JPS64541A - Silver halide photographic sensitive material containing oxonol dyestuff - Google Patents
Silver halide photographic sensitive material containing oxonol dyestuffInfo
- Publication number
- JPS64541A JPS64541A JP6777688A JP6777688A JPS64541A JP S64541 A JPS64541 A JP S64541A JP 6777688 A JP6777688 A JP 6777688A JP 6777688 A JP6777688 A JP 6777688A JP S64541 A JPS64541 A JP S64541A
- Authority
- JP
- Japan
- Prior art keywords
- dyestuff
- titled material
- group
- silver halide
- material containing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/825—Photosensitive materials characterised by the base or auxiliary layers characterised by antireflection means or visible-light filtering means, e.g. antihalation
- G03C1/83—Organic dyestuffs therefor
- G03C1/832—Methine or polymethine dyes
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
Abstract
PURPOSE:To obtain the titled material which has good spectral characteristics and does not produce inconvenience due to the dyestuff by incorporating a specified oxonol dyestuff in the titled material. CONSTITUTION:The titled material contains the oxonol dyestuff shown by formula I, wherein R<1> and R<2> are each a heterocyclic ring group or aryl group, R<3> and R<4> are each alkyl, a heterocyclic ring or aryl group, and at least one kind of each said groups is a water soluble group, L<1>-L<5> are each methine group, (k<1>) and (k<2>) are each 0 or an integer of 1. Thus, the titled material which has the good absorption spectrum and decolors during a development processing and has remarkably less contamination due to a residual color after processing and contains the dyestuff inactive to a photographic emulsion, is obtd.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6777688A JPS64541A (en) | 1987-03-20 | 1988-03-22 | Silver halide photographic sensitive material containing oxonol dyestuff |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6627687 | 1987-03-20 | ||
JP62-66276 | 1987-03-20 | ||
JP6777688A JPS64541A (en) | 1987-03-20 | 1988-03-22 | Silver halide photographic sensitive material containing oxonol dyestuff |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH01541A JPH01541A (en) | 1989-01-05 |
JPS64541A true JPS64541A (en) | 1989-01-05 |
Family
ID=26407459
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6777688A Pending JPS64541A (en) | 1987-03-20 | 1988-03-22 | Silver halide photographic sensitive material containing oxonol dyestuff |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS64541A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013129674A1 (en) * | 2012-03-01 | 2013-09-06 | 学校法人兵庫医科大学 | Novel benzimidazole derivative and use thereof |
US20170123313A1 (en) * | 2015-10-31 | 2017-05-04 | Rohm And Haas Electronic Materials Llc | Thermal acid generators and photoresist pattern trimming compositions and methods |
-
1988
- 1988-03-22 JP JP6777688A patent/JPS64541A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013129674A1 (en) * | 2012-03-01 | 2013-09-06 | 学校法人兵庫医科大学 | Novel benzimidazole derivative and use thereof |
US9212169B2 (en) | 2012-03-01 | 2015-12-15 | Hyogo College Of Medicine | Benzimidazole derivative and use thereof |
US20170123313A1 (en) * | 2015-10-31 | 2017-05-04 | Rohm And Haas Electronic Materials Llc | Thermal acid generators and photoresist pattern trimming compositions and methods |
US10241407B2 (en) * | 2015-10-31 | 2019-03-26 | Rohm And Haas Electronic Materials Llc | Thermal acid generators and photoresist pattern trimming compositions and methods |
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