JPS6414229A - Production of novolac phenolic resin for resist - Google Patents
Production of novolac phenolic resin for resistInfo
- Publication number
- JPS6414229A JPS6414229A JP16874187A JP16874187A JPS6414229A JP S6414229 A JPS6414229 A JP S6414229A JP 16874187 A JP16874187 A JP 16874187A JP 16874187 A JP16874187 A JP 16874187A JP S6414229 A JPS6414229 A JP S6414229A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- phenolic resin
- novolac phenolic
- oligomer components
- novolac
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Phenolic Resins Or Amino Resins (AREA)
Abstract
PURPOSE:To obtain easily and industrially the title resin freed of oligomer components, by dispersing a novolac phenolic resin in a solvent containing a specified aromatic solvent and extracting oligomer components from the resin. CONSTITUTION:The purpose resin is obtained by dispersing a novolac phenolic resin in a solvent mixture containing at least 90vol.% aromatic solvent of the formula and extracting oligomer components from the resin. In the formula, R1, R2, R3 and R4 are each H, Cl, Br or CH3 and at least one of them is a group other than H. Although an aromatic solvent (e.g., chlorobenzene) has heretofore been regarded as a nonsolvent for a novolac resin, it can dissolve an oligomer component of a certain MW or lower. In this way, oligomer components in the resin dispersed in these solvents can be selectively extracted, so that a novolac phenolic resin from which oligomers are extracted can be easily obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16874187A JPS6414229A (en) | 1987-07-08 | 1987-07-08 | Production of novolac phenolic resin for resist |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16874187A JPS6414229A (en) | 1987-07-08 | 1987-07-08 | Production of novolac phenolic resin for resist |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6414229A true JPS6414229A (en) | 1989-01-18 |
Family
ID=15873554
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16874187A Pending JPS6414229A (en) | 1987-07-08 | 1987-07-08 | Production of novolac phenolic resin for resist |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6414229A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0416848A (en) * | 1990-05-10 | 1992-01-21 | Nippon Zeon Co Ltd | Positive type photoresist composition |
EP0786699A1 (en) | 1996-01-22 | 1997-07-30 | Fuji Photo Film Co., Ltd. | Positive photoresist composition |
-
1987
- 1987-07-08 JP JP16874187A patent/JPS6414229A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0416848A (en) * | 1990-05-10 | 1992-01-21 | Nippon Zeon Co Ltd | Positive type photoresist composition |
EP0786699A1 (en) | 1996-01-22 | 1997-07-30 | Fuji Photo Film Co., Ltd. | Positive photoresist composition |
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