JPS6468934A - Brush scrubber apparatus - Google Patents

Brush scrubber apparatus

Info

Publication number
JPS6468934A
JPS6468934A JP22573287A JP22573287A JPS6468934A JP S6468934 A JPS6468934 A JP S6468934A JP 22573287 A JP22573287 A JP 22573287A JP 22573287 A JP22573287 A JP 22573287A JP S6468934 A JPS6468934 A JP S6468934A
Authority
JP
Japan
Prior art keywords
semiconductor substrate
substrate
dust
pure water
same time
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22573287A
Other languages
Japanese (ja)
Inventor
Toshiyuki Tajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Kyushu Ltd
Original Assignee
NEC Kyushu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Kyushu Ltd filed Critical NEC Kyushu Ltd
Priority to JP22573287A priority Critical patent/JPS6468934A/en
Publication of JPS6468934A publication Critical patent/JPS6468934A/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning In General (AREA)
  • Brushes (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To decrease re-attachment of dust to the surface of a semiconductor substrate, by displacing the semiconductor substrate along a straight line, and wiping out the dust on the upper and rear surfaces of the semiconductor substrate during this movement with nozzles and brushes. CONSTITUTION:Arms 4a and 4b, on which a semiconductor substrate 1 is mounted, is moved from a position A to a position B and a position C along a conveying line. When, the semiconductor substrate 1 moves on the position B, pure water is jetted toward the surface of the semiconductor substrate 1 through shower nozzles 3. The surface of the substrate 1 is wiped out with a rotary brush 2. At the same time pure water is jetted toward the rear surface through shower nozzles 5. The rear surface of the substrate 1 is wiped out with a rotary brush 6. Thus dust, which is attached on the upper and rear surfaces of the substrate 1 is removed at the same time.
JP22573287A 1987-09-09 1987-09-09 Brush scrubber apparatus Pending JPS6468934A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22573287A JPS6468934A (en) 1987-09-09 1987-09-09 Brush scrubber apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22573287A JPS6468934A (en) 1987-09-09 1987-09-09 Brush scrubber apparatus

Publications (1)

Publication Number Publication Date
JPS6468934A true JPS6468934A (en) 1989-03-15

Family

ID=16833958

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22573287A Pending JPS6468934A (en) 1987-09-09 1987-09-09 Brush scrubber apparatus

Country Status (1)

Country Link
JP (1) JPS6468934A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0766161A (en) * 1993-08-23 1995-03-10 Enya Syst:Kk Single wafer cleaning system
JPH0817771A (en) * 1994-07-04 1996-01-19 Shin Etsu Handotai Co Ltd Brush washing device and work-washing system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0766161A (en) * 1993-08-23 1995-03-10 Enya Syst:Kk Single wafer cleaning system
JPH0817771A (en) * 1994-07-04 1996-01-19 Shin Etsu Handotai Co Ltd Brush washing device and work-washing system

Similar Documents

Publication Publication Date Title
EP0576175A3 (en) Liquid discharging apparatus and printing method using such an apparatus
DE3368004D1 (en) Surface-cleaning tool
CA2049220A1 (en) High pressure water jet cleaner and coating applicator
ATE59818T1 (en) VEHICLE WASH.
EP0161907A3 (en) Cleaning device with reservoir of cleaning liquid
CA2038058A1 (en) Drip cleaner attachment with solid cleaning concentrate
IT8723100A0 (en) PROCEDURE FOR ADJUSTING THE SPEED OF INKJET NOZZLES IN A NOZZLE COMPLEX.
JPS6468934A (en) Brush scrubber apparatus
MX9801382A (en) Cleaning composition, method and apparatus for cleaning exterior windows.
ITMO910162A1 (en) NOZZLE FOR THE GENERATION OF A ROTATING JET.
EP0246802A3 (en) Process for cleaning surface of semiconductor substrate
GB2196272B (en) "liquid jet apparatus for cleaning surfaces".
FR2643673B1 (en) FACADE CLEANING DEVICE
IT209170Z2 (en) DISHWASHER MACHINE WITH SELF-CLEANING RECIRCULATION FILTER.
DE3369499D1 (en) Spray nozzle for bottle cleaning machines
JPS6489388A (en) Board cleaning device
JPS6419730A (en) Surface treatment device for semiconductor wafer
JPH03286530A (en) Wafer cleaning apparatus
FR2356541A1 (en) Headlamp wiper blade with fluid supply - has bristles forming curtain with all cleaning fluid jet holes along one side
JPS57193369A (en) Ink jet type printing machine
JPS6411523A (en) Dish feeder in tableware washing machine
JPS57205256A (en) Apparatus for cleaning head lamp of car
JPS54125980A (en) Washing device for semiconductor mask cleansing wiper tool
KR200156133Y1 (en) Apparatus for cleaning wafer backside
JPS5289254A (en) Tool of sucking floor for vacuum cleaners