JPS645017A - Projection aligner - Google Patents

Projection aligner

Info

Publication number
JPS645017A
JPS645017A JP16180187A JP16180187A JPS645017A JP S645017 A JPS645017 A JP S645017A JP 16180187 A JP16180187 A JP 16180187A JP 16180187 A JP16180187 A JP 16180187A JP S645017 A JPS645017 A JP S645017A
Authority
JP
Japan
Prior art keywords
liquid crystal
light
panel
pattern
liquid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16180187A
Other languages
Japanese (ja)
Inventor
Toshiyuki Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP16180187A priority Critical patent/JPS645017A/en
Publication of JPS645017A publication Critical patent/JPS645017A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To enable the pattern transfer without forming actually a mask, by supplying a driving signal with the same pattern as a design pattern to the liquid crystal cell of a liquid crystal panel, and forming a light shielding region on the liquid crystal panel by the pattern. CONSTITUTION:Light from a light source 1 is converted to an uniform parallel light having a specified beam diameter by a first optical system 4, and radiated on a liquid panel 3. The light transmitted through the liquid panel 3 is converged on a wafer W surface on a wafer stage 2, by a second optical system 5. In the liquid crystal panel 3, liquid crystal 33 is sealed between two parallel quartz substrates 31, 32. On the inner side of one quartz substrate 31, a plurality of matrix type transparent electrodes 34 ... are formed. On the inner side of the other quartz substrate 32, a common transparent electrode 35 is formed. In this manner, liquid crystal groups C ... are constituted, and deflecting plates 36, 37 are so arranged on the outside that the mutual deflection axes become parallel with each other.
JP16180187A 1987-06-29 1987-06-29 Projection aligner Pending JPS645017A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16180187A JPS645017A (en) 1987-06-29 1987-06-29 Projection aligner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16180187A JPS645017A (en) 1987-06-29 1987-06-29 Projection aligner

Publications (1)

Publication Number Publication Date
JPS645017A true JPS645017A (en) 1989-01-10

Family

ID=15742171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16180187A Pending JPS645017A (en) 1987-06-29 1987-06-29 Projection aligner

Country Status (1)

Country Link
JP (1) JPS645017A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0293536A (en) * 1988-09-30 1990-04-04 Nec Yamagata Ltd Liquid crystal mask for producing semiconductor device
US5196802A (en) * 1990-04-23 1993-03-23 The United States Of America As Represented By The Secretary Of The Navy Method and apparatus for characterizing the quality of electrically thin semiconductor films
JP2002372791A (en) * 1994-02-21 2002-12-26 Friedrich Luellau Device for forming plate surface of offset printing plate or the like by photoengraving

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0293536A (en) * 1988-09-30 1990-04-04 Nec Yamagata Ltd Liquid crystal mask for producing semiconductor device
US5196802A (en) * 1990-04-23 1993-03-23 The United States Of America As Represented By The Secretary Of The Navy Method and apparatus for characterizing the quality of electrically thin semiconductor films
JP2002372791A (en) * 1994-02-21 2002-12-26 Friedrich Luellau Device for forming plate surface of offset printing plate or the like by photoengraving

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