JPS6444936A - Developer composition and treatment of photographic element - Google Patents

Developer composition and treatment of photographic element

Info

Publication number
JPS6444936A
JPS6444936A JP18569888A JP18569888A JPS6444936A JP S6444936 A JPS6444936 A JP S6444936A JP 18569888 A JP18569888 A JP 18569888A JP 18569888 A JP18569888 A JP 18569888A JP S6444936 A JPS6444936 A JP S6444936A
Authority
JP
Japan
Prior art keywords
photographic element
treatment
reprecipitation
benzoate
developer composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18569888A
Other languages
Japanese (ja)
Inventor
Esu Deiron Majiyooa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CNA Holdings LLC
Original Assignee
Hoechst Celanese Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Celanese Corp filed Critical Hoechst Celanese Corp
Publication of JPS6444936A publication Critical patent/JPS6444936A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE: To prevent the reprecipitation of a non-image area forming material by mixing limited amts. of Na, K or Li benzoate, etc., a specified solvent compsn. and a defoaming agent with enough water to prepare an effective developing soln. CONSTITUTION: About 0.1-10.0% Na, K or Li benzoate, about 0.1-2.5% Na or K tetraborate, about 0.1-10.0% Na or K citrate, about 0.1-10.0% Na or K octylsulfate, about 0.1-20.0% Na or K salicylate and about 0.2-10.0% solvent compsn. consisting essentially of benzyl alcohol and phenoxyethanol are mixed with enough water to prepare an effective developing soln. or about 0.005-0.075% defoaming agent is further added. The reprecipitation of a non-image area forming material on a photographic element is prevented.
JP18569888A 1987-07-27 1988-07-27 Developer composition and treatment of photographic element Pending JPS6444936A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7812587A 1987-07-27 1987-07-27

Publications (1)

Publication Number Publication Date
JPS6444936A true JPS6444936A (en) 1989-02-17

Family

ID=22142061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18569888A Pending JPS6444936A (en) 1987-07-27 1988-07-27 Developer composition and treatment of photographic element

Country Status (2)

Country Link
JP (1) JPS6444936A (en)
DE (1) DE3820984A1 (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01287561A (en) * 1988-05-13 1989-11-20 Konica Corp Developer composition for photosensitive planographic printing plate
JPH0362034A (en) * 1989-07-31 1991-03-18 Fuji Photo Film Co Ltd Developer for positive type photoresist
US5276270A (en) * 1991-11-13 1994-01-04 Kabushiki Kaisha Kawai Gakki Seisakusho Solenoid drive system for an automatic performing apparatus
US5321199A (en) * 1991-06-26 1994-06-14 Kabushiki Kaisha Kawai Gakki Seisakusho Method and device for preventing imbalance of sound emissions in an automatic performing piano
US5324883A (en) * 1991-06-26 1994-06-28 Kabushiki Kaisha Kawai Gakki Seisakusho Method and device for preventing imbalance of sound emissions in an automatic performing piano
US5420934A (en) * 1992-03-26 1995-05-30 Kabushiki Kaisha Kawai Gakki Seisakusho Electronic sound processing system
US5600521A (en) * 1991-12-13 1997-02-04 Kabushiki Kaisha Kawai Gakki Seisakusho Automatic performing apparatus with power supply controller

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01287561A (en) * 1988-05-13 1989-11-20 Konica Corp Developer composition for photosensitive planographic printing plate
JPH0362034A (en) * 1989-07-31 1991-03-18 Fuji Photo Film Co Ltd Developer for positive type photoresist
US5321199A (en) * 1991-06-26 1994-06-14 Kabushiki Kaisha Kawai Gakki Seisakusho Method and device for preventing imbalance of sound emissions in an automatic performing piano
US5324883A (en) * 1991-06-26 1994-06-28 Kabushiki Kaisha Kawai Gakki Seisakusho Method and device for preventing imbalance of sound emissions in an automatic performing piano
US5276270A (en) * 1991-11-13 1994-01-04 Kabushiki Kaisha Kawai Gakki Seisakusho Solenoid drive system for an automatic performing apparatus
US5600521A (en) * 1991-12-13 1997-02-04 Kabushiki Kaisha Kawai Gakki Seisakusho Automatic performing apparatus with power supply controller
US5420934A (en) * 1992-03-26 1995-05-30 Kabushiki Kaisha Kawai Gakki Seisakusho Electronic sound processing system

Also Published As

Publication number Publication date
DE3820984A1 (en) 1989-02-09

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