JPS6482623A - Device for alignment - Google Patents
Device for alignmentInfo
- Publication number
- JPS6482623A JPS6482623A JP62241232A JP24123287A JPS6482623A JP S6482623 A JPS6482623 A JP S6482623A JP 62241232 A JP62241232 A JP 62241232A JP 24123287 A JP24123287 A JP 24123287A JP S6482623 A JPS6482623 A JP S6482623A
- Authority
- JP
- Japan
- Prior art keywords
- grating
- diffracted light
- diffracted
- optical system
- light intensity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Optical Transform (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To simplify the optical system by selectively transmitting a diffracted light from a reference grating, irradiating said diffracted light from a predefined specific direction to the reference grating to be aligned, and using a light intensity attenuation means, thereby enabling a high precision alignment. CONSTITUTION:After passing through an optical system for lighting, any one of the 0, + or - primary diffracted lights 3, 1, 2 from a reference grating 12 is cut, and other one diffracted light changes the diffracted light intensity by a light intensity attenuation means 50 is irradiated onto a second grating 15 and a third grating 17 at an angle defined by the NA of the optical system for lighting (Numerical Aperture NA=nAinOi, where n is the refractive index of a medium), forming an interference fringe in the neighborhood thereof. The diffracted lights from the reference grating are separated again at the second and third gratings into 0, + or - primary, + or - secondary... diffracted light beams. Of these, by synthesizing the diffracted light of a specified degree, the amount of the relative positional shift of the third grating 17 to the second grating 15 can be detected as the phase difference of optical beat signals. By moving a mask and a wafer mounting stages 19, 20 based on the phase difference detected from optical beat signals, alignment is performed.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62241232A JPS6482623A (en) | 1987-09-25 | 1987-09-25 | Device for alignment |
DE3853246T DE3853246T2 (en) | 1987-09-25 | 1988-09-23 | Device for checking the positional relationship between a photomask and a plate. |
EP88308878A EP0309281B1 (en) | 1987-09-25 | 1988-09-23 | Apparatus for controlling relation in position between a photomask and a wafer |
US07/248,051 US4870289A (en) | 1987-09-25 | 1988-09-23 | Apparatus for controlling relation in position between a photomask and a wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62241232A JPS6482623A (en) | 1987-09-25 | 1987-09-25 | Device for alignment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6482623A true JPS6482623A (en) | 1989-03-28 |
Family
ID=17071166
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62241232A Pending JPS6482623A (en) | 1987-09-25 | 1987-09-25 | Device for alignment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6482623A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102419520A (en) * | 2010-09-27 | 2012-04-18 | 上海微电子装备有限公司 | Alignment signal simulating generator |
-
1987
- 1987-09-25 JP JP62241232A patent/JPS6482623A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102419520A (en) * | 2010-09-27 | 2012-04-18 | 上海微电子装备有限公司 | Alignment signal simulating generator |
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