JPWO2020241099A1 - - Google Patents

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Publication number
JPWO2020241099A1
JPWO2020241099A1 JP2021522692A JP2021522692A JPWO2020241099A1 JP WO2020241099 A1 JPWO2020241099 A1 JP WO2020241099A1 JP 2021522692 A JP2021522692 A JP 2021522692A JP 2021522692 A JP2021522692 A JP 2021522692A JP WO2020241099 A1 JPWO2020241099 A1 JP WO2020241099A1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2021522692A
Other languages
Japanese (ja)
Other versions
JP7254917B2 (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPWO2020241099A1 publication Critical patent/JPWO2020241099A1/ja
Application granted granted Critical
Publication of JP7254917B2 publication Critical patent/JP7254917B2/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/12—Esters of monohydric alcohols or phenols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
JP2021522692A 2019-05-29 2020-04-15 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, electronic device manufacturing method Active JP7254917B2 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2019100021 2019-05-29
JP2019100021 2019-05-29
PCT/JP2020/016565 WO2020241099A1 (en) 2019-05-29 2020-04-15 Actinic-ray-sensitive or radiation-sensitive resin composition, method for forming pattern, and method for producing electronic device

Publications (2)

Publication Number Publication Date
JPWO2020241099A1 true JPWO2020241099A1 (en) 2020-12-03
JP7254917B2 JP7254917B2 (en) 2023-04-10

Family

ID=73552872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021522692A Active JP7254917B2 (en) 2019-05-29 2020-04-15 Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, electronic device manufacturing method

Country Status (3)

Country Link
JP (1) JP7254917B2 (en)
TW (1) TW202107201A (en)
WO (1) WO2020241099A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2023047992A1 (en) * 2021-09-21 2023-03-30
WO2024048281A1 (en) * 2022-08-31 2024-03-07 富士フイルム株式会社 Active-ray-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, and electronic device production method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001074916A1 (en) * 2000-04-04 2001-10-11 Daikin Industries, Ltd. Novel fluoropolymer having acid-reactive group and chemical amplification type photoresist composition containing the same
JP2003084439A (en) * 2001-09-13 2003-03-19 Matsushita Electric Ind Co Ltd Pattern forming material and pattern forming method
WO2003031487A1 (en) * 2001-10-03 2003-04-17 Daikin Industries, Ltd. Novel fluoropolymer, resist compositions containing the same, and novel fluoromonomers

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4923376B1 (en) * 1970-04-28 1974-06-15
JP3305293B2 (en) * 1999-03-09 2002-07-22 松下電器産業株式会社 Pattern formation method
JP2004219822A (en) * 2003-01-16 2004-08-05 Fuji Photo Film Co Ltd Positive type resist composition
JP2005004158A (en) * 2003-05-19 2005-01-06 Fuji Photo Film Co Ltd Positive resist composition and method for forming pattern using the same
JP4557576B2 (en) * 2004-03-25 2010-10-06 富士フイルム株式会社 Photosensitive composition and pattern forming method using the same
JP2009229773A (en) * 2008-03-21 2009-10-08 Fujifilm Corp Positive resist composition, pattern forming method using positive resist composition, and compound used for positive resist composition
WO2012114963A1 (en) * 2011-02-23 2012-08-30 Jsr株式会社 Negative-pattern-forming method and photoresist composition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001074916A1 (en) * 2000-04-04 2001-10-11 Daikin Industries, Ltd. Novel fluoropolymer having acid-reactive group and chemical amplification type photoresist composition containing the same
JP2003084439A (en) * 2001-09-13 2003-03-19 Matsushita Electric Ind Co Ltd Pattern forming material and pattern forming method
WO2003031487A1 (en) * 2001-10-03 2003-04-17 Daikin Industries, Ltd. Novel fluoropolymer, resist compositions containing the same, and novel fluoromonomers

Also Published As

Publication number Publication date
JP7254917B2 (en) 2023-04-10
WO2020241099A1 (en) 2020-12-03
TW202107201A (en) 2021-02-16

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