JPS6482686A - Semiconductor laser - Google Patents

Semiconductor laser

Info

Publication number
JPS6482686A
JPS6482686A JP24211887A JP24211887A JPS6482686A JP S6482686 A JPS6482686 A JP S6482686A JP 24211887 A JP24211887 A JP 24211887A JP 24211887 A JP24211887 A JP 24211887A JP S6482686 A JPS6482686 A JP S6482686A
Authority
JP
Japan
Prior art keywords
layer
type
surround
refractive index
ohmic electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24211887A
Other languages
Japanese (ja)
Inventor
Takao Furuse
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP24211887A priority Critical patent/JPS6482686A/en
Publication of JPS6482686A publication Critical patent/JPS6482686A/en
Pending legal-status Critical Current

Links

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  • Semiconductor Lasers (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

PURPOSE:To reduce astigmatism and to improve condensing characteristic of a laser beam by forming a refractive index waveguide structure without optical absorption effect. CONSTITUTION:In a first MOCVD crystal growing step, an N-type Al0.4Ga0.6As layer 2, an Al0.05Ga0.95As layer 3 to become a light emitting region, a P-type Al0.4Ga0.6As layer 4, a P-type Al0.3Ga0.7As layer 10, a P-type Al0.5Ga0.5As layer 11 and a P-type GaAs layer 7 are sequentially formed on an N-type GaAs substrate 1. Then, in a normally frequently using step, a mesalike crystal laminate is formed. Thereafter, in a second MOCVD crystal growing step, gas etching is conducted immediately before a crystal growth to surround the mesa section, chemically etched surface is clarified, the layer 10 remaining except the mesa region is removed, an N-type Al0.5Ga0.5As layer 13 and an N-type GaAs layer 5 are sequentially formed to surround the mesa section. Eventually, after an SiO2 film 12 is removed, a P-type ohmic electrode 8 and an N-type ohmic electrode 9 are formed. Thus, a refractive index waveguide mechanism is formed without optical absorption effect, thereby obtaining an optical beam having less astigmatism and excellent condensing characteristic.
JP24211887A 1987-09-25 1987-09-25 Semiconductor laser Pending JPS6482686A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24211887A JPS6482686A (en) 1987-09-25 1987-09-25 Semiconductor laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24211887A JPS6482686A (en) 1987-09-25 1987-09-25 Semiconductor laser

Publications (1)

Publication Number Publication Date
JPS6482686A true JPS6482686A (en) 1989-03-28

Family

ID=17084564

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24211887A Pending JPS6482686A (en) 1987-09-25 1987-09-25 Semiconductor laser

Country Status (1)

Country Link
JP (1) JPS6482686A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03204986A (en) * 1990-01-05 1991-09-06 Sumitomo Electric Ind Ltd Semiconductor laser element
JP2010157511A (en) * 2003-01-16 2010-07-15 Japan Science & Technology Agency High-frequency power supply device and plasma generator

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03204986A (en) * 1990-01-05 1991-09-06 Sumitomo Electric Ind Ltd Semiconductor laser element
JP2010157511A (en) * 2003-01-16 2010-07-15 Japan Science & Technology Agency High-frequency power supply device and plasma generator

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