JPS6428365A - Continuous liquid metal supplying device - Google Patents

Continuous liquid metal supplying device

Info

Publication number
JPS6428365A
JPS6428365A JP18337387A JP18337387A JPS6428365A JP S6428365 A JPS6428365 A JP S6428365A JP 18337387 A JP18337387 A JP 18337387A JP 18337387 A JP18337387 A JP 18337387A JP S6428365 A JPS6428365 A JP S6428365A
Authority
JP
Japan
Prior art keywords
metal
crucible
rod
supplied
filament
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18337387A
Other languages
Japanese (ja)
Inventor
Hajime Iba
Eiichi Nishimura
Mitsuo Kusakabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP18337387A priority Critical patent/JPS6428365A/en
Publication of JPS6428365A publication Critical patent/JPS6428365A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To provide a titled continuous supplying device which is greatly improved in the durable period of a crucible as compared to heretofore by constituting the device in such a manner that a rod-shaped metal is lowered down to the filament part of an electron gun by using a driving mechanism and is melted by an electron beam, by which the metal is dropped and supplied. CONSTITUTION:The liquid level of a molten metal 1 falls and, therefore, said metal 1 is supplied when the metal vapor is generated from the surface of the molten metal 1 housed in the crucible 2 in a vacuum vessel 3. While the metal rod 4 is lowered at a specified speed by the driving mechanism 5, the tip of the rod 4 is melted by the electron beam from the acceleration filament 7 impressed approximate with -20kV and is supplied as a liquid drop 8 to the crucible 2 for the above-mentioned purpose. The rate of forming the liquid drop, i.e., the supply speed of the metal can be changed as desired by regulating the voltage to be improved to the filament 7 and the descending speed of the rod 4. While a continuous operation of 1-2 days is a limit in the case of using the conventional crucible by a batch system, the continuous operation for the service period (about 1,000hr) of the crucible is possible if this invention is embodied.
JP18337387A 1987-07-24 1987-07-24 Continuous liquid metal supplying device Pending JPS6428365A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18337387A JPS6428365A (en) 1987-07-24 1987-07-24 Continuous liquid metal supplying device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18337387A JPS6428365A (en) 1987-07-24 1987-07-24 Continuous liquid metal supplying device

Publications (1)

Publication Number Publication Date
JPS6428365A true JPS6428365A (en) 1989-01-30

Family

ID=16134638

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18337387A Pending JPS6428365A (en) 1987-07-24 1987-07-24 Continuous liquid metal supplying device

Country Status (1)

Country Link
JP (1) JPS6428365A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7011340B2 (en) 2002-07-31 2006-03-14 Yamada Manufacturing Co., Ltd. Position adjustment device for steering handle
JP2010265498A (en) * 2009-05-13 2010-11-25 Panasonic Corp Vapor deposition apparatus and vapor deposition method using the same
US8051742B2 (en) 2007-08-17 2011-11-08 Yamada Manufacturing Co., Ltd. Steering wheel position adjustment device
US8452788B2 (en) 2007-10-05 2013-05-28 Nec Corporation Information retrieval system, registration apparatus for indexes for information retrieval, information retrieval method and program

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7011340B2 (en) 2002-07-31 2006-03-14 Yamada Manufacturing Co., Ltd. Position adjustment device for steering handle
US8051742B2 (en) 2007-08-17 2011-11-08 Yamada Manufacturing Co., Ltd. Steering wheel position adjustment device
US8452788B2 (en) 2007-10-05 2013-05-28 Nec Corporation Information retrieval system, registration apparatus for indexes for information retrieval, information retrieval method and program
JP2010265498A (en) * 2009-05-13 2010-11-25 Panasonic Corp Vapor deposition apparatus and vapor deposition method using the same

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