. 이러한 외관 색상의 개선은 절삭 성능 개선과 함께 사용자들에게 호기심을 유발할 수 있는 요인으로 공구 메이커에서는 판매 증진을 가능하게 하는 중요한 요인이다.Efforts to improve the appearance color in various ways have been carried out mainly by tool makers in order to enhance the merchandise with unique colors. This improvement in appearance color is an important factor that can increase sales in the tool makers as well as improve the cutting performance and intriguing users.
일반적으로 TiAlN 박막은 회색-검정색 계통이며 TiN은 황금색, TiCN은 C의 함량에 따라 10가지 이상의 다양한 색상을 나타낼 수 있다. 그러나 이런 종류의 색상은 이미 일반화 되어있으며 이중 최외각 박막으로는 황금색인 TiN 박막이 색상의 이점과 함께 야간에도 마모 구분이 용이하며 가공물과의 내용착성이 우수하여 일반적으로 선호되고 있다.In general, the TiAlN thin film is a gray-black system, TiN may be golden, and TiCN may exhibit more than 10 different colors depending on the content of C. However, this type of color has already been generalized, and as the outermost thin film, the TiN thin film, which is golden, is generally preferred because of its color, easy to distinguish wear at night, and excellent welding resistance with the workpiece.
이러한 고객들의 다양한 요구에 맞춰 근래에는 내부 박막으로는 내마모성이 우수한 TiAlN을 증착하고 외부에는 TiN을 증착하는 구조의 박막이 적용되고 있다. 그러나 TiAlN과 TiN을 모두 증착하기 위해서는 TiAl, Ti의 2가지 금속 증발원이 필요하며 이에 따라 증착 시간이 길어져 제조원가가 상승하는 단점이 있으며 TiN 박 막은 현재는 일반적인 색상으로 인식이 되어 사용자들에게 더 이상 호기심을 유발하는 색상이 아니다.In order to meet various demands of customers, thin films having a structure of depositing TiAlN having excellent abrasion resistance as an inner thin film and depositing TiN to the outside have been applied. However, in order to deposit both TiAlN and TiN, two metal evaporation sources such as TiAl and Ti are required, which increases the manufacturing time due to the longer deposition time. The TiN thin film is now recognized as a general color and is no longer curious to users. It is not a color that causes it.
본 발명은 상기와 같은 종래의 문제점 및 과제를 해결하기 위한 것으로, 물리 증착법을 이용하여 질화계 경질 박막 증착시 최외각 박막을 내부 박막과 동일한 증착법을 이용하고 동일한 증발원 또는 추가 증발원을 이용하여 질화계 박막을 1㎛이하로 증착할때 표면조도가 우수하며 다양한 색상을 가지는 경질박막을 코팅하는 방법을 제공함에 그 목적이 있다.The present invention is to solve the conventional problems and problems as described above, when the nitride-based hard thin film deposition using physical vapor deposition method of the outermost thin film using the same deposition method as the inner thin film and using the same evaporation source or additional evaporation source The purpose of the present invention is to provide a method for coating a hard thin film having excellent surface roughness and various colors when the thin film is deposited at 1 μm or less.
상기와 같은 목적을 달성하기 위해서 본 발명은,In order to achieve the above object, the present invention,
물리 증착법을 이용하여 절삭공구 또는 내마모성 공구에 코팅되는 TiN, TiCN, TiAlN 등의 질화계 경질박막으로서, 최소 2층 이상의 박막 구조로 이루어지며 최외각의 박막은 질화계 박막이고 최외각 박막의 두께 T가 0<T≤1㎛인 질화계 경질 박막을 제공한다.Nitride-based hard thin films, such as TiN, TiCN, TiAlN, which are coated on cutting tools or wear-resistant tools by physical vapor deposition.At least two layers of thin film structure, the outermost thin film is a nitride thin film and the outermost thin film thickness T A nitride based hard thin film having a thickness of 0 <T ≦ 1 μm is provided.
여기에서, 최외각 박막은 (ΑαΒβΓγ....)C1-(α+β+γ....)N의 조성으로 이루어지고, 여기서 ΑαΒβΓγ....는 금속 물질이며 α+β+γ....≥0인 것이 바람직하다.Here, the outermost thin film is composed of a composition of (ΑαΒβΓγ ....) C1- (α + β + γ ....) N, where Aαββγγ .... is a metal material and α + β + γ. It is preferable that ...> 0.
또한, 최외각의 질화계 박막은 내부 박막과 성분이 상이한 것이 바람직하다.In addition, the outermost nitride-based thin film is preferably different from the internal thin film.
그리고, 박막을 엔드밀류, 드릴류에 증착하였을 때, 최외각 박막의 색상이 인선부와 플루트부가 상이 한 것이 바람직하다.When the thin film is deposited on end mills and drills, it is preferable that the color of the outermost thin film is different from the edge portion and the flute portion.
또한, 박막을 인써트류에 증착하였을 때, 최외각 박막의 색상이 측면부와 상하면부가 상이한 것이 바람직하다.In addition, when the thin film is deposited on the inserts, it is preferable that the color of the outermost thin film is different from the upper and lower sides.
본 발명은 상기 절삭 공구용 경질피막을 형성하는 방법도 규정하는 것으로 성막 가스 분위기중에서 금속을 증발시켜 이온화하고 상기 금속과 함께 성막 가스의 플라즈마화를 촉진시켜서 성막하는 것을 요지로 하고 있다. 한편 이 경우에 상기 피처리체에 인가하는 바이어스 전압은 50V에서 300V로 하는 것이 바람직하다. 또한 성막시의 피처리체 온도는 300℃ 이상 800℃이하의 범위내로 하는 것이 바람직하다.The present invention also defines a method for forming a hard film for a cutting tool, which is intended to form a film by evaporating and ionizing a metal in a film forming gas atmosphere and promoting plasma formation of the film forming gas together with the metal. In this case, on the other hand, the bias voltage applied to the target object is preferably set to 50V to 300V. In addition, it is preferable to make the to-be-processed object temperature at the time of film-forming into the range of 300 degreeC or more and 800 degrees C or less.
본 발명에서의 상기 반응 가스는 질소 가스,메탄가스,에틸렌,아세틸렌,수소 또는 이들 2종 이상이 혼합된 가스를 말한다.이들외에 불활성 가스인 Ar을 사용한다.The reaction gas in the present invention refers to nitrogen gas, methane gas, ethylene, acetylene, hydrogen, or a gas in which two or more thereof are mixed. In addition, Ar, an inert gas, is used.
본 발명에서 사용되는 코팅법으로는 물리증착법인 아크법,마그네트론 스퍼터법등 모두 가능하나 마그네트론 스퍼터법을 이용하여 내부 박막으로 TiAlN을 증착하였으며 동일한 증착법을 이용하여 외부 박막도 증착하였다.The coating method used in the present invention can be physical vapor deposition, arc method, magnetron sputtering method, etc., but TiAlN was deposited on the inner thin film using the magnetron sputtering method, and the outer thin film was also deposited using the same deposition method.
제조공정은 로타리 펌프, 부스타 펌프, 터보 펌프를 이용하여 진공배기한 후 히터로 로내 온도를 700℃까지 가열한다. 승온후 Ar가스와 반응가스로 N2를 투입하고 바이어스 전압을 100V를 인가한다. 마그네트론 스퍼터법을 이용하여 TiAlN 박막을 3㎛로 증착후, Ar 가스를 이용하여 이온 표면 처리를 실시한후 외관 색상을 위한 최외각 박막을 1.0㎛로 증착하였다.The manufacturing process uses a rotary pump, a booster pump, and a turbo pump to evacuate the vacuum and then heat the furnace temperature to 700 ° C with a heater. After raising the temperature, N2 is introduced into the Ar gas and the reactant gas, and a bias voltage of 100 V is applied. The TiAlN thin film was deposited at 3 μm using the magnetron sputtering method, and then the outermost thin film for the appearance color was deposited at 1.0 μm after an ionic surface treatment using Ar gas.
여기서 최외각 경질 박막은 0~0.7㎛로 증착하는 것이 보다 바람직하고 또한 상기 외부 박막은 최외각 박막은 (ΑαΒβΓγ....)C1-(α+β+γ....)N의 조성으로 이루어져 있으며 여기서 ΑαΒβΓγ....는 금속 물질이며 α+β+γ....≥0인 경질박막이 바람직하다(α+β+γ....는 각각 ΑαΒβΓγ....의 원자비를 나타낸다. 이하 동일).Here, the outermost hard thin film is more preferably deposited at 0 to 0.7 μm, and the outer thin film is the outermost thin film having the composition of (ΑαΒβΓγ ....) C1- (α + β + γ ....) N. Where ΑαΒβΓγ .... is a metal material and a thin film of α + β + γ .... ≥0 is preferred (α + β + γ .... is the atomic ratio of ΑαΒβΓγ .... Same as below).
내부 박막을 증착후 외부 박막을 증착하기전에 가스를 이용한 이온 표면 처리를 하는데 이 처리를 하므로써 외부 박막 증착시 박막의 표면 조도가 우수해지며 외부 박막 증착시 광택이 우수한 박막을 증착하는 것이 가능하다. 일반적으로 물리증착 방법을 이용하여 증착시 금속 증발원에서 발생되는 조대 입자 또는 증착되는 박막 성분 자체의 입자가 조대하여 코팅후 표면 조도가 거친 경우가 발생한다.After depositing the inner thin film, the ion surface treatment using gas is carried out before depositing the outer thin film. By this treatment, the surface roughness of the thin film is excellent when the external thin film is deposited, and it is possible to deposit a thin film having excellent gloss when the external thin film is deposited. In general, coarse particles generated from a metal evaporation source or particles of the thin film component itself to be deposited are coarse when the deposition is performed using a physical vapor deposition method, the surface roughness after coating occurs.
이러한 박막은 일반 절삭시에는 큰 영향을 미치지는 않으나 가공물의 면조도가 중요한 가공이나 고속 가공에서는 박막의 거침으로 인해 가공물의 면조도가 나빠지거나 공구의 수명이 저하되는 현상이 나타난다. 즉 이온 표면 처리를 통해 표면의 조도를 부드럽게 해주어 외부 박막 코팅 후에도 우수한 표면조도를 유지 할 수 있게 한다.This thin film does not have a great effect in general cutting, but in the processing where the surface roughness of the workpiece is important or the high speed processing, the surface roughness of the workpiece is degraded due to the roughness of the workpiece or the life of the tool is reduced. In other words, the surface roughness is smoothed through the ion surface treatment, so that the surface roughness can be maintained even after the external thin film coating.
그러나 이러한 이온 표면 처리를 통해 표면 거칠기가 개선은 되지만 완전한 것은 아니므로 외부 박막을 증착하므로써 표면 조도를 최소화 한다. 즉 도1에 예시한바와 같이 이온 표면 처리를 통해 개선된 표면에 외부 박막을 증착하므로써 박막 표면의 평활도를 극대화 한다. 이러한 박막의 평활도는 절삭시 칩의 흐름을 원활히하여 박막의 손상을 최소화해주며 이러한 칩배출의 원활함으로 인해 양호한 가공물의 표면 조도를 얻는 것이 가능하다.However, surface roughness is improved through this ion surface treatment, but it is not perfect. Therefore, surface roughness is minimized by depositing an external thin film. That is, as illustrated in FIG. 1, the external thin film is deposited on the improved surface through ion surface treatment to maximize the smoothness of the thin film surface. The smoothness of the thin film minimizes the damage of the thin film by smoothing the flow of the chip during cutting and it is possible to obtain a good surface roughness of the workpiece due to the smooth discharge of the chip.
또한 이러한 박막의 평활화로 인해 외부 박막 증착시 광택이 우수한 박막을 얻는게 가능하다. 그러나 외부 박막의 두께가 1.0㎛ 이상일때는 표면조도가 저하되며 또한 증착되는 입자의 크기가 조대 할 시에도 표면조도가 저하된다. 또한 외부 박막의 두께가 1.0㎛ 이상일때는 다양한 외관 색상을 얻기가 어려우며 특히 2가지 이상의 색상을 동시에 만들기는 불가능하다.In addition, due to the smoothing of the thin film, it is possible to obtain a thin film having excellent gloss when the external thin film is deposited. However, when the thickness of the outer thin film is 1.0㎛ or more, the surface roughness decreases, and the surface roughness decreases even when the size of the deposited particles is coarse. In addition, when the thickness of the outer thin film is more than 1.0㎛ it is difficult to obtain a variety of appearance colors, in particular it is impossible to make two or more colors at the same time.
도 2에 예시하는 바와 같이 외부 박막의 두께가 1.0㎛ 이상일때는 내부 박막과 동일한 거칠기를 가지며 이로인해 표면 조도의 개선효과를 얻을 수 없다. 또한 증착되는 입자의 크기를 제어하는 것이 중요한데 이는 증발원의 증발율을 조절하므로써 가능하다. 즉 증발율이 높을때는 비교적 큰입자가 발생하는 반면 증발율이 낮을때는 입자의 크기가 다소 미립화되어 표면조도가 우수한 박막을 얻는 것이 가능하다.As illustrated in FIG. 2, when the thickness of the outer thin film is 1.0 μm or more, it has the same roughness as that of the inner thin film, and thus an improvement in surface roughness cannot be obtained. It is also important to control the size of the deposited particles, which is possible by controlling the evaporation rate of the evaporation source. In other words, when the evaporation rate is high, relatively large particles are generated, while when the evaporation rate is low, the particle size is slightly atomized to obtain a thin film having excellent surface roughness.
2가지 이상의 다양한 색상을 동시에 가지는 최외각 박막을 얻기 위해서는 최외각 박막의 두께 제어와 가스량과 증발원의 증발율의 비율이 아주 중요하다. 최외각 박막 두께 및 가스와 증발원의 비율에 따라 2가지 이상의 다양한 색상을 동시에 증착 할 수 있으나 상호간의 관계가 아주 민감하여 박막의 두께 또는 비율이 조금만 틀려져도 기존 TiN,TiCN,TiAlN등과 동일한 색상을 나타낸다.In order to obtain the outermost thin film having two or more different colors simultaneously, the thickness control of the outermost thin film and the ratio of the amount of gas and the evaporation rate of the evaporation source are very important. Depending on the thickness of the outermost film and the ratio of gas and evaporation source, two or more different colors can be deposited at the same time, but the relationship between them is very sensitive. .
또한 이온 표면 처리는 가스를 이용해야 하며 가스외에 증발원을 이용한 금속 표면 처리시에는 금속 입자의 크기로 인해 표면조도가 거칠어 질수 있으며 특히 최외각 박막의 막두께를 제어하여도 광택이 없다. 또한 이온 표면 처리는 최외각 박막과 내부 박막간의 밀착력을 증대하여 절삭시 절삭 부하로 인한 최외각 박막의 탈락을 방지하는 효과도 있다.In addition, the ion surface treatment must use a gas, and when the metal surface treatment using an evaporation source besides the gas, the surface roughness may be rough due to the size of the metal particles, and there is no gloss even when controlling the film thickness of the outermost thin film. In addition, the ion surface treatment increases the adhesion between the outermost thin film and the inner thin film, thereby preventing the outermost thin film from falling off due to the cutting load during cutting.
이러한 이유 때문에 피코팅물의 측면부와 상하면부과 색상이 틀리게 나타나며 엔드밀,드릴류의 경우 외주 부분과 플루트 부분의 색상이 상이하게 나타난다.For this reason, the color of the side and upper and lower portions of the coated object is different from each other. In the case of end mills and drills, the colors of the outer circumference and the flute are different.
이는 피코팅물에서 증발원을 바라보는 부분과 그렇치 않은 부분간의 박막두께 차이, 엔드밀,드릴류에 있어서 외주 부분과 플루트 부분의 직경차이에 의해 발생되는 현상이다.This is a phenomenon caused by the difference in the thickness of the thin film between the part facing the evaporation source and the part not on the coated material, and the diameter difference between the outer peripheral part and the flute part in end mills and drills.
실시예Example
이하 실시예를 들어 본 발명을 보다 구체적으로 설명하지만 본 발명은 하기 실시예를 포함하여 본 발명의 취지에 적합 할 수 있는 범위에서 적당히 변경을 하여 실시하는 것도 가능하고 그것들은 모두 본 발명의 기술적 범위에 포함된다.Hereinafter, the present invention will be described in more detail with reference to the following examples, but the present invention may be carried out with appropriate modifications within a range that may be suitable for the purposes of the present invention, including the following examples, all of which are technical scope of the present invention. Included in
<실시예 1><Example 1>
상기 언급된 증착법을 이용하여 내부 박막 증착후 30분간 이온 표면 처리후 외부 박막을 두께별로 증착을 하였으며 피코팅물로는 초경합금의 기판을 사용하여 증착하였다. 내부 박막은 3㎛로 증착하였으며 코팅후에는 기판을 이용하여 표면 조도를 측정하였으며 테스트 조건 및 표면 조도 분석 결과를 표1에 나타내었다.After the deposition of the inner thin film using the above-mentioned deposition method, the outer thin film was deposited by thickness after ion surface treatment for 30 minutes, and the coated material was deposited using a cemented carbide substrate. The inner thin film was deposited to 3㎛ and after coating the surface roughness was measured using a substrate and the test conditions and surface roughness analysis results are shown in Table 1.
표 table
또한 외관 박막 두께별로 나타난 외관 색상에 대해 육안으로 관찰한 결과와 광학 현미경으로 관찰한 내부 박막의 색상을 표1에 나타내었다.Also, Table 1 shows the results of visual observation of the appearance color of each appearance thin film and the color of the internal thin film observed by the optical microscope.
표 1에 나타난 것처럼 외부 박막의 두께를 0.2㎛ - 2.0㎛까지 다양하게 증착하였다. 일반적으로 마스네트론 스퍼터법의 표면 조도가 Ra 기준으로 0.1㎛ 이하인 것을 감안할 때 No. 1-5까지는 우수한 표면 조도를 나타내었으며 6,7번은 일반적인 수준의 표면 조도를 나타내었다.As shown in Table 1, the thickness of the outer thin film was variously deposited from 0.2 μm to 2.0 μm. In general, considering that the surface roughness of the masnetron sputtering method is 0.1 µm or less on the basis of Ra, No. Up to 1-5 showed excellent surface roughness, and 6 and 7 showed normal surface roughness.
그러나 육안으로 관찰한 외관 색상은 1.0㎛ 이하일때는 2가지 이상의 색상이 혼합된 독특한 색상을 나타내었으나 박막두께가 1.0㎛ 부터는 기존 TiAlN 색상과 유사한 색상을 나타내어 1.0㎛이상에서는 기존과 동일한 색상을 나타내었다. 즉 상기 조건에서는 막두께가 두꺼워짐에 따라 붉은색에서 파란색, 회색으로 변경되는 것으로 나타났다.However, the visual color observed by the naked eye showed a unique color with two or more colors mixed at 1.0 μm or less, but the thin film thickness showed a similar color to that of the existing TiAlN color at 1.0 μm. That is, under the above conditions, as the film thickness increases, it was found that the color changes from red to blue and gray.
<실시예2>Example 2
실시 예 1에서 박막 두께별로 코팅한 스퀘어 엔드밀(직경 8mm,4날)을 이용하여 절삭 평가를 하였으며 피삭재로는 STD61(HRC52)을 이용하였으며 절삭 조건은 하 기와 같다. 또한 절삭후에 가공물의 표면조도를 측정하여 표 2에 나타내었다.In Example 1, cutting evaluation was performed using a square end mill (diameter 8 mm, 4 blades) coated according to the thickness of the thin film. STD61 (HRC52) was used as the workpiece, and the cutting conditions were as follows. In addition, the surface roughness of the workpiece after cutting is shown in Table 2.
절삭조건Cutting condition
절삭 속도: 200m/minCutting speed: 200m / min
이송 속도: 0.07mm/날Feed rate: 0.07mm / blade
축방향 절입 깊이: 10mmAxial infeed depth: 10 mm
반경방향 절입 깊이: 0.8mmRadial infeed depth: 0.8 mm
절삭유: 에어블로우Coolant: Air Blow
증착 조건 및 마모 결과는 표 1에 나타내었다. 마모 평가는 상기 엔드밀을 이용하여 가공물을 30m 절삭후 날끝을 광학 현미경으로 관찰하여 마모 폭을 측정하였다. Deposition conditions and wear results are shown in Table 1. Abrasion evaluation was performed by using an end mill to measure the wear width by observing the edge of the workpiece after cutting 30m with an optical microscope.
표 table
다소간의 차이는 발생하였으나 No.1-4 까지는 마모량이 0.1m 이하로 나타났으며 No.5-7까지는 0.16-0.24mm까지로 나타나 외곽 박막의 면조도에 따라 절삭성능 우수한 것으로 나타났다. 특히 No.5번의 경우 박막의 표면조도는 No.1-4번 대비 다소 열세한 정도였으나 마모량은 거의 2배로 나타나 외부 박막의 막두께 임계값이 1.0㎛ 부근인 것을 알 수 있다.Although there was some difference, the wear amount was less than 0.1m up to No.1-4 and 0.16-0.24mm up to No.5-7, which showed excellent cutting performance according to the surface roughness of the outer thin film. In particular, in case of No. 5, the surface roughness of the thin film was somewhat inferior to No. 1-4, but the wear amount was almost doubled, indicating that the thickness thickness threshold of the outer thin film was around 1.0 μm.
가공물의 표면 조도를 측정하였는데 이는 마모량 결과와 동일한 결과를 나타내어 No.1-4까지는 거의 유사한 값을 나타내었으나 No.5번부터는 거칠어지기 시작하여 No.6,7은 No.1-4의 2배 이상의 거칠기를 나타내었다.The surface roughness of the workpiece was measured, which showed the same results as the abrasion result, and showed almost similar values until No. 1-4, but began to be rough from No. 5, and No. 6 and 7 were twice the No. 1-4. The above roughness was shown.
이러한 결과는 마모량과 큰 연관이 있는데 박막의 표면조도가 거칠어 절삭시 가공 부하로 인해 마모량이 크며 마모량이 크므로 가공량 동일할 때 가공물의 면조도가 거칠어지는 것이다.This result has a large correlation with the amount of wear. The roughness of the surface of the thin film is large, and the amount of wear is large due to the processing load during cutting.
<실시예 3><Example 3>
상기 언급된 방법과 동일하게 내부 박막을 증착 한후에 증발원인 TiAl을 이용하여 이온 표면 처리를 한것과 Ar 가스를 이용하여 표면 처리를 시간별로 처리한후 최외각 박막을 0.5㎛로 증착하였다. 본 실시 예에서는 이온 표면 처리를 실시하는 인자에 따라서 표면 조도의 변화를 측정하기 위한 것으로 증착후 표면 조도를 측정하여 표3에 나타내었다.In the same manner as the above-mentioned method, the inner thin film was deposited, followed by ion surface treatment using TiAl as an evaporation source, and surface treatment using Ar gas for each hour, and then the outermost thin film was deposited to 0.5 μm. In this embodiment, the surface roughness is measured by measuring the surface roughness according to the factor of the ion surface treatment.
표 3에 나타난 것처럼 표면 처리원이 금속인 TiAl을 사용 하였을때는 표면 처리시간이 증가할수록 최외각 박막의 표면 조도가 거칠어지는 것을 알 수 있다. 이는 표면 처리 시간이 길어질수록 금속 자체가 증착되어 금속막의 두께가 두꺼워지면서 표면 조도가 거칠게 나타났다.As shown in Table 3, when TiAl is used as the surface treatment source, the surface roughness of the outermost thin film becomes rough as the surface treatment time increases. The longer the surface treatment time, the more metal surface was deposited as the metal itself was deposited, resulting in a rough surface roughness.
그러나 반대로 가스인 Ar을 이용하여 이온 처리한 시료는 처리시간이 길어질 수록 표면 조도가 우수하게 나타났다. However, on the contrary, the sample treated with Ar using the gas Ar showed better surface roughness as the treatment time increased.
표 3TABLE 3
본 발명은 이상과 같이 구성되어 있고, 외부 박막의 막두께 및 이온 표면 처리를 본 발명과 같이 제어함으로써, 종래의 절삭 공구용 경질 피막보다도 표면 조도가 우수하며 외관 색상이 2가지 이상의 것으로 이루어진 독특한 색상의 경질 피막을 얻을 수 있으며 이러한 경질 피막에 의해 고속 절삭이나 고경도 강의 절삭에 이용할 수 있는 우수한 수명의 절삭 공구를 만들 수 있다.The present invention is constructed as described above, and by controlling the film thickness and the ion surface treatment of the outer thin film as in the present invention, the surface color is superior to that of the conventional hard film for cutting tools and the unique color consisting of two or more external colors. Hard coatings can be obtained, and these hard coatings can be used to make cutting tools with excellent service life that can be used for high speed cutting or cutting of hard steel.
상기에서는 본 발명의 바람직한 실시예를 참조하여 설명하였지만, 해당기술 분야의 숙련된 당업자는 특허청구범위에 기재된 본 발명의 사상 및 영역으로부터 벗어나지 않는 범위 내에서 본 발명을 다양하게 수정 및 변경시킬 수 있음을 이해할 수 있을 것이다.
Although the above has been described with reference to a preferred embodiment of the present invention, those skilled in the art can variously modify and change the present invention without departing from the spirit and scope of the invention described in the claims. You will understand.
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