JPS6481197A - Plasma processing power monitoring device - Google Patents
Plasma processing power monitoring deviceInfo
- Publication number
- JPS6481197A JPS6481197A JP62237107A JP23710787A JPS6481197A JP S6481197 A JPS6481197 A JP S6481197A JP 62237107 A JP62237107 A JP 62237107A JP 23710787 A JP23710787 A JP 23710787A JP S6481197 A JPS6481197 A JP S6481197A
- Authority
- JP
- Japan
- Prior art keywords
- voltage
- peak
- display
- detector
- envelop
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE:To enable a monitor device to perform a suitable monitor display by detecting an upper envelop and an lower envelop of high frequence components from a high frequency voltage applied to an electrode of a plasma generator, and by displaying DC component voltage of peak-to-peak voltage and high frequence voltage obtained. CONSTITUTION:At an upper electrode 104a of a plasma processor 1, voltage is generated by applying power to a processor chamber 104. The power is taken out, and upper and lower envelops are detected by a Vp<+> detector 33 and a Vp<-> detector 33 of an envelop detector 3 to compute peak-to-peak voltage of high frequency voltage by a voltage computing unit 4. A voltage display unit 5 displays DC component voltage of high frequency voltage obtained through the peak-to-peak voltage and an LPF 32. It is possible for an operator to proceed plasma processing properly while confirming the display of a display 5.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62237107A JPS6481197A (en) | 1987-09-24 | 1987-09-24 | Plasma processing power monitoring device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62237107A JPS6481197A (en) | 1987-09-24 | 1987-09-24 | Plasma processing power monitoring device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6481197A true JPS6481197A (en) | 1989-03-27 |
Family
ID=17010516
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62237107A Pending JPS6481197A (en) | 1987-09-24 | 1987-09-24 | Plasma processing power monitoring device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6481197A (en) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7217942B2 (en) | 2002-08-22 | 2007-05-15 | Tokyo Electron Limited | Plasma leak monitoring method, plasma processing apparatus and plasma processing method |
JP2008538852A (en) * | 2005-04-22 | 2008-11-06 | アドバンスト・エナジー・インダストリーズ・インコーポレイテッド | Arc detection and handling in radio frequency power applications |
JP2009048883A (en) * | 2007-08-21 | 2009-03-05 | Panasonic Corp | Plasma treatment apparatus |
US8585862B2 (en) | 2007-08-21 | 2013-11-19 | Panasonic Corporation | Plasma processing device and plasma discharge state monitoring device |
JP2014072043A (en) * | 2012-09-28 | 2014-04-21 | Daihen Corp | High frequency power supply device and method of controlling the same |
WO2021025076A1 (en) * | 2019-08-06 | 2021-02-11 | 株式会社京三製作所 | Pulsed high frequency monitor |
-
1987
- 1987-09-24 JP JP62237107A patent/JPS6481197A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7217942B2 (en) | 2002-08-22 | 2007-05-15 | Tokyo Electron Limited | Plasma leak monitoring method, plasma processing apparatus and plasma processing method |
JP2008538852A (en) * | 2005-04-22 | 2008-11-06 | アドバンスト・エナジー・インダストリーズ・インコーポレイテッド | Arc detection and handling in radio frequency power applications |
JP2009048883A (en) * | 2007-08-21 | 2009-03-05 | Panasonic Corp | Plasma treatment apparatus |
US8585862B2 (en) | 2007-08-21 | 2013-11-19 | Panasonic Corporation | Plasma processing device and plasma discharge state monitoring device |
JP2014072043A (en) * | 2012-09-28 | 2014-04-21 | Daihen Corp | High frequency power supply device and method of controlling the same |
WO2021025076A1 (en) * | 2019-08-06 | 2021-02-11 | 株式会社京三製作所 | Pulsed high frequency monitor |
JP2021027495A (en) * | 2019-08-06 | 2021-02-22 | 株式会社京三製作所 | Pulsed high frequency monitor |
US11852665B2 (en) | 2019-08-06 | 2023-12-26 | Kyosan Electric Mfg. Co., Ltd. | Pulsed high frequency monitor |
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