JPS6411259A - Positive type photoresist composition - Google Patents

Positive type photoresist composition

Info

Publication number
JPS6411259A
JPS6411259A JP16644187A JP16644187A JPS6411259A JP S6411259 A JPS6411259 A JP S6411259A JP 16644187 A JP16644187 A JP 16644187A JP 16644187 A JP16644187 A JP 16644187A JP S6411259 A JPS6411259 A JP S6411259A
Authority
JP
Japan
Prior art keywords
novolak resin
alkaline soluble
soluble novolak
photoresist composition
positive type
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP16644187A
Other languages
Japanese (ja)
Inventor
Nobuaki Matsuda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP16644187A priority Critical patent/JPS6411259A/en
Publication of JPS6411259A publication Critical patent/JPS6411259A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
    • G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To improve sensitivity and resolving power by compounding a 1,2- quinonediazide at a specified ratio or below compd. with an alkaline soluble novolak resin of a specific range. CONSTITUTION:This compsn. consists of the alkaline soluble novolak resin and the 1,2-quinondiazide compd. The ratio of the m-cresol component and p-cresol component of the alkaline soluble novolak resin is specified to 70/30-80/20 and the weight average mol.wt. to 20,000-50,000. In addition, the optical density at 404nm per mum of a resist film is confined to <=0.55. The resolving power and sensitivity are thereby improved and the compsn. having excellent developability is obtd.
JP16644187A 1987-07-03 1987-07-03 Positive type photoresist composition Pending JPS6411259A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16644187A JPS6411259A (en) 1987-07-03 1987-07-03 Positive type photoresist composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16644187A JPS6411259A (en) 1987-07-03 1987-07-03 Positive type photoresist composition

Publications (1)

Publication Number Publication Date
JPS6411259A true JPS6411259A (en) 1989-01-13

Family

ID=15831460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16644187A Pending JPS6411259A (en) 1987-07-03 1987-07-03 Positive type photoresist composition

Country Status (1)

Country Link
JP (1) JPS6411259A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006072080A (en) * 2004-09-03 2006-03-16 Tokyo Ohka Kogyo Co Ltd Method for forming resist pattern and method for forming fine pattern using same and method for manufacturing liquid crystal display element

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006072080A (en) * 2004-09-03 2006-03-16 Tokyo Ohka Kogyo Co Ltd Method for forming resist pattern and method for forming fine pattern using same and method for manufacturing liquid crystal display element

Similar Documents

Publication Publication Date Title
KR890015070A (en) Photosensitive resin composition
KR890005563A (en) Novolac Resin for Positive Photoresist
JPS561044A (en) Photosensitive composition
EP0914964A3 (en) Positive type photosensitive composition for infrared lasers
KR880009291A (en) Positive-acting photoresist composition
KR840004589A (en) Positive type photoresist composition
JPS6444439A (en) Positive photoresist composition
KR940022180A (en) Positive photosensitive composition
JPS5557841A (en) Photosensitive composition
JPS6411259A (en) Positive type photoresist composition
EP0301101A4 (en) Positive photosensitive resin composition.
EP0395346A3 (en) Photosensitive composition
JPS6413541A (en) Positive type photoresist composition
JPS6452139A (en) Photosensitive composition
JPS6432256A (en) Photosensitive composition
KR910006779A (en) Radiation-sensitive positive resist composition
EP0649061A4 (en) Positive electron-beam resist composition and developer for positive electron-beam resist.
EP0295626A3 (en) Photosensitive composition
JPS6450044A (en) Resin composition having sensibility for radiant rays
KR890016424A (en) Positive-working photosensitive composition
JPS6417049A (en) Positive type photoresist composition
JPS642034A (en) Photoresist composition
KR920020275A (en) Method for preparing radiation sensitive compound and positive resist composition
JPS5614232A (en) Negative type resist resin
KR950012147A (en) Positive photoresist composition