KR100518392B1 - 신규한 에스테르 화합물 - Google Patents
신규한 에스테르 화합물 Download PDFInfo
- Publication number
- KR100518392B1 KR100518392B1 KR10-2002-0035531A KR20020035531A KR100518392B1 KR 100518392 B1 KR100518392 B1 KR 100518392B1 KR 20020035531 A KR20020035531 A KR 20020035531A KR 100518392 B1 KR100518392 B1 KR 100518392B1
- Authority
- KR
- South Korea
- Prior art keywords
- carbon atoms
- ester compounds
- formula
- monomer
- present
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D495/00—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms
- C07D495/12—Heterocyclic compounds containing in the condensed system at least one hetero ring having sulfur atoms as the only ring hetero atoms in which the condensed system contains three hetero rings
- C07D495/18—Bridged systems
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D307/00—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom
- C07D307/02—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings
- C07D307/26—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D307/30—Heterocyclic compounds containing five-membered rings having one oxygen atom as the only ring hetero atom not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D307/32—Oxygen atoms
- C07D307/33—Oxygen atoms in position 2, the oxygen atom being in its keto or unsubstituted enol form
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D309/00—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings
- C07D309/16—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member
- C07D309/28—Heterocyclic compounds containing six-membered rings having one oxygen atom as the only ring hetero atom, not condensed with other rings having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D309/30—Oxygen atoms, e.g. delta-lactones
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
Claims (3)
- 다음의 화학식 1의 에스테르 화합물:(화학식 1)(상기식에서, R1은 트리플루오로메틸이고, R2는 수소 또는 1 내지 4의 탄소수의 알킬기이고, R3 및 R4는 각각 단일결합 또는 1 내지 4 탄소원자의 알킬렌기이다.).
- 다음의 화학식 2의 에스테르 화합물:(화학식 2)(상기식에서, R1은 트리플루오로메틸이고, R5는 1 내지 4 탄소원자의 알킬렌기 또는 산소 원자이다.).
- 삭제
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2001-00190610 | 2001-06-25 | ||
JPJP-P-2001-00190611 | 2001-06-25 | ||
JP2001190610 | 2001-06-25 | ||
JP2001190611 | 2001-06-25 | ||
JPJP-P-2001-00362599 | 2001-11-28 | ||
JP2001362599 | 2001-11-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030001339A KR20030001339A (ko) | 2003-01-06 |
KR100518392B1 true KR100518392B1 (ko) | 2005-09-29 |
Family
ID=27347011
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2002-0035531A KR100518392B1 (ko) | 2001-06-25 | 2002-06-25 | 신규한 에스테르 화합물 |
Country Status (3)
Country | Link |
---|---|
US (1) | US6680389B2 (ko) |
KR (1) | KR100518392B1 (ko) |
TW (1) | TWI245043B (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7232638B2 (en) * | 2002-05-02 | 2007-06-19 | Shin-Etsu Chemical Co., Ltd. | Resist composition and patterning process |
WO2019159957A1 (ja) * | 2018-02-16 | 2019-08-22 | Jnc株式会社 | 重合性化合物、重合性組成物、重合体及びフォトレジスト用組成物 |
JP7236830B2 (ja) * | 2018-09-13 | 2023-03-10 | 株式会社ダイセル | 単量体、フォトレジスト用樹脂、フォトレジスト用樹脂組成物、及びパターン形成方法 |
CN112898313A (zh) * | 2021-01-21 | 2021-06-04 | 宁波南大光电材料有限公司 | 一种甲基丙烯酸酯类单体及其制备方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4491628A (en) | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
EP0249139B2 (en) | 1986-06-13 | 1998-03-11 | MicroSi, Inc. (a Delaware corporation) | Resist compositions and use |
US5310619A (en) | 1986-06-13 | 1994-05-10 | Microsi, Inc. | Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable |
JP2578646B2 (ja) | 1988-07-18 | 1997-02-05 | 三洋電機株式会社 | 非水系二次電池 |
JP3751065B2 (ja) | 1995-06-28 | 2006-03-01 | 富士通株式会社 | レジスト材料及びレジストパターンの形成方法 |
JPH09230595A (ja) | 1996-02-26 | 1997-09-05 | Nippon Zeon Co Ltd | レジスト組成物およびその利用 |
KR100536824B1 (ko) | 1996-03-07 | 2006-03-09 | 스미토모 베이클라이트 가부시키가이샤 | 산불안정성펜던트기를지닌다중고리중합체를포함하는포토레지스트조성물 |
US5843624A (en) | 1996-03-08 | 1998-12-01 | Lucent Technologies Inc. | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material |
JP3676918B2 (ja) * | 1997-10-09 | 2005-07-27 | 富士通株式会社 | レジスト材料及びレジストパターンの形成方法 |
-
2002
- 2002-06-24 TW TW091113790A patent/TWI245043B/zh not_active IP Right Cessation
- 2002-06-25 KR KR10-2002-0035531A patent/KR100518392B1/ko active IP Right Grant
- 2002-06-25 US US10/178,482 patent/US6680389B2/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
KR20030001339A (ko) | 2003-01-06 |
TWI245043B (en) | 2005-12-11 |
US6680389B2 (en) | 2004-01-20 |
US20020198390A1 (en) | 2002-12-26 |
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