JPS6361659B2 - - Google Patents
Info
- Publication number
- JPS6361659B2 JPS6361659B2 JP54048154A JP4815479A JPS6361659B2 JP S6361659 B2 JPS6361659 B2 JP S6361659B2 JP 54048154 A JP54048154 A JP 54048154A JP 4815479 A JP4815479 A JP 4815479A JP S6361659 B2 JPS6361659 B2 JP S6361659B2
- Authority
- JP
- Japan
- Prior art keywords
- tank
- processing
- developing
- developer
- plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000007788 liquid Substances 0.000 claims description 63
- 238000000034 method Methods 0.000 claims description 21
- 239000002699 waste material Substances 0.000 claims description 5
- 238000011084 recovery Methods 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims description 3
- 238000011144 upstream manufacturing Methods 0.000 claims description 2
- 239000000243 solution Substances 0.000 description 37
- 238000005406 washing Methods 0.000 description 9
- 239000000463 material Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 238000003672 processing method Methods 0.000 description 4
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000000155 melt Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- JMMVHMOAIMOMOF-UHFFFAOYSA-N (4-prop-2-enoyloxyphenyl) prop-2-enoate Chemical compound C=CC(=O)OC1=CC=C(OC(=O)C=C)C=C1 JMMVHMOAIMOMOF-UHFFFAOYSA-N 0.000 description 1
- 244000171897 Acacia nilotica subsp nilotica Species 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 229920000084 Gum arabic Polymers 0.000 description 1
- 239000000205 acacia gum Substances 0.000 description 1
- 235000010489 acacia gum Nutrition 0.000 description 1
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000010828 elution Methods 0.000 description 1
- 235000011187 glycerol Nutrition 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229940078494 nickel acetate Drugs 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 1
- BSVBQGMMJUBVOD-UHFFFAOYSA-N trisodium borate Chemical compound [Na+].[Na+].[Na+].[O-]B([O-])[O-] BSVBQGMMJUBVOD-UHFFFAOYSA-N 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
- G03F7/3071—Process control means, e.g. for replenishing
Landscapes
- Engineering & Computer Science (AREA)
- Automation & Control Theory (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Description
【発明の詳細な説明】
本発明はPS版の現像処理方法およびそのため
の装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a PS plate development processing method and an apparatus therefor.
原稿を焼付けられたPS版は現像槽に搬送され
ながら現像処理液（以下、単に「処理液」とい
う。）が与えられ、かつブラシやスポンジ等で擦
られて現像処理される。前記原稿を焼付けられた
PS版上の非画像部分では前記現像処理において
有機溶媒やアルカリ水溶液を含む処理液によつて
膨潤膜となる。膨潤膜となつた非画像部分やブラ
シやスポンジ等の擦り手段で容易に取り去られ画
像部のみが残される。したがつて処理液にはPS
版からの感光性物質等の溶出物が混入されること
になる。また、前記処理液は通常現像槽を通過す
るPS版へシヤワー方式で与えられるので空気に
よる劣化、例えば炭酸ガスが溶け込むことによる
PHの低下が起こる。そこで処理液はPS版の処理
量と経時とにより、現像能力が低下して限界に至
ると新しい処理液と交換される。この処理能力の
限界を超えてPS版を処理すると、PS版の表面に
非画像部分の感光膜が残留し、これが印刷時の汚
れとなつたり、調子再現等の印刷性能が不安定と
なる。 The PS plate on which the original has been printed is transported to a developing tank, where it is supplied with a developing solution (hereinafter simply referred to as "processing solution"), and is rubbed with a brush, sponge, etc., and subjected to development processing. The original manuscript was burned.
The non-image area on the PS plate becomes a swollen film due to the processing solution containing an organic solvent or alkaline aqueous solution in the development process. The non-image area that has become a swollen film is easily removed by rubbing means such as a brush or sponge, leaving only the image area. Therefore, the processing solution contains PS.
Extractable materials such as photosensitive substances from the plate will be mixed in. In addition, since the processing liquid is normally applied to the PS plate passing through a developing tank using a shower method, deterioration due to air may occur, such as carbon dioxide dissolving.
A decrease in PH occurs. Therefore, when the developing ability of the processing liquid decreases due to the amount of processing of the PS plate and the passage of time and reaches its limit, it is replaced with a new processing liquid. If the PS plate is processed beyond its processing capacity, the photoresist film in the non-image areas will remain on the surface of the PS plate, which will cause stains during printing and cause instability in printing performance such as tone reproduction.
PS版の処理は、現像工程、水洗工程、ガム引
き工程、乾燥工程からなるのが一般的であつた
が、最近は水洗工程を省いて現像工程から直ちに
ガム引き工程に移す無水洗処理化により排水公害
をなくす方向に進んでいる。上述の如き無水洗処
理を行なう場合には、上記処理能力の限界を超え
ない範囲内の限界附近の処理液で処理した場合で
も版の地汚れや着肉不良が生じたり、また感光性
物質が溶け込んだ疲労した処理液がPS版に付着
し、これがガム液と混合して版上の地汚れや着肉
不良が生ずる。無水洗処理方式では、現像工程の
出口のローラ対を工夫してPS版に付着した処理
液をできるだけ絞つてガム引き工程に持込まない
ことが肝要であるが、処理液の持込みを皆無にす
ることは不可能である。溶出した感光性物質がま
だ少ない状態で処理液を交換することでもこの問
題は解決できるが不経済である。 The processing of PS plates used to generally consist of a developing process, a water washing process, a gumming process, and a drying process, but recently, water-free washing has been adopted, which eliminates the water washing process and moves immediately from the development process to the gumming process. Progress is being made in the direction of eliminating wastewater pollution. When performing the above-mentioned waterless washing process, even when processing with a processing liquid close to the limit within the range of the above-mentioned processing capacity, background stains and poor inking may occur on the plate, and photosensitive materials may be removed. The dissolved and fatigued processing solution adheres to the PS plate and mixes with the gum liquid, causing background stains and poor inking on the plate. In the waterless washing process, it is important to devise a pair of rollers at the exit of the developing process to squeeze as much of the processing liquid that adheres to the PS plate as possible so that it does not enter the gumming process; is not possible. This problem can be solved by replacing the processing solution when the amount of eluted photosensitive material is still small, but this is uneconomical.
本発明の目的は、現像処理工程から出てくる
PS版に付着した処理液に含まれる感光性物質が
少ない状態で現像処理が終了し、かつ処理液を経
済的に使うことができる現像処理方法およびその
ための装置を提供することである。 The purpose of the present invention is to
It is an object of the present invention to provide a development processing method and an apparatus therefor, in which development processing can be completed in a state where the amount of photosensitive material contained in the processing solution adhering to a PS plate is small, and the processing solution can be used economically.
本発明は上記目的を達成するためになされたも
ので、ガム処理部の上流に設けられる現像処理槽
を第１の現像槽と第２の現像槽に分け、これら第
１と第２の現像槽にPS版を順次通過させ、前記
第１の現像槽での処理時間は前記第２の現像槽で
の処理時間よりも長くし、前記第２の現像槽に用
いた処理液を前記第１の現像槽の処理液として再
利用すると共に、前記第１の現像槽の処理液は、
通常の１浴方式でPS版を現像処理するときに要
求される処理能力の限界を越えた状態以上にPS
版を処理したものを用い、前記第１の現像槽と前
記第２の現像槽を通しての処理液の処理能力の限
界近くまでPS版を処理したとき、前記第１の現
像槽の処理液を排出し、前記第２の現像槽の処理
液を前記第１の現像槽へ移し、前記第２の現像槽
へ新しい処理液を供給することを特徴とする。 The present invention has been made to achieve the above-mentioned object, and the developing tank provided upstream of the gum processing section is divided into a first developing tank and a second developing tank. The processing time in the first developing tank is longer than the processing time in the second developing tank, and the processing liquid used in the second developing tank is passed through the first developing tank. In addition to reusing the processing solution in the developer tank, the processing solution in the first developer tank is
The PS plate exceeds the processing capacity limit required when developing PS plates using the normal one-bath method.
When the PS plate is processed to a point close to the processing capacity of the processing liquid through the first developing tank and the second developing tank, the processing liquid in the first developing tank is discharged. The method is characterized in that the processing liquid in the second developer tank is transferred to the first developer tank, and new processing liquid is supplied to the second developer tank.
また本発明に係るPS版の現像処理装置は、第
１の現像槽と第２の現像槽とからなる現像処理部
と、第２の現像槽に直結させたガム処理槽と、前
記第１と第２の現像槽い順次PS版を通過させる
搬送手段と、新液貯蔵タンクから処理液を前記第
２の現像槽へ供給する手段と、前記第２の現像槽
の処理液を前記第１の現像槽へ移す手段と、前記
第１の現像槽の処理液を廃液回収タンクへ排出す
る手段とからなることを特徴としていることを特
徴とするPS版の現像処理方法である。 Further, the PS plate development processing apparatus according to the present invention includes a development processing section including a first developer tank and a second developer tank, a gum processing tank directly connected to the second developer tank, and a gum processing tank that is directly connected to the first developer tank. a conveying means for sequentially passing the PS plates through a second developing tank; a means for supplying a processing solution from a new solution storage tank to the second developing tank; A method for developing a PS plate, characterized by comprising means for transferring the processing solution to a developer tank, and means for discharging the processing solution in the first developer tank to a waste solution recovery tank.
PS版の現像処理は、前述の如くPS版を有機溶
媒やアルカリ水溶液を含む処理液で光硬化しない
非画像部分を膨潤させながらブラシやスポンジ等
の擦り手段で除去することであり、除去された膨
潤膜は処理液中に容易に溶け込む。したがつて、
現像処理槽を第１の現像槽と第２の現像槽に分
け、これら第１と第２の現像槽にPS版を順次通
過させて処理すると、PS版から除去された膨潤
膜の大部分が第１の現像槽に溶け込み、第２の現
像槽には第１の現像槽による現像処理で完全には
除去されずに残つていた膨潤膜に溶け込む程度で
あるおで、第２の現像槽を通つて出てきたPS版
に付着してくる処理液には感光性物質等の溶出物
は僅かしか含まれていないことになる。そして、
第１の現像槽の処理液が可成り疲労した状態、例
えば従来の現像槽が１浴である現像処理方式にお
いて処理能力限度以上にPS版が処理された状態
になつていても、第２の現像槽を通つて出てきた
PS版に付着してくる処理液に含まれる感光性物
質等の溶出物の量は、前述の従来の現像処理方式
において処理能力の限度内の処理液を用いて処理
したときに現像槽から出てきたPS版に付着して
くる処理液に含まれる感光性物質等の溶出物の量
よりも少ない。また、第１の現像槽による処理時
間を第２の現像槽による処理時間より長くするな
らば、第１の現像槽の処理液がより疲労した状態
であつてもPS版を処理することができるという
利点が生ずる。 As mentioned above, the development process for PS plates is to swell the non-image areas that are not photocured with a treatment solution containing an organic solvent or alkaline aqueous solution and remove them with a rubbing means such as a brush or sponge. The swollen membrane easily dissolves into the processing solution. Therefore,
When the developing tank is divided into a first developing tank and a second developing tank, and the PS plate is sequentially passed through these first and second developing tanks, most of the swelling film removed from the PS plate is removed. The film melts into the first developer tank, and into the second developer tank, it melts into the swollen film that remained without being completely removed during the development process in the first developer tank. The processing solution that comes out through the PS plate and adheres to it contains only a small amount of eluted materials such as photosensitive substances. and,
Even if the processing solution in the first developer tank is considerably fatigued, for example, in a conventional one-bath development processing system, the PS plate has been processed beyond the processing capacity limit, came out through the developing tank
The amount of eluted substances such as photosensitive substances contained in the processing solution that adheres to the PS plate is determined by the amount of eluates such as photosensitive substances that come out of the developing tank when processed using a processing solution within the processing capacity limit in the conventional development processing method described above. This amount is smaller than the amount of eluates such as photosensitive substances contained in the processing solution that adheres to the PS plate. Furthermore, if the processing time in the first developer tank is made longer than the processing time in the second developer tank, the PS plate can be processed even when the processing solution in the first developer tank is in a more exhausted state. The advantage arises.
第１の現像槽と第２の現像槽とを通してPS版
の処理量が能力の限界付近に至つたときには、第
１の現像槽の処理液を排出して第２の現像槽の処
理液を第１の現像槽に移し、第２の現像槽へは新
しい処理液をセツトすれば処理液を経済的に使う
ことができる。また、PS版の処理量に応じて第
２の現像槽へ新しい処理液を補充し、第２の現像
槽の一部を第１の現像槽へ移し、第１の現像槽の
一部を排出するようにすれば、連続的に第２の現
像槽の処理液を第１の現像槽に再利用しながら
PS版を処理することができる。この場合の補充
量は処理液の経時による能力低下分も含めて、第
１の現像槽の処理液の能力の限界との兼ね合いで
選ぶことにより処理液を最も経済的に用いること
ができる。 When the amount of PS plates processed through the first developer tank and the second developer tank reaches near the capacity limit, the processing solution in the first developer tank is drained and the processing solution in the second developer tank is transferred to the second developer tank. The processing solution can be used economically by transferring it to the first developing tank and setting a new processing solution in the second developing tank. Also, depending on the amount of PS plate processed, the second developer tank is replenished with new processing solution, a part of the second developer tank is transferred to the first developer tank, and a part of the first developer tank is discharged. By doing so, the processing solution in the second developer tank can be continuously reused in the first developer tank.
PS version can be processed. In this case, the replenishment amount can be selected in consideration of the capacity limit of the processing liquid in the first developing tank, including the decrease in capacity of the processing liquid over time, so that the processing liquid can be used most economically.
以下、実施例にて本発明を具体的に説明する。 Hereinafter, the present invention will be specifically explained with reference to Examples.
装 置
第１図は本発明を実施するための装置を例示す
る側面図であり、第１の現像槽１および第２の現
像槽２からなる現像処理部と、現像処理を終えた
PS版に水洗を行なわずに直ちに非画像部分を保
護するための版面保護層を施すためのガム塗布槽
３を第２の現像槽２に直結したガム処理部とから
なつている。第１の現像槽１は、搬送ローラ４、
串ローラ５、ブラシローラ６、受ローラ７、絞り
ローラ８、および矢印Ａ方向へ送られてくるPS
版へ処理液をシヤワー方式で与えるシヤワーパイ
プ９からなりり、第２の現像槽２は、搬送ローラ
４、ブラシローラ６、受ローラ７、絞りローラ
８、および第１の現像槽１を通つてくるPS版へ
処理液をシヤワー方式で与えるシヤワーパイプ１
０からなつている。そしてガム塗布槽３は、搬送
ローラ４、串ローラ５、絞りローラ８、および第
２の現像槽２を通つてくるPS版へガム液をシヤ
ワー方式で与えるシヤワーパイプ１１からなつて
いる。ポンプ１２は第１の現像槽１の液溜部１３
からシヤワーパイプ９へ処理液を循環供給するも
のであり、ポンプ１４は第２の現像槽２の液溜部
１５からシヤワーパイプ１０へ処理液を循環供給
するものであり、ポンプ１６はガム液タンク１７
からシヤワーパイプ１１へガム液を循環供給する
ものである。そして、ポンプ１８はバルブ１９が
開かれたとき第２の現像槽２の処理液を液溜部１
５から第１の現像槽１の液溜部１３へ移すための
ものであり、ポンプ２０は処理液を新液貯蔵タン
ク２１から第２の現像槽２の液溜部１５へポンプ
アツプするものである。バルブ２２は第１の現像
槽１の処理液を液溜部１３から廃液回収タンク２
３へ排出するときに開くものである。Apparatus FIG. 1 is a side view illustrating an apparatus for carrying out the present invention, which includes a developing processing section consisting of a first developing tank 1 and a second developing tank 2, and
It consists of a gum processing section directly connected to a second developing tank 2, and a gum coating tank 3 for immediately applying a plate surface protective layer to protect non-image areas of the PS plate without washing with water. The first developer tank 1 includes a transport roller 4,
The skewer roller 5, the brush roller 6, the receiving roller 7, the squeezing roller 8, and the PS sent in the direction of arrow A
The second developer tank 2 is composed of a shower pipe 9 that applies processing liquid to the plate in a shower method. Shower pipe 1 that showers processing liquid onto the coming PS plate
Starting from 0. The gum coating tank 3 is composed of a conveyance roller 4, a skewer roller 5, a squeezing roller 8, and a shower pipe 11 that showers gum liquid onto the PS plate passing through the second developing tank 2. The pump 12 is connected to the liquid reservoir 13 of the first developer tank 1.
The pump 14 circulates and supplies the processing liquid from the liquid reservoir 15 of the second developer tank 2 to the shower pipe 10, and the pump 16 circulates and supplies the processing liquid from the liquid reservoir 15 of the second developer tank 2 to the shower pipe 9. 17
The gum liquid is circulated and supplied from the shower pipe 11 to the shower pipe 11. When the valve 19 is opened, the pump 18 pumps the processing liquid in the second developing tank 2 to the liquid reservoir 1.
5 to the liquid reservoir 13 of the first developer tank 1, and the pump 20 pumps up the processing liquid from the new liquid storage tank 21 to the liquid reservoir 15 of the second developer tank 2. . The valve 22 transfers the processing liquid in the first developing tank 1 from the liquid reservoir 13 to the waste liquid recovery tank 2.
It opens when discharging to 3.
PS版
PS版としては、陽極酸化皮膜を有するアルミ
ニウム支持体の表面に、カルボキシメチルセルロ
ースおよび酢酸ニツケルからなる下塗層組成物を
塗布して下塗層を設け、この下塗層の上にジエチ
ル―ｐ―フエニレンジアクリレートと１，４―ジ
―β―ヒドロキシエトキシシクロヘキサンとの縮
合重合により製造した感光性ポリマーを３―メチ
ル―２―ベンゾイルメチレン―β―ナフトチアゾ
リンで増感した感光層をオーバーコートしたもの
を用意した。PS version For the PS version, an undercoat layer composition consisting of carboxymethylcellulose and nickel acetate is coated on the surface of an aluminum support having an anodized film, and a diethyl- A photosensitive layer is formed by sensitizing a photosensitive polymer produced by condensation polymerization of p-phenylene diacrylate and 1,4-di-β-hydroxyethoxycyclohexane with 3-methyl-2-benzoylmethylene-β-naphthothiazoline. I prepared a coated one.
処理液
処理液としては、
γブチロラクトン ……8130ｇ
グリセリン ……813ｇ
水 ……400ｇ
ポリエチレングリコール＃4900 ……400ｇ
パラトルエンスルフオン酸 ……163ｇ
ノイゲンET＃120（商品名：第１工業薬品製
の表面活性剤） ……82ｇ
がこの割合で含まれるものを用意した。Treatment liquids: γ-butyrolactone...8130g Glycerin...813g Water...400g Polyethylene glycol #4900...400g Para-toluene sulfonic acid...163g Neugen ET#120 (product name: Daiichi Kogyo Yakuhin Co., Ltd.) Activator)...We prepared a product containing 82g in this proportion.
ガム液
ガム液としては、
アラビアガム（14゜ボーメ） ……6000ｇ
水 ……3000ｇ
ポリエチレングリコール＃4000 ……500ｇ
リン酸 ……200ｇ
ベンジルアルコール ……100ｇ
ノイゲンET＃120（商品名：第１工業薬品製
の表面活性剤） ……30ｇ
ホウ酸ナトリウム ……200ｇ
がこの割合で含まれるものを用意した。Gum liquid Gum liquid includes: Gum arabic (14° Baume)...6000g Water...3000g Polyethylene glycol #4000...500g Phosphoric acid...200g Benzyl alcohol...100g Neugen ET#120 (Product name: Daiichi Kogyo Yakuhin) A product was prepared containing 30g of surfactant (manufactured by Kawasaki) and 200g of sodium borate in the following proportions.
前述の如く構成した無水洗方式のPS版処理装
置の第１の現像槽１および第２の現像槽２へ処理
液を入れるには、先ずポンプ２０を作動させて新
液貯蔵タンク２１に入つている上記組成の処理液
を第２の現像槽２へ供給しながらバルブ１９を開
いてポンプ１８を作動させ、第１の現像槽１へ処
理液が適量入つたところでポンプ１８を止めると
ともにバルブ１９を閉じ、次に第２の現像槽２へ
処理液が適量入つたところでポンプ２０を止め
る。ガム液タンク１７には上記した組成のガム液
を入れておく。しかる後ポンプ１２、ポンプ１
４、ポンプ１６を作動させてそれぞれ処理液およ
びガム液を循環供給し、上記したPS版を矢印Ａ
方向へ送り込むと、PS版は第１の現像槽１およ
び第２の現像槽２にて現像処理され、ガム塗布槽
３にて版面保護層を形成されて出てくる。そし
て、第１の現像槽１および第２の現像槽２を通し
ての現像処理において処理液が能力の限界に達し
たら、ポンプ１２，１４を止めバルブ２２を開き
第１の現像槽１の処理液を廃液回収タンク２３へ
排出し、バルブ２２を閉じる。次にバルブ１９を
開きポンプ１８を作動させて第２の現像槽２の処
理液を第１の現像槽１へ移し、バルブ１９を閉じ
ポンプ１８を止める。第２の現像槽２へはポンプ
２０を作動させて処理液を新液貯蔵タンク２１か
ら供給し、適量になつたらポンプ２０を止める。
以後、このようにして第１の現像槽１の処理液を
排出し、第２の現像槽２の処理液を第１の現像槽
１へ移し、第２の現像槽２への新しい処理液のセ
ツトを行なう。 In order to fill the first developing tank 1 and the second developing tank 2 of the waterless washing type PS plate processing apparatus configured as described above, first, the pump 20 is operated and the new liquid storage tank 21 is filled. The valve 19 is opened and the pump 18 is operated while supplying the processing liquid having the above composition to the second developing tank 2. When the appropriate amount of processing liquid has entered the first developing tank 1, the pump 18 is stopped and the valve 19 is turned on. The pump 20 is closed, and then the pump 20 is stopped when an appropriate amount of processing liquid has entered the second developing tank 2. The gum solution tank 17 is filled with a gum solution having the composition described above. After that, pump 12, pump 1
4. Operate the pump 16 to circulate and supply the processing liquid and gum liquid respectively, and move the PS plate described above in the direction indicated by the arrow A.
When the PS plate is fed in this direction, it is developed in a first developer tank 1 and a second developer tank 2, and then comes out with a protective layer formed on the plate surface in a gum coating tank 3. When the processing liquid reaches the capacity limit in the developing process through the first developing tank 1 and the second developing tank 2, the pumps 12 and 14 are stopped and the valve 22 is opened to drain the processing liquid in the first developing tank 1. The liquid is discharged to the waste liquid recovery tank 23 and the valve 22 is closed. Next, the valve 19 is opened and the pump 18 is operated to transfer the processing liquid from the second developer tank 2 to the first developer tank 1, and the valve 19 is closed to stop the pump 18. The pump 20 is operated to supply the processing liquid from the new liquid storage tank 21 to the second developer tank 2, and when the appropriate amount is reached, the pump 20 is stopped.
Thereafter, in this way, the processing solution in the first developer tank 1 is discharged, the processing solution in the second developer tank 2 is transferred to the first developer tank 1, and the new processing solution is added to the second developer tank 2. Perform the set.
ガム塗布槽３に循環供給されるガム液は、PS
版が現像部から持ち込む処理液の混入量が増大し
てくると、PS版からの処理液への溶出物とによ
つて固体粒子を生成するようになるので新しいガ
ム液と交換する。 The gum liquid that is circulated and supplied to the gum application tank 3 is PS
When the amount of processing liquid brought into the plate from the developing section increases, solid particles are generated by elution from the PS plate into the processing liquid, so replace the gum liquid with new gum liquid.
上述の如く、本発明を無水洗方式のPS版処理
に実施した場合においては、従来の現像槽が１浴
である場合に比べて、結果的に処理液の処理能力
は約２倍に、ガム液の寿命（処理能力）は約1.5
倍に向上した。 As mentioned above, when the present invention is applied to PS plate processing using a waterless washing method, the processing capacity of the processing solution is approximately doubled, and the processing capacity of the processing solution is approximately twice that of the conventional one-bath developing tank. The life of the liquid (processing capacity) is approximately 1.5
improved twice.
本発明は上記したごときPS版の現像処理方法
および装置であるから処理液を経済的に利用する
ことができ、特に無水洗処理方式に実施する場合
には、現像処理工程から出てくるPS版に付着し
た処理液に含まれる感光性物質が少ない状態でガ
ム処理工程に入るためガム液を経済的に使うこと
ができ、かつ、処理されたPS版の品質を著著し
く向上させ得る。 Since the present invention is a PS plate development processing method and apparatus as described above, the processing solution can be used economically, and especially when implemented in a waterless washing process, the PS plate that comes out from the development process is Since the gum treatment process is started with less photosensitive material contained in the treatment liquid adhering to the plate, the gum liquid can be used economically, and the quality of the treated PS plate can be significantly improved.
第１図は本発明を実施するための装置を例示す
る要部の側面図である。
１…第１の現像槽、２…第２の現像槽、１８，
２０…ポンプ、１９，２２…バルブ、２１…新液
貯蔵タンク、２３…廃液回収タンク。
FIG. 1 is a side view of essential parts illustrating an apparatus for carrying out the present invention. 1...first developer tank, 2...second developer tank, 18,
20... Pump, 19, 22... Valve, 21... New liquid storage tank, 23... Waste liquid collection tank.
Claims (1)
第１の現像槽と第２の現像槽に分け、これら第１
と第２の現像槽にPS版を順次通過させ、前記第
１の現像槽での処理時間は前記第２の現像槽での
処理時間よりも長くし、前記第２の現像槽に用い
た処理液を前記第１の現像槽の処理液として再利
用すると共に、前記第１の現像槽の処理液は、通
常の１浴方式でPS版を現像処理するときに要求
される処理能力の限界を越えた状態以上にPS版
を処理したものを用い、前記第１の現像槽と前記
第２の現像槽を通しての処理液の処理能力の限界
近くまでPS版を処理したとき、前記第１の現像
槽の処理液を排出し、前記第２の現像槽の処理液
を前記第１の現像槽へ移し、前記第２の現像槽へ
新しい処理液を供給することを特徴とするPS版
の現像処理方法。 ２ 第１の現像槽と第２の現像槽とからなる現像
処理部と、第２の現像槽に直結させたガム処理部
と、前記第１と第２の現像槽に順次PS版を通過
させる搬送手段と、新液貯蔵タンクから処理液を
前記第２の現像槽へ供給する手段と、前記第２の
現像槽の処理液を前記第１の現像槽へ移す手段
と、前記第１の現像槽の処理液を廃液回収タンク
へ排出する手段とからなることを特徴とするPS
版の現像処理装置。[Scope of Claims] 1. A developing tank provided upstream of the gum processing section is divided into a first developing tank and a second developing tank, and the first developing tank is divided into a first developing tank and a second developing tank.
and a second developer tank, the processing time in the first developer tank is longer than the processing time in the second developer tank, and the processing used in the second developer tank is In addition to reusing the solution as the processing solution for the first developer tank, the processing solution for the first developer tank can overcome the limits of processing capacity required when developing PS plates using the normal one-bath method. When the PS plate is processed to a point near the limit of the processing capacity of the processing solution through the first developer tank and the second developer tank, the first development A developing process for a PS plate, characterized in that the processing solution in the tank is discharged, the processing solution in the second developer tank is transferred to the first developer tank, and a new processing solution is supplied to the second developer tank. Method. 2. A developing processing section consisting of a first developing tank and a second developing tank, a gum processing section directly connected to the second developing tank, and passing the PS plate sequentially through the first and second developing tanks. a conveying means, a means for supplying the processing liquid from the new liquid storage tank to the second developing tank, a means for transferring the processing liquid from the second developing tank to the first developing tank, and the first developing tank. A PS characterized by comprising means for discharging the treated liquid in the tank to a waste liquid recovery tank.
Plate development processing equipment.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4815479A JPS55140843A (en) | 1979-04-19 | 1979-04-19 | Method and apparatus for developing ps plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4815479A JPS55140843A (en) | 1979-04-19 | 1979-04-19 | Method and apparatus for developing ps plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55140843A JPS55140843A (en) | 1980-11-04 |
| JPS6361659B2 true JPS6361659B2 (en) | 1988-11-29 |
Family
ID=12795444
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4815479A Granted JPS55140843A (en) | 1979-04-19 | 1979-04-19 | Method and apparatus for developing ps plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55140843A (en) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59206830A (en) * | 1983-05-11 | 1984-11-22 | Sanyo Electric Co Ltd | Method for developing resist |
| JPS6064351A (en) * | 1983-09-19 | 1985-04-12 | Fuji Photo Film Co Ltd | Developing method of photosensitive lithographic printing plate |
| JPS622254A (en) * | 1985-06-27 | 1987-01-08 | Fuji Photo Film Co Ltd | Method for developing photosensitive material |
| JPS6259957A (en) * | 1985-09-10 | 1987-03-16 | Fuji Photo Film Co Ltd | Photosensitive material developing device |
| JPS6276342U (en) * | 1985-10-31 | 1987-05-15 | ||
| JPH02138750U (en) * | 1989-11-02 | 1990-11-20 |
-
1979
- 1979-04-19 JP JP4815479A patent/JPS55140843A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55140843A (en) | 1980-11-04 |
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