JPS644285A - Washing method and washer - Google Patents

Washing method and washer

Info

Publication number
JPS644285A
JPS644285A JP15866187A JP15866187A JPS644285A JP S644285 A JPS644285 A JP S644285A JP 15866187 A JP15866187 A JP 15866187A JP 15866187 A JP15866187 A JP 15866187A JP S644285 A JPS644285 A JP S644285A
Authority
JP
Japan
Prior art keywords
washing
wash
washing liquid
unequal
occurrence
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP15866187A
Other languages
Japanese (ja)
Inventor
Akinori Shindo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP15866187A priority Critical patent/JPS644285A/en
Publication of JPS644285A publication Critical patent/JPS644285A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01006—Carbon [C]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01—Chemical elements
    • H01L2924/01033—Arsenic [As]

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE: To prevent the occurrence of unequal washing and to enable the uniform washing over the entire part of wash by propagating ultrasonic waves into a washing liquid and delivering gas into the washing liquid to generate air bubbles. CONSTITUTION: At the time of immersing the wash 15 into the washing liquid 1 and washing the same, the ultrasonic waves are propagated into the washing liquid by an ultrasonic generator 3 and the gas is delivered into the washing liquid by an air bubble generator 10 to generate the air bubbles. Consequently, the occurrence of the unequal washing is prevented and the uniform washing over the entire part of the wash is made possible. In addition, the wash is prevented from receiving cavitation damage.
JP15866187A 1987-06-25 1987-06-25 Washing method and washer Pending JPS644285A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15866187A JPS644285A (en) 1987-06-25 1987-06-25 Washing method and washer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15866187A JPS644285A (en) 1987-06-25 1987-06-25 Washing method and washer

Publications (1)

Publication Number Publication Date
JPS644285A true JPS644285A (en) 1989-01-09

Family

ID=15676586

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15866187A Pending JPS644285A (en) 1987-06-25 1987-06-25 Washing method and washer

Country Status (1)

Country Link
JP (1) JPS644285A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02281625A (en) * 1989-04-24 1990-11-19 Sonitsuku Fueroo Kk Ultrasonic wave irradiation and device
JPH03143558A (en) * 1989-10-30 1991-06-19 Ebara Corp Jet scrubber
US5800626A (en) * 1997-02-18 1998-09-01 International Business Machines Corporation Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substrates
JP2008253373A (en) * 2007-04-02 2008-10-23 Matsushita Electric Ind Co Ltd Ultrasonic washer, dishwasher using the same, and ultrasonic washing method
JP2010240529A (en) * 2009-04-01 2010-10-28 Kao Corp Ultrasonic cleaning method
JP2013503029A (en) * 2009-08-26 2013-01-31 ユニバーシティ、オブ、サウサンプトン Cleaning device, cleaning method, and monitoring method thereof

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02281625A (en) * 1989-04-24 1990-11-19 Sonitsuku Fueroo Kk Ultrasonic wave irradiation and device
JPH03143558A (en) * 1989-10-30 1991-06-19 Ebara Corp Jet scrubber
US5800626A (en) * 1997-02-18 1998-09-01 International Business Machines Corporation Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substrates
JP2008253373A (en) * 2007-04-02 2008-10-23 Matsushita Electric Ind Co Ltd Ultrasonic washer, dishwasher using the same, and ultrasonic washing method
JP2010240529A (en) * 2009-04-01 2010-10-28 Kao Corp Ultrasonic cleaning method
JP2013503029A (en) * 2009-08-26 2013-01-31 ユニバーシティ、オブ、サウサンプトン Cleaning device, cleaning method, and monitoring method thereof
US11577284B2 (en) 2009-08-26 2023-02-14 Sloan Water Technology Limited Cleaning apparatus and method, and monitoring thereof

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