JPS6449038A - Positive type photoresist composition - Google Patents

Positive type photoresist composition

Info

Publication number
JPS6449038A
JPS6449038A JP20578787A JP20578787A JPS6449038A JP S6449038 A JPS6449038 A JP S6449038A JP 20578787 A JP20578787 A JP 20578787A JP 20578787 A JP20578787 A JP 20578787A JP S6449038 A JPS6449038 A JP S6449038A
Authority
JP
Japan
Prior art keywords
compd
titled composition
quinone diazide
contg
chromatographic analysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20578787A
Other languages
Japanese (ja)
Other versions
JPH0346814B2 (en
Inventor
Mineo Nishi
Masahiro Sakaguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Kasei Corp
Original Assignee
Mitsubishi Kasei Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Kasei Corp filed Critical Mitsubishi Kasei Corp
Priority to JP20578787A priority Critical patent/JPS6449038A/en
Publication of JPS6449038A publication Critical patent/JPS6449038A/en
Publication of JPH0346814B2 publication Critical patent/JPH0346814B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Abstract

PURPOSE:To improve the shelf stability of the titled composition by controlling a specified impurity contg. in the titled composition contg. a four functional quinone diazide type photosensitive compd. to less than a prescribed amount. CONSTITUTION:The titled composition comprises the component of the quinone diazide type photosensitive compd. in which the peak area of said compd. having 0.75-0.9 times retention time against that of the peak of a quinone diazide compd. composed of sulfonates formed by substituting the all four hydroxy groups of tetrahydroxy benzophenone, is <=3% the total peak area in a liquid chromatographic analysis. In said liquid chromatographic analysis, a porous silica gel which is allowed to chemically bond with octadecylsilane, is merely used for a column, and a mixture of acetonitrile, water and acetic acid is used for an elute. Thus, the deterioration of the application property of the titled composition can be prevented after storage for a long period.
JP20578787A 1987-08-19 1987-08-19 Positive type photoresist composition Granted JPS6449038A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20578787A JPS6449038A (en) 1987-08-19 1987-08-19 Positive type photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20578787A JPS6449038A (en) 1987-08-19 1987-08-19 Positive type photoresist composition

Publications (2)

Publication Number Publication Date
JPS6449038A true JPS6449038A (en) 1989-02-23
JPH0346814B2 JPH0346814B2 (en) 1991-07-17

Family

ID=16512666

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20578787A Granted JPS6449038A (en) 1987-08-19 1987-08-19 Positive type photoresist composition

Country Status (1)

Country Link
JP (1) JPS6449038A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5358823A (en) * 1991-04-09 1994-10-25 Hoechst Aktiengesellschaft Radiation-sensitive composition containing esterification product of (1,2-naphthoquinone-2-diazide)-sulfonic acid with 2,3,4,4'-tetrahydroxybenzophenone and a di- or tri-hydroxybenzophenone

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3825344B2 (en) 2002-03-15 2006-09-27 富士写真フイルム株式会社 Organic EL element and organic EL display

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3148983A (en) * 1959-08-29 1964-09-15 Azoplate Corp Light sensitive omicron-quinone diazides and the photomechanical preparation of printing plates therewith
JPS61118744A (en) * 1984-11-15 1986-06-06 Tokyo Ohka Kogyo Co Ltd Positive photoresist composition
JPS61185741A (en) * 1985-02-13 1986-08-19 Mitsubishi Chem Ind Ltd Positive type photoresist composition
JPS62280737A (en) * 1986-05-29 1987-12-05 Japan Synthetic Rubber Co Ltd Positive type radiation sensitive resin composition
JPS63249143A (en) * 1987-04-04 1988-10-17 Mitsubishi Kasei Corp Positive type photoresist composition

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3148983A (en) * 1959-08-29 1964-09-15 Azoplate Corp Light sensitive omicron-quinone diazides and the photomechanical preparation of printing plates therewith
JPS61118744A (en) * 1984-11-15 1986-06-06 Tokyo Ohka Kogyo Co Ltd Positive photoresist composition
JPS61185741A (en) * 1985-02-13 1986-08-19 Mitsubishi Chem Ind Ltd Positive type photoresist composition
JPS62280737A (en) * 1986-05-29 1987-12-05 Japan Synthetic Rubber Co Ltd Positive type radiation sensitive resin composition
JPS63249143A (en) * 1987-04-04 1988-10-17 Mitsubishi Kasei Corp Positive type photoresist composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5358823A (en) * 1991-04-09 1994-10-25 Hoechst Aktiengesellschaft Radiation-sensitive composition containing esterification product of (1,2-naphthoquinone-2-diazide)-sulfonic acid with 2,3,4,4'-tetrahydroxybenzophenone and a di- or tri-hydroxybenzophenone

Also Published As

Publication number Publication date
JPH0346814B2 (en) 1991-07-17

Similar Documents

Publication Publication Date Title
IE792247L (en) Interferon purification
IL51958A (en) Process for inversion of configuration of chiral acid esters of alpha-cyano-3-phenoxybenzyl alcohol,chiral esters of(r)or(s)alpha-cyano benzyl alcohol with dimethyl-3(r)dihalovinyl-1(r)cyclopropane-carboxylic acid and insecticidal compositions containing them
IT1096119B (en) PERFECTED VALVE FOR THE MIXING OF FLUIDS AND FOR THE DISPENSING OF THE RESULTING MIXTURE
JPS56129298A (en) Homogenous enzyme containing liquid detergent composition containing saturated fatty acid
EP0161493A3 (en) Liquid chromatography column assembly
JPS6449038A (en) Positive type photoresist composition
ATE74367T1 (en) PEPTIDE COMPOUND AND ANTISERUM PRODUCED BY THIS COMPOUND.
NO930572D0 (en) PROCEDURE FOR DECOLVING A FATTY ACID ESTER AND A FOOD AND COSMETIC COMPOSITION CONTAINING THE ESTER
JPS53141698A (en) Regulation of single pump multistroke mixing ratio for mixed eluate liquid chromatography
CA2168878A1 (en) Quantitation of Carbohydrate Deficient Transferrin in High Alcohol Consumption by HPLC
AU526185B2 (en) Drip chamber with backflow ball valve
ZA893944B (en) Composition having anti-endotoxic activity
JPS562315A (en) Cure accelerating liquid composition containing amine
JPS5317787A (en) Filler for high speed liquid chromatography
AU5560486A (en) Measuring metabolism during liquid injection
DK571585A (en) PROCEDURE FOR THE PREPARATION OF Cinnamic Acid Esters
ATE210421T1 (en) USNIC ACID IN A DEODORANT STICK
JPS55153936A (en) Storage-stabilized photosensitive resin composition for flexographic plate
DE3869573D1 (en) VITAMIN E PREPARATIONS FOR EXTERNAL USE.
JPS6487834A (en) Regulator for fuel discharge adjusting member of fuel injection pump
JPS56145299A (en) Purification of s-adenosyl-l-methionine
JPS562316A (en) Cure accelerating composition
DK143187D0 (en) QUANTITY CONTROL VALVE FOR USED WATER FITTINGS
TAKAGI et al. Resolution of racemic monoacylglycerols to enantiomers by high-performance liquid chromatography
JPS5387294A (en) Preparation of separation column for liquid chromatograph

Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees