JPS6469669A - Actinic radiation-curable coating composition - Google Patents

Actinic radiation-curable coating composition

Info

Publication number
JPS6469669A
JPS6469669A JP22585387A JP22585387A JPS6469669A JP S6469669 A JPS6469669 A JP S6469669A JP 22585387 A JP22585387 A JP 22585387A JP 22585387 A JP22585387 A JP 22585387A JP S6469669 A JPS6469669 A JP S6469669A
Authority
JP
Japan
Prior art keywords
radical
carboxylic acid
double bond
polymerizable double
epoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22585387A
Other languages
English (en)
Other versions
JPH0692561B2 (ja
Inventor
Koji Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyo Ink Mfg Co Ltd
Original Assignee
Toyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyo Ink Mfg Co Ltd filed Critical Toyo Ink Mfg Co Ltd
Priority to JP22585387A priority Critical patent/JPH0692561B2/ja
Publication of JPS6469669A publication Critical patent/JPS6469669A/ja
Publication of JPH0692561B2 publication Critical patent/JPH0692561B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
JP22585387A 1987-09-09 1987-09-09 活性エネルギー線硬化性被覆組成物 Expired - Fee Related JPH0692561B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22585387A JPH0692561B2 (ja) 1987-09-09 1987-09-09 活性エネルギー線硬化性被覆組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22585387A JPH0692561B2 (ja) 1987-09-09 1987-09-09 活性エネルギー線硬化性被覆組成物

Publications (2)

Publication Number Publication Date
JPS6469669A true JPS6469669A (en) 1989-03-15
JPH0692561B2 JPH0692561B2 (ja) 1994-11-16

Family

ID=16835869

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22585387A Expired - Fee Related JPH0692561B2 (ja) 1987-09-09 1987-09-09 活性エネルギー線硬化性被覆組成物

Country Status (1)

Country Link
JP (1) JPH0692561B2 (ja)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101990122B1 (ko) * 2018-11-21 2019-06-19 주식회사 기가레인 임프린트 리소그래피용 리플리카 몰드 제작 장치 및 그 제작 방법

Also Published As

Publication number Publication date
JPH0692561B2 (ja) 1994-11-16

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees