JPS6478249A - Photosensitive material and image forming method - Google Patents

Photosensitive material and image forming method

Info

Publication number
JPS6478249A
JPS6478249A JP23454987A JP23454987A JPS6478249A JP S6478249 A JPS6478249 A JP S6478249A JP 23454987 A JP23454987 A JP 23454987A JP 23454987 A JP23454987 A JP 23454987A JP S6478249 A JPS6478249 A JP S6478249A
Authority
JP
Japan
Prior art keywords
heating
compd
photosensitive layer
exposed
exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23454987A
Other languages
Japanese (ja)
Inventor
Akinobu Koike
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP23454987A priority Critical patent/JPS6478249A/en
Priority to GB8820926A priority patent/GB2210172A/en
Priority to DE19883831290 priority patent/DE3831290A1/en
Publication of JPS6478249A publication Critical patent/JPS6478249A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To enlarge the allowable range of heating at the time of forming a negative image by providing a photosensitive layer contg. a specified compd. and an org. base, in the titled material. CONSTITUTION:The photosensitive copying material comprises the photosensitive layer consisting at least one kind of a compd. selected from the group composed of an ester and an amide of 2-benzoquinone-2-diazide-4-sulfonic acid, as an o-quinone diazide compd., and the org. base. Said material is imagewisely exposed, and then, is wholly exposed by heating, followed by developing the exposed material with an alkaline developer to remove the photosensitive layer corresponding to an unexposed part in the image-wise exposure. Thus, in the negative type image formation comprising the imagewise exposure, the heating, the whole exposure and the alkaline development, the allowable range of the heating is enlarged.
JP23454987A 1987-09-18 1987-09-18 Photosensitive material and image forming method Pending JPS6478249A (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP23454987A JPS6478249A (en) 1987-09-18 1987-09-18 Photosensitive material and image forming method
GB8820926A GB2210172A (en) 1987-09-18 1988-09-06 Light-sensitive material and method for forming images
DE19883831290 DE3831290A1 (en) 1987-09-18 1988-09-14 LIGHT-SENSITIVE MATERIAL AND PICTURE-MAKING METHOD

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23454987A JPS6478249A (en) 1987-09-18 1987-09-18 Photosensitive material and image forming method

Publications (1)

Publication Number Publication Date
JPS6478249A true JPS6478249A (en) 1989-03-23

Family

ID=16972764

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23454987A Pending JPS6478249A (en) 1987-09-18 1987-09-18 Photosensitive material and image forming method

Country Status (3)

Country Link
JP (1) JPS6478249A (en)
DE (1) DE3831290A1 (en)
GB (1) GB2210172A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03142918A (en) * 1989-10-30 1991-06-18 Matsushita Electron Corp Formation of resist pattern
US6806020B2 (en) 2001-08-21 2004-10-19 Kodak Polychrome Graphics Llc Negative working imageable composition containing sulfonic acid
US6921620B2 (en) 2001-08-21 2005-07-26 Kodak Polychrome Graphics Llc Imageable composition containing colorant having a counter anion derived from a non-volatile acid

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3010607B2 (en) * 1992-02-25 2000-02-21 ジェイエスアール株式会社 Radiation-sensitive resin composition
US5580695A (en) * 1992-02-25 1996-12-03 Japan Synthetic Rubber Co., Ltd. Chemically amplified resist

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036209A (en) * 1973-06-20 1975-04-05
JPS526528A (en) * 1975-06-30 1977-01-19 Ibm Method of forming resist film
JPS5559456A (en) * 1978-10-25 1980-05-02 Fuji Photo Film Co Ltd Electron beam recording method
JPS5560944A (en) * 1978-10-31 1980-05-08 Fuji Photo Film Co Ltd Image forming method
JPS5636648A (en) * 1979-09-03 1981-04-09 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
JPS57111531A (en) * 1980-10-24 1982-07-12 Hoechst Ag Photosensitive mixture and photosensitive copying material manufactured from said mixture
JPS57114138A (en) * 1980-11-21 1982-07-15 Hoechst Ag Photosensitive mixture and copying material

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL125781C (en) * 1959-02-04
US3661582A (en) * 1970-03-23 1972-05-09 Western Electric Co Additives to positive photoresists which increase the sensitivity thereof
JPS5614970B2 (en) * 1974-02-01 1981-04-07
DE3325022A1 (en) * 1983-07-11 1985-01-24 Hoechst Ag, 6230 Frankfurt METHOD FOR PRODUCING NEGATIVE COPIES BY MEANS OF A MATERIAL BASED ON 1,2-CHINONDIAZIDES
JPS6235350A (en) * 1985-08-07 1987-02-16 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Photoresist with longer preservation life useful for image inversion

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5036209A (en) * 1973-06-20 1975-04-05
JPS526528A (en) * 1975-06-30 1977-01-19 Ibm Method of forming resist film
JPS5559456A (en) * 1978-10-25 1980-05-02 Fuji Photo Film Co Ltd Electron beam recording method
JPS5560944A (en) * 1978-10-31 1980-05-08 Fuji Photo Film Co Ltd Image forming method
JPS5636648A (en) * 1979-09-03 1981-04-09 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
JPS57111531A (en) * 1980-10-24 1982-07-12 Hoechst Ag Photosensitive mixture and photosensitive copying material manufactured from said mixture
JPS57114138A (en) * 1980-11-21 1982-07-15 Hoechst Ag Photosensitive mixture and copying material

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03142918A (en) * 1989-10-30 1991-06-18 Matsushita Electron Corp Formation of resist pattern
US6806020B2 (en) 2001-08-21 2004-10-19 Kodak Polychrome Graphics Llc Negative working imageable composition containing sulfonic acid
US6921620B2 (en) 2001-08-21 2005-07-26 Kodak Polychrome Graphics Llc Imageable composition containing colorant having a counter anion derived from a non-volatile acid

Also Published As

Publication number Publication date
GB8820926D0 (en) 1988-10-05
GB2210172A (en) 1989-06-01
DE3831290A1 (en) 1989-04-06

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