KR0118568Y1 - Spin dryer cover for polution control wafer - Google Patents
Spin dryer cover for polution control waferInfo
- Publication number
- KR0118568Y1 KR0118568Y1 KR2019940034231U KR19940034231U KR0118568Y1 KR 0118568 Y1 KR0118568 Y1 KR 0118568Y1 KR 2019940034231 U KR2019940034231 U KR 2019940034231U KR 19940034231 U KR19940034231 U KR 19940034231U KR 0118568 Y1 KR0118568 Y1 KR 0118568Y1
- Authority
- KR
- South Korea
- Prior art keywords
- wafer
- cover
- pure water
- door
- spin
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F26—DRYING
- F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
- F26B5/00—Drying solid materials or objects by processes not involving the application of heat
- F26B5/08—Drying solid materials or objects by processes not involving the application of heat by centrifugal treatment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
본 고안은 반도체 제조공정중 웨이퍼의 건조공정을 수행하는 스핀드라이장치에 관한 것으로, 특히 건조공정완료 후 웨이퍼를 꺼낼때 잔류하는 순수가 떨어져 상기 웨이퍼표면이 오염되는 것을 방지하는 스핀드라이어 커버에 관한 것으로, 웨이퍼 캐리어를 인입하기 위한 커버도어의 밑단부에 소정크기의 유출홈을 형성하여 상기 스핀드라이의 회전에 따른 원심력에 의해 커버도어의 내면에 묻어있는 잔류순수가 흘러 내릴 수 있도록 있는 경로를 제공하므로서 상기 커버도어로 인입된 웨이퍼캐리어가 스핀드라이에 의한 건조후 인출시 충격에 의해 도어내면에 묻은 잔류순수를 미연에 제거하므로서 웨이퍼의 생산수율을 향상시키는 효과가 있다.The present invention relates to a spin dry apparatus that performs a wafer drying process in a semiconductor manufacturing process, and more particularly, to a spin dryer cover that prevents contamination of the wafer surface due to falling of pure water remaining when a wafer is taken out after the drying process is completed. By forming an outflow groove of a predetermined size in the bottom of the cover door for introducing the wafer carrier, the residual pure water buried on the inner surface of the cover door by the centrifugal force due to the rotation of the spin dry to flow down The wafer carrier introduced into the cover door removes the residual pure water on the inner surface of the door by impact when the wafer is drawn out after drying by the spin dry, thereby improving the yield of the wafer.
Description
제1a도 및 제1b도는 종래 기술에 따른 웨이퍼 스핀드라이 장치의 구성을 개략적으로 도시한 정면도 및 측면도1A and 1B are front and side views schematically showing the configuration of a wafer spin dry apparatus according to the prior art.
제2a도 및 제2b도는 본 고안에 의한 웨이퍼 오염방지를 위한 스핀드라이어 커버의 일실시예 구성을 나타낸 정면도 및 측면도.2a and 2b is a front view and a side view showing an embodiment configuration of a spin dryer cover for preventing wafer contamination according to the present invention.
* 도면의 주요부분에 대한 부호의 설명* Explanation of symbols for main parts of the drawings
1:스핀드라이어 커버 2:커버도어1: Spin dryer cover 2: Cover door
3:유출홈3: Leaked Home
본 고안은 반도체 제조공정중 웨이퍼의 건조공정을 수행하는 스핀드라이장치에 관한 것으로, 특히 건조공정완료 후 웨이퍼를 꺼낼때 잔류하는 순수가 떨어져 상기 웨이퍼표면이 오염되는 것을 방지하는 스핀드라이어 커버에 관한 것이다.The present invention relates to a spin dry apparatus that performs a wafer drying process in a semiconductor manufacturing process, and more particularly, to a spin dryer cover which prevents contamination of the wafer surface due to falling of pure water remaining when the wafer is taken out after the drying process is completed. .
일반적으로, 웨이퍼의 세정공정후 건조공정을 실시하는 시핀드라이어(spin dryer)는 제1a도 및 제2b도에 도시한 바와 같이 소정 커버(11)내에 구비된 스핀드라이에 상기 세정된 웨이퍼캐리어를 장착한 후 회전시킴으로써 원심력으로 웨이퍼표면에 잔류하는 순수를 이탈시켜 건조하는 것이다.In general, a spin dryer which performs a drying process after a wafer cleaning process is equipped with the cleaned wafer carrier on a spin dryer provided in a predetermined cover 11 as shown in FIGS. 1A and 2B. After the rotation, the pure water remaining on the wafer surface is removed by centrifugal force and dried.
상기 웨이퍼의 건조공정 수행후 커버(11)로부터 웨이퍼를 이탈하게 되는데, 이때 웨이퍼의 건조공정시 원심력에 의한 이탈된 순수는 커버내벽면과 도어(12)에 묻게 되며, 이러한 순수는 상기 웨이퍼를 꺼낼때 충격에 의해 떨어져서 건조가 완료된 웨이퍼표면을 오염시키는 문제점이 있었다.After performing the drying process of the wafer, the wafer is separated from the cover 11, wherein the pure water removed by centrifugal force is buried in the cover inner wall and the door 12 during the drying process of the wafer, and the pure water is taken out of the wafer. There was a problem in that the contamination on the surface of the wafer is dried by falling off the impact.
따라서, 본 고안은 상기의 제반문제점을 해결하기 위하여 안출된 것으로서, 웨이퍼의 건조시 스핀드라이어에 의해 이탈된 순수가 커버의 도어에 묻어있는 것을 제거하기 위한 웨이퍼 오염방지를 위한 스핀드라이어 커버를 제공함에 그 목적이 있다.Accordingly, the present invention has been made to solve the above problems, to provide a spin dryer cover for preventing the contamination of the wafer to remove the pure water separated by the spin dryer during the drying of the wafer is buried in the door of the cover The purpose is.
상기 목적을 달성하기 위하여 본 고안은, 소정 커버내에 구비된 스핀드라이의 회전력으로 세정웨이퍼의 순수를 이탈시켜 건조공정을 수행하는 웨이퍼 스핀드라이장치에 있어서, 상기 웨이퍼 캐리어를 인입하기 위한 커버도어의 밑단부에 소정크기의 유출홈을 형성하여 상기 스핀드라이의 회전에 따른 원심력에 의해 커버도어의 내면에 묻어있는 잔류순수가 흘러 내릴 수 있도록 있는 경로를 제공하는 것을 특징으로 한다.In order to achieve the above object, the present invention is a wafer spin dry apparatus for performing a drying process by removing the pure water of the cleaning wafer by the rotational force of the spin dry provided in a predetermined cover, the bottom of the cover door for introducing the wafer carrier Forming an outlet groove of a predetermined size in the portion is characterized in that it provides a path through which the residual pure water buried on the inner surface of the cover door by the centrifugal force due to the rotation of the spin dry.
이하, 첨부된 제2도의 도면을 참조하여 본 고안의 실시예를 상세히 설명한다.Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings of FIG. 2.
제2a도 및 제2b도는 본 고안에 의한 웨이퍼 오염방지를 위한 스핀드라이어 커버의 일실시예 구성을 나타낸 정면도 및 측면도로서, 도면에서 1은 스핀드라이 커버, 2는 커버도어, 3은 유출홈을 각각 나타낸 것이다.2a and 2b is a front view and a side view showing an embodiment configuration of a spin dryer cover for preventing wafer contamination according to the present invention, 1 is a spin dry cover, 2 is a cover door, 3 is an outlet groove Respectively.
도면에서 도시한 바와같이 본 고안에 의한 웨이퍼 오염방지를 위한 스핀드라이어 커버는 스핀드라이의 회전에 따라 세정웨이퍼의 순수가 원심력에 이탈되어 커버(1)내면에 묻어 잔류하는 것을 제거하기 위한 장치로, 웨이퍼캐리어를 인입 및 이탈시키는 커버도어(2)의 하단부에 소정크기의 유출홈(3)을 형성하여 건조공정의 완료후 도어내면에 묻은 순수가 흘러내리도록 한다.As shown in the figure, the spin dryer cover for preventing wafer contamination according to the present invention is an apparatus for removing the pure water of the cleaning wafer from the centrifugal force and remaining on the inner surface of the cover 1 as the spin dry rotates. Outflow grooves 3 of a predetermined size are formed in the lower ends of the cover doors 2 for introducing and leaving the wafer carriers so that the pure water on the inner surface of the door flows down after completion of the drying process.
이때, 상기 유출홈(3)은 소정기울기만큼 하측으로 경사지게 형성하여 스위치의 온/오프동작에 따라 상기 도어(2)가 자동적으로 개폐될때 잔류순수가 원활히 빠지도록 한 것이다.At this time, the outflow groove 3 is formed to be inclined downward by a predetermined slope so that the residual pure water is smoothly removed when the door 2 is automatically opened and closed according to the on / off operation of the switch.
따라서, 상기와 같이 구성된 본 고안은 상기 커버도어로 인입된 웨이퍼캐리어가 스핀드라이에 의한 건조후 인출시 충격에 의해 도어내면에 묻은 잔류순수를 미연에 제거하므로서 웨이퍼의 생산수율을 향상시키는 효과가 있다.Therefore, the present invention configured as described above has an effect of improving the production yield of the wafer by removing the residual pure water on the inner surface of the door by the impact of the wafer carrier introduced into the cover door after the drying by the spin dry. .
Claims (2)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019940034231U KR0118568Y1 (en) | 1994-12-15 | 1994-12-15 | Spin dryer cover for polution control wafer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR2019940034231U KR0118568Y1 (en) | 1994-12-15 | 1994-12-15 | Spin dryer cover for polution control wafer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR960025320U KR960025320U (en) | 1996-07-22 |
| KR0118568Y1 true KR0118568Y1 (en) | 1998-08-01 |
Family
ID=19401518
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR2019940034231U KR0118568Y1 (en) | 1994-12-15 | 1994-12-15 | Spin dryer cover for polution control wafer |
Country Status (1)
| Country | Link |
|---|---|
| KR (1) | KR0118568Y1 (en) |
-
1994
- 1994-12-15 KR KR2019940034231U patent/KR0118568Y1/en not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| KR960025320U (en) | 1996-07-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1612318B1 (en) | Moisture condensing unit | |
| KR900001231B1 (en) | Rotating dry apparatus of wafer | |
| US4197000A (en) | Positive developing method and apparatus | |
| EP0137947B1 (en) | Spin dryer | |
| KR20080021202A (en) | A method and apparatus for treating substrates | |
| US5318705A (en) | Apparatus for use in extracting liquid from cloth or other water-absorbing goods | |
| KR0118568Y1 (en) | Spin dryer cover for polution control wafer | |
| JPH06333899A (en) | Chemical treatment method and treatment device therefor | |
| KR100452358B1 (en) | condensing duct of drum wash and dry machine | |
| JP3120279B2 (en) | Washing machine | |
| JPH11195635A (en) | Semiconductor wafer cleaning and drying device | |
| KR100495069B1 (en) | A tub for drum washing machine | |
| KR100749547B1 (en) | Apparatus for treating substrates | |
| JPH07100293A (en) | Method and device for clean water washing and drying in washing machine | |
| CN109680457A (en) | A kind of washing machine and its washing tube | |
| JP2002237482A (en) | Vacuum spin dryer method and vacuum spin dryer device | |
| JP3489947B2 (en) | Single wafer chemical processing apparatus and substrate processing method | |
| KR920007733B1 (en) | Drum type laundry-management apparatus | |
| US3526108A (en) | Drain system for laundry washing machines | |
| KR100450268B1 (en) | Washing Machine | |
| JPH0744014Y2 (en) | Semiconductor manufacturing equipment | |
| KR200146590Y1 (en) | Detergent dispensing device in a washing machine | |
| JPH1190084A (en) | Electronic washing machine | |
| JPS558052A (en) | Rotary washer-drier | |
| KR100781256B1 (en) | Washing machine |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A201 | Request for examination | ||
| E701 | Decision to grant or registration of patent right | ||
| REGI | Registration of establishment | ||
| O032 | Opposition [utility model]: request for opposition | ||
| O131 | Decision on opposition [utility model] | ||
| O072 | Maintenance of registration after opposition [utility model]: final registration of opposition | ||
| FPAY | Annual fee payment |
Payment date: 20090223 Year of fee payment: 12 |
|
| EXPY | Expiration of term |