JPS6446738A - Antistatic photosensitive laminated film - Google Patents

Antistatic photosensitive laminated film

Info

Publication number
JPS6446738A
JPS6446738A JP20388287A JP20388287A JPS6446738A JP S6446738 A JPS6446738 A JP S6446738A JP 20388287 A JP20388287 A JP 20388287A JP 20388287 A JP20388287 A JP 20388287A JP S6446738 A JPS6446738 A JP S6446738A
Authority
JP
Japan
Prior art keywords
layer
layers
agent
antistatic
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20388287A
Other languages
Japanese (ja)
Inventor
Kanji Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FUAINTETSUKU KENKYUSHO KK
Original Assignee
FUAINTETSUKU KENKYUSHO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FUAINTETSUKU KENKYUSHO KK filed Critical FUAINTETSUKU KENKYUSHO KK
Priority to JP20388287A priority Critical patent/JPS6446738A/en
Publication of JPS6446738A publication Critical patent/JPS6446738A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/093—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antistatic means, e.g. for charge depletion
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To easily suppress the generation of an electrostatic charge voltage in a process for producing a film and to improve the yield of a printed wiring board or the like which is the final product by subjecting a protective layer or both of a backing layer and the protective layer to an antistatic treatment. CONSTITUTION:The kneading of an antistatic agent into the backing layer 1 and the protective layer 2 or the coating of said agent on the surface of said layers is preferable as the antistatic treatment to be executed on said layers. However, the method of kneading the antistatic agent to the layers has the possibility of bleeding of the antistatic agent onto the surface of the layer to which said agent is kneaded and the consequent change or deterioration in the properties of a photoresist photosensitive layer 3 by the migration of said agent to the photoresist photosensitive layer particularly in such a case when the film consisting of the photosensitive laminated body is preserved for a long period of time. The method for coating the antistatic agent includes a method of executing the coating after the production of the conventional photosensitive laminated film consisting of the three layers or a method of previously coating the antistatic agent on the side to be formed as the backing and protective layers. The stripping electrostatic charge voltage to be generated in the photoresist photosensitive layer is thereby extremely lowered.
JP20388287A 1987-08-17 1987-08-17 Antistatic photosensitive laminated film Pending JPS6446738A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20388287A JPS6446738A (en) 1987-08-17 1987-08-17 Antistatic photosensitive laminated film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20388287A JPS6446738A (en) 1987-08-17 1987-08-17 Antistatic photosensitive laminated film

Publications (1)

Publication Number Publication Date
JPS6446738A true JPS6446738A (en) 1989-02-21

Family

ID=16481282

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20388287A Pending JPS6446738A (en) 1987-08-17 1987-08-17 Antistatic photosensitive laminated film

Country Status (1)

Country Link
JP (1) JPS6446738A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0572724A (en) * 1991-01-29 1993-03-26 Fuji Photo Film Co Ltd Photosensitive transfer material and image forming method
EP0573365A2 (en) * 1992-06-04 1993-12-08 Minnesota Mining And Manufacturing Company Flexographic printing plates having vanadium oxide antistatic coatings
JPH08312722A (en) * 1995-05-22 1996-11-26 Fichtel & Sachs Ag Flywheel mounted on crankshaft

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53136824A (en) * 1977-05-04 1978-11-29 Toray Industries Image material
JPS58108537A (en) * 1981-12-22 1983-06-28 Daicel Chem Ind Ltd Light shading masking film
JPS6086545A (en) * 1983-10-17 1985-05-16 Fujitsu Ltd Mask protective film
JPS60103351A (en) * 1983-11-11 1985-06-07 Daicel Chem Ind Ltd Light shieldable masking film

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53136824A (en) * 1977-05-04 1978-11-29 Toray Industries Image material
JPS58108537A (en) * 1981-12-22 1983-06-28 Daicel Chem Ind Ltd Light shading masking film
JPS6086545A (en) * 1983-10-17 1985-05-16 Fujitsu Ltd Mask protective film
JPS60103351A (en) * 1983-11-11 1985-06-07 Daicel Chem Ind Ltd Light shieldable masking film

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0572724A (en) * 1991-01-29 1993-03-26 Fuji Photo Film Co Ltd Photosensitive transfer material and image forming method
EP0573365A2 (en) * 1992-06-04 1993-12-08 Minnesota Mining And Manufacturing Company Flexographic printing plates having vanadium oxide antistatic coatings
EP0573365A3 (en) * 1992-06-04 1994-11-02 Minnesota Mining & Mfg Flexographic printing plates having vanadium oxide antistatic coatings.
JPH08312722A (en) * 1995-05-22 1996-11-26 Fichtel & Sachs Ag Flywheel mounted on crankshaft

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