KR100316272B1 - 레이저 어닐링 장비 - Google Patents
레이저 어닐링 장비 Download PDFInfo
- Publication number
- KR100316272B1 KR100316272B1 KR1019990047532A KR19990047532A KR100316272B1 KR 100316272 B1 KR100316272 B1 KR 100316272B1 KR 1019990047532 A KR1019990047532 A KR 1019990047532A KR 19990047532 A KR19990047532 A KR 19990047532A KR 100316272 B1 KR100316272 B1 KR 100316272B1
- Authority
- KR
- South Korea
- Prior art keywords
- silicon substrate
- laser
- vacuum chuck
- silicon
- laser beam
- Prior art date
Links
- 238000005224 laser annealing Methods 0.000 title abstract description 19
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 91
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 91
- 239000010703 silicon Substances 0.000 claims abstract description 91
- 239000000758 substrate Substances 0.000 claims abstract description 66
- 238000000034 method Methods 0.000 claims abstract description 19
- 238000005499 laser crystallization Methods 0.000 claims abstract description 14
- 238000000059 patterning Methods 0.000 claims abstract description 6
- 230000003287 optical effect Effects 0.000 claims abstract description 5
- 238000002425 crystallisation Methods 0.000 abstract description 7
- 230000008025 crystallization Effects 0.000 abstract description 7
- 238000001179 sorption measurement Methods 0.000 abstract description 4
- SBEQWOXEGHQIMW-UHFFFAOYSA-N silicon Chemical compound [Si].[Si] SBEQWOXEGHQIMW-UHFFFAOYSA-N 0.000 abstract description 2
- 239000010409 thin film Substances 0.000 description 12
- 238000010586 diagram Methods 0.000 description 4
- 238000007711 solidification Methods 0.000 description 3
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/12—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
- H01L27/1214—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
- H01L27/1259—Multistep manufacturing methods
- H01L27/127—Multistep manufacturing methods with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement
- H01L27/1274—Multistep manufacturing methods with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement using crystallisation of amorphous semiconductor or recrystallisation of crystalline semiconductor
- H01L27/1281—Multistep manufacturing methods with a particular formation, treatment or patterning of the active layer specially adapted to the circuit arrangement using crystallisation of amorphous semiconductor or recrystallisation of crystalline semiconductor by using structural features to control crystal growth, e.g. placement of grain filters
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02656—Special treatments
- H01L21/02664—Aftertreatments
- H01L21/02667—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth
- H01L21/02675—Crystallisation or recrystallisation of non-monocrystalline semiconductor materials, e.g. regrowth using laser beams
- H01L21/02686—Pulsed laser beam
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/022—Mountings; Housings
- H01S5/0225—Out-coupling of light
- H01S5/02253—Out-coupling of light using lenses
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Recrystallisation Techniques (AREA)
Abstract
Description
Claims (2)
- 레이저광원과,상기 레이저광원으로부터 나오는 레이저광의 에너지와 형상을 패터닝하는 광학시스템과,상기 패터닝된 레이저광에 의하여 레이저 결정화를 진행하기 위한 실리콘 기판을 진공흡착에 의하여 지지하는 진공척과,상기 진공척을 지지하되, 상기 진공척을 소정의 방향으로 운반하기 위한 수단으로서의 이동스테이지를 포함하는 레이저 어닐링 장비.
- 청구항 1에 있어서,상기 진공척에 설치되어 상하로 이동하면서 실리콘 기판을 상기 진공척으로부터 분리 혹은, 결합시키는 수단으로서의 이동실린더를 더 포함하는 레이저 어닐링 장비.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019990047532A KR100316272B1 (ko) | 1999-10-29 | 1999-10-29 | 레이저 어닐링 장비 |
US09/697,510 US6514339B1 (en) | 1999-10-29 | 2000-10-27 | Laser annealing apparatus |
US10/211,570 US6852162B2 (en) | 1999-10-29 | 2002-08-05 | Laser annealing apparatus |
US10/885,675 US7335260B2 (en) | 1999-10-29 | 2004-07-08 | Laser annealing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019990047532A KR100316272B1 (ko) | 1999-10-29 | 1999-10-29 | 레이저 어닐링 장비 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20010039229A KR20010039229A (ko) | 2001-05-15 |
KR100316272B1 true KR100316272B1 (ko) | 2001-12-12 |
Family
ID=19617664
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019990047532A KR100316272B1 (ko) | 1999-10-29 | 1999-10-29 | 레이저 어닐링 장비 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100316272B1 (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100848096B1 (ko) * | 2002-05-21 | 2008-07-24 | 삼성전자주식회사 | 다결정용 레이저 조사 장치 |
KR101983327B1 (ko) * | 2016-07-26 | 2019-05-29 | 에이피시스템 주식회사 | 레이저 처리장치 |
-
1999
- 1999-10-29 KR KR1019990047532A patent/KR100316272B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR20010039229A (ko) | 2001-05-15 |
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