JPS6411259A - Positive type photoresist composition - Google Patents
Positive type photoresist compositionInfo
- Publication number
- JPS6411259A JPS6411259A JP16644187A JP16644187A JPS6411259A JP S6411259 A JPS6411259 A JP S6411259A JP 16644187 A JP16644187 A JP 16644187A JP 16644187 A JP16644187 A JP 16644187A JP S6411259 A JPS6411259 A JP S6411259A
- Authority
- JP
- Japan
- Prior art keywords
- novolak resin
- alkaline soluble
- soluble novolak
- photoresist composition
- positive type
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
Abstract
PURPOSE:To improve sensitivity and resolving power by compounding a 1,2- quinonediazide at a specified ratio or below compd. with an alkaline soluble novolak resin of a specific range. CONSTITUTION:This compsn. consists of the alkaline soluble novolak resin and the 1,2-quinondiazide compd. The ratio of the m-cresol component and p-cresol component of the alkaline soluble novolak resin is specified to 70/30-80/20 and the weight average mol.wt. to 20,000-50,000. In addition, the optical density at 404nm per mum of a resist film is confined to <=0.55. The resolving power and sensitivity are thereby improved and the compsn. having excellent developability is obtd.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16644187A JPS6411259A (en) | 1987-07-03 | 1987-07-03 | Positive type photoresist composition |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16644187A JPS6411259A (en) | 1987-07-03 | 1987-07-03 | Positive type photoresist composition |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6411259A true JPS6411259A (en) | 1989-01-13 |
Family
ID=15831460
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16644187A Pending JPS6411259A (en) | 1987-07-03 | 1987-07-03 | Positive type photoresist composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6411259A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006072080A (en) * | 2004-09-03 | 2006-03-16 | Tokyo Ohka Kogyo Co Ltd | Method for forming resist pattern and method for forming fine pattern using same and method for manufacturing liquid crystal display element |
-
1987
- 1987-07-03 JP JP16644187A patent/JPS6411259A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006072080A (en) * | 2004-09-03 | 2006-03-16 | Tokyo Ohka Kogyo Co Ltd | Method for forming resist pattern and method for forming fine pattern using same and method for manufacturing liquid crystal display element |
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