KR100197164B1 - N-(camphorsulfonyloxy) maleimide and preparation for the same - Google Patents
N-(camphorsulfonyloxy) maleimide and preparation for the same Download PDFInfo
- Publication number
- KR100197164B1 KR100197164B1 KR1019980042275A KR19980042275A KR100197164B1 KR 100197164 B1 KR100197164 B1 KR 100197164B1 KR 1019980042275 A KR1019980042275 A KR 1019980042275A KR 19980042275 A KR19980042275 A KR 19980042275A KR 100197164 B1 KR100197164 B1 KR 100197164B1
- Authority
- KR
- South Korea
- Prior art keywords
- camphorsulfonyloxy
- maleimide
- preparation
- same
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
- C08F222/404—Imides, e.g. cyclic imides substituted imides comprising oxygen other than the carboxy oxygen
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F212/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F212/02—Monomers containing only one unsaturated aliphatic radical
- C08F212/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F212/06—Hydrocarbons
- C08F212/08—Styrene
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1804—C4-(meth)acrylate, e.g. butyl (meth)acrylate, isobutyl (meth)acrylate or tert-butyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
- C08F222/408—Imides, e.g. cyclic imides substituted imides comprising other heteroatoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Materials For Photolithography (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Pyrrole Compounds (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019960002773A KR0178332B1 (en) | 1996-02-06 | 1996-02-06 | Copolymers of n-(camphorsulfonyloxy) maleimide and preparation of producing thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
KR100197164B1 true KR100197164B1 (en) | 1999-06-15 |
Family
ID=19450793
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960002773A KR0178332B1 (en) | 1996-02-06 | 1996-02-06 | Copolymers of n-(camphorsulfonyloxy) maleimide and preparation of producing thereof |
KR1019980042275A KR100197164B1 (en) | 1996-02-06 | 1998-10-09 | N-(camphorsulfonyloxy) maleimide and preparation for the same |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1019960002773A KR0178332B1 (en) | 1996-02-06 | 1996-02-06 | Copolymers of n-(camphorsulfonyloxy) maleimide and preparation of producing thereof |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP2834723B2 (en) |
KR (2) | KR0178332B1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100574495B1 (en) * | 2004-12-15 | 2006-04-27 | 주식회사 하이닉스반도체 | Photoacid generator polymer, its preparation method and top anti-reflective coating composition comprising the same |
DE102005060061A1 (en) | 2005-06-02 | 2006-12-07 | Hynix Semiconductor Inc., Ichon | A polymer for immersion lithography, a photoresist composition containing the same, a method of manufacturing a semiconductor device, and a semiconductor device |
CN110358010B (en) * | 2019-07-16 | 2021-11-23 | 儒芯微电子材料(上海)有限公司 | Alkali soluble polymer resin and preparation method and application thereof |
-
1996
- 1996-02-06 KR KR1019960002773A patent/KR0178332B1/en not_active IP Right Cessation
-
1997
- 1997-02-05 JP JP9022774A patent/JP2834723B2/en not_active Expired - Fee Related
-
1998
- 1998-10-09 KR KR1019980042275A patent/KR100197164B1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2834723B2 (en) | 1998-12-14 |
KR970061937A (en) | 1997-09-12 |
KR0178332B1 (en) | 1999-05-15 |
JPH09227634A (en) | 1997-09-02 |
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Legal Events
Date | Code | Title | Description |
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A107 | Divisional application of patent | ||
A201 | Request for examination | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20040130 Year of fee payment: 6 |
|
LAPS | Lapse due to unpaid annual fee |