JPS649448A - Pattern forming process - Google Patents

Pattern forming process

Info

Publication number
JPS649448A
JPS649448A JP16500587A JP16500587A JPS649448A JP S649448 A JPS649448 A JP S649448A JP 16500587 A JP16500587 A JP 16500587A JP 16500587 A JP16500587 A JP 16500587A JP S649448 A JPS649448 A JP S649448A
Authority
JP
Japan
Prior art keywords
photoreactive
compsn
polymer
low molecular
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16500587A
Other languages
Japanese (ja)
Other versions
JP2537883B2 (en
Inventor
Yoshihiro Kawatsuki
Masao Uetsuki
Tsutomu Iguchi
Akiji Takahashi
Toshiaki Tokuhara
Kazuo Baba
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kuraray Co Ltd
Original Assignee
Kuraray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co Ltd filed Critical Kuraray Co Ltd
Priority to JP62165005A priority Critical patent/JP2537883B2/en
Publication of JPS649448A publication Critical patent/JPS649448A/en
Application granted granted Critical
Publication of JP2537883B2 publication Critical patent/JP2537883B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Integrated Circuits (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

PURPOSE:To enhance solvent resistance of a pattern by using a photoreactive compsn. or a photoreactive crosslinking compsn. for a compsn. for forming the pattern. CONSTITUTION:A photoreactive compsn. consists of a polymer having photoreactive functional groups and a low molecular compd. which can cause photoreaction with said functional groups and contribute for the improvement of solvent resistance of the polymer. a photoreactive crosslinking compsn. consists of a polymer having crosslinking and photoreactive functional groups and a low molecular compd. capable of causing photoreaction with said functional groups. After forming a thin film 1 on a substrate 2 from either one of the above described compsns., a part of the low molecular compd. in the film 2 is allowed to cause photoreaction or the polymer is crosslinked by exposing the whole surface of the film or by heating the film. After allowing the polymer in the irradiated part 102 to react with the low molecular compd. by exposing the film through a photomask 3, a pattern is formed by removing the low molecular compd. 11 in the unirradiated part 101.
JP62165005A 1987-06-30 1987-06-30 Pattern forming method Expired - Fee Related JP2537883B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62165005A JP2537883B2 (en) 1987-06-30 1987-06-30 Pattern forming method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62165005A JP2537883B2 (en) 1987-06-30 1987-06-30 Pattern forming method

Publications (2)

Publication Number Publication Date
JPS649448A true JPS649448A (en) 1989-01-12
JP2537883B2 JP2537883B2 (en) 1996-09-25

Family

ID=15804032

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62165005A Expired - Fee Related JP2537883B2 (en) 1987-06-30 1987-06-30 Pattern forming method

Country Status (1)

Country Link
JP (1) JP2537883B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002296407A (en) * 2001-03-30 2002-10-09 Hitachi Chem Co Ltd Method for forming recess and projection, optical film which uses the same and its use

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4995702A (en) * 1972-12-18 1974-09-11
JPS5416203A (en) * 1977-07-07 1979-02-06 Nippon Paint Co Ltd Dry making method of photosensitive resin plate
JPS59214851A (en) * 1983-05-20 1984-12-04 Rikagaku Kenkyusho Manufacture of dry type lithography pattern
JPS60166946A (en) * 1983-10-14 1985-08-30 Kyowa Gas Chem Ind Co Ltd Photosensitive resin composition and formation of pattern having refractive index difference by using it
JPS6188262A (en) * 1984-10-01 1986-05-06 ダブリユー・アール・グレイス・アンド・カンパニー Manufacture of relief plate
JPS6295525A (en) * 1985-10-22 1987-05-02 Kuraray Co Ltd Photosensitive resin composition and method for preparing pattern using the composition
JPS6295526A (en) * 1985-10-22 1987-05-02 Kuraray Co Ltd Photosensitive resin composition and method for preparing pattern using the composition

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4995702A (en) * 1972-12-18 1974-09-11
JPS5416203A (en) * 1977-07-07 1979-02-06 Nippon Paint Co Ltd Dry making method of photosensitive resin plate
JPS59214851A (en) * 1983-05-20 1984-12-04 Rikagaku Kenkyusho Manufacture of dry type lithography pattern
JPS60166946A (en) * 1983-10-14 1985-08-30 Kyowa Gas Chem Ind Co Ltd Photosensitive resin composition and formation of pattern having refractive index difference by using it
JPS6188262A (en) * 1984-10-01 1986-05-06 ダブリユー・アール・グレイス・アンド・カンパニー Manufacture of relief plate
JPS6295525A (en) * 1985-10-22 1987-05-02 Kuraray Co Ltd Photosensitive resin composition and method for preparing pattern using the composition
JPS6295526A (en) * 1985-10-22 1987-05-02 Kuraray Co Ltd Photosensitive resin composition and method for preparing pattern using the composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002296407A (en) * 2001-03-30 2002-10-09 Hitachi Chem Co Ltd Method for forming recess and projection, optical film which uses the same and its use

Also Published As

Publication number Publication date
JP2537883B2 (en) 1996-09-25

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees