JPS6356651A - Silver halide photographic sensitive material preventing sweating phenomenon and formation of static mark - Google Patents
Silver halide photographic sensitive material preventing sweating phenomenon and formation of static markInfo
- Publication number
- JPS6356651A JPS6356651A JP20074186A JP20074186A JPS6356651A JP S6356651 A JPS6356651 A JP S6356651A JP 20074186 A JP20074186 A JP 20074186A JP 20074186 A JP20074186 A JP 20074186A JP S6356651 A JPS6356651 A JP S6356651A
- Authority
- JP
- Japan
- Prior art keywords
- group
- silver halide
- examples
- general formula
- groups
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 Silver halide Chemical class 0.000 title claims abstract description 144
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 35
- 239000004332 silver Substances 0.000 title claims abstract description 35
- 239000000463 material Substances 0.000 title claims abstract description 29
- 230000015572 biosynthetic process Effects 0.000 title abstract description 19
- 230000003068 static effect Effects 0.000 title abstract description 17
- 230000035900 sweating Effects 0.000 title abstract description 4
- 150000001875 compounds Chemical class 0.000 claims abstract description 40
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 31
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims abstract description 18
- 229920002396 Polyurea Polymers 0.000 claims abstract description 9
- 239000004814 polyurethane Substances 0.000 claims abstract description 9
- 229920003226 polyurethane urea Polymers 0.000 claims abstract description 9
- 239000000839 emulsion Substances 0.000 claims description 40
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 22
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 3
- 239000010410 layer Substances 0.000 abstract description 42
- 229920000642 polymer Polymers 0.000 abstract description 16
- 230000001681 protective effect Effects 0.000 abstract description 3
- 239000002344 surface layer Substances 0.000 abstract description 3
- 125000002349 hydroxyamino group Chemical group [H]ON([H])[*] 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 description 32
- 125000003118 aryl group Chemical group 0.000 description 30
- 238000000034 method Methods 0.000 description 30
- 239000000243 solution Substances 0.000 description 21
- 238000003786 synthesis reaction Methods 0.000 description 16
- 108010010803 Gelatin Proteins 0.000 description 15
- 229920000159 gelatin Polymers 0.000 description 15
- 239000008273 gelatin Substances 0.000 description 15
- 235000019322 gelatine Nutrition 0.000 description 15
- 235000011852 gelatine desserts Nutrition 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 239000002253 acid Substances 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 125000001931 aliphatic group Chemical group 0.000 description 12
- 238000012545 processing Methods 0.000 description 12
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 11
- 239000000203 mixture Substances 0.000 description 11
- 238000011161 development Methods 0.000 description 10
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 9
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 9
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 9
- 125000003545 alkoxy group Chemical group 0.000 description 9
- 125000004104 aryloxy group Chemical group 0.000 description 9
- 239000003795 chemical substances by application Substances 0.000 description 9
- 125000005843 halogen group Chemical group 0.000 description 9
- 239000006096 absorbing agent Substances 0.000 description 8
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 125000004093 cyano group Chemical group *C#N 0.000 description 8
- 239000000047 product Substances 0.000 description 8
- 125000004442 acylamino group Chemical group 0.000 description 7
- 125000004423 acyloxy group Chemical group 0.000 description 7
- 125000003282 alkyl amino group Chemical group 0.000 description 7
- 125000004414 alkyl thio group Chemical group 0.000 description 7
- 125000001769 aryl amino group Chemical group 0.000 description 7
- 125000005110 aryl thio group Chemical group 0.000 description 7
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- 238000000576 coating method Methods 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- 239000004816 latex Substances 0.000 description 7
- 229920000126 latex Polymers 0.000 description 7
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 description 7
- 239000002244 precipitate Substances 0.000 description 7
- 125000001424 substituent group Chemical group 0.000 description 7
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 6
- 125000002252 acyl group Chemical group 0.000 description 6
- 125000003277 amino group Chemical group 0.000 description 6
- 125000004397 aminosulfonyl group Chemical group NS(=O)(=O)* 0.000 description 6
- 239000007844 bleaching agent Substances 0.000 description 6
- 239000000084 colloidal system Substances 0.000 description 6
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 6
- 239000000975 dye Substances 0.000 description 6
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 6
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 6
- 125000000565 sulfonamide group Chemical group 0.000 description 6
- YSMRWXYRXBRSND-UHFFFAOYSA-N TOTP Chemical compound CC1=CC=CC=C1OP(=O)(OC=1C(=CC=CC=1)C)OC1=CC=CC=C1C YSMRWXYRXBRSND-UHFFFAOYSA-N 0.000 description 5
- 239000006185 dispersion Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000005056 polyisocyanate Substances 0.000 description 5
- 229920001228 polyisocyanate Polymers 0.000 description 5
- 239000011241 protective layer Substances 0.000 description 5
- 238000010992 reflux Methods 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 5
- 125000003944 tolyl group Chemical group 0.000 description 5
- TYKJILJOXAHUFO-UHFFFAOYSA-N 2-amino-1,4-dihydroimidazol-5-one Chemical class NC1=NC(=O)CN1 TYKJILJOXAHUFO-UHFFFAOYSA-N 0.000 description 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 4
- SJOOOZPMQAWAOP-UHFFFAOYSA-N [Ag].BrCl Chemical compound [Ag].BrCl SJOOOZPMQAWAOP-UHFFFAOYSA-N 0.000 description 4
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 4
- 239000012190 activator Substances 0.000 description 4
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 description 4
- 238000004061 bleaching Methods 0.000 description 4
- 229910052801 chlorine Inorganic materials 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 125000001624 naphthyl group Chemical group 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 238000005406 washing Methods 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WVDDGKGOMKODPV-UHFFFAOYSA-N Benzyl alcohol Chemical compound OCC1=CC=CC=C1 WVDDGKGOMKODPV-UHFFFAOYSA-N 0.000 description 3
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 3
- 239000004698 Polyethylene Substances 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 125000000738 acetamido group Chemical group [H]C([H])([H])C(=O)N([H])[*] 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 125000000068 chlorophenyl group Chemical group 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 229910052731 fluorine Inorganic materials 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 239000012948 isocyanate Substances 0.000 description 3
- 125000000468 ketone group Chemical group 0.000 description 3
- 125000004170 methylsulfonyl group Chemical group [H]C([H])([H])S(*)(=O)=O 0.000 description 3
- 125000000951 phenoxy group Chemical group [H]C1=C([H])C([H])=C(O*)C([H])=C1[H] 0.000 description 3
- 125000003356 phenylsulfanyl group Chemical group [*]SC1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 3
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 description 3
- 229920000573 polyethylene Polymers 0.000 description 3
- 239000004848 polyfunctional curative Substances 0.000 description 3
- ADZWSOLPGZMUMY-UHFFFAOYSA-M silver bromide Chemical compound [Ag]Br ADZWSOLPGZMUMY-UHFFFAOYSA-M 0.000 description 3
- FVAUCKIRQBBSSJ-UHFFFAOYSA-M sodium iodide Chemical compound [Na+].[I-] FVAUCKIRQBBSSJ-UHFFFAOYSA-M 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 230000006641 stabilisation Effects 0.000 description 3
- 238000011105 stabilization Methods 0.000 description 3
- 239000003381 stabilizer Substances 0.000 description 3
- 230000000087 stabilizing effect Effects 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- KXDAEFPNCMNJSK-UHFFFAOYSA-N Benzamide Chemical compound NC(=O)C1=CC=CC=C1 KXDAEFPNCMNJSK-UHFFFAOYSA-N 0.000 description 2
- GAWIXWVDTYZWAW-UHFFFAOYSA-N C[CH]O Chemical group C[CH]O GAWIXWVDTYZWAW-UHFFFAOYSA-N 0.000 description 2
- 229920002284 Cellulose triacetate Polymers 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical group C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- OQHCJCYBKMIJHT-UHFFFAOYSA-N N(C1=CC=CC=C1)COC1=CC=C(C=C1)N Chemical group N(C1=CC=CC=C1)COC1=CC=C(C=C1)N OQHCJCYBKMIJHT-UHFFFAOYSA-N 0.000 description 2
- FZERHIULMFGESH-UHFFFAOYSA-N N-phenylacetamide Chemical compound CC(=O)NC1=CC=CC=C1 FZERHIULMFGESH-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical group C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 2
- 125000003668 acetyloxy group Chemical group [H]C([H])([H])C(=O)O[*] 0.000 description 2
- 238000004378 air conditioning Methods 0.000 description 2
- XYXNTHIYBIDHGM-UHFFFAOYSA-N ammonium thiosulfate Chemical compound [NH4+].[NH4+].[O-]S([O-])(=O)=S XYXNTHIYBIDHGM-UHFFFAOYSA-N 0.000 description 2
- 229940101006 anhydrous sodium sulfite Drugs 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 239000002585 base Substances 0.000 description 2
- 125000000043 benzamido group Chemical group [H]N([*])C(=O)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 2
- 125000001231 benzoyloxy group Chemical group C(C1=CC=CC=C1)(=O)O* 0.000 description 2
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 2
- 229910052794 bromium Inorganic materials 0.000 description 2
- DNSISZSEWVHGLH-UHFFFAOYSA-N butanamide Chemical compound CCCC(N)=O DNSISZSEWVHGLH-UHFFFAOYSA-N 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 230000003750 conditioning effect Effects 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 125000004122 cyclic group Chemical group 0.000 description 2
- HJSLFCCWAKVHIW-UHFFFAOYSA-N cyclohexane-1,3-dione Chemical class O=C1CCCC(=O)C1 HJSLFCCWAKVHIW-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 229960002380 dibutyl phthalate Drugs 0.000 description 2
- 238000007720 emulsion polymerization reaction Methods 0.000 description 2
- 235000019441 ethanol Nutrition 0.000 description 2
- 125000006232 ethoxy propyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 125000003754 ethoxycarbonyl group Chemical group C(=O)(OCC)* 0.000 description 2
- NJBWORPRIRNTLH-UHFFFAOYSA-N ethyl 2-(benzenesulfonyl)acetate Chemical compound CCOC(=O)CS(=O)(=O)C1=CC=CC=C1 NJBWORPRIRNTLH-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical group O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- HNQIVZYLYMDVSB-UHFFFAOYSA-N methanesulfonimidic acid Chemical compound CS(N)(=O)=O HNQIVZYLYMDVSB-UHFFFAOYSA-N 0.000 description 2
- 125000001160 methoxycarbonyl group Chemical group [H]C([H])([H])OC(*)=O 0.000 description 2
- 125000002816 methylsulfanyl group Chemical group [H]C([H])([H])S[*] 0.000 description 2
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 125000006678 phenoxycarbonyl group Chemical group 0.000 description 2
- 229920001084 poly(chloroprene) Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 230000001235 sensitizing effect Effects 0.000 description 2
- ZUNKMNLKJXRCDM-UHFFFAOYSA-N silver bromoiodide Chemical compound [Ag].IBr ZUNKMNLKJXRCDM-UHFFFAOYSA-N 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- 229940001482 sodium sulfite Drugs 0.000 description 2
- 235000010265 sodium sulphite Nutrition 0.000 description 2
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 2
- 239000006097 ultraviolet radiation absorber Substances 0.000 description 2
- GBBZLMLLFVFKJM-UHFFFAOYSA-N 1,2-diiodoethane Chemical compound ICCI GBBZLMLLFVFKJM-UHFFFAOYSA-N 0.000 description 1
- XDPKQGKEOCYMQC-UHFFFAOYSA-N 1,2-diphenylpyrazolidine-3,5-dione Chemical compound O=C1CC(=O)N(C=2C=CC=CC=2)N1C1=CC=CC=C1 XDPKQGKEOCYMQC-UHFFFAOYSA-N 0.000 description 1
- UHNIPFHBUDTBTN-UHFFFAOYSA-N 1,3-diethylimidazolidine-2,4-dione Chemical compound CCN1CC(=O)N(CC)C1=O UHNIPFHBUDTBTN-UHFFFAOYSA-N 0.000 description 1
- UHKAJLSKXBADFT-UHFFFAOYSA-N 1,3-indandione Chemical class C1=CC=C2C(=O)CC(=O)C2=C1 UHKAJLSKXBADFT-UHFFFAOYSA-N 0.000 description 1
- ZOBPZXTWZATXDG-UHFFFAOYSA-N 1,3-thiazolidine-2,4-dione Chemical compound O=C1CSC(=O)N1 ZOBPZXTWZATXDG-UHFFFAOYSA-N 0.000 description 1
- ZRHUHDUEXWHZMA-UHFFFAOYSA-N 1,4-dihydropyrazol-5-one Chemical compound O=C1CC=NN1 ZRHUHDUEXWHZMA-UHFFFAOYSA-N 0.000 description 1
- ACUSQXRCSPCTIF-UHFFFAOYSA-N 1-methyl-3-octyl-1,3-diazinane-2,4,6-trione Chemical compound CCCCCCCCN1C(=O)CC(=O)N(C)C1=O ACUSQXRCSPCTIF-UHFFFAOYSA-N 0.000 description 1
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 1
- ZYERRVHLSYUKNR-UHFFFAOYSA-N 2,2-dimethylpropane-1,3-diol;hexane-1,1-diol Chemical compound OCC(C)(C)CO.CCCCCC(O)O ZYERRVHLSYUKNR-UHFFFAOYSA-N 0.000 description 1
- RDMIJQCFPQDYQN-UHFFFAOYSA-N 2-(2,4,4-trimethylpentan-2-yl)benzene-1,4-diol Chemical compound CC(C)(C)CC(C)(C)C1=CC(O)=CC=C1O RDMIJQCFPQDYQN-UHFFFAOYSA-N 0.000 description 1
- VICLBIYQLBCEJV-UHFFFAOYSA-N 2-(ethylamino)ethane-1,1-diol Chemical compound CCNCC(O)O VICLBIYQLBCEJV-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- KVUPQEKUVSNRCD-UHFFFAOYSA-N 2-amino-1,3-oxazol-4-one Chemical compound NC1=NC(=O)CO1 KVUPQEKUVSNRCD-UHFFFAOYSA-N 0.000 description 1
- HYMJHROUVPWYNQ-UHFFFAOYSA-N 2-amino-1,3-thiazol-4-one Chemical compound NC1=NC(=O)CS1 HYMJHROUVPWYNQ-UHFFFAOYSA-N 0.000 description 1
- JKFYKCYQEWQPTM-UHFFFAOYSA-N 2-azaniumyl-2-(4-fluorophenyl)acetate Chemical compound OC(=O)C(N)C1=CC=C(F)C=C1 JKFYKCYQEWQPTM-UHFFFAOYSA-N 0.000 description 1
- TWWCBLSUGOSDIY-UHFFFAOYSA-N 2-ethyl-1,1-dimethylhydrazine Chemical compound CCNN(C)C TWWCBLSUGOSDIY-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- PJOQCYGCTXGPBK-UHFFFAOYSA-N 3-(2-hydroxyethyl)-1,3-thiazolidine-2,4-dione Chemical compound OCCN1C(=O)CSC1=O PJOQCYGCTXGPBK-UHFFFAOYSA-N 0.000 description 1
- FXDMONMBYCWHBU-UHFFFAOYSA-N 3-amino-1,3-thiazolidine-2,4-dione Chemical compound NN1C(=O)CSC1=O FXDMONMBYCWHBU-UHFFFAOYSA-N 0.000 description 1
- IWLAXCIQVRFHQW-UHFFFAOYSA-N 3-ethyl-1,3-oxazolidine-2,4-dione Chemical compound CCN1C(=O)COC1=O IWLAXCIQVRFHQW-UHFFFAOYSA-N 0.000 description 1
- XRZDIHADHZSFBB-UHFFFAOYSA-N 3-oxo-n,3-diphenylpropanamide Chemical compound C=1C=CC=CC=1NC(=O)CC(=O)C1=CC=CC=C1 XRZDIHADHZSFBB-UHFFFAOYSA-N 0.000 description 1
- UOAVOZAOARIKEL-UHFFFAOYSA-N 3-phenyl-1,3-oxazolidine-2,4-dione Chemical compound O=C1COC(=O)N1C1=CC=CC=C1 UOAVOZAOARIKEL-UHFFFAOYSA-N 0.000 description 1
- ZNBNBTIDJSKEAM-UHFFFAOYSA-N 4-[7-hydroxy-2-[5-[5-[6-hydroxy-6-(hydroxymethyl)-3,5-dimethyloxan-2-yl]-3-methyloxolan-2-yl]-5-methyloxolan-2-yl]-2,8-dimethyl-1,10-dioxaspiro[4.5]decan-9-yl]-2-methyl-3-propanoyloxypentanoic acid Chemical compound C1C(O)C(C)C(C(C)C(OC(=O)CC)C(C)C(O)=O)OC11OC(C)(C2OC(C)(CC2)C2C(CC(O2)C2C(CC(C)C(O)(CO)O2)C)C)CC1 ZNBNBTIDJSKEAM-UHFFFAOYSA-N 0.000 description 1
- UQRONKZLYKUEMO-UHFFFAOYSA-N 4-methyl-1-(2,4,6-trimethylphenyl)pent-4-en-2-one Chemical group CC(=C)CC(=O)Cc1c(C)cc(C)cc1C UQRONKZLYKUEMO-UHFFFAOYSA-N 0.000 description 1
- VUUNCMULTZRHHS-UHFFFAOYSA-N 5,5-diethylcyclohexane-1,3-dione Chemical compound CCC1(CC)CC(=O)CC(=O)C1 VUUNCMULTZRHHS-UHFFFAOYSA-N 0.000 description 1
- KHBQMWCZKVMBLN-UHFFFAOYSA-N Benzenesulfonamide Chemical compound NS(=O)(=O)C1=CC=CC=C1 KHBQMWCZKVMBLN-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229940090898 Desensitizer Drugs 0.000 description 1
- MQIUGAXCHLFZKX-UHFFFAOYSA-N Di-n-octyl phthalate Natural products CCCCCCCCOC(=O)C1=CC=CC=C1C(=O)OCCCCCCCC MQIUGAXCHLFZKX-UHFFFAOYSA-N 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- 206010067482 No adverse event Diseases 0.000 description 1
- 101150064053 Rffl gene Proteins 0.000 description 1
- 229910021612 Silver iodide Inorganic materials 0.000 description 1
- DWAQJAXMDSEUJJ-UHFFFAOYSA-M Sodium bisulfite Chemical compound [Na+].OS([O-])=O DWAQJAXMDSEUJJ-UHFFFAOYSA-M 0.000 description 1
- 229940123464 Thiazolidinedione Drugs 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 229960001413 acetanilide Drugs 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 125000004171 alkoxy aryl group Chemical group 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- SWLVFNYSXGMGBS-UHFFFAOYSA-N ammonium bromide Chemical compound [NH4+].[Br-] SWLVFNYSXGMGBS-UHFFFAOYSA-N 0.000 description 1
- 125000002490 anilino group Chemical group [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 125000001204 arachidyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- XNSQZBOCSSMHSZ-UHFFFAOYSA-K azane;2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxymethyl)amino]acetate;iron(3+) Chemical class [NH4+].[Fe+3].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O XNSQZBOCSSMHSZ-UHFFFAOYSA-K 0.000 description 1
- QVQLCTNNEUAWMS-UHFFFAOYSA-N barium oxide Chemical compound [Ba]=O QVQLCTNNEUAWMS-UHFFFAOYSA-N 0.000 description 1
- 229910001864 baryta Inorganic materials 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- WZTQWXKHLAJTRC-UHFFFAOYSA-N benzyl 2-amino-6,7-dihydro-4h-[1,3]thiazolo[5,4-c]pyridine-5-carboxylate Chemical compound C1C=2SC(N)=NC=2CCN1C(=O)OCC1=CC=CC=C1 WZTQWXKHLAJTRC-UHFFFAOYSA-N 0.000 description 1
- 235000019445 benzyl alcohol Nutrition 0.000 description 1
- 125000000440 benzylamino group Chemical group [H]N(*)C([H])([H])C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- BJQHLKABXJIVAM-UHFFFAOYSA-N bis(2-ethylhexyl) phthalate Chemical compound CCCCC(CC)COC(=O)C1=CC=CC=C1C(=O)OCC(CC)CCCC BJQHLKABXJIVAM-UHFFFAOYSA-N 0.000 description 1
- 125000006367 bivalent amino carbonyl group Chemical group [H]N([*:1])C([*:2])=O 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 150000001767 cationic compounds Chemical class 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000012937 correction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 125000001664 diethylamino group Chemical group [H]C([H])([H])C([H])([H])N(*)C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- BADXJIPKFRBFOT-UHFFFAOYSA-N dimedone Chemical compound CC1(C)CC(=O)CC(=O)C1 BADXJIPKFRBFOT-UHFFFAOYSA-N 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000012992 electron transfer agent Substances 0.000 description 1
- 239000003995 emulsifying agent Substances 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 125000000268 heptanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229940091173 hydantoin Drugs 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- NXPHCVPFHOVZBC-UHFFFAOYSA-N hydroxylamine;sulfuric acid Chemical compound ON.OS(O)(=O)=O NXPHCVPFHOVZBC-UHFFFAOYSA-N 0.000 description 1
- 229910000378 hydroxylammonium sulfate Inorganic materials 0.000 description 1
- 239000005457 ice water Substances 0.000 description 1
- PTFYQSWHBLOXRZ-UHFFFAOYSA-N imidazo[4,5-e]indazole Chemical compound C1=CC2=NC=NC2=C2C=NN=C21 PTFYQSWHBLOXRZ-UHFFFAOYSA-N 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000000250 methylamino group Chemical group [H]N(*)C([H])([H])[H] 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000004573 morpholin-4-yl group Chemical group N1(CCOCC1)* 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000007764 o/w emulsion Substances 0.000 description 1
- 125000005447 octyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 125000004430 oxygen atom Chemical group O* 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 125000001037 p-tolyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1*)C([H])([H])[H] 0.000 description 1
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- PBKBURVPAHHUIK-AVUWLFEKSA-N phenyl-[(e)-3-phenyliminoprop-1-enyl]azanium;chloride Chemical compound Cl.C=1C=CC=CC=1N\C=C\C=NC1=CC=CC=C1 PBKBURVPAHHUIK-AVUWLFEKSA-N 0.000 description 1
- 125000000587 piperidin-1-yl group Chemical group [H]C1([H])N(*)C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000002243 precursor Substances 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- MCSKRVKAXABJLX-UHFFFAOYSA-N pyrazolo[3,4-d]triazole Chemical compound N1=NN=C2N=NC=C21 MCSKRVKAXABJLX-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 125000002112 pyrrolidino group Chemical group [*]N1C([H])([H])C([H])([H])C([H])([H])C1([H])[H] 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229940045105 silver iodide Drugs 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- 239000000344 soap Substances 0.000 description 1
- HRZFUMHJMZEROT-UHFFFAOYSA-L sodium disulfite Chemical compound [Na+].[Na+].[O-]S(=O)S([O-])(=O)=O HRZFUMHJMZEROT-UHFFFAOYSA-L 0.000 description 1
- 235000010267 sodium hydrogen sulphite Nutrition 0.000 description 1
- 235000009518 sodium iodide Nutrition 0.000 description 1
- 229940001584 sodium metabisulfite Drugs 0.000 description 1
- 235000010262 sodium metabisulphite Nutrition 0.000 description 1
- 159000000000 sodium salts Chemical class 0.000 description 1
- NHQVTOYJPBRYNG-UHFFFAOYSA-M sodium;2,4,7-tri(propan-2-yl)naphthalene-1-sulfonate Chemical compound [Na+].CC(C)C1=CC(C(C)C)=C(S([O-])(=O)=O)C2=CC(C(C)C)=CC=C21 NHQVTOYJPBRYNG-UHFFFAOYSA-M 0.000 description 1
- HIEHAIZHJZLEPQ-UHFFFAOYSA-M sodium;naphthalene-1-sulfonate Chemical compound [Na+].C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 HIEHAIZHJZLEPQ-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007962 solid dispersion Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 125000005420 sulfonamido group Chemical group S(=O)(=O)(N*)* 0.000 description 1
- 150000003871 sulfonates Chemical class 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 125000004434 sulfur atom Chemical group 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 229920001059 synthetic polymer Polymers 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 239000000052 vinegar Substances 0.000 description 1
- 235000021419 vinegar Nutrition 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
- G03C1/85—Photosensitive materials characterised by the base or auxiliary layers characterised by antistatic additives or coatings
- G03C1/89—Macromolecular substances therefor
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- General Physics & Mathematics (AREA)
Abstract
Description
【発明の詳細な説明】
[産業上の利用分野]
本発明はハロゲン化銀写真感光材料(以下、「写真感光
材料」と称す)に関し、特にポリマー紫外線吸収剤を含
有せしめることにより表面性状への悪影響がなく、スタ
チックマークが改良された写真感光材料にPAする。[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to a silver halide photographic material (hereinafter referred to as a "photographic material"), and in particular, the present invention relates to a silver halide photographic material (hereinafter referred to as a "photographic material"). To PA a photographic light-sensitive material with no adverse effects and improved static marks.
[発明の背景]
写真感光材料はポリエチレンテレフタレートフィルム又
はポリエチレン等で被覆されたラミネート紙のように比
較的電気絶縁性の高い支持体上に、感光性写真乳剤が塗
布されているので、感光材料の製造工程中、使用時等に
静電電荷の蓄積が原因となって空中放電による放電火花
を発生し、現象処理後に樹枝状等の様々な形の画像欠陥
、いわゆるスタチックマークを生じ、商品両値を著しく
損ねることがある。[Background of the Invention] Photographic materials are made by coating a light-sensitive photographic emulsion on a support with relatively high electrical insulation, such as polyethylene terephthalate film or laminated paper coated with polyethylene. During the manufacturing process, during use, etc., the accumulation of electrostatic charges causes sparks to be generated due to air discharge, and after the phenomenon is processed, various image defects such as dendritic marks, so-called static marks, are produced, which may cause damage to both products. It may significantly reduce the value.
従来、紫外線吸収剤により、特に300〜400nmの
紫外線光を遮光することによりスタチックマーク発生を
防止する試みがなされてきた。Conventionally, attempts have been made to prevent the generation of static marks by blocking ultraviolet light, particularly in the wavelength range of 300 to 400 nm, using ultraviolet absorbers.
我々は、紫外線吸収剤として、特公昭55−12586
号、特開昭53−97425号、同53−133033
号、同53−131837号、同 53−134431
号、同59−109444、R1D、 18032号
、特開昭54−18727号、英国特許2,083,2
39号、同2,083,240号、特開昭53−129
633号、英国特許2,083,241号、***特許出
願(OLS)2、118.798号、英国特許1,19
8,337号、米国特許3.745,010号、特開昭
54−95233号に記載の化合物を添加してみたが、
スタチック防止効果が不充分であること、及び写真感光
材料の表面にオイル状物あるいは粉末結晶状物が出瑛す
る発汗現象を見い出した。As ultraviolet absorbers, we use
No., JP-A-53-97425, JP-A No. 53-133033
No. 53-131837, No. 53-134431
No. 59-109444, R1D, No. 18032, JP-A-54-18727, British Patent No. 2,083,2
No. 39, No. 2,083,240, JP-A-53-129
No. 633, British Patent No. 2,083,241, West German Patent Application (OLS) No. 2, 118.798, British Patent No. 1,19
I tried adding the compounds described in No. 8,337, U.S. Patent No. 3,745,010, and JP-A-54-95233, but
It has been found that the static prevention effect is insufficient and that a sweating phenomenon occurs in which an oily substance or a powdery crystalline substance appears on the surface of the photographic light-sensitive material.
[発明の目的コ
本発明の目的は、発汗現象を生ずることなく、スタチッ
クマーク発生を防止した写真感光材料を提供することに
ある。[Object of the Invention] An object of the present invention is to provide a photographic material that does not cause the sweating phenomenon and prevents the generation of static marks.
[発明の構成コ
本発明者らは上記目的を達成すべく鋭意研究の結果、支
持体上に少なくとも1層の感光性ハロゲン化銀乳剤層を
有するハロゲン化銀写真感光材料において、下記一般式
[A]で示される反復構造単位を含むポリウレタン又は
ポリ尿素を含有するハロゲン化銀写真感光材料によって
上記目的を達成しうろことを見い出した。[Structure of the Invention] As a result of intensive research in order to achieve the above object, the present inventors have found that a silver halide photographic material having at least one light-sensitive silver halide emulsion layer on a support has the following general formula [ It has been found that the above object can be achieved by a silver halide photographic material containing a polyurethane or polyurea containing a repeating structural unit represented by A].
一般式[A]
Q−+Y始−
式中、Qは紫外線吸収性化合物の0価の残塁を表わし、
Yは一〇−または−NRo−を表わし、Roは水素原子
、アルキル基、シクロアルキル基またはフェニル基を表
わし、nは2〜4の整数である。General formula [A] Q−+Y starts− In the formula, Q represents a zero-valent residue of the ultraviolet absorbing compound,
Y represents 10- or -NRo-, Ro represents a hydrogen atom, an alkyl group, a cycloalkyl group or a phenyl group, and n is an integer of 2 to 4.
[発明の具体的構成コ
一般式[A]で表わされる反復構造単位を含むポリウレ
タンまたはポリ尿素として好ましいのは、下記一般式[
B]または一般式[C]で表わされる反復構造単位を有
するものである。[Specific Constitution of the Invention] Preferred polyurethanes or polyureas containing repeating structural units represented by general formula [A] are those represented by the following general formula [
B] or a repeating structural unit represented by the general formula [C].
一般式[B]
式中、Zlはp +11のイソシアナート基を有するイ
ソシアナート化合物のp + 11ffiの残基を表わ
し、pは1以上の整数であり、Y+’、Y2及びYsは
それぞれ一〇−又は−NRo−を表わし、Ro 、Q及
びnは一般式[/MにおけるRo、Q及びnと同義であ
る。General formula [B] In the formula, Zl represents a p + 11ffi residue of an isocyanate compound having p + 11 isocyanate groups, p is an integer of 1 or more, and Y+', Y2, and Ys are each 10 - or -NRo-, and Ro, Q and n have the same meanings as Ro, Q and n in the general formula [/M.
一般式[C]
式中、Y4 、Ys及びYsはそれぞれ一〇−又1、t
−NRo−’T’あり、Z2 G、tY4 、Ys 及
UYsを合わせてq+1@有するポリヒドロキシ、ポリ
アミノまたはヒドロキシ−アミノ化合物のQ+1価の残
基を表わし、qは1以上の整数であり、Ro、Q及びn
は一般式[A]におけるRo 、 Q及びnと同義であ
る。General formula [C] In the formula, Y4, Ys and Ys are respectively 10- or 1, t
-NRo-'T' represents a Q+1-valent residue of a polyhydroxy, polyamino or hydroxy-amino compound having q+1@ together of Z2 G, tY4, Ys and UYs, q is an integer of 1 or more, and Ro , Q and n
are synonymous with Ro, Q and n in general formula [A].
一般式[A]、一般式[B]及び一般式[C]において
、Roで表わされるアルキル基としては好ましくは炭素
数1〜6のものく例えばメチル基、ブチル基、ヘキシル
基)が挙げられ、シクロアルキル基としては5〜7員の
もの(例えばシクロペンチル基、シクロヘキシル基)が
挙げられる。In the general formula [A], the general formula [B] and the general formula [C], the alkyl group represented by Ro preferably has 1 to 6 carbon atoms (eg, methyl group, butyl group, hexyl group). Examples of the cycloalkyl group include 5- to 7-membered ones (eg, cyclopentyl group, cyclohexyl group).
一般式[8]で表わされる反復構造単位を有するポリウ
レタンまたはポリ尿素は、一般式[8]で表わされる反
復構造単位の池に、更に(Y・−);2(N HCO≠
。A polyurethane or polyurea having a repeating structural unit represented by the general formula [8] further contains (Y・−);2(NHCO≠
.
(Y7 、Ya 、Ys 、Z4 、n及びpはそれぞ
れ一般式[B]におけるY+ 、Y2 、Ys 、l+
、n及びpと同義であり、Z3はY7 、Ya及びY
sを合計n([1有する化合物のn%の残基を表わす。(Y7, Ya, Ys, Z4, n and p are respectively Y+, Y2, Ys, l+ in general formula [B]
, n and p, Z3 is Y7, Ya and Y
s represents n% residues of the compound with a total of n([1).
)で表わされる反復構造単位を有していてもよい。) may have a repeating structural unit.
又、一般式[C]で表わされる反復構造単位を有するポ
リウレタンまたはポリ尿素は一般式[C]で表わされる
反復構造単位の他に、更に(式中、Y+o、 Y++
、 YI2. Z6 、 n及びqはそれぞれ一般式[
C]におけるY+、Ys 、Ys、Z2 、n及びqと
同義であり、z5はnvJAのイソシアナート基を有す
るイソシアナート化合物のn圃の残塁を表わす。)で表
わされる反復構造単位を有していてもよい。In addition, polyurethane or polyurea having a repeating structural unit represented by the general formula [C] may further include (in the formula, Y+o, Y++
, YI2. Z6, n and q each have the general formula [
It has the same meaning as Y+, Ys, Ys, Z2, n and q in [C], and z5 represents the remaining base of n field of the isocyanate compound having an isocyanate group of nvJA. ) may have a repeating structural unit.
一般式[A]で表わされる反復構造単位を含むポリウレ
タンまたはポリ尿素はポリイソシアナート化合物とポリ
ヒドロキシ化合物、ポリアミノ化合物またはヒドロキシ
−アミノ化合物との反応(但し、ポリイソシアナート化
合物並びに該ポリイソシアナート化合物と反応するポリ
ヒドロキシ化合物、ポリアミノ化合物又はヒドロキシ−
アミノ化合物の少なくとも一方は紫外線吸収性部分を有
する。)により得ることができる。A polyurethane or polyurea containing a repeating structural unit represented by the general formula [A] is obtained by reacting a polyisocyanate compound with a polyhydroxy compound, a polyamino compound, or a hydroxy-amino compound (however, the polyisocyanate compound and the polyisocyanate compound Polyhydroxy compounds, polyamino compounds or hydroxy-
At least one of the amino compounds has an ultraviolet absorbing moiety. ) can be obtained by
本発明のポリウレタンまたはポリ尿素は好ましくは
一般式[DI
z7+NC○)、+1
(式中、Z7及びpは一般式[B]におけるZl及びp
と同義である。)で表わされるイソシアナート化合物と
一般式[E]
Q+Y H)h
(式中、Q、Y及びnはそれぞれ一般式[A]における
Q、Y及びnと同義であり、n個のYHは同一でも異な
っていてもよい。)で表わされる紫外線吸収性化合物と
の重付加反応により得ることができる。The polyurethane or polyurea of the present invention preferably has the general formula [DI z7+NC○), +1 (wherein Z7 and p are Zl and p in the general formula [B]
is synonymous with ) and the general formula [E] Q+Y H)h (wherein, Q, Y and n are respectively synonymous with Q, Y and n in the general formula [A], and n YHs are the same) ) can be obtained by a polyaddition reaction with an ultraviolet absorbing compound represented by the following.
一般式[DIで表わされるイソシアナート化合D−I
D−20CN
(C)(2)2NCO0CN(CH,)、NGOD−3
D−4
0CN(CH,)、NCO0CN(CH,)、NGOD
−5D−6
0CN(CH2)SC(CH2)SNCOD−9
D−10D−il
D−12一般式[E]で表わさ
れる紫外線吸収性化合物としては、好ましくは下記一般
式[I]〜[rX]で表わされるものが挙げられる。Isocyanate compound DI represented by the general formula [DI
D-20CN
(C) (2) 2NCO0CN (CH,), NGOD-3
D-4 0CN(CH,), NCO0CN(CH,), NGOD
-5D-6 0CN(CH2)SC(CH2)SNCOD-9
D-10D-il
D-12 Preferable examples of the ultraviolet absorbing compound represented by the general formula [E] include those represented by the following general formulas [I] to [rX].
一般式[I]
式中、R111〜R111jは、それぞれ水素原子、ハ
ロゲン原子、炭素数1〜22のアルキルN(例えばメチ
ル基、ブチル基、t−ブチル基、5ec−ブチル基、(
−オクチル基、2−エチルヘキシル基、n−ドデシル基
等)、アルコキシ基(倒えばメトキシ基、ペンチルオキ
シ基、5ec−オクチルオキシ基等)、アリール基(例
えばフェニル基、ナフチル基等)、アリールオキシ基(
例えばフェノキシ基、ナフトキシ基等)、アシル基(例
えばアセチル基、ヘプタノイル基、ベンゾイル基等)、
アミン基またはニドO基を示す。General formula [I] In the formula, R111 to R111j are each a hydrogen atom, a halogen atom, an alkyl N having 1 to 22 carbon atoms (for example, a methyl group, a butyl group, a t-butyl group, a 5ec-butyl group,
-octyl group, 2-ethylhexyl group, n-dodecyl group, etc.), alkoxy group (methoxy group, pentyloxy group, 5ec-octyloxy group, etc.), aryl group (e.g. phenyl group, naphthyl group, etc.), aryloxy Group (
For example, phenoxy group, naphthoxy group, etc.), acyl group (for example, acetyl group, heptanoyl group, benzoyl group, etc.),
Indicates an amine group or a nido O group.
これらの各基は置換基を有するものを包含し、該置換基
の例としてはアシルアミノアリール基、アルコキシアリ
ール基、ヒドロキシ基、ヒトミキシアルキル基、アルキ
ル基が挙げられる。Each of these groups includes those having a substituent, and examples of the substituent include an acylaminoaryl group, an alkoxyaryl group, a hydroxy group, a human mixyalkyl group, and an alkyl group.
R+u〜R1,?は全体として、少なくとも2つのYH
基(Yは前述のものと同義)を有する。R+u~R1,? is a total of at least two YH
group (Y is as defined above).
一般式[I[]
式中R1は脂肪族基又はアリール基を表わし、R2、R
3、R4及びR5はそれぞれ水素原子、脂肪族基又はア
リール基を表わす。General formula [I[] In the formula, R1 represents an aliphatic group or an aryl group, R2, R
3, R4 and R5 each represent a hydrogen atom, an aliphatic group or an aryl group.
Ylは酸素原子、硫黄原子、エチレン基又はメチレン基
を表わす。Yl represents an oxygen atom, a sulfur atom, an ethylene group or a methylene group.
■1及びW1ノはそれぞれ水素原子−CN。■1 and W1 are each a hydrogen atom -CN.
−COR6、−COOR’ 、−3O2R8、ここでR
6、R7及びR8はそれぞれ脂肪族基又はアリール基を
表わし、R9、R10、R11及びR12はそれぞれ水
素原子、脂肪族基又はアリール基を表わし、R9とR1
0及びR11とR12はそれぞれ互いに連結して環を形
成してもよい。R1、R2、R3、R4、R5、■1及
びWlは全体として少なくとも2つのYH基(Yは前述
のものと同!i)を有する。-COR6, -COOR', -3O2R8, where R
6, R7 and R8 each represent an aliphatic group or an aryl group, R9, R10, R11 and R12 each represent a hydrogen atom, an aliphatic group or an aryl group, and R9 and R1
0, R11, and R12 may be connected to each other to form a ring. R1, R2, R3, R4, R5, 1 and W1 as a whole have at least two YH groups (Y is the same as above!i).
式中R21は脂肪族基又はアリール基を表わす。In the formula, R21 represents an aliphatic group or an aryl group.
を表わす。R2m、R2コ′、R23及びR23′ は
それぞれ水素原子、脂肪族基又はアリール基を表わす。represents. R2m, R2co', R23 and R23' each represent a hydrogen atom, an aliphatic group or an aryl group.
R22とR23は連結してベンゼン環又はナフタレン環
を形成してもよい。R22 and R23 may be connected to form a benzene ring or a naphthalene ring.
わし、ここでRz令は水素原子又はア7.キル基を表わ
す。I, Rz order here is a hydrogen atom or a7. Represents a kill group.
V2 及びW2 はそtLFれ−CN、−COR25″
、\R29
\R31
R29はそれぞれ脂肪族基又はアリール基を表わし、R
4、R)9、R3°及びR3/はそれぞれ水素原子、脂
肪族基又はアリール基を表わし、R2?とR2’?、及
びR30とR3/はそれぞれ連結して環を形成して・′
Z・:
もよい。更にV2とW2は連結して −゛ 1環−’
7.−’
を形成してもよく、ここで71は5員又は6員の酸性ケ
ト環を形成するに必要な非金属原子群を表わす。R、R
、R、V2及びW2は全体として少なくとも2つのYH
基(Yは前述のものと同義)を有する。V2 and W2 are LF -CN, -COR25''
, \R29 \R31 R29 each represents an aliphatic group or an aryl group, and R
4, R) 9, R3° and R3/ each represent a hydrogen atom, an aliphatic group or an aryl group, and R2? and R2'? , and R30 and R3/ are each connected to form a ring,
Z: Good. Furthermore, V2 and W2 are connected to -゛ 1 ring-'
7. -' may be formed, where 71 represents a group of nonmetallic atoms necessary to form a 5- or 6-membered acidic keto ring. R, R
, R, V2 and W2 collectively represent at least two YH
group (Y is as defined above).
一般式[rV]
″ ’t” 、R43及びR+弘はそれぞれ水素式中
R、R
原子、ハロゲン原子、アルキル基、アルコキシ基、アリ
ール基、アリールオキシ基、アルキルチオ基、アリール
チオ基、アミン基、アルキルアミノ基、アリールアミノ
基、ヒドロキシ基、シアノ基、アシルアミノ基、カルバ
モイル基、アシル基、スルホニル基、スルファモイル基
、スルホンアミド基、アシルオキシ基、又はオキシカル
ボニル基を表わし、R41とR42、R43とR++又
はR惇とR4′はそれぞれ連結して5〜6員環を形成し
てもよい。General formula [rV] ``'t'', R43 and R + Hiroshi are hydrogen formulas R, R atom, halogen atom, alkyl group, alkoxy group, aryl group, aryloxy group, alkylthio group, arylthio group, amine group, alkyl Represents an amino group, arylamino group, hydroxy group, cyano group, acylamino group, carbamoyl group, acyl group, sulfonyl group, sulfamoyl group, sulfonamido group, acyloxy group, or oxycarbonyl group, R41 and R42, R43 and R++ or R and R4' may each be connected to form a 5- to 6-membered ring.
Z2は5員又は6員の酸性ケト環を形成するに必要な非
金属原子群を表わす。Z2 represents a group of nonmetallic atoms necessary to form a 5- or 6-membered acidic keto ring.
R41、R42、R43、R”及ヒZ2 ニJ:す形成
される環は全体として少なくとも2つのYH基(Yは前
述のものと同義)を有する。The ring formed by R41, R42, R43, R'' and HZ2 has at least two YH groups as a whole (Y is as defined above).
一般式[V]
式中R”、R”、RB 、 pr4−1R5、R2、R
、R、R及びR12はそれぞれ水素原子、59
m 61
ハロゲン原子、アルキル基、アリール基、アルコキシ基
、アリールオキシ基、アルキルチオ基、アリールチオ基
、アミノ基、アルキルアミノ基、アリールアミノ基、ヒ
ドロキシ基、シアノ基、アシルアミノ基、カルバモイル
ニル基、スルファモイル填、スルホンアミド基、アシル
オキシ基又はオキシカルボニル基を表わし、Rffl
トR.!l;l、R53トRS4、Rs4トR5ゝ、8
寸とn sc16(3
R 、R とR 及びR″とR乙2はそれぞれ連結
して5〜6員環を形成してもよい。General formula [V] where R", R", RB, pr4-1R5, R2, R
, R, R and R12 are each a hydrogen atom, 59
m 61 Halogen atom, alkyl group, aryl group, alkoxy group, aryloxy group, alkylthio group, arylthio group, amino group, alkylamino group, arylamino group, hydroxy group, cyano group, acylamino group, carbamoylnyl group, sulfamoyl filling , represents a sulfonamide group, an acyloxy group or an oxycarbonyl group, and Rffl
ToR. ! l;l, R53, RS4, Rs4, R5ゝ, 8
and n sc16 (3 R , R and R , and R″ and R 2 may be respectively connected to form a 5- to 6-membered ring.
R′6及びR1はそれぞれ水素原子、アルキル基又はア
リール基を表わす。R'6 and R1 each represent a hydrogen atom, an alkyl group or an aryl group.
但しR=t 、RE2、RS3、R5俗、R′、R5′
、R5装RSg, R1;1、R≦0、R11及びRど
2は全体として少なくとも2つのYH基(Yは前述のも
のと同義)を有する。However, R=t, RE2, RS3, R5 common, R', R5'
, R5-RSg, R1;1, R≦0, R11 and R2 collectively have at least two YH groups (Y is as defined above).
一般式[VI]
式中R100は水素原子、アシル基、カルバモイル基、
脂肪族基又はアリール基を表わす。General formula [VI] In the formula, R100 is a hydrogen atom, an acyl group, a carbamoyl group,
Represents an aliphatic group or an aryl group.
R101、R102及びR103はそれぞれ水素原子、
ハロゲン原子、アルキル基、アリール基、アシル基、ス
ルホニル基、アルコキシ基、アリールオキシ基、アルキ
ルチオ基、アリールチオ基、アミLLアルキルアミノ基
、カルバモイル基、アリールアミノ基、ヒドロキシ基、
シアノ基、アシルアミ/M。R101, R102 and R103 are each a hydrogen atom,
Halogen atom, alkyl group, aryl group, acyl group, sulfonyl group, alkoxy group, aryloxy group, alkylthio group, arylthio group, amiLL alkylamino group, carbamoyl group, arylamino group, hydroxy group,
Cyano group, acylami/M.
スルファモイル基、スルホンアミド基、アシルオキシ基
又はオキシカルボニル基を表わす。It represents a sulfamoyl group, a sulfonamide group, an acyloxy group or an oxycarbonyl group.
R100、Rj0′、R′。2及びR″3及び一般式[
VI]中の2つのベンゼン環は全体として少なくとも2
つのYH基(Yは前述のものと同義)を有する。R100, Rj0', R'. 2 and R″3 and general formula [
VI], the two benzene rings in total are at least 2
YH groups (Y is as defined above).
一般式[T[1、[IIIa ]、[mb ]、[TV
]、[V]及び[VI]においてR1及びR2/で示さ
れる脂肪族基は飽和でも不飽和でもよく、好ましくは炭
素数1〜1oのものであり、置換基を有していてもよく
、具体的にはメチル、エチル、n−ペンチル、イソヘキ
シル等の非@換のアルキル基、2−ヒドロキシプロピル
、ベンジル、フェネチル、エトキシカルボニルエチル
チル、2,3.3−テトラフルオロプロピル、アリル等
の各基が挙げられる。R1及びR 21で示されるアリ
ール基の例としてはフェニル、p−hリル等の各基が挙
げられる。General formula [T[1, [IIIa], [mb], [TV
], [V] and [VI], the aliphatic groups represented by R1 and R2/ may be saturated or unsaturated, preferably have 1 to 1 o carbon atoms, and may have a substituent, Specifically, non-@-substituted alkyl groups such as methyl, ethyl, n-pentyl, isohexyl, 2-hydroxypropyl, benzyl, phenethyl, ethoxycarbonylethyl, 2,3,3-tetrafluoropropyl, allyl, etc. Examples include groups. Examples of the aryl group represented by R1 and R21 include phenyl, ph-lyl, and the like.
R100で示される脂肪族基は飽和でも不飽和でもよく
、好ましくは炭素数1〜1oの直鎖・分岐並びに環状の
ものであり、置換基を有していてもよく、具体的にはメ
チル−エチル、2−エチルヘキシル、シクロヘキシル等
の非置換のアルキル基、2−ヒドロキシプロピル、ベン
ジル、エトキシカルボニルエチル、アリル等の各基が挙
げられ、アリール基の例としてはフェニル、トリル等の
各基、アシル基の例としてはアセチル、ベンゾイル等の
各基、カルバモイル
イル
れる。The aliphatic group represented by R100 may be saturated or unsaturated, preferably linear, branched, or cyclic with 1 to 1 carbon atoms, and may have a substituent, specifically methyl- Examples of aryl groups include unsubstituted alkyl groups such as ethyl, 2-ethylhexyl, and cyclohexyl; 2-hydroxypropyl, benzyl, ethoxycarbonylethyl, and allyl; examples of aryl groups include phenyl, tolyl, and other groups; Examples of the group include acetyl, benzoyl and other groups, and carbamoyl.
R 2 、 R 3 、 R 4 、 R
5 、 R 6 、 R フ 、 R 8
、= 23 5
R9、R10、R11、R12、R 、R 、R
。R2, R3, R4, R
5, R6, Rfu, R8
, = 23 5 R9, R10, R11, R12, R , R , R
.
R′:L6、R2’7 、 RJ 、R1? 、R30
及びR3/で示される脂肪族基としては炭素数1〜20
のアルキル基であり、置換基を有していても良い。具体
的にはメチル、エチル、(−ブチル、2−エチルヘキシ
ル、sec−ドデシル等の非置換の基、及びとドロキシ
エチル、ベンジル、カルバモイルメチル、メトキシエチ
ル、アリル等の各基が挙げられる。アリール基の例とし
てはフェニル、p−1リル、m−アミノフェニル、p−
メトキシフェニル、p−ドデシルオキシフェニル、−一
エトキシ力ルポニルフェニル等の各基が挙げられる。R': L6, R2'7, RJ, R1? , R30
and the aliphatic group represented by R3/ has 1 to 20 carbon atoms.
is an alkyl group, and may have a substituent. Specific examples include unsubstituted groups such as methyl, ethyl, (-butyl, 2-ethylhexyl, sec-dodecyl, etc.), and groups such as droxyethyl, benzyl, carbamoylmethyl, methoxyethyl, and allyl. Examples include phenyl, p-1lyl, m-aminophenyl, p-
Examples include methoxyphenyl, p-dodecyloxyphenyl, -monoethoxyluponylphenyl, and the like.
R9とRIO,R++とR12、R28とR29及びR
30とR31が連結して形成する環としては例えばモ
ルホリン、ピペリジン、ビOリジン等の環が挙げられる
。R9 and RIO, R++ and R12, R28 and R29 and R
Examples of the ring formed by linking 30 and R31 include rings such as morpholine, piperidine, and bi-Olysine.
R22とR13が連結して形成するベンゼン環及びナフ
タレン環は置換基を有していても良(、置換基の例とし
てはメチル、フッ素、塩素、メトキシ、フェニル、カル
バモイル
ルボキシ、ヒドロキシ、フェニルオキシ等の各基が挙げ
られる。The benzene ring and naphthalene ring formed by connecting R22 and R13 may have a substituent (examples of substituents include methyl, fluorine, chlorine, methoxy, phenyl, carbamoylrboxy, hydroxy, phenyloxy). The following groups are mentioned.
R24、R′6及びR5qで示されるアルキル基の例と
してはメチル、エチル、ベンジル等の各基が挙げられる
。Examples of the alkyl group represented by R24, R'6 and R5q include methyl, ethyl, benzyl and the like.
R5C及び鹸qで示されるアリール基の例としてはフェ
ニル、p−トリル等の基が挙げられる。Examples of the aryl group represented by R5C and Kenq include groups such as phenyl and p-tolyl.
R4−’ 、R”、R43 、R44′、R″f,R5
′〜R5、gに2 101 1o2
R −R 、R 、R 及びR″3で示される
ハロゲン原子の例としてはフッ素、塩素、臭素等の各原
子が挙げられ、アルキル基の例としてはメチル、エチル
、n−プロピル、メトキシエチル、ヒドロキシエチル、
クロロプロピル、ベンジル、シアンエチル、カルボキシ
エチル等の各基が挙げられ、アリール基の例としてはフ
ェニル、トリル、メシチル、クロロフェニル等の各基、
アルコキシ基の例としてはメトキシ、エトキシ、オクチ
ルオキシ、2−エチルへキシルオキシ、メトキシエトキ
シ等の各基、アリールオキシ基の例としてはフェノキシ
、4−メチルフェノキシ等の各基、アルキルチオ基の例
としてはメチルチオ、プロピルチオ等の各基、アリール
チオ旦の例としてはフェニルチオ基、アルキルアミノ基
の例としてはメチルアミン、ジメチルアミノ、エチルア
ミノ、ベンジルアミノ、ジアリルアミノ、シアノエチル
アミノ等の各基、アリールアミノ基の例としてはアニリ
ノ、アニシジン、トルイジノ、ジフェニルアミノ等の各
基、アシルアミノ基の例としてはアセチルアミノ、ベン
ゾイルアミノ等の各基、カルバモイル基の例としてはメ
チルカルバモイル、ジメチルカルバモイル等の各基、ア
シル基の例としてはアセチル、ベンゾイル等の各基、ス
ルホニル基の例としてはメチルスルホニル、フェニルス
ルホニル等の各基、スルファモイル基の例としてはエチ
ルスルファモイル、ジメチルスルファモイル等の各基、
スルホンアミド基の例としてはメタンスルホンアミド、
ベンゼ〕/スルホンアミド等の各基、アシルオキシ基の
例としてはアセトキシ、ベンゾイルオキシ等の各基、オ
キシカルボニル基の例としてはメトキシカルボニル、エ
トキシカルボニル、フェノキシカルボニル等の各基が挙
げられる。R4-', R", R43, R44', R"f, R5
Examples of halogen atoms represented by 2 101 1o2 R -R , R , R and R''3 in '~R5, g include fluorine, chlorine, bromine, etc. Examples of alkyl groups include methyl, ethyl, n-propyl, methoxyethyl, hydroxyethyl,
Examples of aryl groups include chloropropyl, benzyl, cyanethyl, carboxyethyl, etc., and examples of aryl groups include phenyl, tolyl, mesityl, chlorophenyl, etc.
Examples of alkoxy groups include methoxy, ethoxy, octyloxy, 2-ethylhexyloxy, and methoxyethoxy; examples of aryloxy groups include phenoxy and 4-methylphenoxy; examples of alkylthio groups include Examples of arylthio groups include phenylthio groups; examples of alkylamino groups include methylamine, dimethylamino, ethylamino, benzylamino, diallylamino, and cyanoethylamino groups; Examples include groups such as anilino, anisidine, toluidino, and diphenylamino; examples of acylamino groups include groups such as acetylamino and benzoylamino; examples of carbamoyl groups include groups such as methylcarbamoyl and dimethylcarbamoyl; and acyl groups. Examples of groups include acetyl and benzoyl; examples of sulfonyl groups include methylsulfonyl and phenylsulfonyl; examples of sulfamoyl groups include ethylsulfamoyl and dimethylsulfamoyl;
Examples of sulfonamide groups include methanesulfonamide,
Examples of the acyloxy group include acetoxy and benzoyloxy, and examples of the oxycarbonyl group include methoxycarbonyl, ethoxycarbonyl, and phenoxycarbonyl.
4、1+2.+34444 ぜ S/R とR
、R とR 、R とR 、R とRSミ
、RS3とR絡、R外とR町、R3とR5う、R′とR
6°及びR6/とR62がそれぞれ連結して形成する基
としてはメチレンジオキシ、テトラメチレン、トリメチ
レン等の各基が挙げられる。4, 1+2. +34444 Ze S/R and R
, R and R, R and R, R and RS Mi, RS3 and R connection, R outside and R town, R3 and R5, R' and R
Examples of the group formed by linking 6°, R6/ and R62 include methylenedioxy, tetramethylene, trimethylene and the like.
Zl及びZ2で形成される5員又は6員の酸性ケト環と
しては1,3−インダンジオン核、バルビッール酸核(
例えばバルビッール酸、1−フェニルバルビッール酸、
1−メチル−3−オクチルバルビッール酸など)、2−
チオバルビッール酸根(例えば2−チオバルビッール酸
、1−エチル−3−デシル−2−チオバルビッール酸な
ど)、シクロヘキサン−1,3−ジオン核(例えばジメ
ドン−5,5−ジエチルシクロヘキサン−1,3−シオ
ンなど)、2.4−ジアザ−1−アルコキシ−3,5−
ジオキソシクロヘキセン核(例えば2.4−ジアザ−1
−エトキシ−4−[3−(2゜4−ジーtert−アミ
ルフェノキシ)プロピル]−3,5−ジオキソシクロヘ
キセン等)、2.4−チアゾリジンジオン核(例えば3
−フェニル−2゜4−チアゾリジンジオン、3−(2−
ヒドロキシエチル)−2,4−チアゾリジンジオン、3
−アミノ−2,4−チアゾリジンジオンなど)、2−イ
ミノチアゾリジン−4−オン核(例えば2−)工二ルイ
ミノチアゾリジンー4−オン、3−フェニル−2−デシ
ルイミノチアゾリジン−4−オン、3−エチル−2−[
3−(2,4−ジーtert−アミルフェノキシ)ブロ
ビルイミノコチアゾリジン−4−オンなど)、ヒダント
イン核(例えばヒダントイン、1,3−ジエチルヒダン
トイン、1−オクチル−3−フェニルヒダントインなど
〉、2゜4−オキサゾリジンジオン核(例えば3−エチ
ル−2,4−オキサゾリジンジオン、3−フェニル−2
,4−オキサゾリジンジオンなど)、2−イミノオキサ
ゾリジン−4−オン核(例えば3−エチル−2−イミノ
オキサゾリジン−4−オン、3−フェニル−2−エチル
イミノオキサゾリジン−4−オン、3−エチル−2−フ
ェニルイミノオキサゾリジン−4−オン、3−エチル−
2−[3−(2,4−ジーtert−アミルフェノキシ
)プロピルイミノ]オキサゾリジン−4−オンなど)、
2−イミノイミダゾリジン−4−オン核(例えば2−イ
ミツー1,3−ジエチルイミダゾリジン−4−オン、2
−デシルイミノ−1−エチル−3−フェニルイミダゾリ
ジン−4−オン、2−フェニルイミノ−1−フェニル−
3−シクロヘキシルイミダゾリジン−4−オン、1,3
−ジエチル−2−[3−(2,4−ジーtert−アミ
ルフェノキシ)プロピルイミノ]イミダゾリジン−4−
オンなど)、イソオキサシロン核(例えば3−フェニル
−5−イソオキサシロン、3−メチル−5−イソオキサ
シロンなど)が挙げられる。The 5- or 6-membered acidic keto ring formed by Zl and Z2 includes a 1,3-indanedione nucleus, a barbylic acid nucleus (
For example, barbylic acid, 1-phenylbarbylic acid,
1-methyl-3-octylbarbic acid, etc.), 2-
Thiobarbylic acid radical (e.g. 2-thiobarbylic acid, 1-ethyl-3-decyl-2-thiobarbylic acid, etc.), cyclohexane-1,3-dione nucleus (e.g. dimedone-5,5-diethylcyclohexane-1,3-sion, etc.) , 2,4-diaza-1-alkoxy-3,5-
Dioxocyclohexene nucleus (e.g. 2,4-diaza-1
-ethoxy-4-[3-(2°4-di-tert-amylphenoxy)propyl]-3,5-dioxocyclohexene, etc.), 2,4-thiazolidinedione nuclei (e.g., 3
-phenyl-2゜4-thiazolidinedione, 3-(2-
hydroxyethyl)-2,4-thiazolidinedione, 3
-amino-2,4-thiazolidinedione, etc.), 2-iminothiazolidin-4-one nuclei (e.g. 2-)-diliminothiazolidin-4-one, 3-phenyl-2-decyliminothiazolidin-4-one, 3-ethyl-2-[
3-(2,4-di-tert-amylphenoxy)brobyliminocothiazolidin-4-one, etc.), hydantoin core (e.g. hydantoin, 1,3-diethylhydantoin, 1-octyl-3-phenylhydantoin, etc.), 2゜4-oxazolidinedione nucleus (e.g. 3-ethyl-2,4-oxazolidinedione, 3-phenyl-2
, 4-oxazolidinedione, etc.), 2-iminooxazolidin-4-one nuclei (e.g. 3-ethyl-2-iminooxazolidin-4-one, 3-phenyl-2-ethyliminooxazolidin-4-one, 3-ethyl- 2-Phenyliminooxazolidin-4-one, 3-ethyl-
2-[3-(2,4-di-tert-amylphenoxy)propylimino]oxazolidin-4-one, etc.),
2-iminoimidazolidin-4-one nucleus (e.g. 2-iminoimidazolidin-4-one, 2-iminoimidazolidin-4-one, 2-iminoimidazolidin-4-one,
-decylimino-1-ethyl-3-phenylimidazolidin-4-one, 2-phenylimino-1-phenyl-
3-cyclohexylimidazolidin-4-one, 1,3
-diethyl-2-[3-(2,4-di-tert-amylphenoxy)propylimino]imidazolidine-4-
ion, etc.), isoxacilone nuclei (for example, 3-phenyl-5-isoxacilone, 3-methyl-5-isoxacilone, etc.).
一般式[■コ
式中、R/71とR/72は各々水素原子、炭素原子数
1〜20のアルキル基(例えばメチル基、n−ヘキシル
基、シクロヘキシル基、n−ドデシル基、エイコシル基
、メトキシエチル基、エトキシプロピル基、2−エチル
ヘキシル基、ヒドロキシエチル基、タロロプロピル基、
N、N−ジエチルアミノプロビル基、シアンエチル基、
ベンジル基、p−【−ブチルフェネチル基、p−t−オ
クチルフェノキシエチル基、3− (2,4−ジー t
−アミルフェノキシ)プロピル基、エトキシカルボニル
メチル
ル基、2−フリルエチル基等)、又は炭素原子数6〜2
0のアリールN(例えば、トリル基、アニシル基、メシ
チル基、タロロフェニル基、2.4−ジー ℃ーアミル
フェニル基、ナフチル基等)を表わし、更にR’71と
R/72は同時に水素原子を表ゎすごとはない。更にR
/71とR7zは結合して環状アミン基(例えば、ピペ
リジノ基、モルホリノ基、ピロリジノ基、ヘキサヒドロ
アゼピノ基、ピペラジノ基等)を形成してもよい。R’
73はシアノ基、C0ORグs 、 C0
NHR4y 、 −COR,7,5−、父子、炭素
原子数1〜20のアルキル基、又は炭素原子数6〜20
のアリール基を表わし、R9,又はRqLが表わすアル
キル基、アリール基と同意義である。更にRq3とR/
7+は結合して1,3−ジオキソシクロヘキサン環(例
えば、ジメドン、1,3−ジオキソ−5,5−ジエチル
シクロヘキサン等)、1.3−ジアザ−2,4,6−ド
リオキソシクロヘキサン環(例えばバルビッール酸、1
−フェニルパルごツール酸、1−メチル−3−オクチル
バルビッール酸、1−エチル−3−オクチルオキシカル
ボニルエチルパルごツール酸等)、1゜2−ジアザ−3
,5−ジオキソシクロペンタン環(例えば1,2−ジア
ザ−1,2−ジメチル−3゜5−ジオキソシクロペンタ
ン、1.2−ジアザ−1,2−ジフェニル−3,5−ジ
オキソシクロペンタン等)、又は2.4−ジアザ−1−
アルコキシ−3,5−ジオキソシクロヘキセン環(例え
ば、2.4−ジアザ−1−エトキシ−4−[3−(2゜
4−ジー t−アミルフェノキシ)プロピル]−3゜5
−ジオキソシクロヘキセン等)を形成してもよい。General formula [■ In the formula, R/71 and R/72 are each a hydrogen atom, an alkyl group having 1 to 20 carbon atoms (for example, a methyl group, n-hexyl group, cyclohexyl group, n-dodecyl group, eicosyl group, Methoxyethyl group, ethoxypropyl group, 2-ethylhexyl group, hydroxyethyl group, talolopropyl group,
N, N-diethylaminopropyl group, cyanethyl group,
benzyl group, p-[-butylphenethyl group, p-t-octylphenoxyethyl group, 3-(2,4-di-t
-amylphenoxy)propyl group, ethoxycarbonylmethyl group, 2-furylethyl group, etc.), or 6 to 2 carbon atoms
0 aryl N (for example, tolyl group, anisyl group, mesityl group, talolophenyl group, 2.4-diC-amylphenyl group, naphthyl group, etc.), and R'71 and R/72 simultaneously represent a hydrogen atom. It's not a big deal. Further R
/71 and R7z may be combined to form a cyclic amine group (eg, piperidino group, morpholino group, pyrrolidino group, hexahydroazepino group, piperazino group, etc.). R'
73 is a cyano group, C0ORgs, C0
NHR4y, -COR,7,5-, father and son, alkyl group having 1 to 20 carbon atoms, or 6 to 20 carbon atoms
represents an aryl group, and has the same meaning as the alkyl group or aryl group represented by R9 or RqL. Furthermore, Rq3 and R/
7+ is bonded to a 1,3-dioxocyclohexane ring (for example, dimedone, 1,3-dioxo-5,5-diethylcyclohexane, etc.), a 1,3-diaza-2,4,6-drioxocyclohexane ring ( For example, barbylic acid, 1
-phenylpalgoturic acid, 1-methyl-3-octylbarbituric acid, 1-ethyl-3-octyloxycarbonylethylpalgoturic acid, etc.), 1゜2-diaza-3
, 5-dioxocyclopentane ring (e.g. 1,2-diaza-1,2-dimethyl-3゜5-dioxocyclopentane, 1,2-diaza-1,2-diphenyl-3,5-dioxocyclo pentane, etc.), or 2,4-diaza-1-
Alkoxy-3,5-dioxocyclohexene ring (e.g. 2,4-diaza-1-ethoxy-4-[3-(2°4-di-t-amylphenoxy)propyl]-3°5
-dioxocyclohexene, etc.).
更にR’71 、R’72 、R’73 、及びR/7
1fは全体として少なくとも2つのYH基(Yは前述の
ものと同義)を有する。Furthermore, R'71, R'72, R'73, and R/7
1f as a whole has at least two YH groups (Y is as defined above).
一般式[■コにおいて好ましくはR77/とR/72は
各々炭素数1〜20.frに1〜6のアルキル基を表わ
し、R’73はシアン基、又は−S○2R6(特に−S
○2Rグs−)を表わし、R%はシアノ基、又は−〇〇
OR梶(特に−GOOR%)を表わす。In the general formula [■], preferably R77/ and R/72 each have 1 to 20 carbon atoms. fr represents an alkyl group of 1 to 6, and R'73 is a cyan group or -S○2R6 (especially -S
R% represents a cyano group or -00OR (especially -GOOR%).
R45−とR’76は各々炭素数1〜20のアルキル基
又は炭素数6〜20のアリール基(特に好ましくはRr
tsは、フェニル基(例えばフェニル基、トリル基等)
、Rり6は炭素数1〜20のアルキル基)を表わす。R45- and R'76 are each an alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 20 carbon atoms (particularly preferably Rr
ts is a phenyl group (e.g. phenyl group, tolyl group, etc.)
, R 6 represents an alkyl group having 1 to 20 carbon atoms.
一般式[■]
式中、R’?I、 92、R?3 、 R?e及びR?
5は各々水素原子、ハロゲン原子(例えば塩素原子、臭
素原子等)、炭素数1〜20のアルキル基(例えばメチ
ル基、イソプロピル基、t−ブチル基、1−アミル基、
n−オクチル基、エトキシプロピル基、ヒドロキシエチ
ル基、クロロプロピル基、ベンジル基、シアンエチル基
等)、炭素数6〜20のアリール基(例えば、フェニル
基、トリル基、メシチル基、クロロフェニル基等)、炭
素数1〜2゜のアルコキシ基(例えば、エトキシ基、オ
クチルオキシ基、2−エチルへキシルオキシ基、メトキ
シエトキシ基等、炭素数6〜20のアリールオキシ基(
例えば、フェノキシ基、4−メチルフェノキシ基等)、
炭素数1〜20のアルキルチオ基(例えば、メチルチオ
基、n−オクチルチオ基等)、炭素数6=20のアリー
ルチオ基(例えばフェニルチオ基等)、アミノ基、炭素
数1〜20のアルキルアミノ基(例えば、メチルアミン
基、ベンジルアミノ基、ジエチルアミノ基等)、炭素数
6〜20のアリールアミノ基(例えば、アニリノ基、ジ
フェニルアミノ基、アニシジノ基、トルイジノ基等)、
ヒドロキシ基、シアン基、ニトロ基、アシルアミノ基(
例えば、アセチルアミノ基等)、カルバモイル
ジメチルカルバモイル基等)、スルホニル基(例えば、
メチルスルホニル基、フェニルスルホニル基等)、スル
ファモイル基(例えばエチルスルファモイル基、ジメチ
ルスルファモイル基等)、スルホンアミド基(例えば、
メタンスルホンアミド基等)、アシルオキシ基(例えば
、アセトキシ基、ベンゾイルオキシ基等)、又はオキシ
カルボニル基(例えば、エトキシカルボニル基、フェノ
キシカルボニル基等)、を表わし、R’?IとR?□、
R?2とR93、Rct3とR94又はRa4とRa、
S−は閉環して5または6員環を形成してもよい(例え
ばメチレンジオキシ基等)。R96は水素原子、炭素数
1〜20のアルキル基(例えば、メチル基、イソプロピ
ル基、n−ブチル基、n−オチクル基等)、を表わす。General formula [■] In the formula, R'? I, 92, R? 3.R? e and R?
5 each represents a hydrogen atom, a halogen atom (e.g. chlorine atom, bromine atom, etc.), an alkyl group having 1 to 20 carbon atoms (e.g. methyl group, isopropyl group, t-butyl group, 1-amyl group,
n-octyl group, ethoxypropyl group, hydroxyethyl group, chloropropyl group, benzyl group, cyanethyl group, etc.), aryl group having 6 to 20 carbon atoms (for example, phenyl group, tolyl group, mesityl group, chlorophenyl group, etc.) , alkoxy groups having 1 to 2 carbon atoms (e.g., ethoxy group, octyloxy group, 2-ethylhexyloxy group, methoxyethoxy group, etc.), aryloxy groups having 6 to 20 carbon atoms (
For example, phenoxy group, 4-methylphenoxy group, etc.),
Alkylthio groups having 1 to 20 carbon atoms (e.g., methylthio group, n-octylthio group, etc.), arylthio groups having 6=20 carbon atoms (e.g., phenylthio group, etc.), amino groups, alkylamino groups having 1 to 20 carbon atoms (e.g. , methylamine group, benzylamino group, diethylamino group, etc.), arylamino group having 6 to 20 carbon atoms (e.g., anilino group, diphenylamino group, anisidino group, toluidino group, etc.),
Hydroxy group, cyan group, nitro group, acylamino group (
For example, acetylamino group), carbamoyldimethylcarbamoyl group, etc.), sulfonyl group (for example,
methylsulfonyl group, phenylsulfonyl group, etc.), sulfamoyl group (e.g. ethylsulfamoyl group, dimethylsulfamoyl group, etc.), sulfonamide group (e.g.
R'? I and R? □、
R? 2 and R93, Rct3 and R94 or Ra4 and Ra,
S- may be closed to form a 5- or 6-membered ring (eg, methylenedioxy group, etc.). R96 represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms (eg, methyl group, isopropyl group, n-butyl group, n-octicle group, etc.).
R9りはシアン基、−C00Ra9、−CONHR??
、−CORq9 、又は−3O2R??を表わし、R?
gはシアムL−cooR7o、−CONHR90,−C
OR?O又は−8O2Rq□を表わし、R’??とRa
Qは各々水素原子、炭素数1〜20のアルキル基、炭素
数6〜20のアリール基を表わす。R9 is a cyan group, -C00Ra9, -CONHR? ?
, -CORq9, or -3O2R? ? represents R?
g is Siam L-cooR7o, -CONHR90, -C
OR? Represents O or -8O2Rq□, R'? ? and Ra
Q represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms, and an aryl group having 6 to 20 carbon atoms, respectively.
更にRal −Ral −Rg3− Ra4− Raf
f −Ra7−R69、R9?は全体として少なくとも
2つのYl−1基(Yは前述のものと同@)を有する。Furthermore, Ral -Ral -Rg3- Ra4- Raf
f-Ra7-R69, R9? has a total of at least two Yl-1 groups (Y is the same @ as above).
好ましくは、R’?I 、Rat、R93、Rqe、及
びR9sは各々水素原子、ハロゲン原子、炭素数1〜2
0のアルキル基、炭素数6〜20のアリール基、炭素数
1〜20のアルコキシ基、炭素数6〜20のアリールオ
キシ基、炭素数1〜20アルキルアミノ基、炭素数6〜
20のアリールアミノ基、とドロキシ基、アシルアミノ
基、カルバモイル基、アシルオキシ基、オキシカルボニ
ル基を表わし、Ra7とRa2 、R9zとR93、R
93とR芹又はR94とRqs−は閉環してもよい。R
a6は水素原子、炭素数1〜20のアルキル基を表わし
、R9’7はシアムi、−cooR?7、−CON)−
IR、−coR?y、又は−3O2Rツ。Preferably, R'? I, Rat, R93, Rqe, and R9s are each a hydrogen atom, a halogen atom, and a carbon number of 1 to 2
0 alkyl group, aryl group having 6 to 20 carbon atoms, alkoxy group having 1 to 20 carbon atoms, aryloxy group having 6 to 20 carbon atoms, alkylamino group having 1 to 20 carbon atoms, 6 to 20 carbon atoms
20 represents an arylamino group, a droxy group, an acylamino group, a carbamoyl group, an acyloxy group, an oxycarbonyl group, and Ra7 and Ra2, R9z and R93, R
93 and R or R94 and Rqs- may be ring-closed. R
a6 represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms, and R9'7 represents cyam i, -cooR? 7, -CON)-
IR, -coR? y, or -3O2Rts.
?9
を表わし、Rgはシアノ基、−COORao、−CON
)(Ra(1、−COR?Q 、又は−8○2 R5゜
を表わし、R’??とRa11+は各々炭素数1〜2o
のアルキル基、炭素数6〜20のアリール基を表わす。? 9, Rg is a cyano group, -COORao, -CON
) (Ra (1, -COR?Q, or -8○2 R5゜, R'?? and Ra11+ each have 1 to 2 carbon atoms
represents an alkyl group or an aryl group having 6 to 20 carbon atoms.
一般式[■コ
式中、8g1〜R3+はそれぞれ水素原子、ハロゲン原
子、アルキル基、アルコキシ基、アリール基、アリール
オキシ基、アルキルチオ基、アリールチオ基、アミ/W
、アルキルアミノ基、アリールアミノ基、ヒドロキシ基
、シアノ基、アシルアミノ基、カルバモイル
スルファモイル基、′スルホンアミド基、アシルオキシ
基又はオキシカルボニル基を表わし、Rす5及びR2Q
は水素原子、アルキル基又はフェニル基を、
8g6は水素原子、又はフェニル基を表わし、Rg′〜
Rコロは全体として少なくとも2つのYH基(Yは前)
ホのものと同義)を有する。General formula [■ In the formula, 8g1 to R3+ are each a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an aryl group, an aryloxy group, an alkylthio group, an arylthio group, and an ami/W
, represents an alkylamino group, an arylamino group, a hydroxy group, a cyano group, an acylamino group, a carbamoylsulfamoyl group, a sulfonamide group, an acyloxy group, or an oxycarbonyl group, and R5 and R2Q
represents a hydrogen atom, an alkyl group or a phenyl group, 8g6 represents a hydrogen atom or a phenyl group, and Rg'~
R colo as a whole has at least two YH groups (Y is in front)
has the same meaning as that of e).
Rgl〜R詐で示されるハロゲン原子の例としてはフッ
素、塩素、臭素等の各原子が挙げられアルキル基の例と
してはメチル、エチル、n−プロピル、メトキシエチル
、ヒドロキシエチル、クロロプロピル、ベンジル、シア
ノエチル、カルボキシエチル等の各基が挙げられ、アリ
ール基の例としてはフェニル、トリルメシチル、クロロ
フェニル等の各基、アルコキシ基の例としてはメトキシ
、エトキシ、オクチルオキシ、2−エチルへキシルオキ
シ、メトキシエトキシ等の各基、アリールオキシ基の例
としてはフェノキシ、4−メチルフェノキシ等の各基、
アルキルチオ基の例としてはメチルチオ、プロピルチオ
等の根基、アリールチオ基の例としては、フェニルチオ
基、アルキルアミノ基の例としてはメチルアミン、ジメ
チルアミノ、エチルアミン、ベンジルアミノ、ジアクリ
ルアミノ、シアノエチルアミノ、等の各基、アリールア
ミノ基の例としてはアニリノ、アニシジン、トルイジノ
、ジフェニルアミノ等の各基、アシルアミノ基の例とし
てはアセチルアミノ、ベンゾイルアミノ等の各基、カル
バモイル基の例としてはメチルカルバモイル、ジメチル
カルバモイル等の各基、アシル基の例としてはアセチル
、ベンゾイル等の各基、スルホニル基の例としてはメチ
ルスルホニル、フェニルスルホニル等の各基、スルファ
モイル基の例としてはエチルスルファモイル、ジメチル
スルファモイル等の各基、スルホンアミド基の例として
はメタンスルホンアミド、ベンゼンスルホンアミド等の
各基、アシルオキシ基の例としてアセトキシ、ベンゾイ
ルオキシ等の各基、オキシカルボニル基の例としてはメ
トキシカルボニル、エトキシカルボニル、フェノキシカ
ルボニル等の各基が挙げられる。Examples of halogen atoms represented by Rgl to R include fluorine, chlorine, bromine, etc. Examples of alkyl groups include methyl, ethyl, n-propyl, methoxyethyl, hydroxyethyl, chloropropyl, benzyl, Examples of aryl groups include phenyl, tolylmesityl, and chlorophenyl, and examples of alkoxy groups include methoxy, ethoxy, octyloxy, 2-ethylhexyloxy, and methoxyethoxy. Examples of aryloxy groups include phenoxy, 4-methylphenoxy, etc.
Examples of alkylthio groups include methylthio and propylthio, examples of arylthio groups include phenylthio, and examples of alkylamino groups include methylamine, dimethylamino, ethylamine, benzylamino, diacrylamino, cyanoethylamino, etc. Examples of arylamino groups include anilino, anisidine, toluidino, and diphenylamino; examples of acylamino groups include acetylamino and benzoylamino; examples of carbamoyl groups include methylcarbamoyl and dimethylcarbamoyl. Examples of acyl groups include acetyl and benzoyl; examples of sulfonyl groups include methylsulfonyl and phenylsulfonyl; examples of sulfamoyl groups include ethylsulfamoyl and dimethylsulfamoyl. Examples of sulfonamide groups include methanesulfonamide and benzenesulfonamide; examples of acyloxy groups include acetoxy and benzoyloxy; examples of oxycarbonyl groups include methoxycarbonyl and ethoxycarbonyl. , phenoxycarbonyl, and the like.
以上、一般式[E]で表わされる紫外線吸収性化合物と
しては、〜YH基がQで表わされる残基中のアルキル基
に結合している場合が好ましい。As described above, in the ultraviolet absorbing compound represented by the general formula [E], it is preferable that the ~YH group is bonded to the alkyl group in the residue represented by Q.
以下に、一般式[E]で示される紫外線吸収性化合物の
具体例を示す。Specific examples of the ultraviolet absorbing compound represented by the general formula [E] are shown below.
H20H 「 CH,OH E−12 E−13 CH2C820CH。H20H " CH,OH E-12 E-13 CH2C820CH.
’J シh 2 シ!′−12(J FiE−30
本発明の重合体はポリイソシアナート化合物とOH基及
びNRo)−を基のうち少なくとも2個の基を含む化合
物を重付加反応させることにより得られるが、詳しい反
応条件についてはたとえば日本化学会編新実験化学vA
座19巻高分子化学[工](丸善)のp、150〜15
6に記載されている。'J Shih 2 Shi! '-12 (J FiE-30) The polymer of the present invention can be obtained by polyaddition reaction of a polyisocyanate compound and a compound containing at least two of the OH group and NRo)- group. Regarding the conditions, for example, the Chemical Society of Japan, Experimental Chemistry vA
Volume 19 of Polymer Chemistry [Engineering] (Maruzen), p. 150-15
6.
以下具体的合成例について説明する。A specific example of synthesis will be explained below.
合成例1 @水化合物E−2の合成
3−アニリノアクロレインアニル(29(1)とエチル
フェニルスルホニルアセテート(30o )を無水酢酸
(30−)中で85〜90℃に2時間加熱する。減圧下
に無水酢酸を除きエチルアルコール200dとジヒドロ
キジエチルアミン(21g)に加えて還流する。Synthesis Example 1 Synthesis of @Water Compound E-2 3-anilinoacroleinanil (29(1)) and ethylphenylsulfonylacetate (30o) are heated to 85-90°C for 2 hours in acetic anhydride (30-). Reduced pressure. Remove acetic anhydride from the bottom, add 200 d of ethyl alcohol and dihydroxydiethylamine (21 g), and reflux.
反応後、氷水にあけ沈澱を口取する。After the reaction, pour into ice water and take out the precipitate.
得られた沈澱物を精製すると目的物30oが得られた。The obtained precipitate was purified to obtain the desired product 30o.
合成例2 @水化合物E−5の合成
米国特許3,761 、272の方法で合成した2−<
2’ 、4’−ジヒドロキシフェニル)−2)−1−ベ
ンゾトリアゾール22.7Q 1
24.3p 、炭酸カリウム13.8g 、ヨウ化ナト
リウム1gとメチルエチルケトン150dの混合物を撹
拌しながら24時間3!流した。空温まで放冷後、不溶
物を0別して0液を濃縮後精製すると目的物26、01
1が得られた。Synthesis Example 2 @Synthesis of Water Compound E-5 2-<
A mixture of 2',4'-dihydroxyphenyl)-2)-1-benzotriazole 22.7Q 1 24.3p, potassium carbonate 13.8g, sodium iodide 1g and methyl ethyl ketone 150d was stirred for 3 hours for 24 hours. It flowed. After cooling to air temperature, insoluble matter is separated and the 0 liquid is concentrated and purified to obtain the target product 26, 01.
1 was obtained.
合成例3 例示化合物E−12の合成
600 w12に溶解し、還流する。この中へエチレン
アイオダイド55gを2時間かけて滴下する。、W4下
後6時間反応をつづけ=湿まで冷却する。Synthesis Example 3 Synthesis of Exemplified Compound E-12 Dissolve in 600w12 and reflux. 55 g of ethylene iodide was dropped into this over 2 hours. , Continue the reaction for 6 hours after lowering W4 = cooling to humidity.
63(Iを加え再び還流する。5時間反応後、アセトニ
トリルを留去し、60℃まで冷却、メタノール60(h
R、イソプロパツール300ifを加え溶解する。水冷
で結析させ沈澱を口取する。この化合物24.4i;l
、ハイドロキノン2gをトリエチルアミン13.11
1を溶解したアセトニトリル300 dに加え、この混
合液に無水酢酸20gを、50℃で加える。Add 63 (I) and reflux again. After 5 hours of reaction, acetonitrile is distilled off, cooled to 60°C, and methanol 60 (h
R. Add 300if of isopropanol and dissolve. Let it crystallize by cooling with water and take the precipitate. This compound 24.4i;l
, 2 g of hydroquinone to 13.11 g of triethylamine
1 was dissolved in 300 d of acetonitrile, and 20 g of acetic anhydride was added to this mixture at 50°C.
滴下後、2時間還流し、空温まで冷却すると沈澱が生ず
る。この沈澱をメタノールから再結晶し、目的物20g
を得た。After the dropwise addition, the mixture was refluxed for 2 hours and cooled to air temperature to form a precipitate. This precipitate was recrystallized from methanol, and 20 g of the target product was obtained.
I got it.
IR,NMRで構造をTN認した。The structure was confirmed by IR and NMR.
合成例4 例示化合物E−14の合成
CλHS″
11(+を、ハイドロキノンモノメチルエーテル0.5
gを溶解した。2−メトキシエタノール100鶴中で還
流し、メチルアミン1顧を加える。1時間還流後、室温
まで冷却し、生じた沈澱をメタノールから再結晶すると
、目的物12gが得られた。Synthesis Example 4 Synthesis of Exemplified Compound E-14 CλHS'' 11 (+, hydroquinone monomethyl ether 0.5
g was dissolved. Reflux in 100ml of 2-methoxyethanol and add 1x of methylamine. After refluxing for 1 hour, the mixture was cooled to room temperature, and the resulting precipitate was recrystallized from methanol to obtain 12 g of the desired product.
構造はtR,NMRで確認した。The structure was confirmed by tR and NMR.
合成例5 例示化合物E−19の合成
29、7gとピリジン9.5Q 、アセトニトリル80
1gの溶液に滴下した。反応温度を40℃以下で2時間
反応させた後、反応液を水あけ後、アルカリで加水分解
処理を行なった後、I)Hを中性にもどして析出する沈
澱をろ取してメタノールから再結晶を行い目的物20(
lを得た。Synthesis Example 5 Synthesis of Exemplified Compound E-19 29.7 g, 9.5 Q of pyridine, 80 acetonitrile
It was added dropwise to 1 g of solution. After reacting for 2 hours at a reaction temperature of 40°C or lower, the reaction solution was drained and hydrolyzed with an alkali, then I)H was returned to neutrality and the precipitate was collected by filtration and separated from methanol. Perform recrystallization and target object 20 (
I got l.
合成例6 重合体P−1の合成
ヘキサンジオール−ネオペンチルグリコールポリアジペ
ート(MW1700) 68!J (0,04モル)
、例示化合物E−158111(0,17モル)及び無
水トルエン501gを約100℃に加熱する。次に例示
化合物D−641!II (0,+4モル)及び例示
化合物D−3,24g (0,14モル)の混合物をそ
の温度で素早く滴下した。105〜110℃で3時間反
応させた後、アセトン720112を加え希釈後、β′
−アミノエチル−β−アミノエタンスルホン酸のナト
リウム塩の水性m ’818.4g(0,05モル)と
水25dの混合物をこの溶液に50℃で加える。Synthesis Example 6 Synthesis of Polymer P-1 Hexanediol-neopentyl glycol polyadipate (MW1700) 68! J (0.04 mol)
, Exemplified Compound E-158111 (0.17 mol) and 501 g of anhydrous toluene are heated to about 100°C. Next, exemplified compound D-641! A mixture of II (0.+4 mol) and 3.24 g (0.14 mol) of Exemplified Compound D- was quickly added dropwise at that temperature. After reacting at 105-110°C for 3 hours, acetone 720112 was added and diluted, and β'
A mixture of 818.4 g (0.05 mol) of aqueous m' of the sodium salt of -aminoethyl-β-aminoethanesulfonic acid and 25 d of water is added to this solution at 50°C.
10分後、生成物を脱イオン水で分散させ溶媒を減圧下
、除去する。After 10 minutes, the product is dispersed in deionized water and the solvent is removed under reduced pressure.
ポリウレタン−尿素変性UV吸収剤の水性分散液が得ら
れた。 固形分30%。An aqueous dispersion of a polyurethane-urea modified UV absorber was obtained. Solid content 30%.
合成例7 重合体P−2〜P−30の合成合成例6にお
ける例示化合物E−1、D−6及びD−3を次表に示す
例示化合物に代えた他は合成例6と同じにして、重合体
P−2〜P−30を合成した。Synthesis Example 7 Synthesis of Polymers P-2 to P-30 The procedure was the same as Synthesis Example 6 except that the exemplified compounds E-1, D-6, and D-3 in Synthesis Example 6 were replaced with the exemplified compounds shown in the following table. , polymers P-2 to P-30 were synthesized.
本発明の重合体はハロゲン化銀写真感光材料中、ラテッ
クスとして添加されていることが好ましい。The polymer of the present invention is preferably added to the silver halide photographic material as a latex.
ラテックスとして添加するには、水溶性基(例えばスル
ホ基、カルボキシル基)を有するポリヒドロキシ化合物
、ポリアミノ化合物、ヒドロキシ−アミノ化合物または
ポリイソシアナート化合物を用いて、共重合付加反応さ
せるか、変性化してラテックス重合体を得てもよいし、
上記水溶性基を有する化合物を用いずに重付加反応させ
て得られた親油性ポリマーを有機溶媒中に溶かしたもの
をゼラチン水溶液中にラテックスの形で分散して作って
もよい。To add it as a latex, a polyhydroxy compound, a polyamino compound, a hydroxy-amino compound or a polyisocyanate compound having a water-soluble group (e.g. sulfo group, carboxyl group) is used, and the compound is copolymerized and added or modified. A latex polymer may be obtained,
It may also be prepared by dissolving a lipophilic polymer obtained by polyaddition reaction without using the above-mentioned compound having a water-soluble group in an organic solvent and dispersing it in the form of a latex in an aqueous gelatin solution.
開始剤の例およびその作用はF、 A、 BoVey著
[Emulsion polymerlzationJ
l ntersciencePublishes
Inc New York発行1955年第59−
第93頁に記載されている。Examples of initiators and their action can be found in F. A. BoVey [Emulsion polymerization J
lintersciencePublishes
Inc. New York Published 1955 No. 59-
It is described on page 93.
乳化重合の際用いられる乳化剤としては界面活性性を持
つ化合物が用いられ好ましくは石けん、スルホネートお
よびサルフェート、カチオン化合物、両性化合物および
高分子保護コロイドが挙げられる。これらの群の例およ
びそれらの作用はB elalsche Chemi
sche I ndustrie第28巻第16〜第
20頁(1963年〉に記載されている。As the emulsifier used in emulsion polymerization, a compound having surface activity is used, and preferred examples include soaps, sulfonates, sulfates, cationic compounds, amphoteric compounds, and polymeric protective colloids. Examples of these groups and their effects can be found in Belalsche Chemi
28, pp. 16-20 (1963).
一方、本発明の重合体をゼラチン水溶液中にラテックス
の形で分散する際、本発明の重合体を溶解するために用
いる有機溶媒は分散液を塗布する前あるいはくあまり好
ましくないが)塗布した分散液の乾燥中の気化の際に除
かれる。On the other hand, when the polymer of the present invention is dispersed in the form of a latex in an aqueous gelatin solution, the organic solvent used for dissolving the polymer of the present invention may be used before or after coating the dispersion (although this is less preferred). It is removed during evaporation during drying of the liquid.
本発明の重合体中に占める紫外線吸収剤部分を有する単
量体の割合は通常5〜100重量%が望ましいが、膜厚
、安定性の点では特に20〜100重量%が好ましい。The proportion of the monomer having an ultraviolet absorber moiety in the polymer of the present invention is generally preferably 5 to 100% by weight, but from the viewpoint of film thickness and stability, 20 to 100% by weight is particularly preferable.
本発明の重合体はハロゲン化銀写真感光材料の表面保護
層、中間層、ハロゲン化銀乳剤層などの親水性コロイド
層に添加して用いるが、特に表面保護層又は表面層’B
Eに隣接する親水性コロイド層に用いるのが好ましい。The polymer of the present invention is used by being added to a hydrophilic colloid layer such as a surface protective layer, an intermediate layer, or a silver halide emulsion layer of a silver halide photographic light-sensitive material.
It is preferable to use it in the hydrophilic colloid layer adjacent to E.
本発明の重合体の使用量については特に制限はないが1
平方メートル当り10〜3. ooo+no、特に50
〜2 、0OOn+gであることが好ましい。There is no particular restriction on the amount of the polymer of the present invention used, but 1
10-3. ooo+no, especially 50
It is preferable that it is 2,0OOn+g.
本発明のハロゲン化銀写真感光材料の例としてはカラー
ネガフィルム、カラーリバーサルフィルム、Xレイフィ
ルム、カラーペーパー及びカラー拡散転写法感材などを
挙げることが出来る。Examples of the silver halide photographic material of the present invention include color negative film, color reversal film, X-ray film, color paper, and color diffusion transfer method sensitive material.
本発明の感光材料に用いるハロゲン化銀乳剤には、ハロ
ゲン化銀として、沃臭化銀、塩臭化銀等の通常のハロゲ
ン化銀乳剤に使用される任意のものを用いることができ
、ハロゲン化銀粒子は、酸性法、中性法及びアンモニア
法のいずれで得られたものでもよい。In the silver halide emulsion used in the light-sensitive material of the present invention, any silver halide used in ordinary silver halide emulsions, such as silver iodobromide and silver chlorobromide, can be used. The silver oxide particles may be obtained by any of the acid method, neutral method, and ammonia method.
ハロゲン化銀粒子は、粒子内において均一なハロゲン化
銀組成分布を有するものでも、粒子の内部と表面層とで
ハロゲン化銀組成が異なるコア/シェル粒子であっても
よく、潜像が主として表面に形成されるような粒子であ
っても、また主として粒子内部に形成されるような粒子
でもよい。Silver halide grains may have a uniform silver halide composition distribution within the grain, or may be core/shell grains in which the silver halide composition differs between the inside and surface layer of the grain, and the latent image is mainly on the surface. It may be a particle that is formed inside the particle, or it may be a particle that is mainly formed inside the particle.
又、規則的な結晶形を持つものでもよいし、球状−や板
状のような変則的な結晶形を持つものでもよい。Further, it may have a regular crystal shape, or it may have an irregular crystal shape such as a spherical shape or a plate shape.
又、いかなる粒子サイズ分布を持つものを用いてもよく
、粒子サイズ分布の広い乳剤(多分散乳剤と称する)を
用いてもよいし、粒子サイズ分布の狭い乳剤(単分散乳
剤と称する。)を単独又は数種類混合してもよい。又、
多分散乳剤と単分散乳剤を混合して用いてもよい。Also, any grain size distribution may be used, and emulsions with a wide grain size distribution (referred to as polydisperse emulsions) may be used, or emulsions with a narrow grain size distribution (referred to as monodisperse emulsions) may be used. They may be used alone or in combination. or,
A polydisperse emulsion and a monodisperse emulsion may be mixed and used.
ハロゲン化銀乳剤は、別々に形成した2種以上のハロゲ
ン化銀乳剤を混合して用いてもよい。The silver halide emulsion may be a mixture of two or more separately formed silver halide emulsions.
該乳剤は、常法により化学増感することができ、増感色
素を用いて、所望の波長域に光学的に増感できる。増感
色素は単独で用いてもよいが、2種以上を組み合わせて
用いてもよい。The emulsion can be chemically sensitized by conventional methods, and can be optically sensitized to a desired wavelength range using a sensitizing dye. The sensitizing dyes may be used alone or in combination of two or more.
ハロゲン化銀乳剤には、カブリ防止剤、安定剤等を加え
ることができる。該乳剤のバインダーとしては、ゼラチ
ンを用いるのが有利である。Antifoggants, stabilizers, etc. can be added to the silver halide emulsion. Gelatin is advantageously used as binder for the emulsion.
乳剤層、その他の親水性コロイド層は、硬膜することが
でき、又、可塑剤、水不溶性又は難溶性合成ポリマーの
分散物(ラテックス)を含有させることができる。The emulsion layer and other hydrophilic colloid layers can be hardened and can contain a plasticizer and a dispersion (latex) of a water-insoluble or sparingly soluble synthetic polymer.
カラー写真用感光材料の乳剤層には、カプラーが用いら
れる。該カプラーは各々の乳剤層に対して乳剤層の感光
スペクトル光を吸収する色素が形成されるように選択さ
れるのが普通であり、青感性乳剤層にはイエローカプラ
ーが、緑感性乳剤層にはマゼンタカプラーが、赤感性乳
剤層にはシアンカプラーが用いられる。しかしながら目
的に応じて上記組み合わせと異なった用い方でハロゲン
化銀カラー写真感光材料をつくってもよい。A coupler is used in the emulsion layer of a light-sensitive material for color photography. The couplers are usually selected such that a dye is formed for each emulsion layer that absorbs light in the emulsion layer's sensitive spectrum, with a yellow coupler for the blue-sensitive emulsion layer and a yellow coupler for the green-sensitive emulsion layer. A magenta coupler is used in the red-sensitive emulsion layer, and a cyan coupler is used in the red-sensitive emulsion layer. However, depending on the purpose, silver halide color photographic materials may be produced using different combinations from the above.
これらカプラーは4当量性、2当1性のどちらでもよい
。カプラーには色補正の効果を有しているカラードカプ
ラー及び現像主薬の酸化体とのカップリングによって現
像抑制剤、現象促進剤、漂白促進剤、現像剤、ハロゲン
化銀溶剤、調色剤、硬膜剤、カブリ剤、カブリ防止剤、
化学増感剤、分光増感剤、及び減感剤のような写真的に
有用なフラグメントを放出する化合物が包含される。These couplers may be either 4-equivalent or 2-equivalent. Coupling with a colored coupler that has a color correction effect and an oxidized form of a developing agent produces development inhibitors, phenomenon accelerators, bleach accelerators, developers, silver halide solvents, toning agents, and hardeners. film agent, fogging agent, antifogging agent,
Compounds that release photographically useful fragments such as chemical sensitizers, spectral sensitizers, and desensitizers are included.
芳香族第1級アミン現象剤の酸化体とカップリング反応
を行うが、゛色素を形成しない無色カプラー(ii合カ
プラーとも言う)を併用することもできる。A coupling reaction is carried out with an oxidized product of an aromatic primary amine phenomenon agent, but a colorless coupler that does not form a dye (also referred to as a ii-combined coupler) can also be used in combination.
イエローカプラーとしては、公知のアシルアセトアニリ
ド系カプラーを好ましく用いることができる。これらの
うち、ベンゾイルアセトアニリド系及びピバロイルアセ
トアニリド系化合物は有利である。As the yellow coupler, known acylacetanilide couplers can be preferably used. Among these, benzoylacetanilide and pivaloylacetanilide compounds are advantageous.
マゼンタカプラーとしては、公知の5−ピラゾロン系カ
プラー、ピラゾロベンツイミダゾール系カプラー、ピラ
ゾロトリアゾール系カプラー、開鎖アシルアセトニトリ
ル系カプラー、インダシロン系カプラー等を用いること
ができる。As the magenta coupler, known 5-pyrazolone couplers, pyrazolobenzimidazole couplers, pyrazolotriazole couplers, open-chain acylacetonitrile couplers, indacylon couplers, and the like can be used.
シアンカプラーとしては、フェノールまたはナフトール
系カプラーが一般的に用いられる。As the cyan coupler, phenol or naphthol couplers are generally used.
ハロゲン化銀結晶表面に吸着させる必要のないカプラー
、DIR化合物、画像安定剤、蛍光増白剤等のうち、疎
水性化合物の分散は固体分散法、ラテックス分散法、水
中油滴型乳化分散法等、種々の方法を用いることができ
、疎水性化合物の化学構造等に応じて適宜選択すること
ができる。Among couplers, DIR compounds, image stabilizers, fluorescent brighteners, etc. that do not need to be adsorbed on the silver halide crystal surface, hydrophobic compounds can be dispersed using the solid dispersion method, latex dispersion method, oil-in-water emulsion dispersion method, etc. Various methods can be used, and can be appropriately selected depending on the chemical structure of the hydrophobic compound.
又、酸基を有する場合には、アルカリ性水溶液として親
水性コロイド中に導入することもできる。In addition, when it has an acid group, it can also be introduced into the hydrophilic colloid as an alkaline aqueous solution.
現像主薬の酸化体又は電子移動剤が層間を移動して色濁
りが生じたり、鮮鋭性が劣化したり、粒状性が目立つの
を防止するために色カブリ防止剤を用いることができる
。A color antifogging agent can be used to prevent color turbidity, deterioration of sharpness, and noticeable graininess caused by the movement of an oxidized product of a developing agent or an electron transfer agent between layers.
該色カブリ防止剤は乳剤層自身に含有させてもよいし、
中間層を隣接乳剤層間に設けて、該中間層に含有させて
もよい。The color antifoggant may be contained in the emulsion layer itself, or
An interlayer may be provided between adjacent emulsion layers and contained in the interlayer.
感光材料には、フィルター層、ハレーション防止層、イ
ラジェーション防止層等の補助層を設けることができる
。これらの層中及び/又は乳剤層中には現像処理中に感
光材料から流出するかもしくは漂白される染料が含有さ
せられてもよい。The photosensitive material can be provided with auxiliary layers such as a filter layer, an antihalation layer, and an antiirradiation layer. These layers and/or the emulsion layer may contain dyes that are washed out or bleached from the light-sensitive material during the development process.
感光材料には、ホルマリンスカベンジp−1蛍光増白剤
、マット剤、滑剤、画像安定剤、界面活性剤、現像促進
剤、現像遅延剤や漂白促進剤を添加できる。A formalin scavenge p-1 optical brightener, a matting agent, a lubricant, an image stabilizer, a surfactant, a development accelerator, a development retardant, and a bleach accelerator can be added to the photosensitive material.
支持体としては、ポリエチレン等をラミネートした紙、
ポリエチレンテレフタレートフィルム、バライタ紙、三
酢酸セルロース等を用いることができる。As a support, paper laminated with polyethylene, etc.
Polyethylene terephthalate film, baryta paper, cellulose triacetate, etc. can be used.
本発明の感光材料を用いて白黒画像を得るには、現像工
程並びに定着工程及び/又は安定化工程を施せばよく、
色素画像を得るには露光後、カラー写真処理を行う。カ
ラー処理は、発色現像処理工程、漂白処理工程、定着処
理工程、水洗処理工程及び必要に応じて安定化処理工程
を行うが、漂白液を用いた処理工程と定着液を用いた処
理工程の代わりに、1浴漂白定着液を用いて、漂白定着
処理工程を行うこともできるし、発色現像、漂白、定着
を1浴中で行うことができる1浴現像漂白定着処理液を
用いたモノバス処理工程を行うこともできる。In order to obtain a black and white image using the photosensitive material of the present invention, a developing step, a fixing step and/or a stabilizing step may be performed.
After exposure, color photographic processing is performed to obtain a dye image. Color processing includes a color development process, a bleaching process, a fixing process, a water washing process, and, if necessary, a stabilizing process, but instead of the process using a bleach solution and the process using a fixer. In addition, a bleach-fixing process can be performed using a one-bath bleach-fixing solution, or a monobath processing process using a one-bath developing, bleach-fixing solution that allows color development, bleaching, and fixing to be performed in one bath. You can also do
これらの処理工程に組み合わせて前硬膜処理工程、その
中和工程、停止定着処理工程、後硬膜処理工程等を行っ
てもよい。これら処理において発色現像処理工程の代わ
りに発色現像主薬、またはそのプレカーサーを材料中に
含有させておき現像処理をアクチベーター液で行うアク
チベーター処理工程を行ってもよいし、そのモノバス処
理にアクチベーター処理を適用することができる。In combination with these processing steps, a pre-hardening process, its neutralization process, a stop-fixing process, a post-hardening process, etc. may be performed. In these processes, instead of the color development process, an activator process may be performed in which a color developing agent or its precursor is contained in the material and the development process is performed using an activator solution, or an activator process may be performed in which the monobath process is performed using an activator solution. Processing can be applied.
[実施例]
次に本発明の実施例を示すが、本発明はこれらにより限
定されるものではない。[Example] Next, Examples of the present invention will be shown, but the present invention is not limited thereto.
実施例−1
三酢酸セルロース透明ベース上に下記組成をもつ縁感性
乳剤層及び保護層を同時重層塗布、乾燥し、試料を作製
した。Example 1 A sample was prepared by simultaneously coating an edge-sensitive emulsion layer and a protective layer having the following composition on a cellulose triacetate transparent base and drying them.
第1層;緑感性乳剤層
沃化銀7モル%を含む平均粒径1.2μの緑感性沃臭化
銀乳剤を作製した。First layer: green-sensitive emulsion layer A green-sensitive silver iodobromide emulsion containing 7 mol % of silver iodide and having an average grain size of 1.2 μm was prepared.
次いで、ハロゲン化銀1モル当り、マゼンタカプラーと
して、1− (2,4,6−ドリクロロフエニル)−3
−[3−<2.4−ジ−t−アミルフェノキシアセトア
ミド)ベンツアミド]−5−ピラゾロンを80g、カラ
ードマゼンタカプラーとして、1− (2,4,6−ド
リクロフエニル)−4−(1−ナフチルアゾ)−3−(
2−クロロ−5−オクタデセニルサクシンイミドアニリ
ノ)−5−ピラゾロンを2.5gそれぞれ秤伍してから
トリクレジルホスフェート120g、酢酸エチル240
1gを混合して加温溶解し、次いでトリイソプロピルナ
フタレンスルホン酸ナトリウム5gと7.5%ゼラチン
水溶液5501gの溶液中に乳化分散したカプラー溶液
を前記の乳剤に添加した。Then, per mole of silver halide, 1-(2,4,6-drichlorophenyl)-3 was added as a magenta coupler.
-[3-<2.4-di-t-amylphenoxyacetamido)benzamide]-5-pyrazolone, 80 g, as a colored magenta coupler, 1-(2,4,6-doliclophenyl)-4-(1-naphthylazo )-3-(
Weigh out 2.5 g of 2-chloro-5-octadecenylsuccinimideanilino)-5-pyrazolone, then add 120 g of tricresyl phosphate and 240 g of ethyl acetate.
1 g was mixed and dissolved by heating, and then a coupler solution, which was emulsified and dispersed in a solution of 5 g of sodium triisopropylnaphthalene sulfonate and 5,501 g of a 7.5% aqueous gelatin solution, was added to the above emulsion.
さらにゼラチン硬膜剤を添加して緑感性ハロゲン化銀塗
布液を調製し、乾燥膜厚が5.5μとなるよう塗布した
。Further, a gelatin hardener was added to prepare a green-sensitive silver halide coating solution, which was coated to a dry film thickness of 5.5 microns.
第2層;保1層
比較紫外線吸収剤と高沸点溶剤としてトリクレジルホス
フェートを(紫外線吸収剤とトリクレジルホスフェート
を合計した重量の2倍の重量の)酢酸エチルに加熱溶解
し、トリイソプロピルナフタレンスルホン酸ソーダを含
むゼラチン溶液中に加えて、コロイドミルにて乳化分散
した後、酢酸エチルを蒸発除去して塗布、乾燥し、比較
試料を作製した。2nd layer: Comparison of protective 1st layer A UV absorber and tricresyl phosphate as a high boiling point solvent are heated and dissolved in ethyl acetate (twice the weight of the total weight of the UV absorber and tricresyl phosphate), and triisopropyl A comparative sample was prepared by adding it to a gelatin solution containing sodium naphthalene sulfonate, emulsifying and dispersing it in a colloid mill, and then removing ethyl acetate by evaporation, coating, and drying.
一方、比較紫外線吸収剤およびトリクレジルホスフェー
トの代りに本発明のポリマー紫外線吸収剤を用い、塗布
乾燥して本発明に係る試料(第1表参照)を作製した。On the other hand, samples according to the present invention (see Table 1) were prepared by applying and drying a polymer UV absorber of the present invention in place of the comparative UV absorber and tricresyl phosphate.
保護層のゼラチン量は、比較試料、本発明に係る試料と
も10 IQ/ 100C+’ トシタ。The amount of gelatin in the protective layer was 10 IQ/100C+' for both the comparative sample and the sample according to the present invention.
第1表
各試料を未露光のまま、1部を55℃80%RHの雰囲
気下で7日間保存した後、目視にて表面状態(オイル、
結晶等の出現状態)を観察した。Table 1 After storing one portion of each sample unexposed in an atmosphere of 55°C and 80% RH for 7 days, the surface condition (oil,
The state of appearance of crystals, etc.) was observed.
評価は以下の3段階で行なった。Evaluation was performed in the following three stages.
A 出現中又は無
B 出現中
C出現多
又、未露光の試料を25℃、2部%RHで6時間調湿し
た後、同一空調条件の暗室中において試料の乳剤面側を
ネオブレンゴムローラーで摩擦した後、下記の処理液で
現像、漂白、定着、水洗及び安定化を行ってスタチック
マークの発生度を調べた。A: Appearing or not B Appearing: C Appearing: After conditioning the unexposed sample at 25°C and 2 parts % RH for 6 hours, the emulsion side of the sample was rolled with a neoprene rubber roller in a dark room under the same air conditioning conditions. After rubbing with the following processing solution, development, bleaching, fixing, washing with water, and stabilization were performed using the processing solution shown below, and the degree of occurrence of static marks was examined.
処理工程 温 度 君理時間
(1)現像液・・・・38℃ 3分15秒(2)漂
白・・・・38℃ 4分30秒(3)定 着・・・・
38℃ 4分20秒(4)水 洗・・・・38℃
3分15秒(5)安定化・・・・38℃ 1分05秒
なお現像液、漂白液、定着浴及び安定浴のそれぞれの組
成は次の通りである。Processing process Temperature Time (1) Developing solution...38℃ 3 minutes 15 seconds (2) Floating
White...38℃ 4 minutes 30 seconds (3) Fixation...
38℃ 4 minutes 20 seconds (4) Washing with water...38℃
3 minutes and 15 seconds (5) Stabilization: 38°C, 1 minute and 05 seconds The compositions of the developer, bleach, fixing bath, and stabilizing bath are as follows.
現像液(pH−10,05)
硫酸ヒドロキシアミン 2.594−ア
ミノ−3−メチル−N−
(β−ヒドロキシエチル)アニ
リン硫酸塩 456gジエチ
レントリアミノ六酢酸 475QK2 CO33
0,3g
亜硫酸ナトリウム 4g水を加え
て111とする。Developer (pH-10,05) Hydroxyamine sulfate 2.594-Amino-3-methyl-N-(β-hydroxyethyl)aniline sulfate 456g Diethylenetriaminohexaacetic acid 475QK2 CO33
0.3g Sodium sulfite Add 4g water to make 111.
漂白浴(1)H−5,70)
臭化アンモニウム 173g80%
の酢1 20dEDTA F
e NH4103Q
EDTA 279水を加
えて12とする。Bleach bath (1) H-5,70) Ammonium bromide 173g80%
Vinegar 1 20dEDTA F
e NH4103Q EDTA 279 Add water to make 12.
定着浴(IIH−6,50)
チオ硫酸アンモニウム 800117亜
硫酸ナトリウム 4.6部重亜硫酸
ナトリウム 5,0り水を加えて1り
とする。Fixing bath (IIH-6,50) Ammonium thiosulfate 800117 Sodium sulfite 4.6 parts Sodium bisulfite 5.0 Add water to make 1 part.
安定浴(1)H= 7.30 )
40%のホルマリン 6.61250
%のポリオキシエチル化うウ
リルアルコール Q、6.、Q水
を加えて11とする。Stable bath (1) H = 7.30) 40% formalin 6.61250
% of polyoxyethylated uryl alcohol Q, 6. , Q Add water to make 11.
スタチックマークの発生度は下記A−Dの4段階に評価
した。The degree of occurrence of static marks was evaluated on the following four levels A to D.
A:スタチックマークの発生が認められないB:スタチ
ックマークの発生が少し認められるC:スタチックマー
クの発生がかなり認められるD:スタチックマークの発
生がほぼ全面に認められる
第2表
第2表に示す如く、本発明の試料は、表面状態及びスタ
チックマーク発生度において優れている。A: No static marks are observed B: Some static marks are observed C: A considerable amount of static marks are observed D: Static marks are observed almost on the entire surface Table 2 As shown in Table 2, the samples of the present invention are excellent in surface condition and static mark occurrence.
実施例−2
ポリエチレンで両面ラミネートした紙支持体上に、下記
の各層を支持体側から順次塗設し、多色用ハロゲン化銀
写真感光材料を作成した。Example 2 On a paper support laminated on both sides with polyethylene, the following layers were sequentially coated from the support side to prepare a multicolor silver halide photographic material.
第1層:青感性ハロゲン化銀乳剤層
イエローカプラーとしてα−ピバロイル−α−(2,4
−ジオキソ−1−ベンジルイミダゾリジン−3−イル)
−2−クロロ−5−[γ−(2゜4−ジー t−アミル
フェノキシ)ブチルアミド]アセトアニリドを6.81
11M 100cf、青感性塩臭化銀乳剤(臭化銀85
モル%含有)を銀に換算して3.2mo/ 100cf
、ジ−ブチルフタレートを3,5■/100Ct’、及
びゼラチンを13.5111(]/ 1oocfの塗布
材mとなるように塗設した。1st layer: Blue-sensitive silver halide emulsion layer α-pivaloyl-α-(2,4
-dioxo-1-benzylimidazolidin-3-yl)
-2-chloro-5-[γ-(2゜4-di-t-amylphenoxy)butyramide]acetanilide at 6.81
11M 100cf, blue-sensitive silver chlorobromide emulsion (silver bromide 85
3.2 mo/100 cf in terms of silver (containing mol%)
, di-butyl phthalate at 3.5 cm/100 Ct', and gelatin at a coating weight of 13.5111 (]/1 oocf).
第2層:中間層
2.5−ジー t−オクチルハイドロキノンをo、sm
g/’ 100Ct” 、ジ−ブチルフタレートを0.
5ff1g/ 100Ct’及びゼラチンを9.0mg
/ 100c、pとなる様に塗設した。2nd layer: middle layer 2.5-G t-octylhydroquinone o, sm
g/'100Ct'', di-butyl phthalate 0.
5ff1g/100Ct' and 9.0mg gelatin
/ 100c, p.
第3層:緑感性ハロゲン化銀乳剤層
マゼンタカプラーとして、1− (2,4,6−ドリク
ロロフエニル)−3−(2−りロロー5−テトラデカン
アミドアニリノ)−5−ピラゾロンを4.2+no/
100cf、緑感性塩臭化銀乳剤(臭化銀80モル%含
有)を銀に換算して2.5mG/100Cf。3rd layer: green-sensitive silver halide emulsion layer 1-(2,4,6-dolichlorophenyl)-3-(2-dirollo-5-tetradecanamideanilino)-5-pyrazolone was used as a magenta coupler in 4. 2+no/
100cf, green-sensitive silver chlorobromide emulsion (containing 80 mol% silver bromide) converted to silver is 2.5mG/100Cf.
ジ−ブチルフタレートを3.01(1/ 100Cv’
、及びゼラチンを12.0mg/ 100Cy’とな
る様に塗設した。Dibutyl phthalate at 3.01 (1/100 Cv'
, and gelatin were coated at a concentration of 12.0 mg/100 Cy'.
第4層:中間層
紫外線吸収剤(第3表)、ジ−ブチルフタレート、2,
5−ジー (−オクチルハイドロキノン(0,5mO/
100Cv’ )及びゼラチン<12.011!+/1
00c12)を含有する層。(他の素材の量は第3表に
示す。)
第5層:赤感性ハロゲン化銀乳剤層
シアンカプラーとして2−[α−(2,4−ジー も−
ペンチルフェノキシ)ブタンアミド]−4゜6−ジクロ
ロ−5−エチルフェノールを4.2n+g/100C1
” 、赤感性塩臭化銀乳剤(臭化銀80モル%含有)を
銀に換算して3.On/ 100Cv’、トリクレジル
フォスフェートを3.5mg/ 100c1z及びゼラ
チンを11.5ma/ 10Qcfとなる様に塗設した
。4th layer: Intermediate layer ultraviolet absorber (Table 3), dibutyl phthalate, 2,
5-G (-octylhydroquinone (0.5mO/
100Cv') and gelatin <12.011! +/1
00c12). (Amounts of other materials are shown in Table 3.) 5th layer: Red-sensitive silver halide emulsion layer 2-[α-(2,4-G-
Pentylphenoxy)butanamide]-4゜6-dichloro-5-ethylphenol 4.2n+g/100C1
”, red-sensitive silver chlorobromide emulsion (containing 80 mol% silver bromide) converted to silver is 3.On/100Cv', tricresyl phosphate is 3.5mg/100c1z and gelatin is 11.5ma/10Qcf It was painted so that
第611i:中間層
ゼラチン(101(1/ IQOcf) 、紫外線吸収
剤(第3表)及びジオクチルフタレートを含有する層。No. 611i: Interlayer layer containing gelatin (101 (1/IQOcf)), UV absorber (Table 3) and dioctyl phthalate.
(その他の量は第3表に示すa)
第7層:保護層
ゼラチンを8.010/ 100cfとなる様に塗設し
た。(Other amounts are shown in Table 3 a) 7th layer: Protective layer gelatin was coated at a coating thickness of 8.010/100 cf.
保護層にはゼラチン硬膜剤を適量添加した。An appropriate amount of gelatin hardener was added to the protective layer.
試料のテストピースを未露光のまま、55℃、80%R
Hの雰囲気下で3日間保存した後、目視にて表面状態を
観察した。評価基準は実施例−1と同じである。The test piece of the sample was left unexposed at 55°C and 80% R.
After being stored in an H atmosphere for 3 days, the surface condition was visually observed. The evaluation criteria are the same as in Example-1.
又、未露光の試料を25℃、20%RHで6時間調湿し
た後、同一空調条件の暗空中において試料の乳剤面側を
ネオブレンゴムローラーで摩擦した後、下記の処理液で
現像、漂白、定着、水洗及び安定化を行ってスタチック
マークの発生度を調べた。評価M準は実施例−1と同じ
である。Also, after conditioning the unexposed sample at 25°C and 20% RH for 6 hours, the emulsion side of the sample was rubbed with a neoprene rubber roller in the dark under the same air conditioning conditions, and then developed with the following processing solution. After bleaching, fixing, washing and stabilization, the degree of static mark occurrence was examined. The evaluation standard M is the same as in Example-1.
[処理工程] 処理温度 処理時間発色現像
33℃ 3分30秒漂白定着 33℃
1分30秒水 洗 33℃
3分乾 燥 50〜80℃ 2
分各処理液の成分は以下の通りである。[Processing process] Processing temperature Processing time Color development
33℃ 3 minutes 30 seconds bleach fixing 33℃
Wash with water for 1 minute and 30 seconds at 33℃
Dry for 3 minutes 50-80℃ 2
The components of each treatment solution are as follows.
[発色現像液〕
ベンジルアルコール 12顧ジエチレ
ングリコール 10顧炭酸カリウム
25 Q臭化ナトリウム
0.6g無水亜硫酸ナトリウム
2.09ヒドロキシルアミン硫酸MA
2.5aN−エチル−N−β−メタンスル
ホンアミドエチル−3−メチル−
4−アミンアニリン硫酸塩 4.5g水を加
えて1にとし、Na OHにT pH10,21,:調
整。[Color developer] Benzyl alcohol 12% diethylene glycol 10% potassium carbonate
25 Q Sodium Bromide
0.6g anhydrous sodium sulfite
2.09 Hydroxylamine sulfate MA
2.5aN-ethyl-N-β-methanesulfonamidoethyl-3-methyl-4-amine aniline sulfate 4.5g Water was added to make up to 1, and the pH was adjusted to 10.21 with NaOH.
[漂白定着液]
チオ硫酸アンモニウム 120 Qメタ
重亜硫酸ナトリウム 159無水亜硫酸ナ
トリウム 3qEDTA第2鉄アンモ
ニウム塩 65g水を加えて11とし、I)Hを
6,7〜6.8に調整。[Bleach-fix solution] Ammonium thiosulfate 120 Q Sodium metabisulfite 159 Anhydrous sodium sulfite 3q EDTA ferric ammonium salt 65 g Add water to make 11, and adjust I)H to 6.7 to 6.8.
結果を第3表に示す。The results are shown in Table 3.
第3表より、本発明の試料が比較試料に比べて、表面状
態及びスタチックマークの発生度において優れているこ
とがわかる。又、本発明の中でも試料53及び56の如
く、第6mの付mを増したものが特に良好でおった。Table 3 shows that the samples of the present invention are superior to the comparative samples in terms of surface condition and degree of static mark occurrence. Also, among the samples of the present invention, those in which the 6th m was increased, such as Samples 53 and 56, were particularly good.
[本発明の効果1
以上詳細に説明したように、本発明の重合体を用いるこ
とにより、スタチックマークの改良及び過酷な条件下で
の保存による表面状態の悪化の防止が可能であり、更に
WI膜化が可能となる。[Effect of the present invention 1 As explained in detail above, by using the polymer of the present invention, it is possible to improve static marks and prevent deterioration of surface condition due to storage under harsh conditions, and It becomes possible to form a WI film.
Claims (1)
を有するハロゲン化銀写真感光材料において、下記一般
式[A]で示される反復構造単位を含むポリウレタン又
はポリ尿素を含有することを特徴とするハロゲン化銀写
真感光材料。 一般式[A] Q−(Y)−_n (式中、Qは紫外線吸収性化合物のn価の残基を表わし
、Yは−O−または−NRo−を表わし、Roは水素原
子、アルキル基、シクロアルキル基またはフェニル基を
表わし、nは2〜4の整数である。)[Scope of Claims] A silver halide photographic material having at least one light-sensitive silver halide emulsion layer on a support, comprising a polyurethane or polyurea containing a repeating structural unit represented by the following general formula [A]. A silver halide photographic material comprising: General formula [A] Q-(Y)-_n (wherein, Q represents an n-valent residue of an ultraviolet absorbing compound, Y represents -O- or -NRo-, and Ro is a hydrogen atom, an alkyl group , represents a cycloalkyl group or a phenyl group, and n is an integer of 2 to 4.)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20074186A JPS6356651A (en) | 1986-08-27 | 1986-08-27 | Silver halide photographic sensitive material preventing sweating phenomenon and formation of static mark |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP20074186A JPS6356651A (en) | 1986-08-27 | 1986-08-27 | Silver halide photographic sensitive material preventing sweating phenomenon and formation of static mark |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6356651A true JPS6356651A (en) | 1988-03-11 |
Family
ID=16429397
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP20074186A Pending JPS6356651A (en) | 1986-08-27 | 1986-08-27 | Silver halide photographic sensitive material preventing sweating phenomenon and formation of static mark |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6356651A (en) |
Cited By (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7132216B2 (en) * | 1999-11-30 | 2006-11-07 | Brewer Science Inc. | Non-aromatic chromophores for use in polymer anti-reflective coatings |
WO2008123504A1 (en) | 2007-03-30 | 2008-10-16 | Fujifilm Corporation | Ultraviolet ray absorber composition |
WO2009101932A1 (en) | 2008-02-13 | 2009-08-20 | Fujifilm Corporation | Photosensitive color composition, color filter and method for producing the same |
WO2009123109A1 (en) | 2008-03-31 | 2009-10-08 | 富士フイルム株式会社 | Photosensitive transparent resin composition, process for production of color filters, and color filters |
WO2009136624A1 (en) | 2008-05-09 | 2009-11-12 | 富士フイルム株式会社 | Ultraviolet absorbent composition |
EP2157130A1 (en) | 2008-08-21 | 2010-02-24 | Fujifilm Corporation | Photosensitive resin composition, color filter and method of producing the same, and solid-state imaging device |
WO2010024441A1 (en) | 2008-09-01 | 2010-03-04 | 富士フイルム株式会社 | Ultraviolet absorbing agent composition |
WO2011062198A1 (en) | 2009-11-20 | 2011-05-26 | 富士フイルム株式会社 | Dispersion composition, photosensitive resin composition, and solid-state image pickup element |
WO2012015076A1 (en) | 2010-07-29 | 2012-02-02 | Fujifilm Corporation | Polymerizable composition |
WO2013038974A1 (en) | 2011-09-14 | 2013-03-21 | Fujifilm Corporation | Colored radiation-sensitive composition for color filter, pattern forming method, color filter and method of producing the same, and solid-state image sensor |
WO2013099945A1 (en) | 2011-12-28 | 2013-07-04 | 富士フイルム株式会社 | Optical member set and solid-state image pickup element using same |
WO2013099948A1 (en) | 2011-12-28 | 2013-07-04 | 富士フイルム株式会社 | Optical member set and solid-state image sensor using same |
WO2014034815A1 (en) | 2012-08-31 | 2014-03-06 | 富士フイルム株式会社 | Dispersion composition, and curable composition, transparent film, microlens and solid-state imaging element using same |
WO2014034813A1 (en) | 2012-08-31 | 2014-03-06 | 富士フイルム株式会社 | Dispersion composition, and curable composition, transparent film, microlens and solid-state imaging element using same, and polymer compound |
WO2014034814A1 (en) | 2012-08-31 | 2014-03-06 | 富士フイルム株式会社 | Dispersion composition, and curable composition, transparent film, microlens and solid-state imaging element using same |
WO2014104137A1 (en) | 2012-12-28 | 2014-07-03 | 富士フイルム株式会社 | Curable resin composition, infrared cut-off filter, and solid-state imaging element using same |
WO2014104136A1 (en) | 2012-12-28 | 2014-07-03 | 富士フイルム株式会社 | Curable resin composition for forming infrared-reflecting film, infrared-reflecting film and manufacturing method therefor, infrared cut-off filter, and solid-state imaging element using same |
WO2014103628A1 (en) | 2012-12-27 | 2014-07-03 | 富士フイルム株式会社 | Composition for color filter, infrared transmission filter and method for manufacturing infrared transmission filter, and infrared sensor |
CN103965133A (en) * | 2013-01-31 | 2014-08-06 | 华东理工大学 | N, S heterocycle-containing compound having DHODH inhibition activity, preparation and use thereof |
CN103965134A (en) * | 2013-01-31 | 2014-08-06 | 华东理工大学 | N, S-containing heterocyclic compound with nematicidal activity, preparation method and application thereof |
-
1986
- 1986-08-27 JP JP20074186A patent/JPS6356651A/en active Pending
Cited By (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7132216B2 (en) * | 1999-11-30 | 2006-11-07 | Brewer Science Inc. | Non-aromatic chromophores for use in polymer anti-reflective coatings |
WO2008123504A1 (en) | 2007-03-30 | 2008-10-16 | Fujifilm Corporation | Ultraviolet ray absorber composition |
WO2009101932A1 (en) | 2008-02-13 | 2009-08-20 | Fujifilm Corporation | Photosensitive color composition, color filter and method for producing the same |
WO2009123109A1 (en) | 2008-03-31 | 2009-10-08 | 富士フイルム株式会社 | Photosensitive transparent resin composition, process for production of color filters, and color filters |
WO2009136624A1 (en) | 2008-05-09 | 2009-11-12 | 富士フイルム株式会社 | Ultraviolet absorbent composition |
EP2157130A1 (en) | 2008-08-21 | 2010-02-24 | Fujifilm Corporation | Photosensitive resin composition, color filter and method of producing the same, and solid-state imaging device |
WO2010024441A1 (en) | 2008-09-01 | 2010-03-04 | 富士フイルム株式会社 | Ultraviolet absorbing agent composition |
WO2011062198A1 (en) | 2009-11-20 | 2011-05-26 | 富士フイルム株式会社 | Dispersion composition, photosensitive resin composition, and solid-state image pickup element |
WO2012015076A1 (en) | 2010-07-29 | 2012-02-02 | Fujifilm Corporation | Polymerizable composition |
WO2013038974A1 (en) | 2011-09-14 | 2013-03-21 | Fujifilm Corporation | Colored radiation-sensitive composition for color filter, pattern forming method, color filter and method of producing the same, and solid-state image sensor |
WO2013099945A1 (en) | 2011-12-28 | 2013-07-04 | 富士フイルム株式会社 | Optical member set and solid-state image pickup element using same |
WO2013099948A1 (en) | 2011-12-28 | 2013-07-04 | 富士フイルム株式会社 | Optical member set and solid-state image sensor using same |
WO2014034815A1 (en) | 2012-08-31 | 2014-03-06 | 富士フイルム株式会社 | Dispersion composition, and curable composition, transparent film, microlens and solid-state imaging element using same |
WO2014034813A1 (en) | 2012-08-31 | 2014-03-06 | 富士フイルム株式会社 | Dispersion composition, and curable composition, transparent film, microlens and solid-state imaging element using same, and polymer compound |
WO2014034814A1 (en) | 2012-08-31 | 2014-03-06 | 富士フイルム株式会社 | Dispersion composition, and curable composition, transparent film, microlens and solid-state imaging element using same |
EP3124548A1 (en) | 2012-08-31 | 2017-02-01 | FUJIFILM Corporation | Dispersion composition, curable composition using the same, transparent film, microlens, and solid-state imaging device |
EP3135733A1 (en) | 2012-08-31 | 2017-03-01 | FUJIFILM Corporation | Dispersion composition, and curable composition, transparent film, microlens and solid-state imaging element using same |
WO2014103628A1 (en) | 2012-12-27 | 2014-07-03 | 富士フイルム株式会社 | Composition for color filter, infrared transmission filter and method for manufacturing infrared transmission filter, and infrared sensor |
WO2014104137A1 (en) | 2012-12-28 | 2014-07-03 | 富士フイルム株式会社 | Curable resin composition, infrared cut-off filter, and solid-state imaging element using same |
WO2014104136A1 (en) | 2012-12-28 | 2014-07-03 | 富士フイルム株式会社 | Curable resin composition for forming infrared-reflecting film, infrared-reflecting film and manufacturing method therefor, infrared cut-off filter, and solid-state imaging element using same |
CN103965133A (en) * | 2013-01-31 | 2014-08-06 | 华东理工大学 | N, S heterocycle-containing compound having DHODH inhibition activity, preparation and use thereof |
CN103965134A (en) * | 2013-01-31 | 2014-08-06 | 华东理工大学 | N, S-containing heterocyclic compound with nematicidal activity, preparation method and application thereof |
WO2014117677A1 (en) * | 2013-01-31 | 2014-08-07 | 华东理工大学 | Compound containing n, s heterocycle and having nematocidal activity, preparation method and use thereof |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPS6356651A (en) | Silver halide photographic sensitive material preventing sweating phenomenon and formation of static mark | |
JPS6353544A (en) | Silver halide photographic sensitive material preventing sweating phenomenon and formation of static mark | |
JPH0152742B2 (en) | ||
JPH0619524B2 (en) | Silver halide photographic light-sensitive material which prevents sweating phenomenon and static marking | |
JPS5814668B2 (en) | Syashinyougenzoyaku | |
JPS6326377B2 (en) | ||
JPH06509078A (en) | Activated propenes as color couplers and their production method | |
JPS6113748B2 (en) | ||
JPS59113438A (en) | Photosensitive silver halide material | |
JPH0643607A (en) | Polymer material constituted while containing blocked photographically available group and multicolor photographic element | |
JPS59111644A (en) | Silver halide photosensitive material | |
JPS6355542A (en) | Silver halide photographic sensitive material preventing sweating phenomenon and formation of static mark | |
JPS6355543A (en) | Silver halide photographic sensitive material preventing sweating phenomenon and formation of static mark | |
JPS6037459B2 (en) | Cyan coupler for photography | |
JPS6257024B2 (en) | ||
JPH03226750A (en) | Silver halide color photographic sensitive material | |
JPS6365438A (en) | Silver halide photographic sensitive material having improved pressure fog | |
JPH01309057A (en) | Silver halide photographic composition | |
JP3245762B2 (en) | Silver halide color photographic light-sensitive material | |
JP3254455B2 (en) | Silver halide color photographic light-sensitive material | |
JPH0384546A (en) | Silver halide color photographic sensitive material | |
JPS6280646A (en) | Silver halide photographic sensitive material | |
JPH04157457A (en) | Silver halide photosensitive material for color photograph | |
JPS61256345A (en) | Silver halide photographic sensitive material | |
JPS6381425A (en) | Silver halide photographic sensitive material |