KR100304917B1 - LCD and its manufacturing method - Google Patents
LCD and its manufacturing method Download PDFInfo
- Publication number
- KR100304917B1 KR100304917B1 KR1019980038624A KR19980038624A KR100304917B1 KR 100304917 B1 KR100304917 B1 KR 100304917B1 KR 1019980038624 A KR1019980038624 A KR 1019980038624A KR 19980038624 A KR19980038624 A KR 19980038624A KR 100304917 B1 KR100304917 B1 KR 100304917B1
- Authority
- KR
- South Korea
- Prior art keywords
- liquid crystal
- substrate
- display device
- crystal display
- layer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
- G02F1/133707—Structures for producing distorted electric fields, e.g. bumps, protrusions, recesses, slits in pixel electrodes
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1343—Electrodes
- G02F1/134309—Electrodes characterised by their geometrical arrangement
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
- G02F1/1362—Active matrix addressed cells
- G02F1/1368—Active matrix addressed cells in which the switching element is a three-electrode device
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/137—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering
- G02F1/139—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering based on orientation effects in which the liquid crystal remains transparent
- G02F1/1393—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells characterised by the electro-optical or magneto-optical effect, e.g. field-induced phase transition, orientation effect, guest-host interaction or dynamic scattering based on orientation effects in which the liquid crystal remains transparent the birefringence of the liquid crystal being electrically controlled, e.g. ECB-, DAP-, HAN-, PI-LC cells
Landscapes
- Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Mathematical Physics (AREA)
- Liquid Crystal (AREA)
- Geometry (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Spectroscopy & Molecular Physics (AREA)
Abstract
본 발명에 따른 액정표시소자는, 대향하는 제1기판 및 제2기판과, 상기한 제1기판과 제2기판 사이에 형성된 액정층과, 상기한 제1기판 상에 종횡으로 형성되어 화소영역을 정의하는 복수의 게이트배선 및 데이터배선과, 상기한 게이트배선과 데이터배선의 교차점에 형성되어 게이트전극, 반도체층, 및 소스/드레인전극으로 이루어진 박막트랜지스터와, 상기한 제1기판 상에 걸쳐서 형성된 전계유도창을 갖는 화소전극과, 상기한 제2기판 상에 전계왜곡홀을 갖는 컬러필터층과, 상기한 컬러필터층의 표면을 따라 일체로 형성된 공통전극과, 그리고 상기한 제1기판 및 제2기판 중 적어도 한 기판 상에 형성된 배향막으로 이루어진다.According to an exemplary embodiment of the present invention, a liquid crystal display device includes a first substrate and a second substrate facing each other, a liquid crystal layer formed between the first substrate and the second substrate, and a pixel region formed vertically and horizontally on the first substrate. A plurality of gate wirings and data wirings defined, a thin film transistor formed at an intersection point of the gate wirings and data wirings, the gate electrode, a semiconductor layer, and a source / drain electrode, and an electric field formed on the first substrate. A pixel electrode having an induction window, a color filter layer having an electric field distortion hole on the second substrate, a common electrode integrally formed along the surface of the color filter layer, and one of the first and second substrates It is made of an alignment film formed on at least one substrate.
본 발명에 따른 액정표시소자의 제조방법은, 제1 및 제2기판을 제공하는 단계와, 상기한 제1기판 상에 전계유도창을 갖는 화소전극을 형성하는 단계와, 상기한 제2기판 상에 복수의 전계왜곡홀을 갖는 컬러필터층을 형성하는 단계와, 그리고, 상기한 컬러필터층의 표면을 따라 일체로 공통전극을 형성하는 단계로 이루어진다.According to an aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, the method comprising: providing a first substrate and a second substrate, forming a pixel electrode having an electric field induction window on the first substrate, and forming the second substrate on the second substrate. Forming a color filter layer having a plurality of electric field distortion holes in the plurality; and forming a common electrode integrally along the surface of the color filter layer.
Description
본 발명은 액정표시소자에 관한 것으로, 특히 상판에 전계왜곡홀을 가지는 컬러필터층을 형성하고, 하판에 전계유도창을 가진 화소전극을 형성하여 전계를 왜곡시키는 액정표시소자(liquid crystal display device) 및 그 제조방법에 관한 것이다BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device. In particular, a liquid crystal display device for distorting an electric field by forming a color filter layer having an electric field distortion hole in an upper plate, and forming a pixel electrode having an electric field induction window in a lower plate; It is about the manufacturing method
최근, 액정을 배향하지 않고, 오픈영역을 가진 공통전극을 형성하여 액정을 구동하는 액정표시소자가 제안된 바 있다. 도 1은 종래 액정표시소자의 단위화소의 단면도이다.Recently, a liquid crystal display device for driving a liquid crystal by forming a common electrode having an open area without aligning the liquid crystal has been proposed. 1 is a cross-sectional view of a unit pixel of a conventional liquid crystal display device.
종래의 액정표시소자는, 제1기판(31) 및 제2기판(33)과, 제1기판(31) 위에 종횡으로 형성되어 제1기판을 복수의 화소영역으로 나누는 복수의 데이터배선 및 게이트배선과, 제1기판 상의 화소영역 각각에 형성되고 게이트전극(11), 게이트절연막(35), 반도체층(5), 오믹콘택층(Ohmic contact layer) 및 소스/드레인전극(7, 9)으로 구성된 박막트랜지스터(Thin Film Transistor ; TFT)와, 상기한 제1기판 전체에 걸쳐 형성된 보호막(37)과, 상기한 보호막 위에서 콘택홀(39)로써 드레인전극(9)과 연결되고 박막트랜지스터 및/또는 데이터배선, 게이트배선과 오버랩됨과 동시에 오픈영역(19)을 가지도록 형성된 화소전극(13)으로 이루어진다.Conventional liquid crystal display devices have a plurality of data wirings and gate wirings formed vertically and horizontally on the first substrate 31 and the second substrate 33 and on the first substrate 31 to divide the first substrate into a plurality of pixel regions. And a gate electrode 11, a gate insulating film 35, a semiconductor layer 5, an ohmic contact layer and source / drain electrodes 7 and 9 formed in each pixel region on the first substrate. A thin film transistor (TFT), a protective film 37 formed over the first substrate, and a drain hole 9 connected to the drain electrode 9 by a contact hole 39 on the protective film, and the thin film transistor and / or data The pixel electrode 13 is formed to have an open region 19 while overlapping the wiring and the gate wiring.
그리고, 상기한 제2기판 위에 상기한 게이트배선, 데이터배선, 및 박막트랜지스터에서 누설되는 빛을 차단하는 차광층(25)과, 상기한 차광층(25) 위에 형성된 컬러필터층(23)과, 상기한 컬러필터층(23) 위에 형성된 오버코트층(29)과, 상기한 오버코트층 위에 오픈영역(19)을 가지도록 형성된 공통전극(17)과, 그리고, 제1기판(31)과 제2기판(33) 사이에 형성된 액정층으로 이루어진다.The light blocking layer 25 for blocking light leaking from the gate wiring, the data wiring, and the thin film transistor on the second substrate, the color filter layer 23 formed on the light blocking layer 25, and An overcoat layer 29 formed on one color filter layer 23, a common electrode 17 formed to have an open region 19 on the overcoat layer, and a first substrate 31 and a second substrate 33. It consists of a liquid crystal layer formed between.
화소전극(13) 및 공통전극(17)의 오픈영역(19)은 상기한 액정층에 인가되는 전기장을 왜곡시켜 단위 화소 내에서 액정분자를 다양하게 구동시킨다. 이것은 상기한 액정표시소자에 전압을 인가할 때, 왜곡된 전기장에 의한 유전 에너지가 액정 방향자를 원하는 방향으로 위치시킴을 의미한다.The open region 19 of the pixel electrode 13 and the common electrode 17 distorts the electric field applied to the liquid crystal layer, thereby driving various liquid crystal molecules in the unit pixel. This means that when a voltage is applied to the liquid crystal display, the dielectric energy due to the distorted electric field places the liquid crystal director in a desired direction.
그러나, 상기한 액정표시소자는, 멀티도메인 효과를 얻기 위해 화소전극(13) 또는 공통전극(17)에 오픈영역(19)이 필요하며, 이를 위해서 액정표시소자의 제조공정 중 화소전극(13) 또는 공통전극(17)을 패터닝하는 공정이 추가된다.However, the liquid crystal display device requires an open region 19 in the pixel electrode 13 or the common electrode 17 to obtain a multi-domain effect. For this purpose, the pixel electrode 13 is used during the manufacturing process of the liquid crystal display device. Alternatively, a process of patterning the common electrode 17 is added.
또한, 상기한 오픈영역이 없거나 그 폭이 작으면 도메인 분할에 필요한 전기장의 왜곡 정도가 약하므로, 문턱값(Vth; threshold voltage) 이상의 전압이 걸렸을 때 액정의 방향자(director)가 안정한 상태에 이르는 시간은 상대적으로 길어진다는 문제점이 있다.In addition, if the open area is not present or the width thereof is small, the degree of distortion of the electric field required for domain division is weak. Therefore, when a voltage equal to or higher than a threshold voltage (V th ) is applied, the director of the liquid crystal is stable. There is a problem that the time to reach is relatively long.
본 발명은 상기한 종래기술의 문제점을 감안하여 이루어진 것으로, 멀티도메인 효과로 인한 광시야각 특성과, 전압 인가시 액정분자들의 안정된 움직임으로 인한 고휘도 특성을 가짐과 동시에 그 공정을 단순화한 액정표시소자 및 그 제조방법을 제공하는 것을 목적으로 한다.The present invention has been made in view of the above-described problems of the prior art, and has a wide viewing angle characteristic due to the multi-domain effect and a high luminance characteristic due to the stable movement of liquid crystal molecules when voltage is applied, and at the same time, the liquid crystal display device having simplified the process; It aims at providing the manufacturing method.
상기한 목적을 달성하기 위해, 본 발명에 따른 액정표시소자는, 대향하는 제1기판 및 제2기판과, 상기한 제1기판과 제2기판 사이에 형성된 액정층과, 상기한 제1기판 상에 종횡으로 형성되어 화소영역을 정의하는 복수의 게이트배선 및 데이터배선과, 상기한 게이트배선과 데이터배선의 교차점에 형성되어 게이트전극, 반도체층, 및 소스/드레인전극으로 이루어진 박막트랜지스터와, 상기한 제1기판 상에 걸쳐서 형성된 전계유도창을 갖는 화소전극과, 상기한 제2기판 상에 전계왜곡홀을 갖는 컬러필터층과, 상기한 컬러필터층의 표면을 따라 일체로 형성된 공통전극과, 그리고 상기한 제1기판 및 제2기판 중 적어도 한 기판 상에 형성된 배향막으로 이루어진다.In order to achieve the above object, the liquid crystal display device according to the present invention, the opposing first substrate and second substrate, the liquid crystal layer formed between the first substrate and the second substrate, and the first substrate on A plurality of gate wirings and data wirings formed vertically and horizontally in the upper and lower regions of the pixel region; A pixel electrode having an electric field induction window formed on the first substrate, a color filter layer having an electric field distortion hole on the second substrate, a common electrode integrally formed along the surface of the color filter layer, and And an alignment film formed on at least one of the first substrate and the second substrate.
상기한 액정표시소자는, 상기한 화소전극 밑에 패터닝되어 형성된 보호막을 포함하거나, 상기한 화소전극이 패터닝되어 형성된다.The liquid crystal display device may include a passivation layer formed under the pixel electrode, or may be formed by patterning the pixel electrode.
또한, 상기한 화소영역 및 배향막은 적어도 두 영역으로 분할되므로써, 상기한 액정층의 액정분자는 각 영역 상에서 서로 상이한 구동 및 배향 특성을 나타내며, 상기한 배향막은 비배향(non-rubbing)하거나 러빙배향 또는 광배향 처리된다.In addition, since the pixel region and the alignment layer are divided into at least two regions, the liquid crystal molecules of the liquid crystal layer exhibit different driving and alignment characteristics on each region, and the alignment layer is non-rubbing or rubbing. Or photoalignment treatment.
본 발명에 따른 액정표시소자의 제조방법은, 제1 및 제2기판을 제공하는 단계와, 상기한 제1기판 상에 전계유도창을 갖는 화소전극을 형성하는 단계와, 상기한 제2기판 상에 복수의 전계왜곡홀을 갖는 컬러필터층을 형성하는 단계와, 그리고, 상기한 컬러필터층의 표면을 따라 일체로 공통전극을 형성하는 단계로 이루어진다.According to an aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, the method comprising: providing a first and a second substrate, forming a pixel electrode having an electric field induction window on the first substrate, and Forming a color filter layer having a plurality of electric field distortion holes in the plurality; and forming a common electrode integrally along the surface of the color filter layer.
상기한 컬러필터층은 염료 또는 안료의 염색 또는 분산에 의해 형성되며, 감광막을 도포하는 단계와, 슬릿이 형성된 마스크를 통하여 광을 조사하는 단계와, 현상하는 단계로 이루어진다.The color filter layer is formed by dyeing or dispersing a dye or pigment, and applying a photosensitive film, irradiating light through a mask on which a slit is formed, and developing.
도 1은 종래의 액정표시소자의 단면도.1 is a cross-sectional view of a conventional liquid crystal display device.
도 2a 및 2b는 본 발명의 제1 및 제2실시예에 따른 액정표시소자의 단면도.2A and 2B are sectional views of the liquid crystal display device according to the first and second embodiments of the present invention.
도 3a∼3f는 본 발명의 액정표시소자에서 컬러필터층을 형성하는 공정을 나타내는 도면.3A to 3F are views showing a process of forming a color filter layer in the liquid crystal display device of the present invention.
도 4a 및 4b는 본 발명의 일 실시예에 따른 제1기판의 전계유도창 및 제2기판의 전계왜곡홀을 나타내는 평면도.4A and 4B are plan views illustrating electric field distortion windows of a first substrate and an electric field distortion hole of a second substrate according to an embodiment of the present invention.
도 5a 및 5b는 본 발명의 일 실시예에 따른 제1기판의 전계유도창 및 제2기판의 전계왜곡홀을 나타내는 평면도.5A and 5B are plan views illustrating electric field distortion windows of a first substrate and an electric field distortion hole of a second substrate according to an embodiment of the present invention.
도 6a, 6b, 및 6c는 본 발명의 일 실시예에 따른 제1기판의 전계유도창 및 제2기판의 전계왜곡홀을 나타내는 평면도.6A, 6B, and 6C are plan views illustrating field distortion windows of a first substrate and a field distortion hole of a second substrate according to an embodiment of the present invention;
도 7은 본 발명의 일 실시예에 따른 제1기판의 전계유도창 및 제2기판의 전계왜곡홀을 나타내는 평면도.7 is a plan view illustrating an electric field induction window of a first substrate and an electric field distortion hole of a second substrate according to an embodiment of the present invention.
도 8a 및 8b는 본 발명의 일 실시예에 따른 제1기판의 전계유도창 및 제2기판의 전계왜곡홀을 나타내는 평면도.8A and 8B are plan views illustrating electric field distortion windows of a first substrate and an electric field distortion hole of a second substrate according to an embodiment of the present invention.
* 도면의 주요부분에 대한 부호의 설명 *Explanation of symbols on the main parts of the drawings
1 : 게이트배선 3 : 데이터배선1: gate wiring 3: data wiring
5 : 반도체층 7 : 소스전극5 semiconductor layer 7 source electrode
9 : 드레인전극 10 : 마스크9 drain electrode 10 mask
11 : 게이트전극 13 : 화소전극11 gate electrode 13 pixel electrode
14 : 감광막 15 : 전계왜곡홀14 photosensitive film 15 electric field distortion hole
17 : 공통전극 19 : 오픈영역17: common electrode 19: open area
21, 41 : 전계유도창 23 : 컬러필터층21, 41: electric field induction window 23: color filter layer
25, 27 : 차광층 29 : 오버코트층25, 27: light shielding layer 29: overcoat layer
31 : 제1기판 33 : 제2기판31: first substrate 33: second substrate
35 : 게이트절연막 37 : 보호막35 gate insulating film 37 protective film
39 : 콘택홀39: contact hole
이하, 도면을 참조하여 본 발명에 따른 액정표시소자 및 그 제조방법을 상세하게 설명한다.Hereinafter, a liquid crystal display device and a method of manufacturing the same according to the present invention will be described in detail with reference to the drawings.
도 2a 및 2b는 본 발명의 제1 및 제2실시예에 따른 액정표시소자의 단면도이고, 도 3a∼3f는 본 발명의 액정표시소자에서 컬러필터층을 형성하는 공정을 나타내는 도면이다.2A and 2B are cross-sectional views of liquid crystal display devices according to the first and second embodiments of the present invention, and FIGS. 3A to 3F are views illustrating a process of forming a color filter layer in the liquid crystal display device of the present invention.
상기한 도면에 나타낸 바와 같이, 본 발명의 액정표시소자는, 제1기판(31) 및 제2기판(33)과, 제1기판(31) 위에 종횡으로 형성되어 제1기판을 복수의 화소영역으로 나누는 복수의 데이터배선(3) 및 게이트배선(1)과, 제1기판(31) 상의 화소영역 각각에 형성되고 게이트전극(11), 게이트절연막(35), 반도체층(5), 오믹콘택층(Ohmic contact layer) 및 소스/드레인전극(7, 9)으로 구성된 박막트랜지스터와, 상기한 제1기판(31) 전체에 걸쳐 형성된 전계유도창을 갖는 보호막(37)과, 상기한 보호막 위에서 드레인전극(9)과 연결되고 박막트랜지스터 및/또는 데이터배선(3), 게이트배선(1)과 오버랩 되도록 형성된 화소전극(13)으로 이루어진다.As shown in the above drawings, the liquid crystal display device of the present invention is formed on the first substrate 31 and the second substrate 33 and the first substrate 31 vertically and horizontally to form a plurality of pixel regions of the first substrate. A plurality of data wirings 3 and gate wirings 1 and pixel regions formed on the first substrate 31 and divided by the gate electrode 11, the gate insulating film 35, the semiconductor layer 5, and the ohmic contact. A protective film 37 having a thin film transistor composed of an ohmic contact layer and source / drain electrodes 7 and 9, an electric field induction window formed over the first substrate 31, and a drain on the protective film. The pixel electrode 13 is connected to the electrode 9 and formed to overlap the thin film transistor and / or the data wiring 3 and the gate wiring 1.
그리고, 제2기판(33) 위에 상기한 게이트배선(1), 데이터배선(3), 및 박막트랜지스터에서 누설되는 빛을 차단하는 차광층(27)과, 전계왜곡홀을 가지도록 형성된 컬러필터층(23)과, 상기한 컬러필터층(23)의 표면을 따라 일체로 형성된 공통전극(17)과, 그리고, 제1기판(31)과 제2기판(33) 사이에 형성된 액정층으로 이루어진다.The light blocking layer 27 for blocking light leaking from the gate wiring 1, the data wiring 3, and the thin film transistor on the second substrate 33, and a color filter layer formed to have an electric field distortion hole ( 23, a common electrode 17 integrally formed along the surface of the color filter layer 23, and a liquid crystal layer formed between the first substrate 31 and the second substrate 33.
상기한 액정표시소자에서, 컬러필터층(23)과 액정층의 반응에 의한 신뢰성 저하를 막기 위해 보호막을 형성할 수 있으며, 이 경우 상기한 컬러필터층(23) 위에 오버코트층을 형성하고, 그 위에 공통전극(17)을 형성한다.In the above liquid crystal display device, a protective film may be formed to prevent a decrease in reliability caused by the reaction of the color filter layer 23 and the liquid crystal layer. In this case, an overcoat layer is formed on the color filter layer 23 and the common layer thereon. The electrode 17 is formed.
상기한 구조의 액정표시소자를 제조하기 위해서는, 우선, 제1기판(31)의 화소영역 각각에 게이트전극(11), 게이트절연막(35), 반도체층(5), 오믹콘택층 및 소스/드레인전극(7, 9)으로 이루어진 박막트랜지스터를 형성한다. 이 때, 제1기판(31)을 복수의 화소영역으로 나누는 복수의 게이트배선(1) 및 데이터배선(3)이 형성된다. 상기한 게이트전극(11), 게이트/데이터배선(1, 3) 및 소스/드레인전극(7, 9)은 Al, Mo, Cr, Ta 또는 Al합금 등과 같은 금속을 스퍼터링(sputtering)방법으로 적층한 후 패터닝(patterning)하여 형성하고, 반도체층(5) 및 오믹콘택층은 각각 a-Si 및 n+a-Si을 플라즈마 CVD(Plasma Chemical Vapor Deposition)방법으로 적층한 후 패터닝하여 형성하며, 게이트절연막(35)은 SiNX또는 SiOX를 플라즈마 CVD방법으로 적층한 후 패터닝하여 형성한다. 이어서, 제1기판(31) 전체에 걸쳐 BCB(BenzoCycloButene), 아크릴수지(acrylic resin), 폴리이미드(polyimide) 화합물, SiNX또는 SiOX등의 물질로 보호막(37)을 형성하고, ITO(indium tin oxide), Al 또는 Cr 등과 같은 금속을 스퍼터링방법으로 적층한 후 패터닝하여 화소전극(13)을 형성한다. 상기한 보호막(37)에 전계유도창(21 또는 41)을 형성하여 전계 왜곡 효과를 내도록 한다. 또한, 박막트랜지스터의 소스/드레인전극(7, 9)은 상기한 화소전극(13)의 콘택홀(39)을 통해 전기적으로 접속되거나, 일부 화소영역과 데이터와 접속되게 한다.In order to manufacture the liquid crystal display device having the above-described structure, first, the gate electrode 11, the gate insulating film 35, the semiconductor layer 5, the ohmic contact layer and the source / drain in each pixel region of the first substrate 31 are first manufactured. A thin film transistor consisting of electrodes 7 and 9 is formed. At this time, a plurality of gate wirings 1 and data wirings 3 which divide the first substrate 31 into a plurality of pixel regions are formed. The gate electrode 11, the gate / data wirings 1 and 3, and the source / drain electrodes 7 and 9 are formed by sputtering a metal such as Al, Mo, Cr, Ta, or an Al alloy. After patterning (patterning), the semiconductor layer 5 and the ohmic contact layer is formed by laminating a-Si and n + a-Si by plasma CVD (Plasma Chemical Vapor Deposition) method and patterning, respectively, the gate insulating film Denoted at 35 is formed by laminating SiN X or SiO X by plasma CVD. Subsequently, the protective film 37 is formed of a material such as BCB (BenzoCycloButene), an acrylic resin, a polyimide compound, SiN X or SiO X and the like, and the ITO (indium) is formed over the first substrate 31. A metal electrode 13 is formed by stacking a metal such as tin oxide), Al, or Cr by a sputtering method and then patterning the metal. An electric field induction window 21 or 41 is formed in the protective film 37 to produce an electric field distortion effect. In addition, the source / drain electrodes 7 and 9 of the thin film transistor may be electrically connected through the contact hole 39 of the pixel electrode 13 or may be connected to some pixel regions and data.
제2기판(33) 위에는 금속을 스퍼터링방법으로 적층하고, 에칭하여 차광층(27)을 형성하고, R, G, B(Red, Green, Blue) 소자가 화소마다 반복되도록 컬러필터층(23)을 형성한다. 상기한 공통전극(17)은 화소전극(13)과 마찬가지로 ITO 등과 같은 투명전극으로 형성하며, 제1기판(31)과 제2기판(33) 사이에 액정을 주입하므로써 액정표시소자를 완성한다.Metals are deposited on the second substrate 33 by a sputtering method, etched to form a light shielding layer 27, and the color filter layer 23 is formed so that R, G, and B (red, green, blue) elements are repeated for each pixel. Form. Like the pixel electrode 13, the common electrode 17 is formed of a transparent electrode such as ITO, and the liquid crystal display device is completed by injecting liquid crystal between the first substrate 31 and the second substrate 33.
상기한 컬러필터층(23)을 제조하는 공정에 있어서, 일반적으로 컬러필터를 제조하는 방법에는 염색법과 분산법이 있으며, 이것은 다시 염료를 색소로 하여 염색 및 분산하는 방법과 안료를 색소로 하여 분산하는 방법으로 나뉘어 진다.In the above-described process of manufacturing the color filter layer 23, there are generally a method of manufacturing a color filter, a dyeing method and a dispersion method, which are again dyeing and dispersing the dye as a dye and dispersing the pigment as a pigment Divided into ways.
이 중, 염료 염색법은 투명 기판 상에 가염성, 감광성수지를 노광 및 현상한 후 염색액으로 염색하는 방법이며, 염료 분산법은 염료를 분산한 폴리이미드막을 포토레지스트를 이용하여 에칭하는 방법이다. 또한, 안료 분산법은 감광성 수지에 안료를 분산한 감광성 재료를 도포한 후 노광 및 현상하는 방법과 폴리이미드 중에 안료를 분산한 비감광성 재료를 포토레지스트를 사용하여 에칭하는 방법으로 분류할 수 있다.Among these, the dye dyeing method is a method of dyeing with a dyeing solution after exposing and developing the salt and photosensitive resin on a transparent substrate, the dye dispersion method is a method of etching a polyimide film dispersed with a dye using a photoresist. Moreover, the pigment dispersion method can be classified into the method of exposing and developing after apply | coating the photosensitive material which disperse | distributed the pigment to the photosensitive resin, and the method of etching the non-photosensitive material which disperse | distributed the pigment in polyimide using a photoresist.
도 3a∼3f는 본 발명의 일 실시예에 따른 컬러필터층을 형성하는 공정을 나타내는 도면이다. 먼저, 도 3a에 나타내듯이, 제2기판(33) 위에 차광층(27)을 형성한 후, 도 3b에 나타내듯이 가염성 감광막(14)을 도포하고, 도 3c에 나타내듯이 마스크(10)를 사용하여 정면노광을 실시한다. 이 때, 여러 가지 모양의 슬릿이 형성된 마스크를 이용하여, 컬러필터층(23)을 형성함과 동시에, 전계왜곡홀(15)을 패터닝한다. 즉, 도 3d에 나타내듯이, 전계왜곡홀(15)을 가지도록 컬러필터층(23)을 패터닝하고, 도 3e에 나타내듯이 원하는 색(R, G, B)을 염색하여 고착시킨다. 계속해서, 도 3b∼3e의 과정을 반복하여, 도 3f에 나타낸 바와 같이 기판 상에 컬러필터소자(R, G, B)를 형성한다.3A to 3F are views illustrating a process of forming a color filter layer according to an embodiment of the present invention. First, as shown in FIG. 3A, the light shielding layer 27 is formed on the second substrate 33, and then, as shown in FIG. 3B, the salt-sensitive photosensitive film 14 is applied, and as shown in FIG. 3C, the mask 10 is applied. To perform front exposure. At this time, the color filter layer 23 is formed using the mask in which the slits of various shapes are formed, and the field distortion hole 15 is patterned. That is, as shown in FIG. 3D, the color filter layer 23 is patterned to have the field distortion hole 15, and the desired colors R, G, and B are dyed and fixed as shown in FIG. 3E. Subsequently, the processes of FIGS. 3B to 3E are repeated to form the color filter elements R, G, and B on the substrate as shown in FIG. 3F.
상기한 공통전극(17)은, 컬러필터층(23)의 표면을 따라 형성되므로, 컬러필터층(23)의 전계왜곡홀(15)에 의해 전기장을 왜곡시키므로 멀티도메인 효과를 나타낸다. 즉, 컬러필터층(23)의 두께를 1.0㎛∼2.0㎛ 정도로 형성함으로써 응답특성을 향상시키고, 전계왜곡홀(15)에 의해 전기장 왜곡효과를 크게 하며, 따라서 액정표시소자의 구동 시 액정분자를 안정하게 배향하여 멀티도메인 효과를 증대시킨다.Since the common electrode 17 is formed along the surface of the color filter layer 23, the electric field is distorted by the electric field distortion hole 15 of the color filter layer 23, thereby exhibiting a multi-domain effect. That is, by forming the thickness of the color filter layer 23 in the range of about 1.0 μm to 2.0 μm, the response characteristics are improved, and the electric field distortion effect is increased by the field distortion holes 15, and thus the liquid crystal molecules are stabilized when the liquid crystal display is driven. To increase the multidomain effect.
도 4 내지 도 8은 본 발명의 일 실시예에 따른 여러 가지 제1기판의 전계유도창 및 전계왜곡홀을 나타내는 평면도이다.4 to 8 are plan views illustrating electric field induction windows and electric field distortion holes of various first substrates according to an exemplary embodiment of the present invention.
상기한 도면에 나타낸 바와 같이, 전계왜곡홀(15)은, 가로, 세로, 및 양 대각선으로 길게 패터닝하거나, 원형상, ×자 형상, +자 형상, 및 ×자와 +자 형상을 동시에 패터닝하여 상기한 화소전극과 함께 4도메인 및 멀티도메인으로 분할한 효과를 구현한다.As shown in the drawing, the field distortion hole 15 is patterned in a long, horizontal, vertical, and diagonal direction, or simultaneously patterned circular, ×, +, and × and + shapes. The effect of dividing into 4 domains and multi domains together with the pixel electrode is realized.
또한, 상기한 화소전극(13)은 전계유도창(21, 41)을 형성하여 멀티도메인 효과를 구현한다. 전계유도창(41)은 보호막(37)을 여러 가지 형상으로 에칭하고 화소전극(13)을 형성하여 만들고, 전계유도창(21)은 화소전극(13)이 형성된 상태에서 에칭하여 만든다. 상기한 전계유도창(21, 41)은, 가로, 세로, 및 양 대각선으로 길게 패터닝하거나, 원형상, ×자 형상, +자 형상, 및 ×자와 +자 형상을 동시에 패터닝하여 4도메인 및 멀티도메인으로 분할한 효과를 구현한다. 상기한 전계왜곡홀과 전계유도창을 액정표시소자의 상·하판의 구분 없이 여러 형상의 패터닝을 적용할 수 있다.In addition, the pixel electrode 13 forms electric field induction windows 21 and 41 to implement a multi-domain effect. The field induction window 41 is formed by etching the protective film 37 in various shapes and forming the pixel electrode 13, and the field induction window 21 is made by etching in the state where the pixel electrode 13 is formed. The electric field induction windows 21 and 41 are long, horizontally, vertically, and diagonally long patterned, or simultaneously patterned circular, ×, +, and × and + shapes to form 4 domains and multiples. Implement the effect of dividing into domains. Various shapes of patterning may be applied to the electric field distortion hole and the electric field induction window without distinguishing the upper and lower plates of the liquid crystal display.
추가하여, 본 발명의 액정표시소자는 상기한 제1기판 및/또는 제2기판 전체에 걸쳐 배향막(도면에 나타내지 않음)을 형성한다. 이 때, 상기한 배향막을 구성하는 배향물질로서는 폴리아미드(polyamide) 또는 폴리이미드(polyimide)계 화합물, PVA(polyvinylalcohol), 폴리아믹산(polyamic acid) 또는 SiO2등의 물질을 사용하며, 러빙법을 사용하여 배향방향을 결정하는 경우, 그 밖의 러빙처리에 적합한 물질이라면 어떤 것이라도 적용 가능하다.In addition, the liquid crystal display device of the present invention forms an alignment film (not shown) over the entirety of the first substrate and / or the second substrate. In this case, a material such as polyamide or polyimide compound, PVA (polyvinylalcohol), polyamic acid or SiO 2 may be used as the alignment material constituting the alignment layer. In the case of determining the orientation direction by use, any material suitable for other rubbing treatments can be applied.
또한, 상기한 배향막을 광반응성이 있는 물질, 즉, PVCN(polyvinylcinnamate), PSCN(polysiloxanecinnamate), 또는 CelCN(cellulosecinnamate)계 화합물 등의 물질로 구성하여 광배향막을 형성할 수 있으며, 그 밖의 광배향처리에 적합한 물질이라면 어떤 것이라도 적용 가능하다. 상기한 광배향막에는 광을 적어도 1회 조사하여, 액정분자의 방향자가 이루는 배향각(alignment angle), 그 배향방향(alignment direction), 및 프리틸트각(pretilt angle), 그 프리틸트각 방향(pretilt angle direction)을 동시에 결정하고, 그로 인한 액정의 배향 안정성을 확보한다. 이와 같은, 광배향에 사용되는 광은 자외선 영역의 광이 적합하며, 비편광, 선편광, 및 부분편광된 광 중에서 어떤 광을 사용하여도 무방하다.In addition, the alignment layer may be formed of a photoreactive material, that is, a material such as PVCN (polyvinylcinnamate), PSCN (polysiloxanecinnamate), or CelCN (cellulosecinnamate) -based compound to form a photoalignment film, and other optical alignment treatment Any material suitable for is applicable. The photo-alignment film is irradiated with light at least once so that the alignment angle, alignment direction, and pretilt angle of the liquid crystal molecules are formed, and the pretilt angle direction. angle direction) is determined at the same time, thereby ensuring the orientation stability of the liquid crystal. As for the light used for the optical alignment, light in the ultraviolet region is suitable, and any light among non-polarized light, linearly polarized light, and partially polarized light may be used.
그리고, 상기한 러빙법 또는 광배향법은 제1기판 또는 제2기판 중 어느 한 기판에만 적용하거나 양 기판 모두에 처리하여도 되며, 양 기판에 서로 다른 배향처리를 하거나, 배향막만 형성하고 배향처리를 하지 않는 것도 가능하다.The rubbing method or the photo-alignment method may be applied to only one of the first substrates or the second substrates, or may be treated on both substrates, or may be subjected to different alignment treatments on both substrates, or only an alignment film is formed and the alignment treatment is performed. It is also possible not to.
또한, 상기한 배향처리를 하므로써 적어도 두 영역으로 분할된 멀티도메인 액정표시소자를 형성하여, 액정층의 액정분자가 각 영역 상에서 서로 상이하게 배향하도록 할 수 있다. 즉, 각 화소를 +자 또는 ×자와 같이 네 영역으로 분할하거나, 가로, 세로 또는 양 대각선으로 분할하고, 각 영역에서와 각 기판에서의 배향처리 또는 배향방향을 다르게 형성하므로써 멀티도메인 효과를 구현한다. 분할된 영역 중 적어도 한 영역을 비배향 영역으로 할 수 있으며, 전 영역을 비배향 영역으로 하는 것도 가능하다.In addition, by performing the above-described alignment process, a multi-domain liquid crystal display device divided into at least two regions may be formed so that the liquid crystal molecules of the liquid crystal layer may be differently aligned on each region. That is, the multi-domain effect is realized by dividing each pixel into four regions, such as + or × characters, or by dividing them into horizontal, vertical, or diagonal lines, and by forming different alignment processes or orientation directions in each region and each substrate. do. At least one of the divided regions may be a non-oriented region, and the entire region may be a non-oriented region.
그리고, 상기한 본 발명의 액정표시소자는, 액정층을 구성하는 액정분자의 장축이 상기한 제1기판 및 제2기판의 기판 면에 대해 평행하게 배향되는 수평배향(homogeneous alignment), 또는 수직하게 배향되는 수직배향(homeotropic alignment)이 가능하며, 상기한 제1기판 또는 제2기판의 기판 면에 대해 특정한 각을 이루며 배향되는 경사배향(tilted alignment)이나, 트위스트하게 배향되는 트위스트배향(twisted alignment), 제1기판 또는 제2기판 중 어느 한 기판의 기판 면에 대해 수평하게 배향되고 나머지 한 기판의 기판 면에 대해 수직하게 배향되는 하이브리드배향(hybrid alignment) 등 어떤 형태의 배향 및 모드에도 적용이 가능하다는 장점이 있다.In the liquid crystal display device of the present invention described above, the long axis of the liquid crystal molecules constituting the liquid crystal layer is arranged in a horizontal alignment or vertically aligned parallel to the substrate surfaces of the first substrate and the second substrate. Oriented homeotropic alignment is possible, and tilted alignment or twisted alignment is oriented at a specific angle with respect to the substrate surface of the first or second substrate. Can be applied to any type of orientation and mode, such as hybrid alignment, which is oriented horizontally with respect to the substrate face of either the first substrate or the second substrate and perpendicular to the substrate face of the other substrate. Has the advantage.
본 발명의 액정표시소자는 전계왜곡홀을 가진 컬러필터층을 형성하고, 화소전극에 전계유도창을 형성하여 전계왜곡을 유도하므로써, 공정의 단순화와 함께, 멀티도메인 효과를 극대화하며, 광시야각을 구현하는 효과가 있다.The liquid crystal display of the present invention forms a color filter layer having an electric field distortion hole, induces an electric field distortion by forming an electric field induction window in the pixel electrode, thereby simplifying the process, maximizing a multi-domain effect, and realizing a wide viewing angle. It is effective.
또한, 배향처리를 할 경우, 형성되는 프리틸트 및 앵커링 에너지에 의해 빠른 응답속도(response time) 및 안정한 액정구조를 얻을 수 있다. 더욱, 기존의 컬러필터 제조 시에 사용되는 마스크에 슬릿을 형성하고, 이를 이용하여 컬러필터층에 전계왜곡홀을 형성하므로써, 공통전극을 패터닝하는 공정을 생략할 수 있다.In addition, when the alignment process is performed, a fast response time and a stable liquid crystal structure can be obtained by the pretilt and anchoring energy formed. Further, by forming a slit in a mask used in manufacturing a conventional color filter and using the same to form an electric field distortion hole in the color filter layer, the process of patterning the common electrode can be omitted.
Claims (30)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019980038624A KR100304917B1 (en) | 1998-09-18 | 1998-09-18 | LCD and its manufacturing method |
US09/537,570 US6654090B1 (en) | 1998-09-18 | 2000-03-30 | Multi-domain liquid crystal display device and method of manufacturing thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019980038624A KR100304917B1 (en) | 1998-09-18 | 1998-09-18 | LCD and its manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20000020155A KR20000020155A (en) | 2000-04-15 |
KR100304917B1 true KR100304917B1 (en) | 2002-07-18 |
Family
ID=19551054
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019980038624A KR100304917B1 (en) | 1998-09-18 | 1998-09-18 | LCD and its manufacturing method |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR100304917B1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100719920B1 (en) * | 2004-11-17 | 2007-05-18 | 비오이 하이디스 테크놀로지 주식회사 | Valley vertical align liquid crystal display |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100662490B1 (en) * | 2000-10-20 | 2007-01-02 | 엘지.필립스 엘시디 주식회사 | Multidomain liquid crystal display and method for fabricating it |
KR100813023B1 (en) * | 2001-11-02 | 2008-03-13 | 삼성전자주식회사 | Liquid crystal display panel and method for fabricating thereof |
KR20040001333A (en) * | 2002-06-27 | 2004-01-07 | 비오이 하이디스 테크놀로지 주식회사 | Vva mode liquid crystal display |
KR100710159B1 (en) * | 2002-08-28 | 2007-04-20 | 엘지.필립스 엘시디 주식회사 | Liquid Crystal Display device |
TW200528831A (en) | 2004-01-06 | 2005-09-01 | Samsung Electronics Co Ltd | Substrate for a display apparatus |
KR101222973B1 (en) * | 2006-05-30 | 2013-01-17 | 엘지디스플레이 주식회사 | Liquid crystal display and method of manufacturing the same |
KR101636400B1 (en) * | 2015-07-22 | 2016-07-06 | 삼성디스플레이 주식회사 | Liquid crystal display panel |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01265231A (en) * | 1988-04-15 | 1989-10-23 | Seiko Epson Corp | Liquid crystal display device |
JPH0356942A (en) * | 1989-07-26 | 1991-03-12 | Hitachi Ltd | Liquid crystal display device |
-
1998
- 1998-09-18 KR KR1019980038624A patent/KR100304917B1/en not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01265231A (en) * | 1988-04-15 | 1989-10-23 | Seiko Epson Corp | Liquid crystal display device |
JPH0356942A (en) * | 1989-07-26 | 1991-03-12 | Hitachi Ltd | Liquid crystal display device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100719920B1 (en) * | 2004-11-17 | 2007-05-18 | 비오이 하이디스 테크놀로지 주식회사 | Valley vertical align liquid crystal display |
Also Published As
Publication number | Publication date |
---|---|
KR20000020155A (en) | 2000-04-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100313949B1 (en) | Multi-domain Liquid Crystal Display Device | |
KR100480814B1 (en) | Multi-domain liquid crystal display device | |
KR100313952B1 (en) | Multi-domain liquid crystal display device | |
KR100357213B1 (en) | Multi-domain liquid crystal display device | |
KR100357216B1 (en) | Multi-domain liquid crystal display device | |
KR100504532B1 (en) | Multi-domain liquid crystal display device | |
KR100587364B1 (en) | Multi-domain liquid crystal display device | |
US6654090B1 (en) | Multi-domain liquid crystal display device and method of manufacturing thereof | |
KR100339332B1 (en) | Multi-domain liquid crystal display device | |
KR20020019185A (en) | Multi domain liquid crystal display device and method for fabricating the same | |
KR100308161B1 (en) | Multi-domain liquid crystal display device | |
KR100304917B1 (en) | LCD and its manufacturing method | |
KR100323735B1 (en) | Multi-domain liquid crystal display device | |
KR100357217B1 (en) | Multi-domain liquid crystal display device | |
KR100313951B1 (en) | Multi-domain liquid crystal display device | |
KR100519366B1 (en) | Multi-domain liquid crystal display device | |
KR100504533B1 (en) | Multi-domain liquid crystal display device | |
KR100313950B1 (en) | Multi-domain liquid crystal display device | |
KR100327443B1 (en) | Multi-domain liquid crystal display device | |
KR100357215B1 (en) | Multi-domain liquid crystal display device | |
KR100323734B1 (en) | Multi-domain liquid crystal display device | |
KR100313948B1 (en) | Multi-domain liquid crystal display device | |
KR100304916B1 (en) | Transverse electric field liquid crystal display device | |
KR100290923B1 (en) | Multi-domain Liquid Crystal Display Device | |
KR100277929B1 (en) | Multi-domain liquid crystal display device |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A201 | Request for examination | ||
N231 | Notification of change of applicant | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20130619 Year of fee payment: 13 |
|
FPAY | Annual fee payment |
Payment date: 20140630 Year of fee payment: 14 |
|
FPAY | Annual fee payment |
Payment date: 20150629 Year of fee payment: 15 |
|
FPAY | Annual fee payment |
Payment date: 20160630 Year of fee payment: 16 |
|
LAPS | Lapse due to unpaid annual fee |