JPS6461717A - Illuminator - Google Patents

Illuminator

Info

Publication number
JPS6461717A
JPS6461717A JP62218790A JP21879087A JPS6461717A JP S6461717 A JPS6461717 A JP S6461717A JP 62218790 A JP62218790 A JP 62218790A JP 21879087 A JP21879087 A JP 21879087A JP S6461717 A JPS6461717 A JP S6461717A
Authority
JP
Japan
Prior art keywords
luminous flux
filter
passes
characteristic
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62218790A
Other languages
Japanese (ja)
Inventor
Miyoko Noguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP62218790A priority Critical patent/JPS6461717A/en
Publication of JPS6461717A publication Critical patent/JPS6461717A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Microscoopes, Condenser (AREA)

Abstract

PURPOSE:To make the spectral characteristic of a luminous flux which passes an optical filter constant even if the spectral transmission characteristic of the optical filter is altered by disposing two optical filters, at least one of which possesses wavelength selection characteristic, in an opposite direction each other so that they can be movably titled. CONSTITUTION:The luminous flux from a light source 1 becomes almost parallel luminous flux L and is inputted in the optical filter 5 which possesses the wavelength selection characteristic. The intensity of the luminous flux which passes the filter 5 has the distribution of a band in which it becomes the maximum in the specified wavelength and the luminous flux passes the optical filter 6 and is radiated on the surface 10 to be radiated by a condenser lens 9. A light receiving element 13 receives only long wavelength area which is a part of the luminous flux from the way of a projectile optical path through a reflection mirror 11 and a filter 12 for receiving light. The light quantity in the long wavelength area of the light receiving element 13 is altered before and after the filter 5 changes in the lapse of time. Now, the element 13 inputs an output signal in a control part 14 and the control part 14 tilts the optical filters 5 and 6 in the opposite direction by a same angle. The incident angle of the luminous flux L is altered and the illuminance distribution on the surface 10 to be radiated can be uniformized by adjusting the distribution characteristic of the luminous flux which passes the filters 5 and 6 to become an original value.
JP62218790A 1987-08-31 1987-08-31 Illuminator Pending JPS6461717A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62218790A JPS6461717A (en) 1987-08-31 1987-08-31 Illuminator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62218790A JPS6461717A (en) 1987-08-31 1987-08-31 Illuminator

Publications (1)

Publication Number Publication Date
JPS6461717A true JPS6461717A (en) 1989-03-08

Family

ID=16725414

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62218790A Pending JPS6461717A (en) 1987-08-31 1987-08-31 Illuminator

Country Status (1)

Country Link
JP (1) JPS6461717A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH055805A (en) * 1991-06-27 1993-01-14 Mitsubishi Cable Ind Ltd Wavelength variable filter module
JP2006114914A (en) * 2004-10-15 2006-04-27 Asml Netherlands Bv Lithography system, method for adjusting transparent characteristics of optical path in lithography system, semiconductor device, manufacturing method for reflection element used in lithography system, and reflection element manufactured by it
JP2007179002A (en) * 2005-12-02 2007-07-12 Nano Photon Kk Optical microscope and method of measuring spectrum
JP2013516661A (en) * 2010-01-08 2013-05-13 セムロック・インコーポレイテッド Tunable thin film filter
JP5365641B2 (en) * 2008-12-24 2013-12-11 株式会社ニコン Illumination optical system, exposure apparatus, and device manufacturing method
US9304237B1 (en) 2012-12-10 2016-04-05 Semrock, Inc. Tunable band-pass filter
US9857511B2 (en) 2007-05-30 2018-01-02 Semrock, Inc. Interference filter for non-zero angle of incidence spectroscopy

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH055805A (en) * 1991-06-27 1993-01-14 Mitsubishi Cable Ind Ltd Wavelength variable filter module
JP2006114914A (en) * 2004-10-15 2006-04-27 Asml Netherlands Bv Lithography system, method for adjusting transparent characteristics of optical path in lithography system, semiconductor device, manufacturing method for reflection element used in lithography system, and reflection element manufactured by it
JP2007179002A (en) * 2005-12-02 2007-07-12 Nano Photon Kk Optical microscope and method of measuring spectrum
US9857511B2 (en) 2007-05-30 2018-01-02 Semrock, Inc. Interference filter for non-zero angle of incidence spectroscopy
JP5365641B2 (en) * 2008-12-24 2013-12-11 株式会社ニコン Illumination optical system, exposure apparatus, and device manufacturing method
JP2013516661A (en) * 2010-01-08 2013-05-13 セムロック・インコーポレイテッド Tunable thin film filter
JP2015148801A (en) * 2010-01-08 2015-08-20 セムロック・インコーポレイテッドSemrock,Inc. Tunable thin-film filter
US9304237B1 (en) 2012-12-10 2016-04-05 Semrock, Inc. Tunable band-pass filter

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