JPWO2020096794A5 - - Google Patents

Download PDF

Info

Publication number
JPWO2020096794A5
JPWO2020096794A5 JP2021524017A JP2021524017A JPWO2020096794A5 JP WO2020096794 A5 JPWO2020096794 A5 JP WO2020096794A5 JP 2021524017 A JP2021524017 A JP 2021524017A JP 2021524017 A JP2021524017 A JP 2021524017A JP WO2020096794 A5 JPWO2020096794 A5 JP WO2020096794A5
Authority
JP
Japan
Prior art keywords
stage
metrology system
light source
sample holder
sample
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2021524017A
Other languages
Japanese (ja)
Other versions
JP2022514180A (en
Publication date
Application filed filed Critical
Priority claimed from PCT/US2019/058313 external-priority patent/WO2020096794A1/en
Publication of JP2022514180A publication Critical patent/JP2022514180A/en
Publication of JPWO2020096794A5 publication Critical patent/JPWO2020096794A5/ja
Pending legal-status Critical Current

Links

Claims (20)

導波計測システムであって、
第1のステージに結合された光源であって、第2のステージ上に配置されたサンプル保持器に光を向けるように構成された光源、
第3のステージ上に配置された1以上の走査検出器であって、前記サンプル保持器に隣接して且つ前記光源と対向するように軌道上に配置され、前記光源から送信された光を収集するように構成された1以上の走査検出器、及び
前記1以上の走査検出器と通信する分光光度計を備える、計測システム。
A waveguide measurement system,
a light source coupled to the first stage, the light source configured to direct light onto a sample holder located on the second stage;
one or more scanning detectors positioned on a third stage and positioned in orbit adjacent to the sample holder and opposite the light source to collect light transmitted from the light source; and a spectrophotometer in communication with the one or more scanning detectors.
前記第1のステージが、x、y、又はz軸の周りで直線的に移動するように構成される、請求項1に記載の計測システム。 2. The metrology system of claim 1, wherein the first stage is configured to move linearly about an x, y, or z axis. 前記第1のステージが、前記第2のステージの周りで公転するように更に構成される、請求項1に記載の計測システム。 2. The metrology system of claim 1, wherein the first stage is further configured to revolve around the second stage. 前記第2のステージが、垂直軸の周りで回転するように構成される、請求項1に記載の計測システム。 3. The metrology system of claim 1, wherein the second stage is configured to rotate about a vertical axis. 前記光源に隣接して前記第1のステージ上に配置された反射検出器を更に備える、請求項1に記載の計測システム。 2. The metrology system of claim 1, further comprising a reflection detector positioned on said first stage adjacent said light source. 導波計測システムであって、
第1のステージに結合された光源であって、第2のステージ上に配置されたサンプル保持器に向けて光を送信するように構成された光源、
第3のステージに結合された1以上の散乱計であって、前記サンプル保持器に隣接して且つ前記光源と対向するように配置され、前記光源によって送信された光を収集するように構成された1以上の散乱計、
第4のステージに結合された1以上の反射検出器であって、前記サンプル保持器の方向から前記第4のステージに向けて反射された光を収集するように構成された反射検出器、並びに
前記1以上の散乱計及び前記1以上の反射検出器と通信する分光光度計を備える、計測システム。
A waveguide measurement system,
a light source coupled to the first stage, the light source configured to transmit light towards a sample holder located on the second stage;
one or more scatterometers coupled to a third stage positioned adjacent to the sample holder and facing the light source and configured to collect light transmitted by the light source one or more scatterometers,
one or more reflection detectors coupled to a fourth stage, the reflection detectors configured to collect light reflected toward the fourth stage from the direction of the sample holder; A metrology system comprising a spectrophotometer in communication with the one or more scatterometers and the one or more reflection detectors.
前記第1のステージが、x、y、及びz軸の周りで直線的に移動するように構成される、請求項6に記載の計測システム。 7. The metrology system of claim 6, wherein the first stage is configured to move linearly about x, y, and z axes. 前記第1のステージが、前記サンプル保持器の周りで公転するように更に構成される、請求項7に記載の計測システム。 8. The metrology system of Claim 7, wherein the first stage is further configured to revolve around the sample holder. 前記第2のステージが、x、y、及びz軸の周りで直線的に移動するように構成される、請求項6に記載の計測システム。 7. The metrology system of claim 6, wherein the second stage is configured to move linearly about x, y, and z axes. 前記第2のステージが、前記z軸の周りで回転するように更に構成される、請求項9に記載の計測システム。 10. The metrology system of claim 9, wherein the second stage is further configured to rotate about the z-axis. 前記第3のステージ及び前記第4のステージが、前記サンプル保持器の周りで公転するように構成される、請求項6に記載の計測システム。 7. The metrology system of claim 6, wherein the third stage and the fourth stage are configured to revolve around the sample holder. 前記第1のステージと前記第2のステージとが、サンプルの角度均一特性及び空間均一特性を測定するように同期される、請求項6に記載の計測システム。 7. The metrology system of claim 6, wherein the first stage and the second stage are synchronized to measure angular and spatial uniformity properties of the sample. 導波計測システムであって、
第1のステージに結合された平行光源、
第2のステージ上に配置されたサンプル保持器、
第3のステージに結合され、前記サンプル保持器の方向から反射された光を収集するように構成された反射検出器、
第4のステージに結合され、前記平行光源から送信された光を収集するように構成された透過検出器、並びに
前記反射検出器及び前記透過検出器と通信する分光光度計を備える、計測システム。
A waveguide measurement system,
a directional light source coupled to the first stage;
a sample holder positioned on the second stage;
a reflection detector coupled to a third stage and configured to collect light reflected from the direction of the sample holder;
A metrology system comprising: a transmission detector coupled to a fourth stage and configured to collect light transmitted from said collimated light source; and a spectrophotometer in communication with said reflection detector and said transmission detector.
前記第1のステージ及び前記第2のステージが、x、y、及びz軸の周りで直線的に移動し、前記z軸の周りで回転するように構成される、請求項13に記載の計測システム。 14. The metrology of claim 13, wherein the first stage and the second stage are configured to translate linearly about x, y, and z axes and rotate about the z axis. system. 前記第3のステージ及び前記第4のステージが、x、y、及びz軸の周りで直線的に移動するように構成される、請求項13に記載の計測システム。 14. The metrology system of claim 13, wherein the third stage and the fourth stage are configured to move linearly about x, y, and z axes. 前記計測システムが、サンプルの反射及び透過回析効率特性を測定するように構成されている、請求項1に記載の計測システム。 2. The metrology system of claim 1, wherein the metrology system is configured to measure reflection and transmission diffraction efficiency properties of a sample. 前記計測システムが、サンプルの視野及び光結合効率特性を測定するように構成されている、請求項6に記載の計測システム。 7. The metrology system of claim 6, wherein the metrology system is configured to measure field of view and optical coupling efficiency characteristics of a sample. 前記計測システムが、サンプルの色均一特性を測定するように構成されている、請求項6に記載の計測システム。 7. The metrology system of claim 6, wherein the metrology system is configured to measure color uniformity characteristics of a sample. 前記光源が光エンジンであり、前記計測システムが、サンプルの画像解像度及びコントラスト特性を測定するように構成されている、請求項6に記載の計測システム。 7. The metrology system of claim 6, wherein the light source is a light engine and the metrology system is configured to measure image resolution and contrast properties of a sample. 前記平行光源が、白色光源、レーザー、又は発光ダイオードを含む、請求項13に記載の計測システム。 14. The metrology system of claim 13, wherein the directional light source comprises a white light source, laser, or light emitting diode.
JP2021524017A 2018-11-07 2019-10-28 Methods and equipment for waveguide measurement Pending JP2022514180A (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US201862756964P 2018-11-07 2018-11-07
US62/756,964 2018-11-07
US201862772887P 2018-11-29 2018-11-29
US62/772,887 2018-11-29
PCT/US2019/058313 WO2020096794A1 (en) 2018-11-07 2019-10-28 Methods and apparatus for waveguide metrology

Publications (2)

Publication Number Publication Date
JP2022514180A JP2022514180A (en) 2022-02-10
JPWO2020096794A5 true JPWO2020096794A5 (en) 2022-11-08

Family

ID=70459610

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2021524017A Pending JP2022514180A (en) 2018-11-07 2019-10-28 Methods and equipment for waveguide measurement

Country Status (6)

Country Link
US (1) US11029206B2 (en)
EP (1) EP3877739A4 (en)
JP (1) JP2022514180A (en)
KR (1) KR20210072123A (en)
CN (1) CN112997058A (en)
WO (1) WO2020096794A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10676325B1 (en) 2018-02-27 2020-06-09 Willie Dell Hoist track adaptor
WO2021119153A1 (en) * 2019-12-09 2021-06-17 Egalon Claudio Oliveira Systems and methods of side illumination of waveguides
WO2022081366A1 (en) 2020-10-15 2022-04-21 Applied Materials, Inc. See-through metrology systems, apparatus, and methods for optical devices
DE102021200231A1 (en) * 2021-01-13 2022-07-14 Robert Bosch Gesellschaft mit beschränkter Haftung Method for determining a diffraction characteristic of a hologram element for data glasses
CN113218627B (en) * 2021-03-26 2022-10-14 歌尔股份有限公司 Grating diffraction efficiency testing device and method
US20240201456A1 (en) * 2021-04-30 2024-06-20 Magic Leap, Inc. Thin illumination layer waveguide and methods of fabrication
CN113884180B (en) * 2021-09-29 2024-03-12 歌尔光学科技有限公司 Testing system, method and device for diffraction optical waveguide
WO2023197106A1 (en) * 2022-04-11 2023-10-19 Goertek Optical Technology Co., Ltd Waveguide measurement device
US20230375410A1 (en) * 2022-05-20 2023-11-23 Facebook Technologies, Llc Apparatuses and systems for optical element measurements
WO2024059310A1 (en) * 2022-09-15 2024-03-21 Applied Materials, Inc. Methods to measure light loss and efficiency of diffraction gratings on optical substrates
CN115931303B (en) * 2022-10-26 2023-11-17 江西凤凰光学科技有限公司 Test method of polychromatic diffraction optical waveguide
DE102022132453A1 (en) 2022-12-07 2024-06-13 Trioptics Gmbh Device and method for determining an image quality of at least one image for a test object
CN117367751B (en) * 2023-10-19 2024-05-10 中聚科技股份有限公司 Performance detection method and device for ultra-pulse thulium-doped laser

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5493393A (en) * 1989-03-17 1996-02-20 The Boeing Company Planar waveguide spectrograph
US5233405A (en) * 1991-11-06 1993-08-03 Hewlett-Packard Company Optical spectrum analyzer having double-pass monochromator
IL116583A (en) * 1995-12-27 2001-06-14 Ruschin Shlomo Spectral analyzer and direction indicator
JP4882139B2 (en) * 2000-07-19 2012-02-22 大日本印刷株式会社 Hologram evaluation device
US6731380B2 (en) * 2001-06-18 2004-05-04 Applied Optics Center Of Delaware, Inc. Method and apparatus for simultaneous measurement of the refractive index and thickness of thin films
KR100502560B1 (en) * 2002-07-25 2005-07-20 주식회사 솔루션닉스 Apparatus and Method for Registering Multiple Three Dimensional Scan Data by using Optical Marker
JP2005257320A (en) * 2004-03-09 2005-09-22 Tokyo Univ Of Pharmacy & Life Science Spectral electrochemical cell and optical waveguide spectral electrochemical measuring method using it
US7254290B1 (en) 2004-05-10 2007-08-07 Lockheed Martin Corporation Enhanced waveguide metrology gauge collimator
US7791727B2 (en) * 2004-08-16 2010-09-07 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
CN101449134B (en) * 2006-05-01 2011-08-03 海因兹仪器公司 Measurement of linear and circular diattenuation in optical elements
JP4976113B2 (en) 2006-11-29 2012-07-18 三井化学株式会社 Optical waveguide inspection method and inspection apparatus
JP2010139483A (en) 2008-12-15 2010-06-24 Synergy Optosystems Co Ltd Inspection system and inspection method of optical waveguide
WO2010140998A1 (en) * 2009-06-02 2010-12-09 Vladimir Yankov Optical integrated nanospectrometer and method of manufacturing thereof
JP5467875B2 (en) 2010-01-18 2014-04-09 シナジーオプトシステムズ株式会社 Optical waveguide inspection equipment
KR20130091390A (en) 2012-02-08 2013-08-19 주식회사 제씨콤 Goniometer of planar lightguide circuit
WO2013188602A1 (en) * 2012-06-13 2013-12-19 Kla-Tencor Corporation Optical surface scanning systems and methods
JP2014194473A (en) 2013-03-28 2014-10-09 Hitachi Chemical Co Ltd Optical waveguide and inspection method of optical waveguide
US9846122B2 (en) * 2013-11-26 2017-12-19 Nanometrics Incorporated Optical metrology system for spectral imaging of a sample
JP2015215237A (en) 2014-05-09 2015-12-03 日立化成株式会社 Optical waveguide inspection method
JP6331196B2 (en) 2015-01-05 2018-05-30 シナジーオプトシステムズ株式会社 Optical element, irradiation optical system, condensing optical system, and optical waveguide inspection device
US9372347B1 (en) * 2015-02-09 2016-06-21 Microsoft Technology Licensing, Llc Display system
WO2017165403A1 (en) * 2016-03-21 2017-09-28 Nueon Inc. Porous mesh spectrometry methods and apparatus
JP6730125B2 (en) * 2016-08-01 2020-07-29 株式会社ディスコ Measuring device
KR20230070077A (en) * 2016-10-28 2023-05-19 매직 립, 인코포레이티드 Method and system for large field of view display with scanning reflector
JP2018146437A (en) 2017-03-07 2018-09-20 日東電工株式会社 Inspection method of optical waveguide and preparation method of optical waveguide using the same
US11092427B2 (en) * 2018-09-25 2021-08-17 The Charles Stark Draper Laboratory, Inc. Metrology and profilometry using light field generator
EP3956629A4 (en) * 2019-04-15 2023-01-04 Applied Materials, Inc. Measurement system and a method of diffracting light

Similar Documents

Publication Publication Date Title
CN106471332B (en) Multi-wavelength confocal measuring device
JPWO2020096794A5 (en)
US10591279B2 (en) Integrated optical device for contactless measurement of altitudes and thicknesses
CN101553707B (en) Coordinate measurement instrument
JP5868488B2 (en) Coordinate measuring apparatus and method for measuring three-dimensional coordinates
US7130033B2 (en) Portable device for measuring the light intensity from an object, and the use of such a device
CN100552378C (en) Laser emission axle and mechanical reference surface method for measuring coaxiality based on angle prism
CN101806625B (en) Static Fourier transform interference imaging spectrum full-polarization detector
CN107796330A (en) A kind of white light interference measuring three-dimensional morphology optical system
CN110412758A (en) A kind of imaging detection device based on Spectral Confocal
CN110501289A (en) A kind of spectrum widening method and device based on digital micromirror array DMD
CN115574740A (en) Multifunctional optical autocollimator
CN101936885B (en) Optical fiber transceiver integrated air differential optical absorption spectroscopy (DOAS) measuring system
WO2024032154A1 (en) Apparatus for visual aiming spectrum measurement, and optical detection device
CN100521413C (en) Laser coaxial regulating assistant and method thereof
CN111665202A (en) Online optical measurement system and method for preparing film by spin coating process
CN110081980B (en) Optical fiber interference spectrometer device
CN100451607C (en) Phase object scan imaging method and its treating device
CN103197382A (en) Optical fiber derived type interferometer laser light source system
US5355209A (en) Device for measuring the diameter of an object that is largely cylindrical, for example an optical fiber, without contact
CN210071142U (en) Optical fiber interference spectrometer device
CN210514608U (en) Optical device capable of being seen from top to bottom
CN212321830U (en) Laser radar for remote detection
CN108548660B (en) Sampling splits the sampling rate of plate and samples uniformity interferometer measuration system and method
CN208270415U (en) A kind of spectrum widening device based on digital micromirror array DMD