JPS649442A - Pattern forming material - Google Patents

Pattern forming material

Info

Publication number
JPS649442A
JPS649442A JP16239487A JP16239487A JPS649442A JP S649442 A JPS649442 A JP S649442A JP 16239487 A JP16239487 A JP 16239487A JP 16239487 A JP16239487 A JP 16239487A JP S649442 A JPS649442 A JP S649442A
Authority
JP
Japan
Prior art keywords
resin
compd
formulas
constitution
oxygen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16239487A
Other languages
Japanese (ja)
Inventor
Masayuki Oie
Takamasa Yamada
Shigemitsu Kamiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zeon Corp
Original Assignee
Nippon Zeon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Zeon Co Ltd filed Critical Nippon Zeon Co Ltd
Priority to JP16239487A priority Critical patent/JPS649442A/en
Publication of JPS649442A publication Critical patent/JPS649442A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To improve resistance of a pattern forming material to reactive ion etching effect of oxygen by using a silicone modified product of phenol resin. CONSTITUTION:An alkali-soluble resin (A) and a photo-cross-linking agent (B) are containing in the title material. A resin prepd. by modifying a phenol resin consisting of a phenolic compd. and an aldehydic compd. with a silicone compd. having a fundamental skeleton expressed by formula I, II, or III, is used for the resin (A). In the formulas, >=one substituent(s) of the formulas is(are) functional groups(s) (e.g., OH group, COOH group, alkoxy group, etc.); each a-e is an integer >=1. Further, 2,6-bis(4'-azidobenzal)cyclohexanone, etc. may be used for the crosslinking agent. By this constitution, a compsn. for top layer resist having high resistance to RIE effect of oxygen is obtd.
JP16239487A 1987-07-01 1987-07-01 Pattern forming material Pending JPS649442A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16239487A JPS649442A (en) 1987-07-01 1987-07-01 Pattern forming material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16239487A JPS649442A (en) 1987-07-01 1987-07-01 Pattern forming material

Publications (1)

Publication Number Publication Date
JPS649442A true JPS649442A (en) 1989-01-12

Family

ID=15753753

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16239487A Pending JPS649442A (en) 1987-07-01 1987-07-01 Pattern forming material

Country Status (1)

Country Link
JP (1) JPS649442A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE37604E1 (en) 1991-06-24 2002-03-26 Ford Global Technologies, Inc. Variable engine valve control system

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE37604E1 (en) 1991-06-24 2002-03-26 Ford Global Technologies, Inc. Variable engine valve control system

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