JPS6440530A - Production of polybenzo-oxy or thio-azole - Google Patents

Production of polybenzo-oxy or thio-azole

Info

Publication number
JPS6440530A
JPS6440530A JP19719187A JP19719187A JPS6440530A JP S6440530 A JPS6440530 A JP S6440530A JP 19719187 A JP19719187 A JP 19719187A JP 19719187 A JP19719187 A JP 19719187A JP S6440530 A JPS6440530 A JP S6440530A
Authority
JP
Japan
Prior art keywords
polybenzo
thio
oxy
polyphosphoric acid
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19719187A
Other languages
Japanese (ja)
Inventor
Shuji Kitamura
Hisao Kitano
Fumio Tanimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Research Institute for Production Development
Original Assignee
Research Institute for Production Development
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Research Institute for Production Development filed Critical Research Institute for Production Development
Priority to JP19719187A priority Critical patent/JPS6440530A/en
Publication of JPS6440530A publication Critical patent/JPS6440530A/en
Pending legal-status Critical Current

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  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)

Abstract

PURPOSE:To readily product a compound capable of providing a high-quality and heat-resistant crystal high polymer, etc., by dispersing and blending a thick malt syrupy - rice caky substance containing a polybenzo-oxy or thio-azole precursor in a specific solvent. CONSTITUTION:A thick malt syrupy - gummy - rice caky substance consisting of a polybenzo-oxy or thio-azole precursor and polyphosphoric acid is dispersed in a solvent inert to phosphoric acid, the polyphosphoric acid and phosphoric anhydride and blended at 100-300 deg.C. An inert solvent selected from hydrocarbon oils, phenols, silicone oil, etc., is used as the inert solvent. Polyphosphoric acid containing phosphorous acid or ester thereof is used as the polyphosphoric acid.
JP19719187A 1987-08-06 1987-08-06 Production of polybenzo-oxy or thio-azole Pending JPS6440530A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19719187A JPS6440530A (en) 1987-08-06 1987-08-06 Production of polybenzo-oxy or thio-azole

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19719187A JPS6440530A (en) 1987-08-06 1987-08-06 Production of polybenzo-oxy or thio-azole

Publications (1)

Publication Number Publication Date
JPS6440530A true JPS6440530A (en) 1989-02-10

Family

ID=16370322

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19719187A Pending JPS6440530A (en) 1987-08-06 1987-08-06 Production of polybenzo-oxy or thio-azole

Country Status (1)

Country Link
JP (1) JPS6440530A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007262158A (en) * 2006-03-27 2007-10-11 Osaka Prefecture Microparticle of polyoxazole or its precursor and method for producing the microparticle
WO2012137840A1 (en) * 2011-04-08 2012-10-11 三菱瓦斯化学株式会社 Polybenzoxazole resin and precursor thereof
JP2013064130A (en) * 2011-08-31 2013-04-11 Toho Chem Ind Co Ltd Method of producing polybenzoxazole precursor
WO2017164129A1 (en) * 2016-03-22 2017-09-28 日産化学工業株式会社 Polyhydroxyamide composition for manufacturing substrate for electronic device, and polybenzoxazole resin film

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007262158A (en) * 2006-03-27 2007-10-11 Osaka Prefecture Microparticle of polyoxazole or its precursor and method for producing the microparticle
WO2012137840A1 (en) * 2011-04-08 2012-10-11 三菱瓦斯化学株式会社 Polybenzoxazole resin and precursor thereof
JP5870997B2 (en) * 2011-04-08 2016-03-01 三菱瓦斯化学株式会社 Polybenzoxazole resin and precursor thereof
US9410055B2 (en) 2011-04-08 2016-08-09 Mitsubishi Gas Chemical Company, Inc. Polybenzoxazole resin and precursor thereof
JP2013064130A (en) * 2011-08-31 2013-04-11 Toho Chem Ind Co Ltd Method of producing polybenzoxazole precursor
WO2017164129A1 (en) * 2016-03-22 2017-09-28 日産化学工業株式会社 Polyhydroxyamide composition for manufacturing substrate for electronic device, and polybenzoxazole resin film
CN108884316A (en) * 2016-03-22 2018-11-23 日产化学株式会社 For manufacturing the polyhydroxyamide composition and polybenzoxazole resin film of substrate for electronic device
JPWO2017164129A1 (en) * 2016-03-22 2019-01-31 日産化学株式会社 Polyhydroxyamide composition for manufacturing substrates for electronic devices, and polybenzoxazole resin film
KR20210100761A (en) * 2016-03-22 2021-08-17 닛산 가가쿠 가부시키가이샤 Polyhydroxyamide composition for manufacturing substrate for electronic device, and polybenzoxazole resin film
CN108884316B (en) * 2016-03-22 2021-09-24 日产化学株式会社 Polyhydroxyamide composition for producing substrate for electronic device, and polybenzoxazole resin film
JP2021178962A (en) * 2016-03-22 2021-11-18 日産化学株式会社 Polyhydroxyamide composition for manufacturing substrate for electronic device, and polybenzoxazole resin film

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