JPWO2022210797A1 - - Google Patents
Info
- Publication number
- JPWO2022210797A1 JPWO2022210797A1 JP2023511433A JP2023511433A JPWO2022210797A1 JP WO2022210797 A1 JPWO2022210797 A1 JP WO2022210797A1 JP 2023511433 A JP2023511433 A JP 2023511433A JP 2023511433 A JP2023511433 A JP 2023511433A JP WO2022210797 A1 JPWO2022210797 A1 JP WO2022210797A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/14—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Electromagnetism (AREA)
- Health & Medical Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021054900 | 2021-03-29 | ||
| PCT/JP2022/015714 WO2022210797A1 (en) | 2021-03-29 | 2022-03-29 | Negative photosensitive composition, optical semiconductor device, solid-state imaging device and electronic device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022210797A1 true JPWO2022210797A1 (en) | 2022-10-06 |
Family
ID=83459449
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2023511433A Pending JPWO2022210797A1 (en) | 2021-03-29 | 2022-03-29 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JPWO2022210797A1 (en) |
| WO (1) | WO2022210797A1 (en) |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006350029A (en) * | 2005-06-16 | 2006-12-28 | Sekisui Chem Co Ltd | Black resist composition |
| KR102411740B1 (en) * | 2014-07-18 | 2022-06-21 | 에이지씨 가부시키가이샤 | Negative-type photosensitive resin composition, and resin cured film, partition and optical element |
| JP2021012223A (en) * | 2017-10-19 | 2021-02-04 | Jsr株式会社 | Manufacturing method of substrate for display panel, radiation-sensitive composition and infrared ray transmission film |
| JP7111031B2 (en) * | 2018-03-23 | 2022-08-02 | 信越化学工業株式会社 | Photosensitive resin composition, photosensitive resin laminate, and pattern forming method |
| JP2019182899A (en) * | 2018-04-02 | 2019-10-24 | Jsr株式会社 | Curable composition, and cured film forming method |
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2022
- 2022-03-29 WO PCT/JP2022/015714 patent/WO2022210797A1/en active Application Filing
- 2022-03-29 JP JP2023511433A patent/JPWO2022210797A1/ja active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| WO2022210797A1 (en) | 2022-10-06 |