JPWO2022215417A1 - - Google Patents
Info
- Publication number
- JPWO2022215417A1 JPWO2022215417A1 JP2023512873A JP2023512873A JPWO2022215417A1 JP WO2022215417 A1 JPWO2022215417 A1 JP WO2022215417A1 JP 2023512873 A JP2023512873 A JP 2023512873A JP 2023512873 A JP2023512873 A JP 2023512873A JP WO2022215417 A1 JPWO2022215417 A1 JP WO2022215417A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0846—Optical arrangements having multiple detectors for performing different types of detection, e.g. using radiometry and reflectometry channels
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/0003—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter
- G01J5/0007—Radiation pyrometry, e.g. infrared or optical thermometry for sensing the radiant heat transfer of samples, e.g. emittance meter of wafers or semiconductor substrates, e.g. using Rapid Thermal Processing
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/60—Radiation pyrometry, e.g. infrared or optical thermometry using determination of colour temperature
- G01J5/602—Radiation pyrometry, e.g. infrared or optical thermometry using determination of colour temperature using selective, monochromatic or bandpass filtering
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/80—Calibration
- G01J5/806—Calibration by correcting for reflection of the emitter radiation
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Radiation Pyrometers (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021066292 | 2021-04-09 | ||
PCT/JP2022/010056 WO2022215417A1 (ja) | 2021-04-09 | 2022-03-08 | 放射温度測定装置及び放射温度測定方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPWO2022215417A1 true JPWO2022215417A1 (ja) | 2022-10-13 |
Family
ID=83546052
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2023512873A Pending JPWO2022215417A1 (ja) | 2021-04-09 | 2022-03-08 |
Country Status (4)
Country | Link |
---|---|
US (1) | US20240110834A1 (ja) |
EP (1) | EP4303547A1 (ja) |
JP (1) | JPWO2022215417A1 (ja) |
WO (1) | WO2022215417A1 (ja) |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4956538A (en) * | 1988-09-09 | 1990-09-11 | Texas Instruments, Incorporated | Method and apparatus for real-time wafer temperature measurement using infrared pyrometry in advanced lamp-heated rapid thermal processors |
JP2001056253A (ja) * | 1999-08-20 | 2001-02-27 | Toshiba Corp | 温度測定方法及び温度測定装置 |
JP2002122480A (ja) * | 2000-10-12 | 2002-04-26 | Toshiba Corp | 温度測定方法および装置、並びにプラズマ処理装置 |
US8152365B2 (en) * | 2005-07-05 | 2012-04-10 | Mattson Technology, Inc. | Method and system for determining optical properties of semiconductor wafers |
JP2017090351A (ja) | 2015-11-13 | 2017-05-25 | 株式会社堀場製作所 | 放射温度計 |
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2022
- 2022-03-08 EP EP22784402.4A patent/EP4303547A1/en active Pending
- 2022-03-08 WO PCT/JP2022/010056 patent/WO2022215417A1/ja active Application Filing
- 2022-03-08 US US18/285,428 patent/US20240110834A1/en active Pending
- 2022-03-08 JP JP2023512873A patent/JPWO2022215417A1/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
EP4303547A1 (en) | 2024-01-10 |
US20240110834A1 (en) | 2024-04-04 |
WO2022215417A1 (ja) | 2022-10-13 |