JPS64437B2 - - Google Patents
Info
- Publication number
- JPS64437B2 JPS64437B2 JP60154404A JP15440485A JPS64437B2 JP S64437 B2 JPS64437 B2 JP S64437B2 JP 60154404 A JP60154404 A JP 60154404A JP 15440485 A JP15440485 A JP 15440485A JP S64437 B2 JPS64437 B2 JP S64437B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- sulfate
- abrasive
- acetate
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000005498 polishing Methods 0.000 claims description 77
- 239000000203 mixture Substances 0.000 claims description 27
- 239000004033 plastic Substances 0.000 claims description 22
- 229920003023 plastic Polymers 0.000 claims description 22
- 230000002378 acidificating effect Effects 0.000 claims description 9
- 230000007935 neutral effect Effects 0.000 claims description 9
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 8
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 claims description 6
- 239000002245 particle Substances 0.000 claims description 6
- 150000003839 salts Chemical class 0.000 claims description 5
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 claims description 3
- 239000005695 Ammonium acetate Substances 0.000 claims description 3
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 claims description 3
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 claims description 3
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 claims description 3
- 150000008043 acidic salts Chemical class 0.000 claims description 3
- 229940043376 ammonium acetate Drugs 0.000 claims description 3
- 235000019257 ammonium acetate Nutrition 0.000 claims description 3
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 claims description 3
- 229910052921 ammonium sulfate Inorganic materials 0.000 claims description 3
- 235000011130 ammonium sulphate Nutrition 0.000 claims description 3
- 229940044175 cobalt sulfate Drugs 0.000 claims description 3
- 229910000361 cobalt sulfate Inorganic materials 0.000 claims description 3
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 claims description 3
- 159000000011 group IA salts Chemical class 0.000 claims description 3
- XIXADJRWDQXREU-UHFFFAOYSA-M lithium acetate Chemical compound [Li+].CC([O-])=O XIXADJRWDQXREU-UHFFFAOYSA-M 0.000 claims description 3
- 229940071264 lithium citrate Drugs 0.000 claims description 3
- WJSIUCDMWSDDCE-UHFFFAOYSA-K lithium citrate (anhydrous) Chemical compound [Li+].[Li+].[Li+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O WJSIUCDMWSDDCE-UHFFFAOYSA-K 0.000 claims description 3
- INHCSSUBVCNVSK-UHFFFAOYSA-L lithium sulfate Inorganic materials [Li+].[Li+].[O-]S([O-])(=O)=O INHCSSUBVCNVSK-UHFFFAOYSA-L 0.000 claims description 3
- UEGPKNKPLBYCNK-UHFFFAOYSA-L magnesium acetate Chemical compound [Mg+2].CC([O-])=O.CC([O-])=O UEGPKNKPLBYCNK-UHFFFAOYSA-L 0.000 claims description 3
- 235000011285 magnesium acetate Nutrition 0.000 claims description 3
- 239000011654 magnesium acetate Substances 0.000 claims description 3
- 229940069446 magnesium acetate Drugs 0.000 claims description 3
- 229910052943 magnesium sulfate Inorganic materials 0.000 claims description 3
- 235000019341 magnesium sulphate Nutrition 0.000 claims description 3
- 229940078494 nickel acetate Drugs 0.000 claims description 3
- HZPNKQREYVVATQ-UHFFFAOYSA-L nickel(2+);diformate Chemical compound [Ni+2].[O-]C=O.[O-]C=O HZPNKQREYVVATQ-UHFFFAOYSA-L 0.000 claims description 3
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 claims description 3
- 229910052939 potassium sulfate Inorganic materials 0.000 claims description 3
- 235000011151 potassium sulphates Nutrition 0.000 claims description 3
- 239000001632 sodium acetate Substances 0.000 claims description 3
- 235000017281 sodium acetate Nutrition 0.000 claims description 3
- 229910052938 sodium sulfate Inorganic materials 0.000 claims description 3
- 235000011152 sodium sulphate Nutrition 0.000 claims description 3
- AKHNMLFCWUSKQB-UHFFFAOYSA-L sodium thiosulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=S AKHNMLFCWUSKQB-UHFFFAOYSA-L 0.000 claims description 3
- 235000019345 sodium thiosulphate Nutrition 0.000 claims description 3
- RBTVSNLYYIMMKS-UHFFFAOYSA-N tert-butyl 3-aminoazetidine-1-carboxylate;hydrochloride Chemical compound Cl.CC(C)(C)OC(=O)N1CC(N)C1 RBTVSNLYYIMMKS-UHFFFAOYSA-N 0.000 claims description 3
- UGLUPDDGTQHFKU-UHFFFAOYSA-M [NH4+].S(=O)(=O)([O-])[O-].[Mg+] Chemical compound [NH4+].S(=O)(=O)([O-])[O-].[Mg+] UGLUPDDGTQHFKU-UHFFFAOYSA-M 0.000 claims description 2
- 239000002002 slurry Substances 0.000 description 18
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 5
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 5
- 230000004580 weight loss Effects 0.000 description 4
- BNGXYYYYKUGPPF-UHFFFAOYSA-M (3-methylphenyl)methyl-triphenylphosphanium;chloride Chemical compound [Cl-].CC1=CC=CC(C[P+](C=2C=CC=CC=2)(C=2C=CC=CC=2)C=2C=CC=CC=2)=C1 BNGXYYYYKUGPPF-UHFFFAOYSA-M 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229910000746 Structural steel Inorganic materials 0.000 description 2
- 229910001593 boehmite Inorganic materials 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- FAHBNUUHRFUEAI-UHFFFAOYSA-M hydroxidooxidoaluminium Chemical compound O[Al]=O FAHBNUUHRFUEAI-UHFFFAOYSA-M 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- NNWNNQTUZYVQRK-UHFFFAOYSA-N 5-bromo-1h-pyrrolo[2,3-c]pyridine-2-carboxylic acid Chemical compound BrC1=NC=C2NC(C(=O)O)=CC2=C1 NNWNNQTUZYVQRK-UHFFFAOYSA-N 0.000 description 1
- 229920002574 CR-39 Polymers 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- DCNGHDHEMTUKNP-UHFFFAOYSA-L diazanium;magnesium;disulfate Chemical compound [NH4+].[NH4+].[Mg+2].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DCNGHDHEMTUKNP-UHFFFAOYSA-L 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
Description
〈産業上の利用分野〉
本発明は、プラスチツクを研磨する組成物に関
する。
〈従来の技術とその課題〉
プラスチツク製品の研磨用組成物は、特公昭53
−3518号公報に開示されているように、水と、酸
化アルミニウムの研磨剤、及び、硝酸アルミニウ
ムの研磨促進剤からなる。
この研磨用組成物は、プラスチツクを高能率か
つ高品質に研磨することができる。
ところが、この研磨用組成物は、研磨促進剤の
硝酸アルミニウムが強酸塩であるので、強酸性で
あり、PH値が４〜２位である。
従つて、この研磨用組成物は、酸性が強いの
で、研磨機や治具が錆び易く、また、作業者の手
が荒れ易く、機械や作業者を害し易い。
本発明の目的は、上記のような従来の課題を解
決することである。
〈課題を解決するための手段〉
本発明は、水と、酸化アルミニウムの研磨剤、
及び、研磨促進剤からなり、プラスチツクを研磨
する研磨用組成物において、
研磨促進剤が、プラスチツクの研磨を促進する
中性塩又は弱酸性塩若しくは弱アルカリ性塩であ
つて、酢酸ニツケル、酢酸リチウム、硫酸リチウ
ム、硫酸ナトリウム、酢酸ナトリウム、酢酸アン
モニウム、硫酸アンモニウム、硫酸マグネシウ
ム、酢酸マグネシウム、硫酸マグネシウムアンモ
ニウム、硫酸カリウム、硫酸コバルト、チオ硫酸
ナトリウム、ギ酸ニツケル又はクエン酸リチウム
であり、
研磨用組成物が中性又は弱酸性若しくは弱アル
カリ性である
ことを特徴とするプラスチツク製品の研磨用組成
物である。
〈作用〉
本発明の研磨用組成物の研磨作用は、明確には
解明されていないが、次のように推察される。
本発明の研磨用組成物を用いて、プラスチツク
を研磨すると、いわゆるメカノケミカル研磨が行
われ、研磨促進剤と水がプラスチツクの被研磨面
を化学的に研磨され易く改質し、又は溶解し、同
時に、研磨剤と水がプラスチツクの被研磨面を機
械的に研磨して、プラスチツクの被研磨面が機械
的かつ化学的に研磨される。
機械的化学的研磨の際、本発明の研磨用組成物
においては、プラスチツクに対する機械的作用力
と化学的作用力が適合しており、プラスチツクに
対する両作用力の適合によつて優れた研磨面が得
られる。
本発明の研磨用組成物は、研磨促進剤が中性塩
又は弱酸性塩若しくは弱アルカリ性塩であるの
で、中性又は弱酸性若しくは弱アルカリ性にな
る。
従つて、他の物質を酸化する力が弱いので、研
磨機や治具の金属を錆びさせる力や作業者の手を
荒れさせる力が弱い。
〈実施例〉
次に、本発明の実施例について説明する。
本例のプラスチツク製品の研磨用組成物は、純
水にα型酸化アルミニウム（α−Al2O3）の研磨
剤を懸濁し、これに次に列挙する研磨促進剤の１
種を添加した中性ないし弱酸性又は弱アルカリ性
のスラリーである。
研磨促進剤
(1) 酢酸ニツケル Ni（CH3COO）2・4H2O
(2) 酢酸リチウム Li（CH3COO）・2H2O
(3) 硫酸リチウム Li2SO4・H2O
(4) 硫酸ナトリウム Na2SO4
(5) 酢酸ナトリウム CH3COONa・3H2O
(6) 酢酸アンモニウム CH3COONH4
(7) 硫酸アンモニウム （NH4）SO4
(8) 硫酸マグネシウム MgSO4・7H2O
(9) 酢酸マグネシウム Mg（CH3COO）2・4H2O
(7) 硫酸マグネシウムアンモニウム
（NH4）2SO4・MgSO4・6H2O
(10) 硫酸カリウム K2SO4
(11) 硫酸コバルト CoSO4・7H2O
(13) チオ硫酸ナトリウム Na2S2O3・5H2O
(14) ギ酸ニツケル Ni（HCOO）2・2H2O
(15) クエン酸リチウム Li3C6H5O7・4H2O
上記のスラリー中の研磨促進剤の重量割合は１
〜20％であり、PH値は５〜９である。
また、研磨剤の重量割合は２〜30％であり、研
磨剤の平均粒子径は0.7〜4.0μｍであり、研磨剤
の最大粒子径は20μｍ以下である。
また、研磨剤のα型酸化アルミニウムは、粒状
のベーマイト（Al2O3・H2O，AlO（OH））を
1.100〜1.200℃で２〜３時間仮焼し、その後、粉
砕して整粒したものである。
本例の研磨用組成物を用いてプラスチツク製品
を研磨する場合は、従来の研磨用組成物を用いる
場合と同様であり、研磨用組成物をプラスチツク
製品の表面とその表面を摺動する研磨パツトの表
面の間に供給する。
次に、本発明の効果を確認する比較実験につい
て説明する。
研磨能力の実験
本発明の研磨用組成物には、純水にα型酸化ア
ルミニウム（α−Al2O3）の研磨剤を懸濁し、こ
れに実施例の説明において列挙した研磨促進剤の
１種を重量割合で10.0％添加したスラリーを用い
る。このスラリーのPH値は、後の表に示す通りで
ある。
従来の研磨用組成物には、純水にα型酸化アル
ミニウム（α−Al2O3）の研磨剤を懸濁し、これ
に硝酸アルミニウム（Al（NO3）3・9H2O）の研
磨促進剤を重量割合で10.0％添加したスラリーを
用いる。このスラリーのPH値は、後の表に示す。
本発明と従来の上記の研磨スラリーにおいて、
研磨剤の重量割合は20％であり、研磨剤の平均粒
子径は1.3μｍであり、研磨剤の最大粒子径は20μ
ｍ以下である。
また、研磨剤のα型酸化アルミニウムは、粒状
のベーマイト（Al2O3・H2O，AlO（OH））を
1.150℃で３時間仮焼し、その後、粉砕して整粒
したものである。
プラスチツク製品には、アリルジグリコールカ
ーボネート樹脂の65mm径の眼鏡用レンズを用い
る。
このレンズは、非球面レンズ研磨機に装填し、
レンズの表面に植毛布の研磨パツトを当接し、レ
ンズと研磨パツトを相対的に摺動して、10分間研
磨する。研磨の間、レンズと研磨パツトの間に本
発明の研磨スラリー又は従来の研磨スラリーを２
／minの割合で供給する。なお、研磨圧は270
ｇ／cm2である。
研磨の後、レンズの研磨表面を検査して、オレ
ンジピールやスクラツチのような表面欠陥の有無
を調べる。次に、レンズの重量を計測し、研磨に
よる重量損失を算出して、研磨量を求める。
この実験結果は、次の表に示す通りである。
<Industrial Application Field> The present invention relates to a composition for polishing plastics. <Conventional technology and its problems> Polishing compositions for plastic products are
As disclosed in Japanese Patent No. 3518, it consists of water, an abrasive of aluminum oxide, and a polishing accelerator of aluminum nitrate. This polishing composition can polish plastics with high efficiency and high quality. However, since the polishing accelerator aluminum nitrate is a strong acid salt, this polishing composition is strongly acidic and has a pH value of 4 to 2. Therefore, since this polishing composition is highly acidic, polishing machines and jigs tend to rust, and workers' hands tend to get rough, which can easily harm the machines and workers. An object of the present invention is to solve the conventional problems as described above. <Means for Solving the Problems> The present invention provides water, an aluminum oxide abrasive,
and a polishing composition for polishing plastics comprising a polishing accelerator, wherein the polishing accelerator is a neutral salt, a weakly acidic salt, or a weakly alkaline salt that promotes polishing of plastics, and includes nickel acetate, lithium acetate, Lithium sulfate, sodium sulfate, sodium acetate, ammonium acetate, ammonium sulfate, magnesium sulfate, magnesium acetate, ammonium magnesium sulfate, potassium sulfate, cobalt sulfate, sodium thiosulfate, nickel formate, or lithium citrate, and the polishing composition is neutral. Or, it is a polishing composition for plastic products characterized by being weakly acidic or weakly alkaline. <Effect> The polishing action of the polishing composition of the present invention has not been clearly elucidated, but is presumed to be as follows. When plastic is polished using the polishing composition of the present invention, so-called mechanochemical polishing is performed, in which the polishing accelerator and water modify or dissolve the polished surface of the plastic to make it easier to chemically polish it. At the same time, the abrasive and water mechanically polish the polished surface of the plastic, thereby mechanically and chemically polishing the polished surface of the plastic. During mechanical and chemical polishing, in the polishing composition of the present invention, the mechanical acting force and the chemical acting force on the plastic are matched, and an excellent polished surface is obtained by matching both acting forces on the plastic. can get. Since the polishing accelerator of the present invention is a neutral salt, a weakly acidic salt, or a weakly alkaline salt, the polishing composition of the present invention becomes neutral, weakly acidic, or weakly alkaline. Therefore, since the power to oxidize other substances is weak, the power to rust the metal of polishing machines and jigs, and the power to roughen the hands of workers is weak. <Example> Next, an example of the present invention will be described. The composition for polishing plastic products of this example consists of suspending an abrasive of α-type aluminum oxide (α-Al 2 O 3 ) in pure water, and adding one of the polishing accelerators listed below to this.
It is a neutral to weakly acidic or weakly alkaline slurry to which seeds are added. Polishing accelerator (1) Nickel acetate Ni (CH 3 COO) 2・4H 2 O (2) Lithium acetate Li (CH 3 COO)・2H 2 O (3) Lithium sulfate Li 2 SO 4・H 2 O (4) Sodium sulfate Na 2 SO 4 (5) Sodium acetate CH 3 COONa・3H 2 O (6) Ammonium acetate CH 3 COONH 4 (7) Ammonium sulfate (NH 4 )SO 4 (8) Magnesium sulfate MgSO 4・7H 2 O (9 ) Magnesium acetate Mg (CH 3 COO) 2・4H 2 O (7) Magnesium ammonium sulfate
(NH 4 ) 2 SO 4・MgSO 4・6H 2 O (10) Potassium sulfate K 2 SO 4 (11) Cobalt sulfate CoSO 4・7H 2 O (13) Sodium thiosulfate Na 2 S 2 O 3・5H 2 O (14) Nickel formate (HCOO) 2・2H 2 O (15) Lithium citrate Li 3 C 6 H 5 O 7・4H 2 O The weight ratio of the polishing accelerator in the above slurry is 1
~20%, and the PH value is 5-9. Further, the weight ratio of the abrasive is 2 to 30%, the average particle diameter of the abrasive is 0.7 to 4.0 μm, and the maximum particle diameter of the abrasive is 20 μm or less. In addition, the abrasive α-type aluminum oxide is made of granular boehmite (Al 2 O 3 H 2 O, AlO (OH)).
It is calcined at 1.100 to 1.200°C for 2 to 3 hours, and then crushed and sized. When polishing a plastic product using the polishing composition of this example, it is the same as when using a conventional polishing composition, and the polishing composition is applied to the surface of the plastic product and a polishing pad that slides on the surface. supply between the surfaces of the Next, a comparative experiment to confirm the effects of the present invention will be described. Experiment on Polishing Ability In the polishing composition of the present invention, an abrasive of α-type aluminum oxide (α-Al 2 O 3 ) is suspended in pure water, and one of the polishing accelerators listed in the description of the examples is added to the polishing composition. A slurry containing 10.0% by weight of seeds is used. The PH value of this slurry is as shown in the table below. Conventional polishing compositions include suspending α-type aluminum oxide (α-Al 2 O 3 ) polishing agent in pure water, and adding aluminum nitrate (Al(NO 3 ) 3 9H 2 O) to this to accelerate polishing. A slurry containing 10.0% by weight of the agent is used. The PH value of this slurry is shown in the table below. In the above polishing slurry of the present invention and the conventional polishing slurry,
The weight percentage of the abrasive is 20%, the average particle size of the abrasive is 1.3 μm, and the maximum particle size of the abrasive is 20 μm.
m or less. In addition, the abrasive α-type aluminum oxide is made of granular boehmite (Al 2 O 3 H 2 O, AlO (OH)).
1. It is calcined at 150°C for 3 hours, then crushed and sized. The plastic product used is a 65mm diameter eyeglass lens made of allyl diglycol carbonate resin. This lens is loaded into an aspherical lens polisher,
Apply a flocked polishing pad to the surface of the lens, slide the lens and polishing pad relative to each other, and polish for 10 minutes. During polishing, the polishing slurry of the present invention or a conventional polishing slurry is placed between the lens and the polishing pad.
/min. The polishing pressure is 270
g/ cm2 . After polishing, the polished surface of the lens is inspected for surface defects such as orange peel or scratches. Next, the weight of the lens is measured, the weight loss due to polishing is calculated, and the amount of polishing is determined. The results of this experiment are shown in the table below.
【表】【table】
【表】
この表から明らかなように、本発明の研磨スラ
リーは、PH値が6.0〜8.2であつて中性ないし弱酸
性又は弱アルカリ性であり、これに対し、従来の
研磨スラリーは、PH値が3.2であつて強酸性であ
る。ところが、本発明の研磨スラリーを用いる
と、従来のそれを用いた場合と同様に、研磨量が
多くて研磨能率が高く、また、表面欠陥が認めら
れず、研磨表面の品質が高い。
錆び易さの実験
本発明と従来の研磨スラリーには、それぞれ、
一般構造用鋼材（SS41）の試験片を一週間浸漬
する。
その後、研磨スラリー中で錆びた試験片は、錆
を落して、試験片の重量を計測し、錆による重量
損失を算出し、その重量損失を試験片の最初の重
量で割つて重量減少率を求める。
この実験結果は、次の表の通りである。[Table] As is clear from this table, the polishing slurry of the present invention has a pH value of 6.0 to 8.2 and is neutral to weakly acidic or weakly alkaline, whereas the conventional polishing slurry has a pH value of 6.0 to 8.2. is 3.2 and is strongly acidic. However, when the polishing slurry of the present invention is used, the polishing amount is large and the polishing efficiency is high, and no surface defects are observed, and the quality of the polished surface is high, as in the case of using the conventional slurry. Rustability experiment The present invention and conventional polishing slurry each had the following properties:
A test piece of general structural steel (SS41) is immersed for one week. The rusted specimen in the polishing slurry is then derusted, the specimen is weighed, the weight loss due to rust is calculated, and the weight loss is calculated by dividing the weight loss by the initial weight of the specimen. demand. The results of this experiment are shown in the table below.
【表】
この表から明らかなように、本発明の研磨スラ
リーは、従来のそれに比し、研磨機や治具が非常
に錆び難い。また、作業者の手が荒れ難いものと
推認される。
〈発明の効果〉
本発明の研磨用組成物は、プラスチツクを、従
来の研磨用組成物と同様に、高能率かつ高品質に
研磨することができる上に、従来の研磨用組成物
とは異なり、中性又は弱酸性若しくは弱アルカリ
性であるので、研磨機や治具が錆び難く、また、
作業者の手が荒れ難く、機械や作業者を害し難
い。[Table] As is clear from this table, the polishing slurry of the present invention is extremely resistant to rust on polishing machines and jigs compared to conventional slurries. It is also presumed that the worker's hands will not get rough easily. <Effects of the Invention> The polishing composition of the present invention can polish plastics with high efficiency and high quality like conventional polishing compositions, and unlike conventional polishing compositions, Because it is neutral, weakly acidic, or weakly alkaline, polishing machines and jigs are hard to rust, and
Workers' hands are less likely to get rough, and less likely to cause harm to the machine or workers.
Claims (1)
磨促進剤からなり、プラスチツクを研磨する磨用
組成物において、 研磨促進剤が、プラスチツクの研磨を促進する
中性塩又は弱酸性塩若しくは弱アルカリ性塩であ
つて、酢酸ニツケル、酢酸リチウム、硫酸リチウ
ム、硫酸ナトリウム、酢酸ナトリウム、酢酸アン
モニウム、硫酸アンモニウム、硫酸マグネシウ
ム、酢酸マグネシウム、硫酸マグネシウムアンモ
ニウム、硫酸カリウム、硫酸コバルト、チオ硫酸
ナトリウム、ギ酸ニツケル又はクエン酸リチウム
であり、 研磨用組成物が中性又は弱酸性若しくは弱アル
カリ性である ことを特徴とするプラスチツク製品の研磨用組成
物。 ２ 研磨促進剤の重量割合が１〜20％であり、研
磨用組成物のPH値が５〜９である特許請求の範囲
第１項記載のプラスチツク製品の研磨用組成物。 ３ 研磨剤の重量割合が２〜30％であり、研磨剤
の平均粒子径が0.7〜4.0μｍであり、研磨剤の最
大粒子径が20μｍ以下である特許請求の範囲第１
項又は第２項記載のプラスチツク製品の研磨用組
成物。[Claims] 1. A polishing composition for polishing plastics comprising water, an abrasive of aluminum oxide, and a polishing accelerator, wherein the polishing accelerator is a neutral salt or a weak salt that promotes polishing of plastics. Acidic salts or weakly alkaline salts, including nickel acetate, lithium acetate, lithium sulfate, sodium sulfate, sodium acetate, ammonium acetate, ammonium sulfate, magnesium sulfate, magnesium acetate, magnesium ammonium sulfate, potassium sulfate, cobalt sulfate, sodium thiosulfate, A polishing composition for plastic products, which is made of nickel formate or lithium citrate, and is neutral, weakly acidic, or weakly alkaline. 2. The composition for polishing plastic products according to claim 1, wherein the weight proportion of the polishing accelerator is 1 to 20%, and the pH value of the polishing composition is 5 to 9. 3 The weight ratio of the abrasive is 2 to 30%, the average particle diameter of the abrasive is 0.7 to 4.0 μm, and the maximum particle diameter of the abrasive is 20 μm or less, Claim 1
A polishing composition for plastic products according to item 1 or 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60154404A JPS6215282A (en) | 1985-07-12 | 1985-07-12 | Composition for grinding plastic product |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60154404A JPS6215282A (en) | 1985-07-12 | 1985-07-12 | Composition for grinding plastic product |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6215282A JPS6215282A (en) | 1987-01-23 |
| JPS64437B2 true JPS64437B2 (en) | 1989-01-06 |
Family
ID=15583404
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60154404A Granted JPS6215282A (en) | 1985-07-12 | 1985-07-12 | Composition for grinding plastic product |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6215282A (en) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0197560A (en) * | 1987-10-09 | 1989-04-17 | Showa Denko Kk | Composition for polishing aluminum magnetic disc |
| JP2632889B2 (en) * | 1988-01-19 | 1997-07-23 | 株式会社フジミインコーポレーテッド | Polishing composition |
| JP2632898B2 (en) * | 1988-02-09 | 1997-07-23 | 株式会社フジミインコーポレーテッド | Polishing composition |
| JPH0214280A (en) * | 1988-07-01 | 1990-01-18 | Showa Denko Kk | Composition for polishing plastic |
| JP2013035110A (en) * | 2011-08-11 | 2013-02-21 | Hoya Corp | Method for polishing plastic lens, polishing tool to be used therein and method for producing plastic lens |
| JP6358739B2 (en) * | 2014-04-08 | 2018-07-18 | 山口精研工業株式会社 | Polishing composition |
| JP6358740B2 (en) * | 2014-04-08 | 2018-07-18 | 山口精研工業株式会社 | Polishing composition |
-
1985
- 1985-07-12 JP JP60154404A patent/JPS6215282A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6215282A (en) | 1987-01-23 |
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