KR100643486B1 - Filtering device for preventing flowing backward of drain line in a part clean equipment - Google Patents

Filtering device for preventing flowing backward of drain line in a part clean equipment Download PDF

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KR100643486B1
KR100643486B1 KR1020000064839A KR20000064839A KR100643486B1 KR 100643486 B1 KR100643486 B1 KR 100643486B1 KR 1020000064839 A KR1020000064839 A KR 1020000064839A KR 20000064839 A KR20000064839 A KR 20000064839A KR 100643486 B1 KR100643486 B1 KR 100643486B1
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wastewater
bath
filtration
exhaust line
impurities
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KR1020000064839A
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KR20020034051A (en
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이진원
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삼성전자주식회사
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D35/00—Filtering devices having features not specifically covered by groups B01D24/00 - B01D33/00, or for applications not specifically covered by groups B01D24/00 - B01D33/00; Auxiliary devices for filtration; Filter housing constructions
    • B01D35/02—Filters adapted for location in special places, e.g. pipe-lines, pumps, stop-cocks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2201/00—Details relating to filtering apparatus
    • B01D2201/48—Overflow systems

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  • Chemical Kinetics & Catalysis (AREA)
  • Filtration Of Liquid (AREA)

Abstract

본 발명은 파트크리닝설비에서 파트크리닝 시 배기라인으로 배기되는 산폐수를 여과하여 폐수관내부의 막힘을 방지하는 배기라인 역류방지용 여과장치에 관한 것이다.The present invention relates to an exhaust line backflow prevention filtration device for filtering the acid wastewater exhausted to the exhaust line during the part cleaning in the part cleaning facility to prevent clogging in the wastewater pipe.

본 발명은 파트크리닝 후 배출되는 폐수의 불순물을 여과하여 산폐수라인의 역류발생을 방지하기 위해 파트크린설비에서 웨트베쓰와 오버플로우베쓰를 통해 배출되는 폐수를 1차 여과한 후 배기라인을 통해 흐르도록 하고, 배기라인을 통해 배출되는 폐수에 섞여있는 불순물중 무게가 무거운 불순물은 침전시키고 , 무게가 가벼운 불순물은 여과망에서 여과되어 메인 산폐수라인으로 불순물이 제거된 산폐수만을 배출하므로 산폐수라인이 막혀 다른 설비들로 산폐수가 역류되는 현상을 방지한다.
The present invention flows through the exhaust line after the primary filtration of the wastewater discharged through the wet bath and the overflow bath in the parts clean facility to prevent the backflow of the acid wastewater by filtering the impurities of the wastewater discharged after the part cleaning The heavy weight of the impurities mixed in the wastewater discharged through the exhaust line is precipitated, and the light weight impurities are filtered through the filter network to discharge only the wastewater from which impurities are removed to the main wastewater line. This prevents the return of acid wastewater to other plants.

배기라인 역류방지Exhaust Line Backflow Prevention

Description

파트크리닝설비의 배기라인 역류방지용 여과장치{FILTERING DEVICE FOR PREVENTING FLOWING BACKWARD OF DRAIN LINE IN A PART CLEAN EQUIPMENT} FILTERING DEVICE FOR PREVENTING FLOWING BACKWARD OF DRAIN LINE IN A PART CLEAN EQUIPMENT}             

도 1은 종래의 파트크린설비의 구조도1 is a structural diagram of a conventional part clean facility

도 2는 본 발명의 실시 예에 따른 파트크리닝설비의 배기라인 역류방지용 여과장치의 구성도2 is a block diagram of the exhaust line backflow prevention filter device of the part cleaning equipment according to an embodiment of the present invention

* 도면의 주요부분에 대한 부호의 설명 *        Explanation of symbols on the main parts of the drawings

10:웨트베쓰 12: 오버플로우베쓰10: wet bath 12: overflow bath

14: 크린액공급부 16: 구스넥14: Clean liquid supply unit 16: Gooseneck

20, 22, 32, 34, 36: 제1 내지 제5여과망 24: 배기라인20, 22, 32, 34, 36: first to fifth filtration networks 24: exhaust line

26, 28, 30: 제1 내지 제3 여과베스 40: 경사로
26, 28, 30: first to third filter bath 40: ramp

본 발명은 파트크리닝설비(PART CLEANING EQUIPMENT)의 배기라인 역류방지용 여과장치에 관한 것으로, 특히 파트크리닝설비에서 파트크리닝 시 배기라인으로 배 기되는 산폐수를 여과하여 폐수관내부의 막힘을 방지하는 배기라인 역류방지용 여과장치에 관한 것이다.The present invention relates to an exhaust line backflow prevention filtration device of a part cleaning facility, and in particular, an exhaust line for filtering the wastewater discharged to the exhaust line during the part cleaning in the part cleaning facility to prevent clogging in the wastewater pipe. The present invention relates to a filter for preventing backflow.

일반적으로 웨트클린 스테이션(WET CLEAN STATION)은 파트크린설비로 두 개의 베쓰(BATH)를 통해 순수(DI)와 N2개스를 강하게 공급 및 배기시키며, 파트에 형성된 폴리머(POLYMER)찌꺼기(불순물)들을 제거하는 장치이다. In general, the wet clean station is a part clean facility that strongly supplies and exhausts DI and N2 gas through two baths, and removes POLYMER residues formed in the part. Device.

도 1은 종래의 파트크린설비의 구조도이다.1 is a structural diagram of a conventional part clean facility.

크린액공급부(14)는 DI WATER나 케미컬을 보관하고 있으며, 파트크리닝 시 DI WATER나 케미컬을 구스넥(16)을 통해 공급한다. 웨트베쓰(10)는 구스넥(16)을 통해 공급되는 파트를 크리닝하고 크리닝한 폐수를 산폐수기라인(18)으로 배출한다. 오버플로우베쓰(12)는 상기 웨트베쓰(10)로부터 오버플로우(OVERFLOW)된 폐수를 받아 산폐수라인(18)으로 배출한다. The clean solution supply unit 14 stores DI WATER or chemicals, and supplies DI WATER or chemicals through the gooseneck 16 during part cleaning. The wet bath 10 cleans the parts supplied through the gooseneck 16 and discharges the cleaned wastewater to the acid wastewater line 18. The overflow bath 12 receives wastewater overflowed from the wet bath 10 and discharges it to the acid wastewater line 18.

이와 같은 종래의 파트크린설비는 웨트베쓰(10)내에서 파트크리닝 후 발생하는 오염된 DI WATER와 폴리머찌꺼기들이 산폐수라인(18)라인으로 여과없이 배출되므로 폐수관 내부가 막히는 현상이 발생하게 되어 산폐수라인(18)에서 다른 설비로 산폐수가 역류하여 다른 설비를 오염시키는 문제가 있었다.
In the conventional part clean facility, the contaminated DI WATER and polymer residues generated after the part cleaning in the wet bath 10 are discharged without filtration to the acid wastewater line 18, thereby causing the phenomenon that the inside of the wastewater pipe is clogged. There was a problem that the wastewater backflow from the wastewater line 18 to another facility to contaminate the other facility.

따라서 본 발명의 목적은 상기와 같은 문제를 해결하기 위해 파트크리닝 후 배출되는 폐수의 불순물을 여과하여 산폐수라인의 역류발생을 방지하는 파트크리닝설비의 배기라인 역류방지용 여과장치를 제공함에 있다.Accordingly, an object of the present invention is to provide an exhaust line backflow prevention filtration device of a part cleaning facility to prevent the backflow of the acid wastewater by filtering impurities in the wastewater discharged after the part cleaning to solve the above problems.

상기 목적을 달성하기 위한 본 발명의 DI WATER나 케미컬을 보관하고 있으며, 파트크리닝 시 DI WATER나 케미컬을 구스넥을 통해 공급하는 크린액공급부와, 상기 구스넥을 통해 공급되는 파트를 크리닝하고 크리닝한 폐수를 배출하는 웨트베쓰와, 상기 웨트베쓰로부터 오버플로우된 폐수를 받아 배출하는 오버플로우베쓰를 구비한 파트크리닝설비의 배기라인 역류방지용 여과장치에 있어서, 상기 웨트베쓰에 연결된 배기라인에 설치되어 상기 웨트베쓰로부터 배출된 폐수에 섞여 있는 폴리머찌꺼기 및 불순물을 여과하여 DI WATER와 케미컬만 배기라인을 통해 흐도록 하는 제1여과망와, 상기 오버플로우베쓰에 연결된 배기라인에 설치되어 상기 오버플로우베쓰로부터 배출된 폐수에 섞여 있는 폴리머찌꺼기 및 불순물을 여과하여 DI WATER와 케미컬만 배기라인을 통해 흐르도록 하는 제2여과망으로 구성함을 특징으로 한다.The DI WATER or chemicals of the present invention are stored to achieve the above object, and the cleaning liquid supply unit for supplying DI WATER or chemicals through gooseneck during part cleaning, and the wastewater cleaned and cleaned through the parts supplied through the gooseneck. An exhaust line backflow prevention filtration apparatus of a part cleaning facility having a wet bath for discharging and an overflow bath for receiving and discharging the wastewater overflowed from the wet bath, wherein the wet bath is installed in an exhaust line connected to the wet bath. A first filtration network for filtering polymer residues and impurities mixed in the wastewater discharged from the effluent and flowing only the DI WATER and the chemicals through the exhaust line, and installed in an exhaust line connected to the overflow bath to the wastewater discharged from the overflow bath. DI WATER and CHEMICAL EXHAUST LINE by filtering mixed polymer residue and impurities Characterized in that composed of a second filtration network to flow through.

이하 본 발명에 따른 바람직한 실시 예를 첨부한 도면을 참조하여 상세히 설명한다. 그리고 본 발명을 설명함에 있어서, 관련된 공지 기능 혹은 구성에 대한 구체적인 설명이 본 발명의 요지를 불필요하게 흐릴 수 있다고 판단되는 경우 그 상세한 설명을 생략한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the following description of the present invention, if it is determined that a detailed description of a related known function or configuration may unnecessarily obscure the subject matter of the present invention, the detailed description thereof will be omitted.

도 2는 본 발명의 실시 예에 따른 파트크리닝설비의 배기라인 역류방지용 여과장치의 구성도이다. 2 is a block diagram of an exhaust line backflow prevention filtration device of a part cleaning facility according to an embodiment of the present invention.

크린액공급부(14)는 DI WATER나 케미컬을 보관하고 있으며, 파트크리닝 시 DI WATER나 케미컬을 구스넥(goose neck)(16)을 통해 공급한다. 웨트베쓰(10)는 구 스넥(16)을 통해 공급되는 파트를 크리닝하고 크리닝한 폐수를 배출한다. 제1여과망(20)은 상기 웨트베쓰(10)에 연결된 배기라인에 설치되어 상기 웨트베쓰(10)로부터 배출된 폐수에 섞여 있는 폴리머찌꺼기 및 불순물을 여과하여 DI WATER와 케미컬만 배기라인(24)을 통해 흐도록 한다. 오버플로우베쓰(12)는 상기 웨트베쓰(10)로부터 오버플로우(OVERFLOW)된 폐수를 받아 배출한다. 제2여과망(22)은 상기 오버플로우베쓰(12)에 연결된 배기라인에 설치되어 상기 오버플로우베쓰(12)로부터 배출된 폐수에 섞여 있는 폴리머찌꺼기 및 불순물을 여과하여 DI WATER와 케미컬만 배기라인(24)을 통해 흐르도록 한다. 제1여과베쓰(26)는 설비의 배기라인(24)과 연결되어 배기라인(24)을 통해 플로우된 폐수등을 하단으로 유입하여 그 속도를 감소시키고, 속도가 감소된 폐수에 섞여있는 불순물들중에 무게가 무거운 불순물은 바닥에 가라앉는 침전현상을 거친다. 제3여과망(32)은 상기 제1여과베쓰(26)으로 유입된 폐수에 섞여있는 불순물중에 가벼운 불순물을 여과하여 폐수를 배출한다. 제2여과베쓰(28)는 제3여과망(32)을 통해 플로우된 폐수를 유입하여 그 폐수에 섞여있는 불순물들중에 무게가 무거운 불순물은 바닥에 가라앉는 침전현상을 거친다. 제4여과망(32)은 상기 제2여과베쓰(28)로 유입된 폐수에 섞여있는 불순물중에 가벼운 불순물을 여과하여 폐수를 배출한다. 그리고 제3여과베쓰(30)는 메인산폐수라인(38)로 폐수를 배출시키는 부분으로 제4여과망(34)을 통해 여과되어 플로우된 폐수를 경사로(40)를 거치며 속도가 증가하여 메인 산폐수라인(38)로 유입되도록 한다. 제5여과망(36)은 경사로(40)를 따라 플로우되는 폐수를 여과하여 메인산폐수라인(38)으로 불순물을 제외한 DI WATER만 배출한다. 상기 제1 내지 제5 여과망(20, 22,32, 34, 36)은 포켓식 여과망을 사용한다. The clean solution supply unit 14 stores DI WATER or chemicals, and supplies DI WATER or chemicals through a goose neck 16 during part cleaning. The wet bath 10 cleans the parts supplied through the old neck 16 and discharges the cleaned waste water. The first filtration network 20 is installed in an exhaust line connected to the wet bath 10 to filter polymer residues and impurities mixed in the wastewater discharged from the wet bath 10 to filter DI WATER and the chemical only exhaust line 24. To flow through. The overflow bath 12 receives waste water overflowed from the wet bath 10 and discharges it. The second filtration network 22 is installed in an exhaust line connected to the overflow bath 12 to filter polymer residues and impurities mixed in the wastewater discharged from the overflow bath 12 to filter the DI WATER and the chemical only exhaust line. 24). The first filtration bath 26 is connected to the exhaust line 24 of the facility to reduce the speed by flowing the waste water flowed through the exhaust line 24 to the lower side, and the impurities mixed in the waste water with reduced speed. Heavy impurities in the process undergo sedimentation, which sinks to the bottom. The third filtration network 32 filters the light impurities among the impurities mixed in the wastewater introduced into the first filtration bath 26 to discharge the wastewater. The second filtration bath 28 enters the wastewater flown through the third filtration network 32, and the heavy impurities among the impurities mixed in the wastewater sink through the precipitation phenomenon. The fourth filtration network 32 filters the light impurities among the impurities mixed in the wastewater introduced into the second filtration bath 28 to discharge the wastewater. In addition, the third filtration bath 30 discharges wastewater to the main acid wastewater line 38, and the wastewater flowed through the ramp 40 through the fourth filtration network 34 increases through the ramp 40 to increase the speed of the main wastewater. Allow flow to line 38. The fifth filtration network 36 filters wastewater flowing along the ramp 40 to discharge only DI WATER excluding impurities to the main acid wastewater line 38. The first to fifth filter nets 20, 22, 32, 34 and 36 use a pocket filter net.

크린액공급부(14)는 DI WATER나 케미컬을 보관하고 있으며, 파트크리닝 시 DI WATER나 케미컬을 구스넥(goose neck)(16)을 통해 공급한다. 웨트베쓰(10)는 구스넥(16)을 통해 공급되는 파트를 크리닝하고 크리닝한 폐수를 배출한다. 제1여과망(20)은 상기 웨트베쓰(10)로부터 배출된 폐수에 섞여 있는 폴리머찌꺼기 및 불순물을 여과하여 DI WATER와 케미컬만 배기라인(24)을 통해 흐도록 한다. 오버플로우베쓰(12)는 상기 웨트베쓰(10)로부터 오버플로우(OVERFLOW)된 폐수를 받아 배출한다. 제2여과망(22)은 상기 오버플로우베쓰(12)로부터 배출된 폐수에 섞여 있는 폴리머찌꺼기 및 불순물을 여과하여 DI WATER와 케미컬만 배기라인(24)을 통해 흐르도록 한다. 이렇게 제1 및 제2여과망(22)을 통해 배출된 폐수는 제1여과베쓰(26)로 인가되며, 제1여과베쓰(26)는 설비의 배기라인(24)과 연결되어 배기라인(24)을 통해 플로우된 폐수등을 하단으로 유입하여 그 속도가 감소시키고, 그 속도가 감소된 폐수에 섞여있는 불순물들중에 무게가 무거운 불순물은 바닥에 가라앉는 침전현상을 거치고 나머지 가벼운 불순물은 제3여과망(32)에 의해 여과된다. 상기 제3여과망(32)을 통해 배출된 폐수는 제2여과베쓰(28)로 인가되며, 제2여과베쓰(28)는 제3여과망(32)을 통해 플로우된 폐수는 상단으로 유입하여 폐수에 섞여있는 불순물들중에 무게가 무거운 불순물은 바닥에 가라앉는 침전현상을 거치고 나머지 가벼운 불순물은 제4여과망(34)에 의해 여과되도록 한다. 그리고 제3여과베쓰(30)는 메인산폐수라인(38)으로 폐수를 배출시키는 부분으로, 제4여과망(34)을 통해 여과되어 플로우된 폐수는 경사로(40)를 거치며 속도가 증가하여 제5여과망(36)을 거쳐 메인 산폐수라인(38)으로 유입된다. 이때 경사로(40)를 따라 플로우되는 폐수는 메인산폐수라인(38)에 설치된 제5여과망(36)을 거치며 불순물을 제외한 DI WATER만 메인산폐수라인(38)으로 유입되므로 파트크린닝 후 발생하는 모든 불순물들이 메인산폐수라인(38)으로 유입되지 않도록 하여 메인 산폐수라인(38)이 막혀 다른 설비로 산폐수가 역류되는 것을 방지할 수 있다.
The clean solution supply unit 14 stores DI WATER or chemicals, and supplies DI WATER or chemicals through a goose neck 16 during part cleaning. The wet bath 10 cleans the parts supplied through the gooseneck 16 and discharges the cleaned waste water. The first filtration network 20 filters the polymer residue and impurities mixed in the wastewater discharged from the wet bath 10 so that only the DI WATER and the chemical flow through the exhaust line 24. The overflow bath 12 receives waste water overflowed from the wet bath 10 and discharges it. The second filtration network 22 filters the polymer residues and impurities mixed in the wastewater discharged from the overflow bath 12 to flow only through the DI WATER and the chemical exhaust line 24. The wastewater discharged through the first and second filtration networks 22 is applied to the first filtration bath 26, and the first filtration bath 26 is connected to the exhaust line 24 of the facility and the exhaust line 24. The waste water flowed through the lower part flows into the lower part, and the speed is decreased. Among the impurities mixed in the waste water with reduced speed, heavy impurities go through the sedimentation phenomenon that sinks to the bottom, and the other light impurities go through the third filtration network ( 32). The wastewater discharged through the third filtration network 32 is applied to the second filtration bath 28, and the second filtration bath 28 flows through the third filtration network 32 to the top to the wastewater. Among the impurities that are mixed, heavier impurities pass through the settling phenomenon that sinks to the bottom and the remaining light impurities are filtered by the fourth filtration network 34. In addition, the third filtration bath 30 is a part for discharging wastewater to the main acid wastewater line 38, and the wastewater filtered and flowed through the fourth filtration network 34 passes through the ramp 40 to increase the speed. It enters the main acid wastewater line 38 via the filtering net 36. At this time, the wastewater flowing along the ramp 40 passes through the fifth filtration network 36 installed in the main acid wastewater line 38, and since only DI WATER excluding impurities flows into the main acid wastewater line 38, By preventing all impurities from flowing into the main wastewater line 38, the main wastewater line 38 may be blocked to prevent backflow of the wastewater to another facility.

상술한 바와 같이 본 발명은 파트크린설비에서 웨트베쓰와 오버플로우베쓰를 통해 배출되는 폐수를 1차 여과한 후 배기라인을 통해 흐르도록 하고, 배기라인을 통해 배출되는 폐수에 섞여있는 불순물중 무게가 무거운 불순물은 침전시키고 , 무게가 가벼운 불순물은 여과망에서 여과되어 메인 산폐수라인으로 불순물이 제거된 산폐수만을 배출하므로 산폐수라인이 막혀 다른 설비들로 산폐수가 역류되는 현상을 방지할 수 있는 이점이 있다.






As described above, in the present invention, the wastewater discharged through the wet bath and the overflow bath in the part clean facility is first filtered and flows through the exhaust line, and the weight of impurities mixed in the wastewater discharged through the exhaust line is increased. Heavy impurities are precipitated, and light weight impurities are filtered out of the filter network to discharge only the wastewater from which impurities are removed to the main wastewater line, preventing the wastewater line from clogging and preventing backflow of wastewater to other facilities. There is this.






Claims (5)

DI WATER나 케미컬을 보관하고 있으며, 파트크리닝 시 DI WATER나 케미컬을 구스넥을 통해 공급하는 크린액공급부와, 상기 구스넥을 통해 공급되는 파트를 크리닝하고 크리닝한 폐수를 배출하는 웨트베쓰와, 상기 웨트베쓰로부터 오버플로우된 폐수를 받아 배출하는 오버플로우베쓰를 구비한 파트크리닝설비의 배기라인 역류방지용 여과장치에 있어서, DI water and chemicals are stored, and during cleaning parts, the wet liquid supply unit for supplying the DI water or chemicals through the gooseneck, the wet bath for cleaning the parts supplied through the gooseneck and cleaning the waste water, and the wet bath. In the exhaust line backflow prevention filtration apparatus of the part cleaning equipment having an overflow bath for receiving the waste water overflowed from the 상기 웨트베쓰에 연결된 배기라인에 설치되어 상기 웨트베쓰로부터 배출된 폐수에 섞여 있는 폴리머찌꺼기 및 불순물을 여과하여 DI WATER와 케미컬만 배기라인을 통해 흐도록 하는 제1여과망와,A first filtration network installed in an exhaust line connected to the wet bath to filter polymer residues and impurities mixed in the wastewater discharged from the wet bath so that only DI WATER and chemicals flow through the exhaust line; 상기 오버플로우베쓰에 연결된 배기라인에 설치되어 상기 오버플로우베쓰로부터 배출된 폐수에 섞여 있는 폴리머찌꺼기 및 불순물을 여과하여 DI WATER와 케미컬만 배기라인을 통해 흐르도록 하는 제2여과망으로 구성함을 특징으로 하는 파트크리닝설비의 배기라인 역류방지용 여과장치. And a second filtration network installed in an exhaust line connected to the overflow bath to filter polymer residues and impurities mixed in wastewater discharged from the overflow bath so that only DI WATER and chemicals flow through the exhaust line. Filter for preventing the backflow of the exhaust line of the parts cleaning equipment. 제1항에 있어서,The method of claim 1, 상기 제1 및 제2여과망은 포켓식 여과망임을 특징으로 하는 파트크리닝설비의 배기라인 역류방지용 여과장치. The first and second filtration network is an exhaust line backflow prevention filter device of the part cleaning equipment, characterized in that the pocket filter network. 제2항에 있어서,The method of claim 2, 상기 배기라인을 통해 흐르는 폐수를 유입하여 상기 폐수에 섞여있는 불순물들을 침전 및 여과하여 메인 산폐수라인으로 불순물을 제외한 DI WATER만을 배출하는 여과베쓰부를 더 구비함을 특징으로 하는 파트크리닝설비의 배기라인 역류방지용 여과장치. The waste line of the part cleaning equipment, further comprising a filtration bath unit for discharging impurities mixed in the wastewater by introducing the wastewater flowing through the exhaust line to discharge only DI WATER excluding impurities to the main acid wastewater line. Backflow filtration device. 제3항에 있어서, 상기 여과베쓰부는, The method of claim 3, wherein the filter bath portion, 상기 배기라인과 연결되어 상기 배기라인을 통해 플로우된 폐수등을 하단으로 유입하여 그 속도를 감소시키고, 속도가 감소된 폐수에 섞여있는 불순물들중에 무게가 무거운 불순물이 바닥에 가라앉도록 하는 제1여과베쓰와,A first flow rate connected to the exhaust line to reduce the speed by flowing wastewater, etc. flowing through the exhaust line, to allow heavy weight impurities to settle on the floor among impurities mixed in the wastewater with reduced speed; Filtration bath, 상기 제1여과베쓰로 유입된 폐수에 섞여있는 불순물중에 가벼운 불순물을 여과하여 폐수를 배출하는 제3여과망과,A third filtration network for filtering light impurities from the impurities mixed in the wastewater introduced into the first filtration bath and discharging the wastewater; 상기 제3여과망을 통해 플로우된 폐수를 유입하여 그 폐수에 섞여있는 불순물들중에 무게가 무거운 불순물은 바닥에 가라앉도록 하는 제2여과베쓰와,A second filtration bath which introduces wastewater flown through the third filtration network and allows heavy impurities to sink to the bottom among impurities mixed in the wastewater; 상기 제2여과베쓰로 유입된 폐수에 섞여있는 불순물중에 가벼운 불순물을 여과하여 폐수를 배출하는 제4여과망과,A fourth filtration network for filtering light impurities from the impurities mixed in the wastewater introduced into the second filtration bath and discharging the wastewater; 상기 제4여과망을 통해 여과되어 플로우된 폐수를 경사로를 거치며 속도가 증가하여 메인 산폐수라인로 배출하도록 하는 제3여과베쓰와,A third filtration bath for increasing the speed of the wastewater filtered and flown through the fourth filtration network through a ramp to be discharged to the main acid wastewater line; 상기 경사로를 따라 플로우되는 폐수를 여과하여 메인산폐수라인으로 불순물을 제외한 DI WATER만 배출하는 제5여과망으로 구성함을 특징으로 하는 파트크리닝설비의 배기라인 역류방지용 여과장치. And a fifth filtration network for filtering the wastewater flowing along the ramp to discharge only DI WATER excluding impurities to the main acid wastewater line. 제4항에 있어서,The method of claim 4, wherein 상기 제3 내지 제5여과망은 포켓식 여과망임을 특징으로 하는 파트크리닝설비의 배기라인 역류방지용 여과장치. The third to fifth filtration network is an exhaust line backflow prevention filter device of the part cleaning equipment, characterized in that the pocket filter network.
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JPH021995A (en) * 1988-06-10 1990-01-08 Hamamatsu Photonics Kk Semiconductor photodetecting element and detector therewith
JPH101995A (en) * 1996-07-04 1998-01-06 Nippon Soda Co Ltd Scale preventive method of toilet drain pipe

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JPH021995A (en) * 1988-06-10 1990-01-08 Hamamatsu Photonics Kk Semiconductor photodetecting element and detector therewith
JPH101995A (en) * 1996-07-04 1998-01-06 Nippon Soda Co Ltd Scale preventive method of toilet drain pipe

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