JPS6484558A - Gas pressure controller for ion implantating device - Google Patents
Gas pressure controller for ion implantating deviceInfo
- Publication number
- JPS6484558A JPS6484558A JP62240738A JP24073887A JPS6484558A JP S6484558 A JPS6484558 A JP S6484558A JP 62240738 A JP62240738 A JP 62240738A JP 24073887 A JP24073887 A JP 24073887A JP S6484558 A JPS6484558 A JP S6484558A
- Authority
- JP
- Japan
- Prior art keywords
- pressure
- low pressure
- pipe
- gas
- valves
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000000630 rising effect Effects 0.000 abstract 1
Abstract
PURPOSE:To prevent pressure in a low pressure pipe from suddenly rising the moment a valve is opened, by providing plural control valves and a throttle valve in series in a pipe for supplying gas to the wafer rear face. CONSTITUTION:The pressure in a low pressure pipe 1 is measured by a pressuring instrument 5 and if the pressure is lower than the specified pressure, control valves 2, 3 open and gas flows in from the gas source 6. A throttle valve 4 is provided so that the high pressure gas may not flow suddenly into a low pressure pipe 1 at this time. When the pressure in the low pressure pipe 1 rises, the control valves 2, 3 close by the signal from the measuring instrument 5. At this time, the pressure between the valves 2, 3 become vacuum. Gas is not left between the valves 2, 3 when the pressure in the low pressure pipe 1 has lowered and the valves 2, 3 have opened again, and it flows into the low pressure pipe with its flow being controlled by the throttle device 4. Hereby the pressure in the low pressure pipe 1 never rises suddenly.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62240738A JPS6484558A (en) | 1987-09-28 | 1987-09-28 | Gas pressure controller for ion implantating device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62240738A JPS6484558A (en) | 1987-09-28 | 1987-09-28 | Gas pressure controller for ion implantating device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6484558A true JPS6484558A (en) | 1989-03-29 |
Family
ID=17063966
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62240738A Pending JPS6484558A (en) | 1987-09-28 | 1987-09-28 | Gas pressure controller for ion implantating device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6484558A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012513092A (en) * | 2008-12-19 | 2012-06-07 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | Condensable gas cooling system |
-
1987
- 1987-09-28 JP JP62240738A patent/JPS6484558A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012513092A (en) * | 2008-12-19 | 2012-06-07 | ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド | Condensable gas cooling system |
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