JPS647567A - Mos transistor - Google Patents
Mos transistorInfo
- Publication number
- JPS647567A JPS647567A JP62162061A JP16206187A JPS647567A JP S647567 A JPS647567 A JP S647567A JP 62162061 A JP62162061 A JP 62162061A JP 16206187 A JP16206187 A JP 16206187A JP S647567 A JPS647567 A JP S647567A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- impurity
- diffusion layer
- doped
- channel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000009792 diffusion process Methods 0.000 abstract 4
- 239000012535 impurity Substances 0.000 abstract 4
- 230000015556 catabolic process Effects 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Thin Film Transistor (AREA)
Abstract
PURPOSE:To enable the drive of a transistor of this design by high voltage by a method wherein a channel stopper layer doped with impurity of polarity opposite to that of impurity doped to a diffusion layer is formed adjacently to the diffusion layer on the part where a channel is to be formed. CONSTITUTION:The region, which is lightly doped with impurity of polarity opposite to that of high concentrated impurity doped into a diffusion layer 5, or A channel stopper layer 8 is formed on the part where a channel of a poly-Si layer 2 is built and the diffusion layer 5 is adjacent. Therefore, depletion layer becomes short in length W and it is hard to happen that current suddenly flows (breakdown state) even if high voltage is applied. By these processes, breakdown strength between a drain and a source is improved, and thus a transistor can be driven by high voltage.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62162061A JPS647567A (en) | 1987-06-29 | 1987-06-29 | Mos transistor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62162061A JPS647567A (en) | 1987-06-29 | 1987-06-29 | Mos transistor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS647567A true JPS647567A (en) | 1989-01-11 |
Family
ID=15747347
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62162061A Pending JPS647567A (en) | 1987-06-29 | 1987-06-29 | Mos transistor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS647567A (en) |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04273445A (en) * | 1991-02-28 | 1992-09-29 | G T C:Kk | Thin film semiconductor device and its production |
JPH0521800A (en) * | 1991-07-11 | 1993-01-29 | Victor Co Of Japan Ltd | Soimosfet |
JPH07111333A (en) * | 1993-08-20 | 1995-04-25 | Casio Comput Co Ltd | Thin film transistor, manufacture thereof, and input or output device equipped therewith |
US6049092A (en) * | 1993-09-20 | 2000-04-11 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
KR100262099B1 (en) * | 1991-03-08 | 2000-07-15 | 가나이 쓰도무 | Semiconductor memory device |
US6259120B1 (en) | 1993-10-01 | 2001-07-10 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for fabricating the same |
US6489632B1 (en) * | 1993-01-18 | 2002-12-03 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having a gate oxide film |
US6777763B1 (en) | 1993-10-01 | 2004-08-17 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for fabricating the same |
-
1987
- 1987-06-29 JP JP62162061A patent/JPS647567A/en active Pending
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04273445A (en) * | 1991-02-28 | 1992-09-29 | G T C:Kk | Thin film semiconductor device and its production |
KR100262099B1 (en) * | 1991-03-08 | 2000-07-15 | 가나이 쓰도무 | Semiconductor memory device |
JPH0521800A (en) * | 1991-07-11 | 1993-01-29 | Victor Co Of Japan Ltd | Soimosfet |
US6489632B1 (en) * | 1993-01-18 | 2002-12-03 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having a gate oxide film |
US6995432B2 (en) | 1993-01-18 | 2006-02-07 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device having a gate oxide film with some NTFTS with LDD regions and no PTFTS with LDD regions |
JPH07111333A (en) * | 1993-08-20 | 1995-04-25 | Casio Comput Co Ltd | Thin film transistor, manufacture thereof, and input or output device equipped therewith |
US6049092A (en) * | 1993-09-20 | 2000-04-11 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
US6867431B2 (en) | 1993-09-20 | 2005-03-15 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for manufacturing the same |
US6259120B1 (en) | 1993-10-01 | 2001-07-10 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for fabricating the same |
US6777763B1 (en) | 1993-10-01 | 2004-08-17 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and method for fabricating the same |
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