JPS63300867A - Abrasive grain and surface treatment using said abrasive grain - Google Patents
Abrasive grain and surface treatment using said abrasive grainInfo
- Publication number
- JPS63300867A JPS63300867A JP13784887A JP13784887A JPS63300867A JP S63300867 A JPS63300867 A JP S63300867A JP 13784887 A JP13784887 A JP 13784887A JP 13784887 A JP13784887 A JP 13784887A JP S63300867 A JPS63300867 A JP S63300867A
- Authority
- JP
- Japan
- Prior art keywords
- aqueous solution
- acid
- frozen
- degreasing
- sodium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000006061 abrasive grain Substances 0.000 title claims abstract description 36
- 238000004381 surface treatment Methods 0.000 title claims abstract description 10
- 239000007864 aqueous solution Substances 0.000 claims abstract description 55
- 238000000034 method Methods 0.000 claims abstract description 36
- 238000005238 degreasing Methods 0.000 claims abstract description 27
- 238000005530 etching Methods 0.000 claims abstract description 25
- 150000003839 salts Chemical class 0.000 claims abstract description 18
- 239000002253 acid Substances 0.000 claims abstract description 17
- 239000003513 alkali Substances 0.000 claims abstract description 13
- 239000010419 fine particle Substances 0.000 claims description 32
- 238000005498 polishing Methods 0.000 claims description 19
- 239000007788 liquid Substances 0.000 abstract description 40
- 239000002245 particle Substances 0.000 abstract description 24
- 238000005422 blasting Methods 0.000 abstract description 23
- 239000002826 coolant Substances 0.000 abstract 1
- 239000003507 refrigerant Substances 0.000 description 26
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 20
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- 229910001868 water Inorganic materials 0.000 description 17
- 239000004576 sand Substances 0.000 description 16
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 15
- 238000011282 treatment Methods 0.000 description 10
- 238000011084 recovery Methods 0.000 description 9
- 238000003860 storage Methods 0.000 description 8
- 230000008014 freezing Effects 0.000 description 7
- 238000007710 freezing Methods 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- WGLPBDUCMAPZCE-UHFFFAOYSA-N chromium trioxide Inorganic materials O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 238000005406 washing Methods 0.000 description 5
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 4
- -1 that is Substances 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 229910000831 Steel Inorganic materials 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- XTVVROIMIGLXTD-UHFFFAOYSA-N copper(II) nitrate Chemical compound [Cu+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XTVVROIMIGLXTD-UHFFFAOYSA-N 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 239000008187 granular material Substances 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000001488 sodium phosphate Substances 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- 239000010959 steel Substances 0.000 description 3
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- XTEGARKTQYYJKE-UHFFFAOYSA-M Chlorate Chemical class [O-]Cl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-M 0.000 description 2
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- CSNNHWWHGAXBCP-UHFFFAOYSA-L Magnesium sulfate Chemical compound [Mg+2].[O-][S+2]([O-])([O-])[O-] CSNNHWWHGAXBCP-UHFFFAOYSA-L 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 239000003082 abrasive agent Substances 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- IWOUKMZUPDVPGQ-UHFFFAOYSA-N barium nitrate Chemical compound [Ba+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O IWOUKMZUPDVPGQ-UHFFFAOYSA-N 0.000 description 2
- 150000001642 boronic acid derivatives Chemical class 0.000 description 2
- 150000001649 bromium compounds Chemical class 0.000 description 2
- YKYOUMDCQGMQQO-UHFFFAOYSA-L cadmium dichloride Chemical compound Cl[Cd]Cl YKYOUMDCQGMQQO-UHFFFAOYSA-L 0.000 description 2
- ZCCIPPOKBCJFDN-UHFFFAOYSA-N calcium nitrate Chemical compound [Ca+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ZCCIPPOKBCJFDN-UHFFFAOYSA-N 0.000 description 2
- 235000011089 carbon dioxide Nutrition 0.000 description 2
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical class [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 description 2
- PHFQLYPOURZARY-UHFFFAOYSA-N chromium trinitrate Chemical compound [Cr+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PHFQLYPOURZARY-UHFFFAOYSA-N 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- LVXHNCUCBXIIPE-UHFFFAOYSA-L disodium;hydrogen phosphate;hydrate Chemical compound O.[Na+].[Na+].OP([O-])([O-])=O LVXHNCUCBXIIPE-UHFFFAOYSA-L 0.000 description 2
- 150000002222 fluorine compounds Chemical class 0.000 description 2
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical class Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 description 2
- VCJMYUPGQJHHFU-UHFFFAOYSA-N iron(3+);trinitrate Chemical compound [Fe+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O VCJMYUPGQJHHFU-UHFFFAOYSA-N 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Chemical compound [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 2
- IIPYXGDZVMZOAP-UHFFFAOYSA-N lithium nitrate Chemical compound [Li+].[O-][N+]([O-])=O IIPYXGDZVMZOAP-UHFFFAOYSA-N 0.000 description 2
- YIXJRHPUWRPCBB-UHFFFAOYSA-N magnesium nitrate Chemical compound [Mg+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O YIXJRHPUWRPCBB-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 150000002823 nitrates Chemical class 0.000 description 2
- ZODDGFAZWTZOSI-UHFFFAOYSA-N nitric acid;sulfuric acid Chemical compound O[N+]([O-])=O.OS(O)(=O)=O ZODDGFAZWTZOSI-UHFFFAOYSA-N 0.000 description 2
- 150000007524 organic acids Chemical class 0.000 description 2
- 235000005985 organic acids Nutrition 0.000 description 2
- AQSJGOWTSHOLKH-UHFFFAOYSA-N phosphite(3-) Chemical class [O-]P([O-])[O-] AQSJGOWTSHOLKH-UHFFFAOYSA-N 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 229920003023 plastic Polymers 0.000 description 2
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 2
- KMUONIBRACKNSN-UHFFFAOYSA-N potassium dichromate Chemical compound [K+].[K+].[O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O KMUONIBRACKNSN-UHFFFAOYSA-N 0.000 description 2
- FGIUAXJPYTZDNR-UHFFFAOYSA-N potassium nitrate Chemical compound [K+].[O-][N+]([O-])=O FGIUAXJPYTZDNR-UHFFFAOYSA-N 0.000 description 2
- 150000004760 silicates Chemical class 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- JHJLBTNAGRQEKS-UHFFFAOYSA-M sodium bromide Chemical compound [Na+].[Br-] JHJLBTNAGRQEKS-UHFFFAOYSA-M 0.000 description 2
- FQENQNTWSFEDLI-UHFFFAOYSA-J sodium diphosphate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]P([O-])(=O)OP([O-])([O-])=O FQENQNTWSFEDLI-UHFFFAOYSA-J 0.000 description 2
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 2
- VWDWKYIASSYTQR-UHFFFAOYSA-N sodium nitrate Chemical compound [Na+].[O-][N+]([O-])=O VWDWKYIASSYTQR-UHFFFAOYSA-N 0.000 description 2
- GEHJYWRUCIMESM-UHFFFAOYSA-L sodium sulfite Chemical compound [Na+].[Na+].[O-]S([O-])=O GEHJYWRUCIMESM-UHFFFAOYSA-L 0.000 description 2
- DHEQXMRUPNDRPG-UHFFFAOYSA-N strontium nitrate Chemical compound [Sr+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O DHEQXMRUPNDRPG-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 150000004763 sulfides Chemical class 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 2
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 2
- 150000004764 thiosulfuric acid derivatives Chemical class 0.000 description 2
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 2
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 2
- 235000019801 trisodium phosphate Nutrition 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- ONDPHDOFVYQSGI-UHFFFAOYSA-N zinc nitrate Chemical compound [Zn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O ONDPHDOFVYQSGI-UHFFFAOYSA-N 0.000 description 2
- QLOKJRIVRGCVIM-UHFFFAOYSA-N 1-[(4-methylsulfanylphenyl)methyl]piperazine Chemical compound C1=CC(SC)=CC=C1CN1CCNCC1 QLOKJRIVRGCVIM-UHFFFAOYSA-N 0.000 description 1
- PAWQVTBBRAZDMG-UHFFFAOYSA-N 2-(3-bromo-2-fluorophenyl)acetic acid Chemical compound OC(=O)CC1=CC=CC(Br)=C1F PAWQVTBBRAZDMG-UHFFFAOYSA-N 0.000 description 1
- JHWIEAWILPSRMU-UHFFFAOYSA-N 2-methyl-3-pyrimidin-4-ylpropanoic acid Chemical compound OC(=O)C(C)CC1=CC=NC=N1 JHWIEAWILPSRMU-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- CBOCVOKPQGJKKJ-UHFFFAOYSA-L Calcium formate Chemical compound [Ca+2].[O-]C=O.[O-]C=O CBOCVOKPQGJKKJ-UHFFFAOYSA-L 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 1
- OCUCCJIRFHNWBP-IYEMJOQQSA-L Copper gluconate Chemical compound [Cu+2].OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O.OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O OCUCCJIRFHNWBP-IYEMJOQQSA-L 0.000 description 1
- RGHNJXZEOKUKBD-SQOUGZDYSA-M D-gluconate Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O RGHNJXZEOKUKBD-SQOUGZDYSA-M 0.000 description 1
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- XWROUVVQGRRRMF-UHFFFAOYSA-N F.O[N+]([O-])=O Chemical compound F.O[N+]([O-])=O XWROUVVQGRRRMF-UHFFFAOYSA-N 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical class Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000005819 Potassium phosphonate Substances 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- 206010036790 Productive cough Diseases 0.000 description 1
- 239000004115 Sodium Silicate Substances 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- VMHLLURERBWHNL-UHFFFAOYSA-M Sodium acetate Chemical compound [Na+].CC([O-])=O VMHLLURERBWHNL-UHFFFAOYSA-M 0.000 description 1
- 239000004280 Sodium formate Substances 0.000 description 1
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- 235000011054 acetic acid Nutrition 0.000 description 1
- LXFUCSMCVAEMCD-UHFFFAOYSA-N acetic acid;nitric acid;phosphoric acid Chemical compound CC(O)=O.O[N+]([O-])=O.OP(O)(O)=O LXFUCSMCVAEMCD-UHFFFAOYSA-N 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- ILRRQNADMUWWFW-UHFFFAOYSA-K aluminium phosphate Chemical compound O1[Al]2OP1(=O)O2 ILRRQNADMUWWFW-UHFFFAOYSA-K 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- DIZPMCHEQGEION-UHFFFAOYSA-H aluminium sulfate (anhydrous) Chemical compound [Al+3].[Al+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O DIZPMCHEQGEION-UHFFFAOYSA-H 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N ammonia Natural products N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 235000012501 ammonium carbonate Nutrition 0.000 description 1
- KHPLPBHMTCTCHA-UHFFFAOYSA-N ammonium chlorate Chemical compound N.OCl(=O)=O KHPLPBHMTCTCHA-UHFFFAOYSA-N 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- VBIXEXWLHSRNKB-UHFFFAOYSA-N ammonium oxalate Chemical compound [NH4+].[NH4+].[O-]C(=O)C([O-])=O VBIXEXWLHSRNKB-UHFFFAOYSA-N 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- 238000002048 anodisation reaction Methods 0.000 description 1
- 238000007743 anodising Methods 0.000 description 1
- QZPSXPBJTPJTSZ-UHFFFAOYSA-N aqua regia Chemical compound Cl.O[N+]([O-])=O QZPSXPBJTPJTSZ-UHFFFAOYSA-N 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- WDIHJSXYQDMJHN-UHFFFAOYSA-L barium chloride Chemical compound [Cl-].[Cl-].[Ba+2] WDIHJSXYQDMJHN-UHFFFAOYSA-L 0.000 description 1
- 229910001626 barium chloride Inorganic materials 0.000 description 1
- UPBWPRFVGWGSOM-UHFFFAOYSA-L barium(2+);disulfamate Chemical compound [Ba+2].NS([O-])(=O)=O.NS([O-])(=O)=O UPBWPRFVGWGSOM-UHFFFAOYSA-L 0.000 description 1
- 239000008280 blood Substances 0.000 description 1
- 210000004369 blood Anatomy 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 210000000481 breast Anatomy 0.000 description 1
- XIEPJMXMMWZAAV-UHFFFAOYSA-N cadmium nitrate Inorganic materials [Cd+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O XIEPJMXMMWZAAV-UHFFFAOYSA-N 0.000 description 1
- QCUOBSQYDGUHHT-UHFFFAOYSA-L cadmium sulfate Chemical compound [Cd+2].[O-]S([O-])(=O)=O QCUOBSQYDGUHHT-UHFFFAOYSA-L 0.000 description 1
- 229910000331 cadmium sulfate Inorganic materials 0.000 description 1
- XFHMDVKMKRZMIF-UHFFFAOYSA-L cadmium(2+);disulfamate Chemical compound [Cd+2].NS([O-])(=O)=O.NS([O-])(=O)=O XFHMDVKMKRZMIF-UHFFFAOYSA-L 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- AXCZMVOFGPJBDE-UHFFFAOYSA-L calcium dihydroxide Chemical compound [OH-].[OH-].[Ca+2] AXCZMVOFGPJBDE-UHFFFAOYSA-L 0.000 description 1
- 239000004281 calcium formate Substances 0.000 description 1
- 235000019255 calcium formate Nutrition 0.000 description 1
- 229940044172 calcium formate Drugs 0.000 description 1
- 239000004227 calcium gluconate Substances 0.000 description 1
- 235000013927 calcium gluconate Nutrition 0.000 description 1
- 229960004494 calcium gluconate Drugs 0.000 description 1
- 239000000920 calcium hydroxide Substances 0.000 description 1
- 229910001861 calcium hydroxide Inorganic materials 0.000 description 1
- NEEHYRZPVYRGPP-UHFFFAOYSA-L calcium;2,3,4,5,6-pentahydroxyhexanoate Chemical compound [Ca+2].OCC(O)C(O)C(O)C(O)C([O-])=O.OCC(O)C(O)C(O)C(O)C([O-])=O NEEHYRZPVYRGPP-UHFFFAOYSA-L 0.000 description 1
- RSIPQRDGPVEGLE-UHFFFAOYSA-L calcium;disulfamate Chemical compound [Ca+2].NS([O-])(=O)=O.NS([O-])(=O)=O RSIPQRDGPVEGLE-UHFFFAOYSA-L 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- XTEGARKTQYYJKE-UHFFFAOYSA-N chloric acid Chemical compound OCl(=O)=O XTEGARKTQYYJKE-UHFFFAOYSA-N 0.000 description 1
- 229940005991 chloric acid Drugs 0.000 description 1
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 1
- GRWVQDDAKZFPFI-UHFFFAOYSA-H chromium(III) sulfate Chemical compound [Cr+3].[Cr+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O GRWVQDDAKZFPFI-UHFFFAOYSA-H 0.000 description 1
- 235000015165 citric acid Nutrition 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- UFMZWBIQTDUYBN-UHFFFAOYSA-N cobalt dinitrate Chemical compound [Co+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O UFMZWBIQTDUYBN-UHFFFAOYSA-N 0.000 description 1
- 229910001981 cobalt nitrate Inorganic materials 0.000 description 1
- 229910000361 cobalt sulfate Inorganic materials 0.000 description 1
- 229940044175 cobalt sulfate Drugs 0.000 description 1
- KTVIXTQDYHMGHF-UHFFFAOYSA-L cobalt(2+) sulfate Chemical compound [Co+2].[O-]S([O-])(=O)=O KTVIXTQDYHMGHF-UHFFFAOYSA-L 0.000 description 1
- WLQXLCXXAPYDIU-UHFFFAOYSA-L cobalt(2+);disulfamate Chemical compound [Co+2].NS([O-])(=O)=O.NS([O-])(=O)=O WLQXLCXXAPYDIU-UHFFFAOYSA-L 0.000 description 1
- 229940108925 copper gluconate Drugs 0.000 description 1
- 229910000365 copper sulfate Inorganic materials 0.000 description 1
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 description 1
- ZQLBQWDYEGOYSW-UHFFFAOYSA-L copper;disulfamate Chemical compound [Cu+2].NS([O-])(=O)=O.NS([O-])(=O)=O ZQLBQWDYEGOYSW-UHFFFAOYSA-L 0.000 description 1
- 229960003280 cupric chloride Drugs 0.000 description 1
- 235000011180 diphosphates Nutrition 0.000 description 1
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 description 1
- YXXXKCDYKKSZHL-UHFFFAOYSA-M dipotassium;dioxido(oxo)phosphanium Chemical compound [K+].[K+].[O-][P+]([O-])=O YXXXKCDYKKSZHL-UHFFFAOYSA-M 0.000 description 1
- BNIILDVGGAEEIG-UHFFFAOYSA-L disodium hydrogen phosphate Chemical compound [Na+].[Na+].OP([O-])([O-])=O BNIILDVGGAEEIG-UHFFFAOYSA-L 0.000 description 1
- 229910000397 disodium phosphate Inorganic materials 0.000 description 1
- 235000019800 disodium phosphate Nutrition 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 239000011790 ferrous sulphate Substances 0.000 description 1
- 235000003891 ferrous sulphate Nutrition 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229940050410 gluconate Drugs 0.000 description 1
- 239000000174 gluconic acid Substances 0.000 description 1
- 235000012208 gluconic acid Nutrition 0.000 description 1
- 229960004275 glycolic acid Drugs 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 150000003840 hydrochlorides Chemical class 0.000 description 1
- 150000004679 hydroxides Chemical class 0.000 description 1
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- SQZYOZWYVFYNFV-UHFFFAOYSA-L iron(2+);disulfamate Chemical compound [Fe+2].NS([O-])(=O)=O.NS([O-])(=O)=O SQZYOZWYVFYNFV-UHFFFAOYSA-L 0.000 description 1
- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 description 1
- 229910000359 iron(II) sulfate Inorganic materials 0.000 description 1
- 229910000360 iron(III) sulfate Inorganic materials 0.000 description 1
- VRIVJOXICYMTAG-IYEMJOQQSA-L iron(ii) gluconate Chemical compound [Fe+2].OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O.OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O VRIVJOXICYMTAG-IYEMJOQQSA-L 0.000 description 1
- RLJMLMKIBZAXJO-UHFFFAOYSA-N lead nitrate Chemical compound [O-][N+](=O)O[Pb]O[N+]([O-])=O RLJMLMKIBZAXJO-UHFFFAOYSA-N 0.000 description 1
- INHCSSUBVCNVSK-UHFFFAOYSA-L lithium sulfate Inorganic materials [Li+].[Li+].[O-]S([O-])(=O)=O INHCSSUBVCNVSK-UHFFFAOYSA-L 0.000 description 1
- TWRXJAOTZQYOKJ-UHFFFAOYSA-L magnesium chloride Substances [Mg+2].[Cl-].[Cl-] TWRXJAOTZQYOKJ-UHFFFAOYSA-L 0.000 description 1
- 229910001629 magnesium chloride Inorganic materials 0.000 description 1
- 229910052943 magnesium sulfate Inorganic materials 0.000 description 1
- 235000019341 magnesium sulphate Nutrition 0.000 description 1
- NNNSKJSUQWKSAM-UHFFFAOYSA-L magnesium;dichlorate Chemical compound [Mg+2].[O-]Cl(=O)=O.[O-]Cl(=O)=O NNNSKJSUQWKSAM-UHFFFAOYSA-L 0.000 description 1
- 229940099596 manganese sulfate Drugs 0.000 description 1
- 239000011702 manganese sulphate Substances 0.000 description 1
- 235000007079 manganese sulphate Nutrition 0.000 description 1
- MIVBAHRSNUNMPP-UHFFFAOYSA-N manganese(2+);dinitrate Chemical compound [Mn+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O MIVBAHRSNUNMPP-UHFFFAOYSA-N 0.000 description 1
- SQQMAOCOWKFBNP-UHFFFAOYSA-L manganese(II) sulfate Chemical compound [Mn+2].[O-]S([O-])(=O)=O SQQMAOCOWKFBNP-UHFFFAOYSA-L 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- LNOPIUAQISRISI-UHFFFAOYSA-N n'-hydroxy-2-propan-2-ylsulfonylethanimidamide Chemical compound CC(C)S(=O)(=O)CC(N)=NO LNOPIUAQISRISI-UHFFFAOYSA-N 0.000 description 1
- 238000006386 neutralization reaction Methods 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- KBJMLQFLOWQJNF-UHFFFAOYSA-N nickel(ii) nitrate Chemical compound [Ni+2].[O-][N+]([O-])=O.[O-][N+]([O-])=O KBJMLQFLOWQJNF-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- VXAPDXVBDZRZKP-UHFFFAOYSA-N nitric acid phosphoric acid Chemical compound O[N+]([O-])=O.OP(O)(O)=O VXAPDXVBDZRZKP-UHFFFAOYSA-N 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- NMHMNPHRMNGLLB-UHFFFAOYSA-N phloretic acid Chemical compound OC(=O)CCC1=CC=C(O)C=C1 NMHMNPHRMNGLLB-UHFFFAOYSA-N 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- VKJKEPKFPUWCAS-UHFFFAOYSA-M potassium chlorate Chemical compound [K+].[O-]Cl(=O)=O VKJKEPKFPUWCAS-UHFFFAOYSA-M 0.000 description 1
- 239000001103 potassium chloride Substances 0.000 description 1
- 235000011164 potassium chloride Nutrition 0.000 description 1
- HEAFNBIOTNKFMJ-UHFFFAOYSA-M potassium dihydrogen phosphate hydrofluoride Chemical class F.[K+].OP(O)([O-])=O HEAFNBIOTNKFMJ-UHFFFAOYSA-M 0.000 description 1
- WFIZEGIEIOHZCP-UHFFFAOYSA-M potassium formate Chemical compound [K+].[O-]C=O WFIZEGIEIOHZCP-UHFFFAOYSA-M 0.000 description 1
- SATVIFGJTRRDQU-UHFFFAOYSA-N potassium hypochlorite Chemical compound [K+].Cl[O-] SATVIFGJTRRDQU-UHFFFAOYSA-N 0.000 description 1
- 239000004323 potassium nitrate Substances 0.000 description 1
- 235000010333 potassium nitrate Nutrition 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- OTYBMLCTZGSZBG-UHFFFAOYSA-L potassium sulfate Chemical compound [K+].[K+].[O-]S([O-])(=O)=O OTYBMLCTZGSZBG-UHFFFAOYSA-L 0.000 description 1
- 229910052939 potassium sulfate Inorganic materials 0.000 description 1
- DPLVEEXVKBWGHE-UHFFFAOYSA-N potassium sulfide Chemical compound [S-2].[K+].[K+] DPLVEEXVKBWGHE-UHFFFAOYSA-N 0.000 description 1
- 235000011151 potassium sulphates Nutrition 0.000 description 1
- BTAAXEFROUUDIL-UHFFFAOYSA-M potassium;sulfamate Chemical compound [K+].NS([O-])(=O)=O BTAAXEFROUUDIL-UHFFFAOYSA-M 0.000 description 1
- 239000003380 propellant Substances 0.000 description 1
- 229940005657 pyrophosphoric acid Drugs 0.000 description 1
- 150000003236 pyrrolines Chemical class 0.000 description 1
- 238000004062 sedimentation Methods 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- HELHAJAZNSDZJO-OLXYHTOASA-L sodium L-tartrate Chemical compound [Na+].[Na+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O HELHAJAZNSDZJO-OLXYHTOASA-L 0.000 description 1
- 239000001632 sodium acetate Substances 0.000 description 1
- 235000017281 sodium acetate Nutrition 0.000 description 1
- 229960004249 sodium acetate Drugs 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- PXLIDIMHPNPGMH-UHFFFAOYSA-N sodium chromate Chemical compound [Na+].[Na+].[O-][Cr]([O-])(=O)=O PXLIDIMHPNPGMH-UHFFFAOYSA-N 0.000 description 1
- 239000001509 sodium citrate Substances 0.000 description 1
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 1
- 239000011775 sodium fluoride Substances 0.000 description 1
- 235000013024 sodium fluoride Nutrition 0.000 description 1
- HLBBKKJFGFRGMU-UHFFFAOYSA-M sodium formate Chemical compound [Na+].[O-]C=O HLBBKKJFGFRGMU-UHFFFAOYSA-M 0.000 description 1
- 235000019254 sodium formate Nutrition 0.000 description 1
- VILMUCRZVVVJCA-UHFFFAOYSA-M sodium glycolate Chemical compound [Na+].OCC([O-])=O VILMUCRZVVVJCA-UHFFFAOYSA-M 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- 239000004317 sodium nitrate Substances 0.000 description 1
- 235000010344 sodium nitrate Nutrition 0.000 description 1
- ZNCPFRVNHGOPAG-UHFFFAOYSA-L sodium oxalate Chemical compound [Na+].[Na+].[O-]C(=O)C([O-])=O ZNCPFRVNHGOPAG-UHFFFAOYSA-L 0.000 description 1
- 229940039790 sodium oxalate Drugs 0.000 description 1
- BAZAXWOYCMUHIX-UHFFFAOYSA-M sodium perchlorate Chemical compound [Na+].[O-]Cl(=O)(=O)=O BAZAXWOYCMUHIX-UHFFFAOYSA-M 0.000 description 1
- 229940048086 sodium pyrophosphate Drugs 0.000 description 1
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 1
- 229910052911 sodium silicate Inorganic materials 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 229910052979 sodium sulfide Inorganic materials 0.000 description 1
- GRVFOGOEDUUMBP-UHFFFAOYSA-N sodium sulfide (anhydrous) Chemical compound [Na+].[Na+].[S-2] GRVFOGOEDUUMBP-UHFFFAOYSA-N 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 235000010265 sodium sulphite Nutrition 0.000 description 1
- 239000001433 sodium tartrate Substances 0.000 description 1
- 229960002167 sodium tartrate Drugs 0.000 description 1
- 235000011004 sodium tartrates Nutrition 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- QDWYPRSFEZRKDK-UHFFFAOYSA-M sodium;sulfamate Chemical compound [Na+].NS([O-])(=O)=O QDWYPRSFEZRKDK-UHFFFAOYSA-M 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 210000003802 sputum Anatomy 0.000 description 1
- 208000024794 sputum Diseases 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 239000004575 stone Substances 0.000 description 1
- 229910001631 strontium chloride Inorganic materials 0.000 description 1
- AHBGXTDRMVNFER-UHFFFAOYSA-L strontium dichloride Chemical compound [Cl-].[Cl-].[Sr+2] AHBGXTDRMVNFER-UHFFFAOYSA-L 0.000 description 1
- PHUJCVAICLQULC-UHFFFAOYSA-L strontium;disulfamate Chemical compound [Sr+2].NS([O-])(=O)=O.NS([O-])(=O)=O PHUJCVAICLQULC-UHFFFAOYSA-L 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical class NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- ISIJQEHRDSCQIU-UHFFFAOYSA-N tert-butyl 2,7-diazaspiro[4.5]decane-7-carboxylate Chemical compound C1N(C(=O)OC(C)(C)C)CCCC11CNCC1 ISIJQEHRDSCQIU-UHFFFAOYSA-N 0.000 description 1
- RBTVSNLYYIMMKS-UHFFFAOYSA-N tert-butyl 3-aminoazetidine-1-carboxylate;hydrochloride Chemical compound Cl.CC(C)(C)OC(=O)N1CC(N)C1 RBTVSNLYYIMMKS-UHFFFAOYSA-N 0.000 description 1
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 1
- 235000019818 tetrasodium diphosphate Nutrition 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- UEUXEKPTXMALOB-UHFFFAOYSA-J tetrasodium;2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxylatomethyl)amino]acetate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]C(=O)CN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O UEUXEKPTXMALOB-UHFFFAOYSA-J 0.000 description 1
- ADUQGQSOYWRHCA-UHFFFAOYSA-J tetrasodium;hydroxide;phosphate Chemical compound [OH-].[Na+].[Na+].[Na+].[Na+].[O-]P([O-])([O-])=O ADUQGQSOYWRHCA-UHFFFAOYSA-J 0.000 description 1
- SFKTYEXKZXBQRQ-UHFFFAOYSA-J thorium(4+);tetrahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[Th+4] SFKTYEXKZXBQRQ-UHFFFAOYSA-J 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
- NCPXQVVMIXIKTN-UHFFFAOYSA-N trisodium;phosphite Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])[O-] NCPXQVVMIXIKTN-UHFFFAOYSA-N 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
- GTQFPPIXGLYKCZ-UHFFFAOYSA-L zinc chlorate Chemical compound [Zn+2].[O-]Cl(=O)=O.[O-]Cl(=O)=O GTQFPPIXGLYKCZ-UHFFFAOYSA-L 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
- YDJJYISOOCYHQU-UHFFFAOYSA-L zinc;disulfamate Chemical compound [Zn+2].NS([O-])(=O)=O.NS([O-])(=O)=O YDJJYISOOCYHQU-UHFFFAOYSA-L 0.000 description 1
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、凍結微粒よりなる砥粒、および該砥粒を用い
て被処理物体をブラスト処理することにより該物体の表
面処理を行う方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to abrasive grains made of frozen fine particles, and a method for surface treating an object by blasting the object using the abrasive grains. be.
従来の技術
アルミニムおよびアルミニウム合金の展延材、鋳造材な
どの素地に硫酸陽極酸化処理を行うに際しては、一般に
次のような前処理工程を設けることが必要である。BACKGROUND OF THE INVENTION When performing sulfuric acid anodization treatment on a substrate such as a rolled or cast aluminum or aluminum alloy material, it is generally necessary to perform the following pretreatment process.
（ｉ）機械研磨−説脂一木洗、または、（ｉｉ）機械研
磨−説脂一水洗一エッチングー水洗
機械研磨法としては、ブラスト研磨、研磨布紙研磨、ブ
ラシ研磨、グラインダバフ研磨、パフ研磨、スチールウ
ール研磨などがあるが、ブラスト研磨により仕上げを行
う方法が重要性が高い。(i) Mechanical polishing - degreasing, one wood wash, or (ii) mechanical polishing - degreasing, one water wash, etching - water washing Mechanical polishing methods include blast polishing, abrasive cloth polishing, brush polishing, grinder buff polishing, and puff polishing. , steel wool polishing, etc., but finishing by blast polishing is more important.
ところで、被処理物体をブラスト研磨仕上げするための
研磨材、つまり砥粒としては、従来より、ケイ砂、アル
ミナ゛、鋼球などが用いられている。By the way, silica sand, alumina, steel balls, etc. have conventionally been used as abrasives, that is, abrasive grains, for finishing the object by blast polishing.
また最近では、水を液体窒素等の冷媒に噴霧して製造し
た凍結微粒（氷粒）をブラスト用の砥粒として用いる方
法が開発されている。Recently, a method has been developed in which frozen particles (ice particles) produced by spraying water onto a refrigerant such as liquid nitrogen are used as abrasive particles for blasting.
さらに、氷粒あるいはドライアイス粒にそれよりも微細
な砂を結合一体化した砥粒も提案されている、（たとえ
ば特開昭６１−７５３００号公報）
発明が解決しようとする問題点
くサンド砥粒の問題点〉
しかしながら、ケイ砂、アルミナ、鋼球などでできた砥
粒（以下サンド砥粒という）を用いると、ブラスト作業
に際し大量の粉塵が飛散、浮遊するため作業環境が著し
く低下する上、ブラスト後の被処理物体表面にこの砥粒
が残存するため、その除去に少なからぬ手間を要すると
いう問題点がある。Furthermore, abrasive grains in which finer sand is bonded to ice grains or dry ice grains have also been proposed (e.g., Japanese Patent Application Laid-Open No. 1983-75300). Problems with grains> However, when using abrasive grains made of silica sand, alumina, steel balls, etc. (hereinafter referred to as sand abrasive grains), a large amount of dust is scattered and suspended during blasting work, which significantly degrades the working environment. Since the abrasive grains remain on the surface of the object to be treated after blasting, there is a problem in that considerable effort is required to remove them.
なお、サンド砥粒を用いてのブラスト工程後には２、別
途脱脂工程やエツチング工程を設けて脱脂やエツチング
を行わなければならない。Note that after the blasting process using sand abrasive grains, a separate degreasing process or etching process must be performed to perform degreasing and etching.
〈氷粒砥粒の問題点〉
これに対し、水を凍結させて製造した凍結微粒（以下氷
粒という）からなる砥粒は、ブラスト操作後は融解して
水に戻るため、粉塵の発生のおそれは解消し、残存する
砥粒の除去も不必要となるが、氷粒の比重が小さいため
に被処理物体に十分の衝撃を与えることが難しく、研磨
効率が劣るという問題点がある。そのため、サンド砥粒
に比しコストが高いという不利を上まわる利点が必ずし
も見当らず、広く普及するまでには至っていない。<Problems with ice grain abrasives> On the other hand, abrasive grains made of frozen fine grains (hereinafter referred to as ice grains) produced by freezing water melt back into water after the blasting operation, so they are less likely to generate dust. This problem is eliminated, and the removal of the remaining abrasive grains becomes unnecessary, but since the specific gravity of the ice grains is small, it is difficult to apply a sufficient impact to the object to be processed, resulting in a problem that the polishing efficiency is poor. Therefore, it cannot be seen that there are any advantages that outweigh the disadvantage of high cost compared to sand abrasive grains, and it has not become widespread.
また、この氷粒を用いる方法にあっては、上記のように
ブラスト操作後の砥粒の除去工程が省略できるという利
点はあるものの、ブラスト工程後に脱脂工程やエツチン
グ工程を設けて脱脂やエツチングを行わなければならな
い点ではサンド砥粒を用いる場合と変りはなく、この点
での工程的な利点はない。Furthermore, although this method using ice particles has the advantage of omitting the step of removing abrasive grains after the blasting operation as described above, it is necessary to include a degreasing step and an etching step after the blasting step to perform degreasing and etching. The steps that must be taken are the same as when using sand abrasive grains, and there is no process advantage in this respect.
〈氷粒／サンド結合砥粒の問題点〉
氷粒あるいはドライアイス粒にそれよりも微細な砂を結
合一体化した砥粒を用いる方法は、上記のようなサンド
砥粒を用いる場合の不利、および氷粒を用いる場合の不
利を軽減しようとするものであるが、氷粒に砂を一体化
するのに新たな工程を要し、また得られる粒子が大きく
なりすぎるため精密研磨には適用しがたく、やはり実用
的には問題がある。<Problems with ice/sand bonded abrasive grains> The method of using abrasive grains in which finer sand is bonded to ice grains or dry ice grains has the disadvantages of using sand abrasive grains as described above. This method attempts to alleviate the disadvantages of using sand and ice grains, but it requires a new process to integrate the sand into the ice grains, and the resulting particles are too large, so it cannot be applied to precision polishing. However, there are practical problems.
またこの方法にあっては、ブラスト操作後の砥粒の除去
工程を省略することができない点ではかえって氷粒を用
いる方法よりも不利であり、さらにはブラスト工程後に
脱脂工程やエツチング工程を設けて脱脂やエツチングを
行わなければならない点ではサンド砥粒を用いる場合と
変るところがなく、結局この方法では工程的な面での利
点が期待できない。Furthermore, this method is more disadvantageous than the method using ice grains in that the step of removing abrasive grains after the blasting operation cannot be omitted, and furthermore, it requires a degreasing step and an etching step after the blasting step. There is no difference from using sand abrasive grains in that degreasing and etching must be carried out, and in the end this method cannot be expected to have any advantages in terms of process.
く本発明の目的〉
本発明は、このような従来の方法における問題点を一挙
に解決しうる砥粒、および該砥粒を用いて被処理物体の
表面処理を行う方法を見出すことを目的になされたもの
である。OBJECTS OF THE INVENTION The purpose of the present invention is to find an abrasive grain that can solve all of the problems in conventional methods, and a method of surface treating an object using the abrasive grain. It has been done.
問題点を解決するための手段
本発明は、「脱脂またはエツチング作用を有する酸、ア
ルカリまたは塩の水溶液から形成した凍結微粒よりなる
砥粒、ｊをその要旨とするものである。Means for Solving the Problems The gist of the present invention is ``abrasive grains made of frozen fine particles formed from an aqueous solution of acid, alkali, or salt having a degreasing or etching action.
また本発明は、「脱脂またはエツチング作用を有する酸
、アルカリまたは塩の水溶液から形成した凍結微粒より
なる砥粒を用いて被処理物体をブラスト処理し、研磨と
同時に、脱脂または／およびエツチングを行うことを特
徴とする被処理物体の表面処理方法、」をその要旨とす
るものである。In addition, the present invention provides a method for blasting an object to be treated using abrasive grains made of frozen fine particles formed from an aqueous solution of an acid, alkali, or a salt having a degreasing or etching action, and degreasing and/or etching the object at the same time as polishing. ``A method for surface treatment of an object to be treated,'' characterized by the following.
以下本発明の詳細な説明する。The present invention will be explained in detail below.
、アルカリま−は
本発明における酸、アルカリまたは塩としては、次に例
示するような化合物のいずれかあるいはこれらの混合物
のうち、脱脂またはエツチング作用を有するものが用い
られる。単に防錆作用のみを奏するもの（たとえばリン
酸三ナトリウムの単独使用）は、本発明の目的には適当
でないので、除外される。As the acid, alkali or salt in the present invention, any one of the following compounds or a mixture thereof having a degreasing or etching action can be used. Those that merely have a rust-preventing effect (for example, the use of trisodium phosphate alone) are not suitable for the purpose of the present invention and are therefore excluded.
シュウ酸、クエン酸、グルコン酸、酒石酸、ギ酸、酢酸
、ヒドロキシ酢酸、エチレンシアミンチ゛トラ酢酸など
の有機酸。Organic acids such as oxalic acid, citric acid, gluconic acid, tartaric acid, formic acid, acetic acid, hydroxyacetic acid, and ethylenecyamine ditraacetic acid.
これらの有機酸の塩、たとえば、シュウ酸ナトリウム、
シュウ酸アンモニウム、クエン酸ナトリラム、クエン酸
アンモニウム、グルコン酸カルシウム、グルコン酸鉄、
グルコン酸銅、グルコン酸鉛、酒石酸ナトリウム、ギ酸
ナトリウム、ギ酸カリウム、ギ酸カルシウム、酢酸ナト
リウム、ヒドロキシ酢酸ナトリウム、エチレンジアミン
テトラ酢酸ナトリウムなど。Salts of these organic acids, such as sodium oxalate,
Ammonium oxalate, sodium citrate, ammonium citrate, calcium gluconate, iron gluconate,
Copper gluconate, lead gluconate, sodium tartrate, sodium formate, potassium formate, calcium formate, sodium acetate, sodium hydroxyacetate, sodium ethylenediaminetetraacetate, etc.
硫酸、硝酸、塩酸、フッ化水素酸、リン酸、亜リン酸、
ピロリン酸、スルファミン酸、塩素酸、過塩素酸、ホウ
酸などの無機酸。Sulfuric acid, nitric acid, hydrochloric acid, hydrofluoric acid, phosphoric acid, phosphorous acid,
Inorganic acids such as pyrophosphoric acid, sulfamic acid, chloric acid, perchloric acid, and boric acid.
これらの無機酸の塩、たとえば、硫酸塩、硝酸塩、塩酸
塩（塩化物）、臭化水素酸塩（臭化物）、フッ化水素酸
塩（フッ化物）、リン酸塩、亜リン酸塩、ピロリン酸塩
、アミドスルホン酸塩（スルファミン酸塩）、塩素酸塩
、過塩素酸塩、ホウ酸塩など。そのほか亜硫酸塩、クロ
ム酸塩、重クロム酸塩、ケイ酸塩、炭酸塩、次亜塩素酸
塩、チオ硫酸塩、硫化物など。Salts of these inorganic acids, such as sulfates, nitrates, hydrochlorides (chlorides), hydrobromides (bromides), hydrofluorides (fluorides), phosphates, phosphites, pyrrolines acid salts, amidosulfonates (sulfamates), chlorates, perchlorates, borates, etc. Other substances include sulfites, chromates, dichromates, silicates, carbonates, hypochlorites, thiosulfates, and sulfides.
具体的には、硫酸リチウム、硫酸ナトリウム、硫酸カリ
ウム、硫酸マグネシウム、硫酸亜鉛、硫酸カドミウム、
硫酸第一鉄、硫酸第二鉄、硫酸コバルト、硫酸ニッケル
、硫酸銅、硫酸アルミニウム、硫酸クロム、硫酸マンガ
ン、硫酸アンモニウムなどの硫酸塩；
硝酸リチウム、硝酸ナトリウム、硝酸カリウム、硝酸マ
グネシウム、硝酸カルシウム、硝酸ストロンチウム、硝
酸バリウム、硝酸亜鉛、硝酸カドミウム、硝酸第二鉄、
硝酸コバルト、硝酸ニッケル、硝酸第二銅、硝酸銀、悄
酸アルミニウム、硝酸鉛、硝酸クロム、硝酸マンガン、
硝酸アンモニウムなどの硝酸塩；
塩化リチウム、塩化ナトリウム、塩化カリウム、−塩化
マグネシウム、塩化カルシウム、塩化ストロンチウム、
塩化バリウム、塩化亜鉛、塩化カドミウム、塩化第二鉄
、塩化コバルト、塩化ニッケル、塩化第二銅、塩化クロ
ム、塩化アンモニウムなどの塩化物；
臭化リチウム、臭化ナトリウムなどの臭化物；フッ化ナ
トリウム、フッ化カリウムなどのフッ化物ニ
リン酸−ナトリウム、リン酸二ナトリウム、リン酸三ナ
トリウムなどのリン酸塩；
ピロリン酸ナトリウム、ピロリン酸カリウムなどのピロ
リン酸塩；
亜リン酸ナトリウム、亜リン酸カリウムなどの亜リン酸
塩；
アミドスルホン酸ナトリウム、アミドスルホン酸カリウ
ム、アミドスルホン酸カルシウム、アミドスルホン酸バ
リウム、アミドスルホン酸ストロンチウム、アミドスル
ホン酸亜鉛、アミドスルホン酸カドミウム、アミドスル
ホン酸鉄、アミドスルホン酸コバルト、アミドスルホン
酸銅などの７ミドスルホン酸塩；
塩素酸ナトリウム、塩素酸カリウム、塩素酸ナトリウム
、塩素酸アンモニウム、塩素酸マグネシウム、塩素酸亜
鉛などの塩素酸塩；
過塩素酸ナトリウムなどの過塩素酸塩；ホウ砂などのホ
ウ酸塩；
亜硫酸ナトリウムなどの亜硫酸塩；
クロム酸ナトリウム、クロム酸カリウムなどのクロム酸
塩；
重クロム酸ナトリウム、重クロム酸カリウムなどの重ク
ロム酸塩；
ケイ酸ナトリウム、ケイ酸カリウムなどのケイ酸塩；
炭酸ナトリウム、炭酸カリウム、炭酸アンモニウムなど
の炭酸塩；
次亜塩素酸ナトリウム、次亜塩素酸カリウムなどの次亜
塩素酸塩；
千オ硫酸ナトリウムなどのチオ硫酸塩；硫化ナトリウム
、硫化カリウムなどの硫化物。Specifically, lithium sulfate, sodium sulfate, potassium sulfate, magnesium sulfate, zinc sulfate, cadmium sulfate,
Sulfates such as ferrous sulfate, ferric sulfate, cobalt sulfate, nickel sulfate, copper sulfate, aluminum sulfate, chromium sulfate, manganese sulfate, ammonium sulfate; lithium nitrate, sodium nitrate, potassium nitrate, magnesium nitrate, calcium nitrate, strontium nitrate , barium nitrate, zinc nitrate, cadmium nitrate, ferric nitrate,
Cobalt nitrate, nickel nitrate, cupric nitrate, silver nitrate, aluminum phosphate, lead nitrate, chromium nitrate, manganese nitrate,
Nitrates such as ammonium nitrate; lithium chloride, sodium chloride, potassium chloride, -magnesium chloride, calcium chloride, strontium chloride,
Chlorides such as barium chloride, zinc chloride, cadmium chloride, ferric chloride, cobalt chloride, nickel chloride, cupric chloride, chromium chloride, ammonium chloride; Bromides such as lithium bromide and sodium bromide; sodium fluoride, Fluorides such as potassium fluoride Phosphates such as sodium diphosphate, disodium phosphate, and trisodium phosphate; Pyrophosphates such as sodium pyrophosphate and potassium pyrophosphate; Sodium phosphite, potassium phosphite, etc. phosphites; sodium amidosulfonate, potassium amidosulfonate, calcium amidosulfonate, barium amidosulfonate, strontium amidosulfonate, zinc amidosulfonate, cadmium amidosulfonate, iron amidosulfonate, cobalt amidosulfonate , 7-midosulfonates such as copper amidosulfonate; chlorates such as sodium chlorate, potassium chlorate, sodium chlorate, ammonium chlorate, magnesium chlorate, zinc chlorate; perchlorates such as sodium perchlorate Salt; borates such as borax; sulfites such as sodium sulfite; chromates such as sodium chromate and potassium chromate; dichromates such as sodium dichromate and potassium dichromate; sodium silicate; Silicates such as potassium silicate; Carbonates such as sodium carbonate, potassium carbonate, and ammonium carbonate; Hypochlorites such as sodium hypochlorite and potassium hypochlorite; Thiosulfates such as sodium periosulfate ; Sulfides such as sodium sulfide and potassium sulfide.
水酸化物、たとえば、水酸化ナトリウム、水、酸化カリ
ウム、水酸化リチウム、水酸化カルシウム、水酸化アン
モニウム（アンモニア水）など。Hydroxides, such as sodium hydroxide, water, potassium oxide, lithium hydroxide, calcium hydroxide, ammonium hydroxide (aqueous ammonia), etc.
上記各種の化合物の混合物、たとえば、硝酸−塩酸、硫
酸−硝酸、リン酸−硝酸、リン酸−硝酸−酢酸、リン酸
−硝酸一酢酸一塩化銅、硫酸−硝一、フッ化水素酸−硝
酸、リン酸ナトリウム−水酸化ナトリウム、硫酸−無水
クロム酸、リン酸−無水クロム酸など。Mixtures of the various compounds mentioned above, such as nitric acid-hydrochloric acid, sulfuric acid-nitric acid, phosphoric acid-nitric acid, phosphoric acid-nitric acid-acetic acid, phosphoric acid-nitric acid monoacetic acid copper monochloride, sulfuric acid-nitric acid, hydrofluoric acid-nitric acid , sodium phosphate-sodium hydroxide, sulfuric acid-chromic anhydride, phosphoric acid-chromic anhydride, etc.
上述の酸、アルカリまたは塩の中では、脱脂作用を有す
るものの例として、水酸化ナトリウム、水酸化ナトリウ
ム−リン酸ナトリウム、エツチング作用を有するものの
例として、水酸化ナトリウム、水酸化ナトリウム−リン
酸ナトリウム、硫酸−無水クロム酸などが特に好適に用
いられる。Among the acids, alkalis, and salts mentioned above, examples of those having a degreasing action include sodium hydroxide, sodium hydroxide-sodium phosphate, and examples of those having an etching action include sodium hydroxide and sodium hydroxide-sodium phosphate. , sulfuric acid-chromic anhydride, etc. are particularly preferably used.
友血痰ユ】ｌ
上述のような脱脂またはエツチング作用を有する酸、ア
ルカリまたは塩を水に溶解して水溶液を調製する。水溶
液中の酸、アルカリまたは塩の濃度は広い範囲から選択
されるが、通常は０．１重量％ないし飽和濃度の範囲の
適当な濃度に設定する。好ましい範囲は１〜５０重量％
、さらに好ましい範囲は２〜４０重量％である。[Friend Blood Sputum Yu] l An aqueous solution is prepared by dissolving in water an acid, alkali or salt having a degreasing or etching effect as described above. The concentration of acid, alkali or salt in the aqueous solution can be selected from a wide range, but is usually set at an appropriate concentration in the range of 0.1% by weight to saturation concentration. The preferred range is 1 to 50% by weight.
A more preferable range is 2 to 40% by weight.
水溶液の凝固点は、凍結の容易さや凍結微粒の強度等を
考慮して、−５０℃以上であることが好ましい。The freezing point of the aqueous solution is preferably −50° C. or higher in consideration of ease of freezing, strength of frozen fine particles, and the like.
速ＪＬＩＬ粒１０１造
上述のような脱脂またはエツチング作用を有する酸、ア
ルカリまたは塩の水溶液を微粒状に凍結させる代表的な
方法としては、適当な貯留容器に収容した冷奴液面上に
ａ ＩＨＪ器を用いて一ヒ記水溶液を散布する方法があ
げられる。散布器のノズル孔の大きさや吐出圧を調整す
れば、凍結微粒の粒径を所１７ｊの範囲に設定できる。Quick JLIL Granules 101 Production A typical method for freezing an aqueous solution of an acid, alkali or salt having a degreasing or etching action as described above into fine particles is to freeze it in an IHJ device on the surface of the cold liquid stored in a suitable storage container. An example of this method is to spray the aqueous solution as described in 1-1 above. By adjusting the size and discharge pressure of the nozzle hole of the sprayer, the particle size of the frozen fine particles can be set within the range 17j.
冷奴液としては、液体窒素、液体空気などが好適に用い
られる。場合により液化炭酸ガス等の液化ガス、融点の
低い炭化水素等の４１機溶剤を用いることもある。As the chilled liquid, liquid nitrogen, liquid air, etc. are suitably used. In some cases, a 41 solvent such as a liquefied gas such as liquefied carbon dioxide or a hydrocarbon with a low melting point may be used.
静１１−シた冷媒液面に水溶液を散布すると、形成した
凍結微粒上に後続の凍結微粒が蓄積して増粒するという
トラブルを生ずることがある。When an aqueous solution is sprinkled on a static refrigerant liquid surface, subsequent frozen fine particles may accumulate on the formed frozen fine particles and increase the size of the particles.
このトラブルを避けるためには、散布器を回転または移
動させるか、冷奴液面を水平面内において移動させるか
して、冷奴液面の同一個所に水溶液の液滴が落下しない
ように留意することが好ましい。To avoid this problem, be careful not to drop droplets of the aqueous solution onto the same spot on the chilled liquid surface by rotating or moving the sprayer or by moving the chilled liquid surface in a horizontal plane. preferable.
また、貯留容器に収容した冷々Ｖ液面にさざなみを発生
させながら、そこに水溶液を噴霧する方法も有効である
。この方法によれば、微粒同士の固着成長が防１Ｆでき
るだけでなく、装置の小型化および一層の微粒化が図ら
れる。It is also effective to spray the aqueous solution onto the surface of the cold V liquid stored in the storage container while generating ripples there. According to this method, not only can the adhesion and growth of fine particles to each other be prevented by 1F, but also the size of the apparatus and further atomization can be achieved.
さざなみを発生させる手段としては、たとえば、（ｉ）
冷媒液内へガスまたは液体を噴出させる方法、（ｂ）貯
留容器の内部または外部の振動子を振動させる方法、（
→冷媒液内の発振子を発振させる方法、（Φ冷奴液面に
ガスまたは液体を噴出する方法、（ｄ）容器自体に振と
う力を加える方法などが採用される。Examples of means for generating ripples include (i)
A method of ejecting gas or liquid into a refrigerant liquid, (b) a method of vibrating a vibrator inside or outside a storage container, (
→Methods such as causing an oscillator in the refrigerant liquid to oscillate, (Φ) spouting gas or liquid onto the liquid surface, and (d) applying shaking force to the container itself are employed.
人通口［理
脱脂またはエツチング作用を有する酸、アルカリまたは
塩の水溶液を冷媒液と接触させて微粒状に凍結固化させ
た後は、得られた凍結微粒を用いて被処理物体の表面処
理を行う。[After the aqueous solution of acid, alkali, or salt that has a degreasing or etching effect is brought into contact with a refrigerant liquid and frozen and solidified into fine particles, the obtained frozen fine particles are used to treat the surface of the object to be treated. conduct.
被処理物体としては、金属、プラスチックス成形物１石
材、ガラス、構築物、各種装置・機器などがあげられ、
特に金属が重要である。Objects to be processed include metals, plastics, molded materials, stones, glass, structures, and various devices and equipment.
Metals are particularly important.
被処理物体の処理は、Ｌ記で得られた凍結微粒よりなる
砥粒を圧縮空気、加圧水、その他の噴射剤と）（に、被
処理物体表面にブラストすることにより行われる。これ
により被処理物体の表面は研磨される。ブラストによる
表面什ヒ状態は、砥粒の種類・粒度、ブラスト時間、ブ
ラスト圧、ノズル−被処理物体間の距離などに応じて定
まる。The treatment of the object to be treated is carried out by blasting the abrasive grains made of frozen fine particles obtained in Section L with compressed air, pressurized water, or other propellant onto the surface of the object to be treated. The surface of the object is polished. The surface condition due to blasting is determined depending on the type and particle size of the abrasive grains, the blasting time, the blasting pressure, the distance between the nozzle and the object to be treated, etc.
この際、被処理物体のブラストと同時に、脱脂または／
およびエツチングが達成できる。At this time, at the same time as blasting the object to be treated, degreasing or/
and etching can be achieved.
ブラスト操作後の被処理物体に対しては、必要に応じ中
和処理や水洗処理などの後処理を行う。After the blasting operation, the object to be treated is subjected to post-treatments such as neutralization treatment and water washing treatment as necessary.
一方、被処理物体に衝突した後の砥粒（凍結微粒）は融
解して水溶液に戻るので、この水溶液をリサイクルして
縁り返し砥粒の製造に用いる。On the other hand, since the abrasive grains (frozen fine grains) that have collided with the object to be treated melt and return to an aqueous solution, this aqueous solution is recycled and used to produce edge-returning abrasive grains.
作 用 酸、アルカリまたは塩の水溶液を噴霧すると。For production When sprayed with aqueous solutions of acids, alkalis or salts.
水溶液の液滴は落下中の表面張力によりほぼ球形となっ
た状態で冷媒液面ヒに落下し、直ちに凍結微粒となる。The droplets of the aqueous solution fall to the refrigerant liquid level in a nearly spherical state due to the surface tension during falling, and immediately become frozen fine particles.
形成した凍結微粒は、酸、アルカリまたは塩の水溶液を
微粒状に凍結固化してなるものであるので、単に水を凍
結したものに比べて比重が大きく、従ってこれを被処理
物体にプラストすると、連動エネルギーが大きいために
必要な衝撃力を有するようになり、研磨が短時間内に確
実になされる。比重が大きいことは、噴霧した水溶液が
冷媒液と接触して凍結微粒となったときの沈降速度がＩ
瞥先まり、冷媒液面に微粒が堆積して微粒同士が固着し
、増粒するというトラブルが軽減されることにも役立つ
。しかも機械的研磨と同時に、脱脂またはエツチングが
達成できる。The formed frozen particles are made by freezing and solidifying an aqueous solution of acid, alkali or salt into fine particles, so they have a higher specific gravity than simply frozen water. Since the interlocking energy is large, it has the necessary impact force, and polishing can be done reliably within a short time. A high specific gravity means that the sedimentation rate when the sprayed aqueous solution comes into contact with the refrigerant liquid and becomes frozen fine particles is I.
It also helps to reduce the problem of fine particles accumulating on the refrigerant liquid surface, sticking to each other, and increasing the size of the particles. Furthermore, degreasing or etching can be accomplished simultaneously with mechanical polishing.
ブラスト後の砥粒（凍結微粒）は融解して水溶液に戻る
。After blasting, the abrasive grains (frozen fine grains) melt and return to an aqueous solution.
実 施 例 次に実施例をあげて本発明をさらに説明する。Example Next, the present invention will be further explained with reference to Examples.
以下「％」とあるのは、重敬％である。Hereinafter, "%" refers to % with high regard.
実施例１
第１図は２本発明の処理方法の一例を示した工程図であ
る。Example 1 FIG. 1 is a process diagram showing an example of the treatment method of the present invention.
人乳型ｒ
（１）は水溶液貯槽であり、ここに水溶液が収容される
。Human breast type r (1) is an aqueous solution storage tank, and an aqueous solution is stored here.
（２）は微粒発生装置本体であり、（３）は噴霧器、（
４）は微粒取出装置の一例としてのスクリューコンベア
である。(2) is the main body of the particle generator, (3) is the sprayer, (
4) is a screw conveyor as an example of a particle extraction device.
（５）は水溶液供給管路、（６）は水溶液供給ポンプ、
（７）は回収冷気管路である。(5) is an aqueous solution supply pipe, (6) is an aqueous solution supply pump,
(7) is a recovery cold air conduit.
（８）は取出された凍結微粒を蓄積するホッパー、（９
）はブラストガンである。(8) is a hopper for accumulating the frozen fine particles taken out;
) is a blast gun.
（１０）は冷媒液供給管路、（１１） 、 （１２）は
熱交換器、（１３） 、 （１４）は分岐管路であ
る。(10) is a refrigerant liquid supply pipe, (11) and (12) are heat exchangers, and (13) and (14) are branch pipes.
（１５）は処理室、（１６）は被処理物体である。(15) is a processing chamber, and (16) is an object to be processed.
（１７）は水溶液回収管路、（１８）は回収ポンプ、（
１９）は清炸器の一例としてのフィルターである。(17) is the aqueous solution recovery pipe, (18) is the recovery pump, (
19) is a filter as an example of a clean bomber.
水溶液貯槽（１）内の水溶液は、水溶液供給ポンプ（６
）により水溶液供給管路（５）を経て、噴’Ｊ３（３）
のノズルから微粒発生装置本体（２）に噴霧状で導入さ
れるが、水溶液供給管路（５）を流れるｆｌｆｉに回収
冷気管路（７）との間で熱交換され、予備的に冷却され
る。The aqueous solution in the aqueous solution storage tank (1) is supplied by the aqueous solution supply pump (6
) via the aqueous solution supply pipe (5),
It is introduced in the form of a spray from the nozzle into the main body of the particle generator (2), but it is preliminarily cooled by heat exchange between flfi flowing through the aqueous solution supply pipe (5) and the collected cold air pipe (7). Ru.
冷媒液供給管路（１０）からの冷媒液は、微粒発生装置
本体（２）に導入される。The refrigerant liquid from the refrigerant liquid supply pipe (10) is introduced into the particle generator main body (2).
該冷媒液供給管路（ｌＯ）から分岐した分岐管路（１３
）は熱交換器（１１）を経て前記水溶液供給管路（５）
に連絡しており、冷媒液は熱交換器（１１）にて気化さ
れて水溶液供給管路（５）との連絡部で水溶液と混合さ
れ、前記噴霧器（３）に送られる。A branch pipe (13) branched from the refrigerant liquid supply pipe (lO).
) is connected to the aqueous solution supply pipe (5) via the heat exchanger (11).
The refrigerant liquid is vaporized in the heat exchanger (11), mixed with the aqueous solution at the connection with the aqueous solution supply pipe (5), and sent to the atomizer (3).
また、該冷媒液供給管路（ｌＯ）から分岐したもう一方
の分岐管路（１４）は熱交換器（１２）を経てブラスト
ガン（９）にｉ！ｆｌ絡しており、冷媒液は熱交換器（
１２）にて気化されてブラストガン（９）に至る。Further, the other branch pipe (14) branched from the refrigerant liquid supply pipe (lO) is connected to the blast gun (9) via the heat exchanger (12). The refrigerant liquid is connected to the heat exchanger (
12) and reaches the blast gun (9).
微粒発生装置本体（２）においては、■二部に設置した
噴霧器（３）から水溶液が噴霧され、一方冷媒液供給管
路（１０）からは冷媒液が導入される。噴霧された水溶
液の液滴は冷媒液面に落下し、冷媒液と接触して直ちに
凍結微粒となり、冷奴液中を沈降する。In the particulate generator main body (2), an aqueous solution is sprayed from a sprayer (3) installed in the second part, while a refrigerant liquid is introduced from a refrigerant liquid supply pipe (10). The droplets of the sprayed aqueous solution fall on the refrigerant liquid surface, contact the refrigerant liquid, immediately become frozen fine particles, and settle in the chilled liquid.
形成された凍結微粒は、微粒取出装置（４）によって取
出されてホッパー（８）に一時的に貯留され、ついでそ
の底部から切出される。そして前記分岐管路（１４）内
の冷媒液の気化したガスと合してブラストガン（９）に
至り、ここでＩＥ縮空気流と共に処理室（１５）内の被
処理物体（１６）の表面にプラストされる。The formed frozen granules are taken out by a granule extraction device (4), temporarily stored in a hopper (8), and then cut out from the bottom thereof. Then, it is combined with the vaporized gas of the refrigerant liquid in the branch pipe (14) and reaches the blast gun (9), where it is delivered to the surface of the object to be treated (16) in the treatment chamber (15) together with the IE condensed air flow. will be added to.
ブラスト後の凍結微粒は、融解して処理室（１５）底部
に貯り、回収ポンプ（１８）により水溶液回収管路（１
７）を通って水溶液貯槽（１）に戻る。The frozen fine particles after blasting are thawed and accumulated at the bottom of the processing chamber (15), and are sent to the aqueous solution recovery pipe (1) by the recovery pump (18).
7) and returns to the aqueous solution storage tank (1).
なおその際、水溶液回収管路（１７）の途中に設けたフ
ィルター（１９）により、水溶液中に混在する異物等が
除去される。At this time, foreign substances mixed in the aqueous solution are removed by a filter (19) provided in the middle of the aqueous solution recovery pipe (17).
瓦証蓋立ス１
１−記試験装置を用いて被処理物体の一例としてのアル
ミニウム板（ＪＩＳ Ｈ４０００、ＭＬＪＦＰ、番号
ｉ ｏａｏ板）の処理を行った。凍結微粒製造用の水溶
液としては３０％水酸化ナトリウム水溶液を用い、また
冷媒液としては液体窒素を用いた。EXAMPLE 1 An aluminum plate (JIS H4000, MLJFP, No. ioao plate) as an example of the object to be processed was processed using the testing apparatus described in 1-1. A 30% aqueous sodium hydroxide solution was used as the aqueous solution for producing frozen fine particles, and liquid nitrogen was used as the refrigerant liquid.
試験条件は次の通りに設定した。The test conditions were set as follows.
水溶液貯槽（１）中の水溶液温度 １０℃ 微粒発生装置本体（２）中の冷媒液深さ００ｍｍ 冷奴液面と噴霧器（３）のノズル先端との間の距２１Ｆ ００ｍｍ 微粒発生装置本体（２）中の冷媒液温度−１９６℃ プラストガン（９）と被処理物体（１６）との間の距離 ０ｍｍ 結果を第１表に示す。Aqueous solution temperature in aqueous solution storage tank (1) 10℃ Refrigerant liquid depth in the particle generator main body (2) 00mm Distance 21F between the chilled liquid level and the nozzle tip of the sprayer (3) 00mm Refrigerant liquid temperature in the particulate generator main body (2) -196°C Distance between the plastic gun (9) and the object to be treated (16) 0mm The results are shown in Table 1.
比較例１
３０％水酸化すトリウム水溶液に代えて水を用いたほか
は実施例１と同様にして凍結微粒の製造および表面処理
試験を行った。Comparative Example 1 Frozen fine particles were produced and a surface treatment test was conducted in the same manner as in Example 1, except that water was used in place of the 30% aqueous solution of thorium hydroxide.
結果を第１表に併せて示す。The results are also shown in Table 1.
第１表
実施例２
３０％水酸化ナトリウム水溶液に代えて、硫ＭＬｏｗ／
ｖ％、無水クロム酸７ｗ／マ２を含む水溶液を用いたほ
かは実施例１と同様にして凍結微粒の製造および表面処
理試験を行った。Table 1 Example 2 In place of 30% sodium hydroxide aqueous solution, sulfur MLow/
Frozen fine particles were produced and a surface treatment test was conducted in the same manner as in Example 1, except that an aqueous solution containing chromic anhydride 7w/ma2 was used.
結果を第２表に併せて示す。The results are also shown in Table 2.
比較例２
実施例２の水溶液に代えて水を用いたほかは実施例２と
同様にして凍結微粒の製造および表面処理試験を行った
。Comparative Example 2 Frozen fine particles were produced and a surface treatment test was conducted in the same manner as in Example 2, except that water was used instead of the aqueous solution in Example 2.
結果を第２表に併せて示す。The results are also shown in Table 2.
第 ２ 表
発明の効果
本発明においては、水溶液を凍結させた微粒を砥粒とし
て用いているので、従来のサンド砥粒の如き粉塵の発生
の問題は解消され、またサンド砥粒に比し微細な粒径の
ものが得られるので精密表面処理も達成できる。また表
面処理後は、凍結微粒は水溶液に戻り被処理物体表面に
は残存しないため、砥粒除去の工程が省略できる。Table 2 Effects of the Invention In the present invention, fine particles made by freezing an aqueous solution are used as abrasive grains, so the problem of dust generation caused by conventional sand abrasive grains is solved, and the particles are finer than sand abrasive grains. Since particles of a certain size can be obtained, precise surface treatment can also be achieved. Further, after the surface treatment, the frozen fine particles return to an aqueous solution and do not remain on the surface of the object to be treated, so that the step of removing the abrasive particles can be omitted.
また水を凍結させて製造した凍結微粒（氷粒）に比し比
重が大きいので、被処理物体に必要な衝撃力をかえるこ
とができ、ブラストが短時間に効−（へ良く行える。比
重が大きいことは、噴霧した水溶液が冷媒液と接触して
凍結微粒となったときの沈降速度が早まり、冷媒液面に
微粒が堆積して微粒同士が固着するというトラブルが軽
減されることにも役立つ。In addition, since the specific gravity is higher than that of frozen fine particles (ice particles) produced by freezing water, the impact force required on the object to be treated can be changed, and blasting can be performed more effectively in a short time. The larger size also helps to speed up the settling speed when the sprayed aqueous solution comes into contact with the refrigerant liquid and becomes frozen fine particles, reducing the problem of fine particles accumulating on the refrigerant liquid surface and sticking to each other. .
さらに、酸、アルカリまたは塩として脱脂またはエツチ
ング作用を右するものを用いているので、プラスト工程
後に脱脂工程やエツチング１程を設ける必要がなく、工
程が大幅に短縮される。Furthermore, since an acid, alkali or salt having a degreasing or etching effect is used, there is no need to provide a degreasing step or etching step 1 after the blasting step, and the process can be significantly shortened.
典型的な例をあげると、アルミニムおよびアルミニウム
合金の展延材、鋳造材などの素地に硫酸陽極酸化処理（
つまりアルマイト処理）を行うに際しての前処理として
、この方法を採用すると、従来であれば
（ｉ）機械研磨−説脂一水洗、または
（ｉｉ）機械研磨−説脂一水洗一エッチングー水洗、
の各工程が必要であったものが、に記ブラスト丁程と水
洗１程のみで完了する。A typical example is sulfuric acid anodizing treatment (
In other words, if this method is adopted as a pretreatment for performing alumite treatment, the conventional method would be (i) mechanical polishing - degreasing, washing with water, or (ii) mechanical polishing - degreasing, washing with water, etching - washing with water. What used to require several steps can now be completed with only one blasting step and one water wash.
従って、本発明の凍結微粒は、サンド砥粒に比しコスト
が高いという不利はあるが、その不利をはるかに」−ま
わる種々の利点があり、工業的に十分に採用できる。Therefore, although the frozen fine grains of the present invention have the disadvantage of being higher in cost than sand abrasive grains, they have various advantages that far outweigh this disadvantage and can be fully employed industrially.
第１図は、本発明の処理方法の一例を示した工程図であ
る。
（１）・・・水溶液貯槽、（２）・・・微粒発生装置本
体、（３）・・・噴霧器、（４）・・・微粒取出装置、
スクリューコンベア、（５）・・・水溶液供給管路、（
６）・・・水溶液供給ポンプ、（７）・・・回収冷気管
路、（８）・・・ホッパー、（９）・・・ブラストガン
、（１０）・・・冷媒液供給管路、（１１） 、 （
１２）・・・熱交換器、（１３） 、 （１４）・・
・分岐管路、（１５）・・・処理室、（１６）・・・被
処理物体、（１７）・・・水溶液回収管路、（１８）・
・・回収ポンプ、（１９）・・・清炸器、フィルターFIG. 1 is a process diagram showing an example of the treatment method of the present invention. (1)... Aqueous solution storage tank, (2)... Fine particle generator main body, (3)... Sprayer, (4)... Fine particle extraction device,
Screw conveyor, (5)...aqueous solution supply pipe, (
6)...Aqueous solution supply pump, (7)...Recovery cold air pipe line, (8)...Hopper, (9)...Blast gun, (10)...Refrigerant liquid supply pipe line, ( 11) , (
12)...Heat exchanger, (13), (14)...
・Branch pipe line, (15)...processing chamber, (16)...processing object, (17)...aqueous solution recovery pipe line, (18)・
・・Recovery pump, (19)・・・・・・・・・filter
Claims (1)
たは塩の水溶液から形成した凍結微粒よりなる砥粒。 ２、脱脂またはエッチング作用を有する酸、アルカリま
たは塩の水溶液から形成した凍結微粒よりなる砥粒を用
いて被処理物体をブラスト処理し、研磨と同時に、脱脂
または／およびエッチングを行うことを特徴とする被処
理物体の表面処理方法。[Claims] 1. Abrasive grains made of frozen fine particles formed from an aqueous solution of acid, alkali or salt having a degreasing or etching action. 2. The object to be treated is blasted using abrasive grains made of frozen fine particles formed from an aqueous solution of acid, alkali or salt having a degreasing or etching action, and the object is degreased and/or etched at the same time as polishing. A method for surface treatment of objects to be treated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13784887A JPS63300867A (en) | 1987-05-31 | 1987-05-31 | Abrasive grain and surface treatment using said abrasive grain |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13784887A JPS63300867A (en) | 1987-05-31 | 1987-05-31 | Abrasive grain and surface treatment using said abrasive grain |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63300867A true JPS63300867A (en) | 1988-12-08 |
Family
ID=15208218
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13784887A Pending JPS63300867A (en) | 1987-05-31 | 1987-05-31 | Abrasive grain and surface treatment using said abrasive grain |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63300867A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5344494A (en) * | 1993-01-21 | 1994-09-06 | Smith & Nephew Richards, Inc. | Method for cleaning porous and roughened surfaces on medical implants |
| US5348615A (en) * | 1992-10-21 | 1994-09-20 | Advanced Micro Devices, Inc. | Selective planarization method using regelation |
| JP2007302435A (en) * | 2006-05-12 | 2007-11-22 | Taiyo Nippon Sanso Corp | Gas conveying mechanism for dry ice and dry ice injection device |
| US7509735B2 (en) * | 2004-04-22 | 2009-03-31 | Siemens Energy, Inc. | In-frame repairing system of gas turbine components |
| CN104634389A (en) * | 2015-01-22 | 2015-05-20 | 晋州市水泵厂 | Submersible pump motor testing method and device with self-water feeding pressurization system |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5097533A (en) * | 1973-12-28 | 1975-08-02 |
-
1987
- 1987-05-31 JP JP13784887A patent/JPS63300867A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5097533A (en) * | 1973-12-28 | 1975-08-02 |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5348615A (en) * | 1992-10-21 | 1994-09-20 | Advanced Micro Devices, Inc. | Selective planarization method using regelation |
| US5344494A (en) * | 1993-01-21 | 1994-09-06 | Smith & Nephew Richards, Inc. | Method for cleaning porous and roughened surfaces on medical implants |
| US7509735B2 (en) * | 2004-04-22 | 2009-03-31 | Siemens Energy, Inc. | In-frame repairing system of gas turbine components |
| JP2007302435A (en) * | 2006-05-12 | 2007-11-22 | Taiyo Nippon Sanso Corp | Gas conveying mechanism for dry ice and dry ice injection device |
| CN104634389A (en) * | 2015-01-22 | 2015-05-20 | 晋州市水泵厂 | Submersible pump motor testing method and device with self-water feeding pressurization system |
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