KR0119273B1 - Fabrication method of x-ray mask - Google Patents

Fabrication method of x-ray mask

Info

Publication number
KR0119273B1
KR0119273B1 KR93026317A KR930026317A KR0119273B1 KR 0119273 B1 KR0119273 B1 KR 0119273B1 KR 93026317 A KR93026317 A KR 93026317A KR 930026317 A KR930026317 A KR 930026317A KR 0119273 B1 KR0119273 B1 KR 0119273B1
Authority
KR
South Korea
Prior art keywords
guard ring
silicon wafer
fabrication method
ray mask
depositing
Prior art date
Application number
KR93026317A
Other languages
Korean (ko)
Inventor
Sang-Soo Choe
Young-Jin Chon
Hyung-Joon Yu
Original Assignee
Korea Electronics Telecomm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Korea Electronics Telecomm filed Critical Korea Electronics Telecomm
Priority to KR93026317A priority Critical patent/KR0119273B1/en
Application granted granted Critical
Publication of KR0119273B1 publication Critical patent/KR0119273B1/en

Links

Landscapes

  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)

Abstract

A fabrication method of X-ray mask is provided to reduce stress at the time of X-ray exposing using a guard ring. The method comprises the steps of: depositing an oxide layer(6) and a nitride layer(3) on a front and rear side of a silicon wafer(1), respectively; forming a guard ring(7) by etching the oxide layer(6) under CHF3/C2F6/He gas and the silicon wafer(1) under SF6 gas; depositing a silicon nitride(2) on the front side of the silicon wafer(1); defining an PMMA pattern(4) by E-bean exposure; and plating a gold metal(5) and lift-off the PMMA pattern(4). Thereby, it is possible to easily form a fine pattern without generating of stress by using the guard ring(7).
KR93026317A 1993-12-03 1993-12-03 Fabrication method of x-ray mask KR0119273B1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR93026317A KR0119273B1 (en) 1993-12-03 1993-12-03 Fabrication method of x-ray mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR93026317A KR0119273B1 (en) 1993-12-03 1993-12-03 Fabrication method of x-ray mask

Publications (1)

Publication Number Publication Date
KR0119273B1 true KR0119273B1 (en) 1997-09-30

Family

ID=19369782

Family Applications (1)

Application Number Title Priority Date Filing Date
KR93026317A KR0119273B1 (en) 1993-12-03 1993-12-03 Fabrication method of x-ray mask

Country Status (1)

Country Link
KR (1) KR0119273B1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020043184A (en) * 2000-12-01 2002-06-08 가네꼬 히사시 Mask for electron beam projection lithography and method of fabricating the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20020043184A (en) * 2000-12-01 2002-06-08 가네꼬 히사시 Mask for electron beam projection lithography and method of fabricating the same

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