JPS6414229A - Production of novolac phenolic resin for resist - Google Patents

Production of novolac phenolic resin for resist

Info

Publication number
JPS6414229A
JPS6414229A JP16874187A JP16874187A JPS6414229A JP S6414229 A JPS6414229 A JP S6414229A JP 16874187 A JP16874187 A JP 16874187A JP 16874187 A JP16874187 A JP 16874187A JP S6414229 A JPS6414229 A JP S6414229A
Authority
JP
Japan
Prior art keywords
resin
phenolic resin
novolac phenolic
oligomer components
novolac
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16874187A
Other languages
Japanese (ja)
Inventor
Hiroshi Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Showa Denko Materials Co Ltd
Original Assignee
Hitachi Chemical Co Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Chemical Co Ltd, Hitachi Ltd filed Critical Hitachi Chemical Co Ltd
Priority to JP16874187A priority Critical patent/JPS6414229A/en
Publication of JPS6414229A publication Critical patent/JPS6414229A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Phenolic Resins Or Amino Resins (AREA)

Abstract

PURPOSE:To obtain easily and industrially the title resin freed of oligomer components, by dispersing a novolac phenolic resin in a solvent containing a specified aromatic solvent and extracting oligomer components from the resin. CONSTITUTION:The purpose resin is obtained by dispersing a novolac phenolic resin in a solvent mixture containing at least 90vol.% aromatic solvent of the formula and extracting oligomer components from the resin. In the formula, R1, R2, R3 and R4 are each H, Cl, Br or CH3 and at least one of them is a group other than H. Although an aromatic solvent (e.g., chlorobenzene) has heretofore been regarded as a nonsolvent for a novolac resin, it can dissolve an oligomer component of a certain MW or lower. In this way, oligomer components in the resin dispersed in these solvents can be selectively extracted, so that a novolac phenolic resin from which oligomers are extracted can be easily obtained.
JP16874187A 1987-07-08 1987-07-08 Production of novolac phenolic resin for resist Pending JPS6414229A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16874187A JPS6414229A (en) 1987-07-08 1987-07-08 Production of novolac phenolic resin for resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16874187A JPS6414229A (en) 1987-07-08 1987-07-08 Production of novolac phenolic resin for resist

Publications (1)

Publication Number Publication Date
JPS6414229A true JPS6414229A (en) 1989-01-18

Family

ID=15873554

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16874187A Pending JPS6414229A (en) 1987-07-08 1987-07-08 Production of novolac phenolic resin for resist

Country Status (1)

Country Link
JP (1) JPS6414229A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0416848A (en) * 1990-05-10 1992-01-21 Nippon Zeon Co Ltd Positive type photoresist composition
EP0786699A1 (en) 1996-01-22 1997-07-30 Fuji Photo Film Co., Ltd. Positive photoresist composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0416848A (en) * 1990-05-10 1992-01-21 Nippon Zeon Co Ltd Positive type photoresist composition
EP0786699A1 (en) 1996-01-22 1997-07-30 Fuji Photo Film Co., Ltd. Positive photoresist composition

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