JPS6447885A - Dry etching equipment - Google Patents
Dry etching equipmentInfo
- Publication number
- JPS6447885A JPS6447885A JP20452687A JP20452687A JPS6447885A JP S6447885 A JPS6447885 A JP S6447885A JP 20452687 A JP20452687 A JP 20452687A JP 20452687 A JP20452687 A JP 20452687A JP S6447885 A JPS6447885 A JP S6447885A
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- load lock
- dry etching
- equipment
- etching
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- ing And Chemical Polishing (AREA)
Abstract
PURPOSE:To carry out the curing of resist by means of ultraviolet-ray irradiation in a load lock and to simplify dry etching equipment as a whole, by providing an ultraviolet lamp to the inside of a load lock in front of an etching chamber in dry etching equipment. CONSTITUTION:A wafer 2a is fed from a carrier 6a into a load lock 1a on the former-stage side, and the surface of the wafer 2a is irradiated with an ultraviolet lamp 14 in the vacuum load lock 1a, by which the resist on the surface of the wafer 2a is cured. Successively, the wafer 2a is transferred into an etching chamber 7, where a high-frequency voltage is impressed from a high-frequency electric power source 3 on internal electrodes 5a, 5b to carry out electric discharge so as to subject the wafer 2a surface to etching treatment. Subsequently, the wafer 2a is transferred into a load lock 1b on the latter-stage side and supplied with N2 gas until atmospheric pressure is reached, and then, the wafer 2a is held into a carrier 6b. In this way, by unifying the etching chamber 7 and the ultraviolet lamp into one equipment, dry etching can be performed by simple equipment.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20452687A JPS6447885A (en) | 1987-08-18 | 1987-08-18 | Dry etching equipment |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20452687A JPS6447885A (en) | 1987-08-18 | 1987-08-18 | Dry etching equipment |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6447885A true JPS6447885A (en) | 1989-02-22 |
Family
ID=16491995
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20452687A Pending JPS6447885A (en) | 1987-08-18 | 1987-08-18 | Dry etching equipment |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6447885A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57149733A (en) * | 1981-03-11 | 1982-09-16 | Hitachi Ltd | Dry etching method |
JPS59207628A (en) * | 1983-05-11 | 1984-11-24 | Hitachi Ltd | Dry-etching method |
-
1987
- 1987-08-18 JP JP20452687A patent/JPS6447885A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57149733A (en) * | 1981-03-11 | 1982-09-16 | Hitachi Ltd | Dry etching method |
JPS59207628A (en) * | 1983-05-11 | 1984-11-24 | Hitachi Ltd | Dry-etching method |
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