JPS6421063A - Al-cr-ti type plating metal for vacuum deposition - Google Patents
Al-cr-ti type plating metal for vacuum depositionInfo
- Publication number
- JPS6421063A JPS6421063A JP17783287A JP17783287A JPS6421063A JP S6421063 A JPS6421063 A JP S6421063A JP 17783287 A JP17783287 A JP 17783287A JP 17783287 A JP17783287 A JP 17783287A JP S6421063 A JPS6421063 A JP S6421063A
- Authority
- JP
- Japan
- Prior art keywords
- plating metal
- alloy
- metal
- vacuum deposition
- corrosion resistance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
PURPOSE:To obtain the titled plating metal consisting of a prescribed amt. in total of prescribed amts. of Cr and Ti and the balance Al with inevitable impurities and capable of providing high corrosion resistance to an Al alloy plated product. CONSTITUTION:This Al-Cr-Ti type plating metal for vacuum deposition consists of 1-50wt.% in total of 0.5-49.5wt.% Cr and 0.5-49.5wt.% Ti and the balance Al with inevitable impurities. In the plating metal, an Al-Cr-Ti alloy plating metal can be relatively easily formed without causing a problem such as the formation of an Fe-Al intermetallic compd. The plating metal is an Al alloy plating metal having superior corrosion resistance at high temp. not attained by a binary Al alloy plating metal. When a base metal such as steel, Cr, a Cr alloy or an Al alloy is coated with the metal of this invention, a plated product having superior corrosion resistance is obtd.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62177832A JP2535353B2 (en) | 1987-07-15 | 1987-07-15 | A1-Cr-Ti system vapor deposition plating metal |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62177832A JP2535353B2 (en) | 1987-07-15 | 1987-07-15 | A1-Cr-Ti system vapor deposition plating metal |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6421063A true JPS6421063A (en) | 1989-01-24 |
JP2535353B2 JP2535353B2 (en) | 1996-09-18 |
Family
ID=16037892
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62177832A Expired - Lifetime JP2535353B2 (en) | 1987-07-15 | 1987-07-15 | A1-Cr-Ti system vapor deposition plating metal |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2535353B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03143872A (en) * | 1989-10-28 | 1991-06-19 | Furukawa Electric Co Ltd:The | Formation of compact coil of electrode wire for manufacturing can |
JP3035145U (en) * | 1996-08-27 | 1997-03-11 | 大電株式会社 | Electric wire / cable bundle winding and winding device |
CN101996870A (en) * | 2009-08-07 | 2011-03-30 | 索尼公司 | Doping method and method for manufacturing semiconductor device |
-
1987
- 1987-07-15 JP JP62177832A patent/JP2535353B2/en not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03143872A (en) * | 1989-10-28 | 1991-06-19 | Furukawa Electric Co Ltd:The | Formation of compact coil of electrode wire for manufacturing can |
JP3035145U (en) * | 1996-08-27 | 1997-03-11 | 大電株式会社 | Electric wire / cable bundle winding and winding device |
CN101996870A (en) * | 2009-08-07 | 2011-03-30 | 索尼公司 | Doping method and method for manufacturing semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JP2535353B2 (en) | 1996-09-18 |
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