JPS6421088A - Method for chemically cleaning hardly soluble scale - Google Patents

Method for chemically cleaning hardly soluble scale

Info

Publication number
JPS6421088A
JPS6421088A JP17716687A JP17716687A JPS6421088A JP S6421088 A JPS6421088 A JP S6421088A JP 17716687 A JP17716687 A JP 17716687A JP 17716687 A JP17716687 A JP 17716687A JP S6421088 A JPS6421088 A JP S6421088A
Authority
JP
Japan
Prior art keywords
liq
hardly soluble
added
ammonia
chemically cleaning
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17716687A
Other languages
Japanese (ja)
Other versions
JP2625123B2 (en
Inventor
Yukio Hayashi
Taketoshi Furusawa
Hiroshi Nakayama
Mitsuhiko Ishida
Akihiro Niimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP62177166A priority Critical patent/JP2625123B2/en
Priority to EP88107845A priority patent/EP0299166A1/en
Publication of JPS6421088A publication Critical patent/JPS6421088A/en
Application granted granted Critical
Publication of JP2625123B2 publication Critical patent/JP2625123B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
    • C23G1/08—Iron or steel
    • C23G1/088—Iron or steel solutions containing organic acids
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F5/00—Softening water; Preventing scale; Adding scale preventatives or scale removers to water, e.g. adding sequestering agents
    • C02F5/08—Treatment of water with complexing chemicals or other solubilising agents for softening, scale prevention or scale removal, e.g. adding sequestering agents
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
    • C23G1/19—Iron or steel
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/24—Cleaning or pickling metallic material with solutions or molten salts with neutral solutions
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F28—HEAT EXCHANGE IN GENERAL
    • F28G—CLEANING OF INTERNAL OR EXTERNAL SURFACES OF HEAT-EXCHANGE OR HEAT-TRANSFER CONDUITS, e.g. WATER TUBES OR BOILERS
    • F28G9/00—Cleaning by flushing or washing, e.g. with chemical solvents

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • General Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

PURPOSE:To dissolve and remove hardly soluble steam oxidized scale by adding one or more kinds of compds. such as ammonia and morpholine, hydrazine hydrate and a corrosion inhibitor to polyaminocarboxylic acid, adjusting the pH and using the resulting mixed liq. CONSTITUTION:One or more among an aq. ammonia soln., gaseous ammonia, morpholine, cyclohexylamine, monoethanolamine, diethanolamine and triethanolamine are added to polyaminocarboxylic acid and the pH is adjusted to 3.5-5.5 to prepare a cleaning liq. Hydrazine hydrate is added to the cleaning liq., the pH is adjusted to 4-6 and a corrosion inhibitor is further added to prepare a mixed liq. Scale formed on the surface of an iron-based metal is dissolved and removed with the mixed liq.
JP62177166A 1987-07-17 1987-07-17 Chemical cleaning method for poorly soluble scale Expired - Fee Related JP2625123B2 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP62177166A JP2625123B2 (en) 1987-07-17 1987-07-17 Chemical cleaning method for poorly soluble scale
EP88107845A EP0299166A1 (en) 1987-07-17 1988-05-16 Method for removing scale on inner surfaces of boiler tube members

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62177166A JP2625123B2 (en) 1987-07-17 1987-07-17 Chemical cleaning method for poorly soluble scale

Publications (2)

Publication Number Publication Date
JPS6421088A true JPS6421088A (en) 1989-01-24
JP2625123B2 JP2625123B2 (en) 1997-07-02

Family

ID=16026340

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62177166A Expired - Fee Related JP2625123B2 (en) 1987-07-17 1987-07-17 Chemical cleaning method for poorly soluble scale

Country Status (1)

Country Link
JP (1) JP2625123B2 (en)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06266119A (en) * 1992-07-09 1994-09-22 Ekc Technol Inc Cleaning agent containing nucleophilic amine compound provided with reduction and oxidation potential
US5672577A (en) * 1990-11-05 1997-09-30 Ekc Technology, Inc. Cleaning compositions for removing etching residue with hydroxylamine, alkanolamine, and chelating agent
US5911835A (en) * 1990-11-05 1999-06-15 Ekc Technology, Inc. Method of removing etching residue
US6000411A (en) * 1990-11-05 1999-12-14 Ekc Technology, Inc. Cleaning compositions for removing etching residue and method of using
US6242400B1 (en) 1990-11-05 2001-06-05 Ekc Technology, Inc. Method of stripping resists from substrates using hydroxylamine and alkanolamine
US6399551B1 (en) 1993-06-21 2002-06-04 Ekc Technology, Inc. Alkanolamine semiconductor process residue removal process
CN102721319A (en) * 2012-03-29 2012-10-10 鞍钢股份有限公司 Clearing method of distilled ammonia wastewater cooler
JP2015186977A (en) * 2014-03-27 2015-10-29 本田技研工業株式会社 Vehicle body frame structure of motorcycle
WO2016002516A1 (en) * 2014-07-04 2016-01-07 三菱日立パワーシステムズ株式会社 Chemical washing method and chemical washing device
JP2017072134A (en) * 2015-10-05 2017-04-13 ゼネラル・エレクトリック・カンパニイ Cleaning solution and methods of cleaning turbine engine

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5221456A (en) * 1975-08-11 1977-02-18 Hiroko Miyoshi Knitting machine
JPS5320252A (en) * 1977-08-26 1978-02-24 Hitachi Ltd Position detecting apparatus for mobile body

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5221456A (en) * 1975-08-11 1977-02-18 Hiroko Miyoshi Knitting machine
JPS5320252A (en) * 1977-08-26 1978-02-24 Hitachi Ltd Position detecting apparatus for mobile body

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6319885B1 (en) 1990-11-05 2001-11-20 Ekc Technologies, Inc. Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
US6564812B2 (en) 1990-11-05 2003-05-20 Ekc Technology, Inc. Alkanolamine semiconductor process residue removal composition and process
US5902780A (en) * 1990-11-05 1999-05-11 Ekc Technology, Inc. Cleaning compositions for removing etching residue and method of using
US5911835A (en) * 1990-11-05 1999-06-15 Ekc Technology, Inc. Method of removing etching residue
US6242400B1 (en) 1990-11-05 2001-06-05 Ekc Technology, Inc. Method of stripping resists from substrates using hydroxylamine and alkanolamine
US6110881A (en) * 1990-11-05 2000-08-29 Ekc Technology, Inc. Cleaning solutions including nucleophilic amine compound having reduction and oxidation potentials
US5672577A (en) * 1990-11-05 1997-09-30 Ekc Technology, Inc. Cleaning compositions for removing etching residue with hydroxylamine, alkanolamine, and chelating agent
US6140287A (en) * 1990-11-05 2000-10-31 Ekc Technology, Inc. Cleaning compositions for removing etching residue and method of using
US6000411A (en) * 1990-11-05 1999-12-14 Ekc Technology, Inc. Cleaning compositions for removing etching residue and method of using
JPH06266119A (en) * 1992-07-09 1994-09-22 Ekc Technol Inc Cleaning agent containing nucleophilic amine compound provided with reduction and oxidation potential
US6399551B1 (en) 1993-06-21 2002-06-04 Ekc Technology, Inc. Alkanolamine semiconductor process residue removal process
CN102721319A (en) * 2012-03-29 2012-10-10 鞍钢股份有限公司 Clearing method of distilled ammonia wastewater cooler
US11834632B2 (en) 2013-12-09 2023-12-05 General Electric Company Cleaning solution and methods of cleaning a turbine engine
JP2015186977A (en) * 2014-03-27 2015-10-29 本田技研工業株式会社 Vehicle body frame structure of motorcycle
WO2016002516A1 (en) * 2014-07-04 2016-01-07 三菱日立パワーシステムズ株式会社 Chemical washing method and chemical washing device
JP2017072134A (en) * 2015-10-05 2017-04-13 ゼネラル・エレクトリック・カンパニイ Cleaning solution and methods of cleaning turbine engine

Also Published As

Publication number Publication date
JP2625123B2 (en) 1997-07-02

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees