JPS6457108A - Interference measurement method of film thickness - Google Patents

Interference measurement method of film thickness

Info

Publication number
JPS6457108A
JPS6457108A JP21270787A JP21270787A JPS6457108A JP S6457108 A JPS6457108 A JP S6457108A JP 21270787 A JP21270787 A JP 21270787A JP 21270787 A JP21270787 A JP 21270787A JP S6457108 A JPS6457108 A JP S6457108A
Authority
JP
Japan
Prior art keywords
film
interference
measurement
correlation
coefficient
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP21270787A
Other languages
Japanese (ja)
Other versions
JPH0654217B2 (en
Inventor
Katsu Inoue
Shigeru Matsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP21270787A priority Critical patent/JPH0654217B2/en
Publication of JPS6457108A publication Critical patent/JPS6457108A/en
Publication of JPH0654217B2 publication Critical patent/JPH0654217B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)

Abstract

PURPOSE:To enable the execution of measurement of high reliability by determining a correlation coefficient from an interference figure formed by a reflected light of an object film of measurement and a trial interference figure which is composed by using an interference figure of white light and has a subsidiary maximum in a finite optical path difference. CONSTITUTION:A trial interference figure having a subsidiary maximum in a finite optical path difference is composed by using an interference figure of white light which is stored 70 beforehand. A coefficient of correlation between this composed figure and a film interference figure obtained by introducing into a polarization interferometer 30 a film interference caused by reflected lights 19 from the surface and the back of an object film 24 of measurement, is determined. Then, an optical path difference having the maximum coefficient of correlation is taken for the optical distance of the object film 24, while the probability of measurement is estimated from the maximum value of the coefficient of correlation. Even when the film thickness of the object film 24 is small and further when a second film exists under said film, the measurement of high reliability can be implemented by composing the trial interference figure, inclusive of the effect of the second film.
JP21270787A 1987-08-28 1987-08-28 Interference film thickness measurement method Expired - Lifetime JPH0654217B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21270787A JPH0654217B2 (en) 1987-08-28 1987-08-28 Interference film thickness measurement method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21270787A JPH0654217B2 (en) 1987-08-28 1987-08-28 Interference film thickness measurement method

Publications (2)

Publication Number Publication Date
JPS6457108A true JPS6457108A (en) 1989-03-03
JPH0654217B2 JPH0654217B2 (en) 1994-07-20

Family

ID=16627098

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21270787A Expired - Lifetime JPH0654217B2 (en) 1987-08-28 1987-08-28 Interference film thickness measurement method

Country Status (1)

Country Link
JP (1) JPH0654217B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007506071A (en) * 2003-09-15 2007-03-15 ザイゴ　コーポレーション Method and system for surface interference analysis and related applications
WO2011083544A1 (en) * 2010-01-06 2011-07-14 パナソニック株式会社 Film thickness measuring apparatus using interference and method of measuring film thickness using interference
JP2011526692A (en) * 2008-06-30 2011-10-13 エスエヌユー プレシジョン カンパニー，リミテッド Measuring method of thickness or surface shape

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007506071A (en) * 2003-09-15 2007-03-15 ザイゴ　コーポレーション Method and system for surface interference analysis and related applications
JP2011526692A (en) * 2008-06-30 2011-10-13 エスエヌユー プレシジョン カンパニー，リミテッド Measuring method of thickness or surface shape
WO2011083544A1 (en) * 2010-01-06 2011-07-14 パナソニック株式会社 Film thickness measuring apparatus using interference and method of measuring film thickness using interference
US8619263B2 (en) 2010-01-06 2013-12-31 Panasonic Corporation Film thickness measuring apparatus using interference and film thickness measuring method using interference
JP5427896B2 (en) * 2010-01-06 2014-02-26 パナソニック株式会社 Film thickness measuring apparatus using interference and film thickness measuring method using interference

Also Published As

Publication number Publication date
JPH0654217B2 (en) 1994-07-20

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