JPS6461717A - Illuminator - Google Patents
IlluminatorInfo
- Publication number
- JPS6461717A JPS6461717A JP62218790A JP21879087A JPS6461717A JP S6461717 A JPS6461717 A JP S6461717A JP 62218790 A JP62218790 A JP 62218790A JP 21879087 A JP21879087 A JP 21879087A JP S6461717 A JPS6461717 A JP S6461717A
- Authority
- JP
- Japan
- Prior art keywords
- luminous flux
- filter
- passes
- characteristic
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Microscoopes, Condenser (AREA)
Abstract
PURPOSE:To make the spectral characteristic of a luminous flux which passes an optical filter constant even if the spectral transmission characteristic of the optical filter is altered by disposing two optical filters, at least one of which possesses wavelength selection characteristic, in an opposite direction each other so that they can be movably titled. CONSTITUTION:The luminous flux from a light source 1 becomes almost parallel luminous flux L and is inputted in the optical filter 5 which possesses the wavelength selection characteristic. The intensity of the luminous flux which passes the filter 5 has the distribution of a band in which it becomes the maximum in the specified wavelength and the luminous flux passes the optical filter 6 and is radiated on the surface 10 to be radiated by a condenser lens 9. A light receiving element 13 receives only long wavelength area which is a part of the luminous flux from the way of a projectile optical path through a reflection mirror 11 and a filter 12 for receiving light. The light quantity in the long wavelength area of the light receiving element 13 is altered before and after the filter 5 changes in the lapse of time. Now, the element 13 inputs an output signal in a control part 14 and the control part 14 tilts the optical filters 5 and 6 in the opposite direction by a same angle. The incident angle of the luminous flux L is altered and the illuminance distribution on the surface 10 to be radiated can be uniformized by adjusting the distribution characteristic of the luminous flux which passes the filters 5 and 6 to become an original value.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62218790A JPS6461717A (en) | 1987-08-31 | 1987-08-31 | Illuminator |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62218790A JPS6461717A (en) | 1987-08-31 | 1987-08-31 | Illuminator |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6461717A true JPS6461717A (en) | 1989-03-08 |
Family
ID=16725414
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62218790A Pending JPS6461717A (en) | 1987-08-31 | 1987-08-31 | Illuminator |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6461717A (en) |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH055805A (en) * | 1991-06-27 | 1993-01-14 | Mitsubishi Cable Ind Ltd | Wavelength variable filter module |
JP2006114914A (en) * | 2004-10-15 | 2006-04-27 | Asml Netherlands Bv | Lithography system, method for adjusting transparent characteristics of optical path in lithography system, semiconductor device, manufacturing method for reflection element used in lithography system, and reflection element manufactured by it |
JP2007179002A (en) * | 2005-12-02 | 2007-07-12 | Nano Photon Kk | Optical microscope and method of measuring spectrum |
JP2013516661A (en) * | 2010-01-08 | 2013-05-13 | セムロック・インコーポレイテッド | Tunable thin film filter |
JP5365641B2 (en) * | 2008-12-24 | 2013-12-11 | 株式会社ニコン | Illumination optical system, exposure apparatus, and device manufacturing method |
US9304237B1 (en) | 2012-12-10 | 2016-04-05 | Semrock, Inc. | Tunable band-pass filter |
US9857511B2 (en) | 2007-05-30 | 2018-01-02 | Semrock, Inc. | Interference filter for non-zero angle of incidence spectroscopy |
-
1987
- 1987-08-31 JP JP62218790A patent/JPS6461717A/en active Pending
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH055805A (en) * | 1991-06-27 | 1993-01-14 | Mitsubishi Cable Ind Ltd | Wavelength variable filter module |
JP2006114914A (en) * | 2004-10-15 | 2006-04-27 | Asml Netherlands Bv | Lithography system, method for adjusting transparent characteristics of optical path in lithography system, semiconductor device, manufacturing method for reflection element used in lithography system, and reflection element manufactured by it |
JP2007179002A (en) * | 2005-12-02 | 2007-07-12 | Nano Photon Kk | Optical microscope and method of measuring spectrum |
US9857511B2 (en) | 2007-05-30 | 2018-01-02 | Semrock, Inc. | Interference filter for non-zero angle of incidence spectroscopy |
JP5365641B2 (en) * | 2008-12-24 | 2013-12-11 | 株式会社ニコン | Illumination optical system, exposure apparatus, and device manufacturing method |
JP2013516661A (en) * | 2010-01-08 | 2013-05-13 | セムロック・インコーポレイテッド | Tunable thin film filter |
JP2015148801A (en) * | 2010-01-08 | 2015-08-20 | セムロック・インコーポレイテッドSemrock,Inc. | Tunable thin-film filter |
US9304237B1 (en) | 2012-12-10 | 2016-04-05 | Semrock, Inc. | Tunable band-pass filter |
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