JPS638424Y2 - - Google Patents
Info
- Publication number
- JPS638424Y2 JPS638424Y2 JP2879384U JP2879384U JPS638424Y2 JP S638424 Y2 JPS638424 Y2 JP S638424Y2 JP 2879384 U JP2879384 U JP 2879384U JP 2879384 U JP2879384 U JP 2879384U JP S638424 Y2 JPS638424 Y2 JP S638424Y2
- Authority
- JP
- Japan
- Prior art keywords
- oxygen concentration
- irradiation chamber
- gas
- irradiation
- inert gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 25
- 239000001301 oxygen Substances 0.000 claims description 25
- 229910052760 oxygen Inorganic materials 0.000 claims description 25
- 239000011261 inert gas Substances 0.000 claims description 18
- 239000007789 gas Substances 0.000 claims description 14
- 239000002245 particle Substances 0.000 claims description 11
- 238000001816 cooling Methods 0.000 claims description 3
- 238000001514 detection method Methods 0.000 claims description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 18
- 229910001873 dinitrogen Inorganic materials 0.000 description 18
- 238000010894 electron beam technology Methods 0.000 description 10
- 230000000694 effects Effects 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Application Of Or Painting With Fluid Materials (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Description
【考案の詳細な説明】
(イ) 産業上の利用分野
この考案は、不活性ガスを充填した照射室内で
荷電粒子照射を行う荷電粒子照射装置に関する。[Detailed description of the invention] (a) Industrial application field This invention relates to a charged particle irradiation device that performs charged particle irradiation in an irradiation chamber filled with inert gas.
(ロ) 従来技術
塗膜等を電子線硬化させるために電子線照射を
酸素雰囲気中で行うと、塗料が酸素と結合し、満
足な硬化膜が得られない。そこで、たとえば窒素
ガスなどの不活性ガスを照射室に充填し、酸素濃
度を下げて荷電粒子照射を行うことが必要であ
る。(B) Prior Art When electron beam irradiation is performed in an oxygen atmosphere to cure a paint film or the like with electron beams, the paint combines with oxygen and a satisfactory cured film cannot be obtained. Therefore, it is necessary to fill the irradiation chamber with an inert gas such as nitrogen gas to lower the oxygen concentration and perform charged particle irradiation.
一方、荷電粒子照射に供つて雰囲気温度が上昇
するため、温度上昇した不活性ガスをすみやかに
除去すると共に冷たいガスを新たに供給すること
が必要である。 On the other hand, since the ambient temperature increases with charged particle irradiation, it is necessary to promptly remove the inert gas whose temperature has increased and to newly supply cold gas.
そこで照射室内に不活性ガスを連続的に供給
し、かつ照射室の被照射物搬入口や搬出口から照
射室内に供給された不活性ガスを吹き出させ、常
に新たな不活性ガスを照射室に充填することが一
般に行われている。 Therefore, inert gas is continuously supplied into the irradiation chamber, and the inert gas supplied into the irradiation chamber is blown out from the irradiation object entrance and exit of the irradiation chamber, and new inert gas is constantly supplied to the irradiation chamber. Filling is commonly done.
しかし、この方式自体は、電子線の照射線量が
増大するに従い大量の不活性ガスを消費すること
になり、本来の目的である酸素濃度コントロール
に比べ、熱除去のためにランニングコストが大き
くなる欠点がある。 However, this method itself consumes a large amount of inert gas as the electron beam irradiation dose increases, and the disadvantage is that running costs are higher due to heat removal compared to the original purpose of oxygen concentration control. There is.
(ハ) 目的
この考案は、不活性ガスの消費量を大幅に低減
することができる荷電粒子照射装置を提供するこ
とを目的とするものである。(c) Purpose The purpose of this invention is to provide a charged particle irradiation device that can significantly reduce the amount of inert gas consumed.
(ニ) 構成
この考案の荷電粒子照射装置は、不活性ガスを
充填した照射室内で荷電粒子照射を行う荷電粒子
照射装置において、照射室内のガスを回収し冷却
して再び照射室内に供給する冷却循環手段と、照
射室内に不活性ガスを追加供給する不活性ガス供
給手段と、照射室内のガスの酸素濃度を検出する
酸素濃度検出手段と、検出した酸素濃度が所定値
以上なつたときに前記不活性ガスの追加供給比率
を上昇させる酸素濃度コントロール手段とを具備
したことを特徴とするものである。(d) Configuration The charged particle irradiation device of this invention is a charged particle irradiation device that performs charged particle irradiation in an irradiation chamber filled with inert gas, and a cooling system that collects the gas in the irradiation chamber, cools it, and supplies it again to the irradiation chamber. a circulation means; an inert gas supply means for additionally supplying inert gas into the irradiation chamber; an oxygen concentration detection means for detecting the oxygen concentration of the gas in the irradiation chamber; The present invention is characterized by comprising an oxygen concentration control means for increasing the additional supply ratio of inert gas.
(ホ) 実施例
以下、図に示す実施例について説明するが、こ
れによりこの考案が限定されるものではない。(E) Embodiments Hereinafter, embodiments shown in the figures will be described, but the present invention is not limited thereto.
第１図に示す１は、この考案の一実施例の電子
線照射装置である。被照射物Ｔは、搬入口２ａか
ら照射室２内に送り込まれ、電子線照射器３で電
子線を照射され、搬出口２ｂから照射室２外へ送
り出される。４はターゲツトで、水冷管５にて、
冷却されている。 Reference numeral 1 shown in FIG. 1 is an electron beam irradiation device according to an embodiment of this invention. The object T to be irradiated is sent into the irradiation chamber 2 through the carry-in port 2a, irradiated with an electron beam by the electron beam irradiator 3, and sent out of the irradiation chamber 2 through the carry-in port 2b. 4 is the target, at the water-cooled pipe 5,
It is cooled.
６は窒素ガス源、７は流量制御バルブ、８は流
量計、９は混合器で、これらによつて照射室２内
には窒素ガスが供給される。供給された窒素ガス
の一部は搬入口２ａおよび搬出口２ｂから照射室
２外へ流出し、また他の一部は窒素ガス吸入カバ
ー１０および吸入管１１を介してポンプ１２で吸
い出される。吸い出されたガスは、熱交換器１３
で水冷管５にて冷却され、混合器９を経て再び照
射室２に供給される。 6 is a nitrogen gas source, 7 is a flow control valve, 8 is a flow meter, and 9 is a mixer, by which nitrogen gas is supplied into the irradiation chamber 2. A part of the supplied nitrogen gas flows out of the irradiation chamber 2 through the carry-in port 2a and the carry-out port 2b, and the other part is sucked out by the pump 12 via the nitrogen gas suction cover 10 and the suction pipe 11. The sucked gas is transferred to the heat exchanger 13
It is then cooled in a water-cooled pipe 5 and supplied to the irradiation chamber 2 again via a mixer 9.
１４は酸素濃度計、１５はコントローラであ
る。コントローラ１５は、酸素濃度計１４により
測定された照射室２内の酸素濃度が所定の濃度レ
ベル以上になると流量制御バルブ７を開いて窒素
ガスの供給量を増加させ、逆に所定の濃度レベル
以下になると流量制御バルブ７を閉じて窒素ガス
の供給量を減少させる。そこで照射室２内の酸素
濃度は所定の濃度レベルに保たれる。 14 is an oxygen concentration meter, and 15 is a controller. The controller 15 opens the flow rate control valve 7 to increase the supply amount of nitrogen gas when the oxygen concentration in the irradiation chamber 2 measured by the oxygen concentration meter 14 exceeds a predetermined concentration level, and conversely increases the supply amount of nitrogen gas to a predetermined concentration level or below. When this happens, the flow rate control valve 7 is closed to reduce the amount of nitrogen gas supplied. Therefore, the oxygen concentration within the irradiation chamber 2 is maintained at a predetermined concentration level.
さて、照射室２内の過度の温度上昇を防ぐため
には、温度上昇した照射室２内のガスを排出し、
新たに冷たいガスを供給してやる必要があり、そ
の流量は照射条件によつてほぼ決まる。従来は、
排出したガスを回収せず、新たな冷たい窒素ガス
を供給するだけであつたので、前記流量分の窒素
ガスがそのまま消費されていた。しかし、この装
置１では、照射室２から排出したガスを回収し冷
却して再び使用するから、新たに追加供給する窒
素ガス量すなわち窒素ガス消費量は照射室２内の
酸素濃度を所定レベルに維持するのに必要な量だ
けとなり、この量は温度上昇を防ぐための前記流
量に比べて著しく少量であるから、大幅に窒素ガ
スを節約できることとなる。 Now, in order to prevent an excessive temperature rise in the irradiation chamber 2, the gas in the irradiation chamber 2 whose temperature has risen is discharged,
It is necessary to supply new cold gas, and its flow rate is approximately determined by the irradiation conditions. conventionally,
Since the discharged gas was not recovered and only new cold nitrogen gas was supplied, the nitrogen gas equivalent to the above flow rate was consumed as it was. However, in this device 1, the gas discharged from the irradiation chamber 2 is recovered, cooled, and used again, so the amount of newly additionally supplied nitrogen gas, that is, the amount of nitrogen gas consumed, is required to maintain the oxygen concentration in the irradiation chamber 2 at a predetermined level. Only the amount necessary to maintain the temperature is required, and this amount is significantly smaller than the flow rate for preventing temperature rise, so nitrogen gas can be saved significantly.
なお、第１図１６で例示しているように、照射
室２内のガスの循環経路中に酸素吸収手段を設け
れば、照射室２内の酸素濃度の上昇を或る程度防
止できるから、さらに窒素ガスの消費量を低減で
きる。 Note that, as illustrated in FIG. 16, if oxygen absorption means is provided in the gas circulation path within the irradiation chamber 2, an increase in the oxygen concentration within the irradiation chamber 2 can be prevented to some extent. Furthermore, the amount of nitrogen gas consumed can be reduced.
さらに他の実施例としては、被照射物Ｔから溶
媒が揮発するような場合、ガスの循環経路中に溶
媒吸収手段を設けたものが挙げられる。また酸素
濃度計１４によるコントロールの外に、照射室２
内の温度や圧力を条件に加えて窒素ガスの追加供
給量をコントロールしてもよい。さらに、窒素ガ
スの追加供給量と共に循環させるガス量のコント
ロールを行つてもよい。 Still another embodiment is one in which a solvent absorbing means is provided in the gas circulation path when the solvent evaporates from the irradiated object T. In addition to the control by the oxygen concentration meter 14, the irradiation chamber 2
The additional supply amount of nitrogen gas may be controlled by adjusting the internal temperature and pressure. Furthermore, the amount of gas to be circulated together with the additional supply amount of nitrogen gas may be controlled.
(ヘ) 効果
この考案の電子線照射装置によれば、照射室内
のガスを回収し冷却して再使用すると共に、照射
室内の酸素濃度が所定値以上とならないように不
活性ガスを追加供給するから、照射室内は常に所
定値より低い酸素濃度に保たれ、酸素の濃度上昇
による塗膜硬化への悪影響を確実に防止できる。(f) Effect According to the electron beam irradiation device of this invention, the gas in the irradiation chamber is recovered, cooled, and reused, and inert gas is additionally supplied to prevent the oxygen concentration in the irradiation chamber from exceeding a predetermined value. Therefore, the inside of the irradiation chamber is always kept at an oxygen concentration lower than a predetermined value, and it is possible to reliably prevent an adverse effect on coating film curing due to an increase in oxygen concentration.
また酸素濃度の維持に必要な少量の不活性ガス
を消費するだけで照射室内の冷却を行うことがで
き、ランニングコストを低減することができる。 Furthermore, the interior of the irradiation chamber can be cooled by consuming only a small amount of inert gas required to maintain the oxygen concentration, and running costs can be reduced.
第１図はこの考案の一実施例の電子線照射装置
の構成説明図である。
１……電子線照射装置、２……照射室、２ａ…
…搬入口、２ｂ……搬出口、３……電子線照射
器、５……水冷管、６……窒素ガス源、７……流
量制御バルブ、８……流量計、９……混合器、１
０……窒素ガス吸入カバー、１１……吸入管、１
２……ポンプ、１３……熱交換器、１４……酸素
濃度計、１５……コントローラー。
FIG. 1 is an explanatory diagram of the configuration of an electron beam irradiation device according to an embodiment of this invention. 1...Electron beam irradiation device, 2...Irradiation chamber, 2a...
... Carrying inlet, 2b... Carrying out port, 3... Electron beam irradiator, 5... Water cooling tube, 6... Nitrogen gas source, 7... Flow rate control valve, 8... Flow meter, 9... Mixer, 1
0...Nitrogen gas suction cover, 11...Suction pipe, 1
2...Pump, 13...Heat exchanger, 14...Oxygen concentration meter, 15...Controller.
Claims (1)
を行う荷電粒子照射装置において、 照射室内のガスを回収し冷却して再び照射室内
に供給する冷却循環手段と、照射室内に不活性ガ
スを追加供給する不活性ガス供給手段と、照射室
内のガスの酸素濃度を検出する酸素濃度検出手段
と、検出した酸素濃度が所定値以上なつたときに
前記不活性ガスの追加供給比率を上昇させる酸素
濃度コントロール手段とを具備したことを特徴と
する荷電粒子照射装置。[Scope of Claim for Utility Model Registration] In a charged particle irradiation device that irradiates charged particles in an irradiation chamber filled with inert gas, a cooling circulation means that collects and cools the gas in the irradiation chamber and supplies it again to the irradiation chamber; an inert gas supply means for additionally supplying inert gas into the room; an oxygen concentration detection means for detecting the oxygen concentration of the gas in the irradiation chamber; and an oxygen concentration detection means for adding the inert gas when the detected oxygen concentration exceeds a predetermined value A charged particle irradiation device characterized by comprising an oxygen concentration control means for increasing a supply ratio.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2879384U JPS60140641U (en) | 1984-02-28 | 1984-02-28 | Charged particle irradiation device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2879384U JPS60140641U (en) | 1984-02-28 | 1984-02-28 | Charged particle irradiation device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60140641U JPS60140641U (en) | 1985-09-18 |
| JPS638424Y2 true JPS638424Y2 (en) | 1988-03-14 |
Family
ID=30527004
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2879384U Granted JPS60140641U (en) | 1984-02-28 | 1984-02-28 | Charged particle irradiation device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60140641U (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU778181B2 (en) * | 1999-10-12 | 2004-11-18 | Toyo Ink Manufacturing Co. Ltd. | Method and apparatus for irradiating active energy ray |
| JP4641844B2 (en) * | 2005-03-25 | 2011-03-02 | 大日本印刷株式会社 | Electron beam irradiation device |
| JP2010054407A (en) * | 2008-08-29 | 2010-03-11 | Univ Of Fukui | Equipment and method for electron beam irradiation |
-
1984
- 1984-02-28 JP JP2879384U patent/JPS60140641U/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60140641U (en) | 1985-09-18 |
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