KR100213769B1 - Fluorescent plane of crt - Google Patents
Fluorescent plane of crt Download PDFInfo
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- KR100213769B1 KR100213769B1 KR1019960029543A KR19960029543A KR100213769B1 KR 100213769 B1 KR100213769 B1 KR 100213769B1 KR 1019960029543 A KR1019960029543 A KR 1019960029543A KR 19960029543 A KR19960029543 A KR 19960029543A KR 100213769 B1 KR100213769 B1 KR 100213769B1
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Abstract
본 발명은 음극선관의 형광면에 관한 것으로, 특히 판넬의 내면에 형성되는 형광면을 평탄하도록 도포하여 BM층이 형성되어 있는 부위에서 광의 반사효과에 의해 스크린 표면에 형성되는 투과광은 BM층에 흡수 및 난반사 현상이 일어나지 않도록 함으로서 음극선관의 휘도 및 포커스 특성을 향상시키도록 한 것으로서, 요철되어 있는 판넬 내면에 오목부를 형성하고, 그부위에 형광체층이 도포되도록 구성하였다.The present invention relates to a fluorescent surface of a cathode ray tube, and in particular, the fluorescent surface formed on the inner surface of the panel is coated so that the transmitted light formed on the surface of the screen is reflected and diffused by the BM layer at the portion where the BM layer is formed. In order to improve the brightness and focus characteristics of the cathode ray tube by preventing the phenomenon from occurring, a concave portion was formed on an uneven panel inner surface, and the phosphor layer was applied to the portion.
Description
제1도는 일반적인 음극선관의 단면도.1 is a cross-sectional view of a typical cathode ray tube.
제2도는 종래 음극선관의 형광면 상세도.2 is a detailed view of a fluorescent surface of a conventional cathode ray tube.
제3도는 본 발명 음극선관의 형광면 상세도.Figure 3 is a detailed view of the fluorescent surface of the cathode ray tube of the present invention.
제4도는 종래 형광면에서의 배광 분포도.4 is a light distribution diagram of a conventional fluorescent surface.
제5도는 본 발명에 의한 형광면에서의 배광 분포도.5 is a light distribution diagram on the fluorescent surface according to the present invention.
제6도는 종래와 본발명의 투과광 분포 비교도.Figure 6 is a comparison of the transmission light distribution of the prior art and the present invention.
제7a, b도는 본 발명에서 BM층과 판넬에 오목부를 형성하는 공정을 나타낸 도면.Figure 7a, b is a view showing a step of forming a recess in the BM layer and the panel in the present invention.
* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
101 : 판넬 102 : 돌출부101: panel 102: protrusion
103 : 오목부 104 : R형광체103 recessed portion 104 R phosphor
105 : G형광 체 106 : B형광체105: G phosphor 106: B phosphor
는 등의 문제점이 발생하였다.Problems such as occurred.
본 발명은 이러한 점을 감안하여 형광체가 도포되는 판넬내면에 오목홈을 형성함으로서, 형광면을 평탄하게 하여 반사율을 향상시키고 투과광의 세기가 강해짐으로 인한 브라운관의 휘도향상을 구현하도록 하는데 목적이 있다.The present invention has been made in view of the above-described concave grooves on the inner surface of the panel to which the phosphor is applied to improve the luminance of the CRT due to the flattening of the fluorescent surface to improve the reflectance and the intensity of the transmitted light.
본 발명을 이하에서 상세히 설명한다.The present invention is described in detail below.
먼저 구성을 살펴보면 제3도에 도시된 바와 같이 판넬(101)의 내면에는 오목부(102)와 돌출부(103)를 형성하여, 오목부(102)에는 형광체층(104, 105, 106)을 도포하고, 돌출부(103)에는 BM층(107)을 도포하게 된다.First, as shown in FIG. 3, concave portions 102 and protrusions 103 are formed on the inner surface of the panel 101, and phosphor layers 104, 105, and 106 are applied to the concave portions 102. The BM layer 107 is applied to the protrusion 103.
이때, BM층(107)의 도트경 크기는 100∼200㎛이고, 두께는 80∼160㎛이며, 각 도트간의 간격은 50∼150㎛ 정도로 형성한다.At this time, the dot diameter of the BM layer 107 is 100-200 micrometers, thickness is 80-160 micrometers, and the space | interval between each dot is formed about 50-150 micrometers.
형광체층은 R형광체(104), G형광체(105), B형광체(106)로 구성되어 있으며 각각의 형광체 화소경은 150∼200㎛ 이고, 화소의 두께는 100∼300㎛ 이며 각 화소간의 간격은 0∼50㎛ 정도로 형성되어 있다.The phosphor layer is composed of an R phosphor 104, a G phosphor 105, and a B phosphor 106. Each phosphor pixel diameter is 150 to 200 mu m, the thickness of the pixel is 100 to 300 mu m, and the interval between each pixel is 0. It is formed at about -50 micrometers.
또한, 형광면(110)을 평탄하게 하여 알루미늄막(108)을 균일하게 형성해 줌으로서 반사율 향상에 따른 휘도향상을 위해 BM층(107)과 형광체층(104, 105, 106)의 단차를 없애줄 목적으로 돌출부(102)의 두께(T)에 비해 오목부(103)의 두께(t)가 90%이상이 되도록 형성해 준다.In addition, by uniformly forming the aluminum film 108 by flattening the fluorescent surface 110, for the purpose of eliminating the step between the BM layer 107 and the phosphor layers 104, 105, 106 to improve the luminance according to the improved reflectance. The thickness t of the recess 103 is formed to be 90% or more compared with the thickness T of the protrusion 102.
따라서, BM층(107) 사이에 형광체층(104, 105, 106)이 오목하게 들어가 있으며 형광면(110)의 표면은 평탄한 구조를 가지도록 구성되어 있다.Therefore, the phosphor layers 104, 105, and 106 are recessed between the BM layers 107, and the surface of the fluorescent surface 110 is configured to have a flat structure.
여기서 BM층과 판넬에 오목부를 형성하는 과정을 제7도에 의거하여 상세히 설명하면 다음과 같다.Herein, the process of forming the recesses in the BM layer and the panel will be described in detail with reference to FIG.
첫 번째 방법은 제7a도에서와 같이 판넬 내면을 불산 등으로 에칭하는 방법으로서, 불산에 융해되지 않고 노광된 부분이 에칭시에 떨어져 나가는 포지티브형(Positve Type)감광체를 판넬 위에 도포한 후 노광을 실시하여 노광부를 형성한다.The first method is to etch the inner surface of the panel with hydrofluoric acid or the like, as shown in FIG. 7A. After applying a positive type photosensitive member on the panel, a positive type photosensitive member which does not melt in hydrofluoric acid and falls off during etching is applied. To form an exposed portion.
이어서 노광부에 에칭을 실시한 후 에칭된 부분을 불산으로 세척하고 현상을 하여 판넬을 완성함과 동시에 BM/PH를 도포한다.Subsequently, the exposed portion is etched, and then the etched portion is washed with hydrofluoric acid and developed to complete the panel and simultaneously apply BM / PH.
또한 두 번째 방법은 제7b도에서와 같이 판넬 내면에 불산에 용해 되는 도전막을 고팅하여 불산으로 에칭하는 방법으로서, 판넬 위에 도전막과 감광제를 차례로 도포하는 과정만 제7a도와 상이하고 이후 공정은 제7a도와 동일하다.In addition, the second method is a method of etching the conductive film dissolved in the hydrofluoric acid on the inner surface of the panel and etching with hydrofluoric acid, as shown in FIG. 7b, except that the process of sequentially applying the conductive film and the photosensitive agent on the panel is different from FIG. Same as 7a.
본 발명에 의한 브라운관의 동작을 설명하면 다음과 같다.Referring to the operation of the CRT according to the present invention.
전자총에서 나온 전자빔은 판넬(101)쪽으로 등속운동을 하여 형광면(110)에 이르게 되는데 이 입사 전자빔에 의해 형광면에 형성된 R, G, B 각각의 형광체 화소(104, 105, 106)는 여기되어 발광하게 된다.The electron beam emitted from the electron gun moves to the panel 101 at a constant velocity to reach the fluorescent surface 110. The phosphor pixels 104, 105, and 106 formed on the fluorescent surface by the incident electron beam are excited to emit light. do.
그리고 형광체에서 발생된 광은 판넬(101)을 거쳐 스크린 전면으로 투사하게 되고 후면으로 역행한 투사광의 일부는 알루미늄막(108)에서 되반사 되는데 이때, 형광체 가장자리부에서 발생한 광은 돌출부(102)의 벽면에서 되반사 되고 BM층(107)에 흡수되지 않는다.Light emitted from the phosphor is projected to the front of the screen via the panel 101, and a part of the projection light back to the back is reflected by the aluminum film 108. At this time, the light generated at the edge of the phosphor is emitted from the protrusion 102. Reflected back from the wall and not absorbed by the BM layer 107.
따라서, 투사광은 판넬(101)을 통과하면서 돌출부(102)의 벽면에서 광의 굴절과 반사효과에 의해 분사되지 않고 집광되어 제5도의 투사광 배광분포와 같이 스크린 전면에 형성됨으로서 광손실 감소 및 집광효과에 의해 상대적으로 휘도와 포커스특성이 좋아지게 된다.Therefore, the projection light passes through the panel 101 and is focused on the screen surface as shown in FIG. 5 through the projection light distribution distribution of FIG. The effect is that the luminance and focus characteristics are relatively improved.
또한, 형광체층(104, 105, 106)이 형성되어 있는 오목부(103)의 두께(t)가 BM층(107)이 형성되어 있는 돌출부(102)의 두께(T)에 비해 1∼10% 정도 얇게 형성되어 있어 방폭특성에 영향을 주지 않으면서 형광체층(104, 105, 106) 투과율 향상에 의한 휘도향상 및 BM층과 형광체층의 투과율차에 의한 콘트라스트 향상에도 도움을 주는 것이다.In addition, the thickness t of the recess 103 in which the phosphor layers 104, 105, and 106 are formed is 1 to 10% of the thickness T of the protrusion 102 in which the BM layer 107 is formed. It is formed so thin that it helps to improve the luminance by improving the transmittance of the phosphor layers 104, 105 and 106 and the contrast by the difference in transmittance between the BM layer and the phosphor layer without affecting the explosion-proof characteristics.
그리고 여기서, 형광체층(104, 105, 106)의 두께가 100∼300㎛으로 일반적인 판넬글라스의 두께 10∼15mm에 비해 1%정도로서 돌출부(102) 벽면에서의 광의 반사효과를 최대로 하기 위해서는 형광체층이 형성되어 있는 오목부(103)의 판넬두께(t)를 BM층이 형성되어 있는 돌출부(102)의 두께(T)보다 1%이상 얇게 형성해주는 것이 바람직하지만, 10%이상 얇게 해줄 경우 응력분포차에 의한 방폭특성이 나빠지게 때문에 1∼10%정도로 해주는 것이 바람직하다.In this case, the phosphor layers 104, 105, and 106 have a thickness of 100 to 300 µm, which is about 1% of the thickness of 10-15 mm of general panel glass, in order to maximize the reflection effect of light on the wall of the protrusion 102. The panel thickness t of the formed recess 103 is preferably 1% or more thinner than the thickness T of the protrusion 102 on which the BM layer is formed. Explosion-proof characteristics of the car worsens, so it is preferable to set it to about 1 to 10%.
이상에서 살펴본 바와 같은 본 발명은 판넬내면 형광면의 오목부에 형광체층이 형성되어 있기 때문에 BM층이 형성되어 있는 돌출부의 벽면에서 광의 반사효과에 의해 스크린 표면에 형성되는 투과광은 BM층에 흡수 및 난반사 현상이 일어나지 않고 제6도와 같이 투과광의 세기가 강해지도록 집광되어 휘도향상 및 포커스특성이 향상될수 있는 발명이다.In the present invention as described above, since the phosphor layer is formed in the concave portion of the fluorescent surface inside the panel, the transmitted light formed on the screen surface by the reflection effect of light on the wall surface of the protrusion where the BM layer is formed is absorbed and diffused in the BM layer. It is an invention that the brightness can be improved and the focus characteristic can be improved by condensing so that the intensity of transmitted light becomes stronger as shown in FIG.
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KR1019960029543A KR100213769B1 (en) | 1996-07-22 | 1996-07-22 | Fluorescent plane of crt |
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KR1019960029543A KR100213769B1 (en) | 1996-07-22 | 1996-07-22 | Fluorescent plane of crt |
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