JPS63298936A - Manufacture of shadow mask structure - Google Patents
Manufacture of shadow mask structureInfo
- Publication number
- JPS63298936A JPS63298936A JP13111887A JP13111887A JPS63298936A JP S63298936 A JPS63298936 A JP S63298936A JP 13111887 A JP13111887 A JP 13111887A JP 13111887 A JP13111887 A JP 13111887A JP S63298936 A JPS63298936 A JP S63298936A
- Authority
- JP
- Japan
- Prior art keywords
- frame
- shadow mask
- tensile force
- tension
- mask
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 238000000034 method Methods 0.000 claims description 6
- 238000010894 electron beam technology Methods 0.000 claims description 5
- 229910052751 metal Inorganic materials 0.000 claims description 2
- 239000002184 metal Substances 0.000 claims description 2
- 238000003466 welding Methods 0.000 abstract description 6
- 239000000758 substrate Substances 0.000 abstract description 2
- 238000005452 bending Methods 0.000 abstract 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 229910000831 Steel Inorganic materials 0.000 description 5
- 239000010959 steel Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 4
- 229910052759 nickel Inorganic materials 0.000 description 3
- VNTLIPZTSJSULJ-UHFFFAOYSA-N chromium molybdenum Chemical compound [Cr].[Mo] VNTLIPZTSJSULJ-UHFFFAOYSA-N 0.000 description 2
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N ferric oxide Chemical compound O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
Abstract
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明はシャドウマスク構体の製造方法に係り。[Detailed description of the invention] [Industrial application field] The present invention relates to a method for manufacturing a shadow mask structure.
特6とシャドウマスクを張力を与えた状態でフレームl
こ架張したシャドウマスク構体の製造方法lこ関する。Frame l with tension applied to special 6 and shadow mask
This relates to a method of manufacturing a stretched shadow mask structure.
カラーブラウン管fこ用いられるシャドウマスクは、パ
ネルの螢光面にモザイク状iこ塗布された螢光体の色選
択機能を持っているが、電子ビームが衝突すること−こ
よって熱膨張して変形すると、色選択機能を損うことが
ある。The shadow mask used in color cathode ray tubes has a color selection function of phosphors coated in a mosaic pattern on the fluorescent surface of the panel, but when the electron beam collides with it, it thermally expands and deforms. This may impair the color selection function.
この解決策として、例えば特開昭61−80735号に
示すように、シャドウマスクを張力を与えた状態でフレ
ームに架張した架張式シャドウマスク構体が知られてい
る。As a solution to this problem, a stretching type shadow mask structure is known, for example, as shown in Japanese Patent Laid-Open No. 61-80735, in which a shadow mask is stretched on a frame under tension.
上記従来技術は、単にシャドウマスクlこ張力を与え先
状態でフV−ム5こ固着するので、固着後(こシャドウ
マスクの張力によってフレームがたわんで変形し、シャ
ドウマスクに所定の張力がかからないという問題があっ
た。In the above-mentioned prior art, the frame is simply fixed by applying tension to the shadow mask in the previous state. There was a problem.
本発明の目的は、シャドウマスクに所定の均一な張力を
印加させることができるシャドウマスク構体の製造方法
を提供することfこある。An object of the present invention is to provide a method for manufacturing a shadow mask structure that can apply a predetermined uniform tension to a shadow mask.
上記目的は、フレームに内側方向の応力をかけた状態で
、張力が与えられたシャドウマスクをフレームに固着す
ること醗こより達成される。The above object is achieved by securing the tensioned shadow mask to the frame while applying an inward stress to the frame.
フレームには内側方向に応力がかけられているので、外
側lこ拡がろうとする張力が働く。このフレームの外側
方向の張力は、シャドウマスクの内側方向の張力を相殺
させるので、シャドウマスクには所定の均一な張力が印
加される。Since stress is applied to the frame in the inward direction, a tension force is exerted on the frame that tends to expand outward. The tension in the outer direction of the frame cancels out the tension in the inner direction of the shadow mask, so that a predetermined uniform tension is applied to the shadow mask.
以下、本発明の一実施例を第1図及び第2図1こより説
明する。溶接装置の基板1上に断面り形のフレーム2を
位置決め載置する。次にばね3で内側方向に付勢された
押棒4をフレーム2の外周に当て、フレーム2を内側に
押して所定量たわませておく。前記押棒4は、フレーム
2の各辺に均一な応力がかかるようfこ、例えば各辺に
2個、即ち計8個配設し、第2図に矢印A、、A2.B
、、B、、C,、C,、D、 、 D、で示す部分を矢
印方向にたわませるようIこする。次tこフレーム2上
に薄い金属板に多数の電子ビーム通過孔5aが明けられ
たシャドウマスク5を載置する。この場合、シャドウマ
スク5は板厚が薄くて上下にたわみやすいので、シャド
ウマスク5が水平lこなる程度の張力で、縦、横、対角
の8つの方向から引張っておく。即ち、ばね6で外側方
向に付勢されたこま7で外側方向に引張っておく。An embodiment of the present invention will be described below with reference to FIGS. 1 and 2. A cross-sectional frame 2 is positioned and placed on a substrate 1 of a welding device. Next, a push rod 4 urged inward by a spring 3 is applied to the outer periphery of the frame 2 to push the frame 2 inward and bend it by a predetermined amount. The push rods 4 are arranged so that uniform stress is applied to each side of the frame 2, for example, two on each side, ie, eight in total, and are indicated by arrows A, A2, . . . in FIG. B
, , B , , C , , C , , D , , Rub the parts indicated by I to bend them in the direction of the arrow. Next, a shadow mask 5, which is a thin metal plate with a large number of electron beam passage holes 5a, is placed on the frame 2. In this case, since the shadow mask 5 is thin and easily bends vertically, the shadow mask 5 is pulled in eight directions (vertical, horizontal, and diagonal) with enough tension to make the shadow mask 5 horizontally curved. That is, the top 7, which is biased outwardly by the spring 6, is pulled outwardly.
そして、シャドウマスク5の上面から、遠赤外線を出す
パネルヒータ8でシャドウマスク5を約150℃まで加
熱する。この場合、フレーム2は、熱容量が大きく、ま
た直接赤外線が嶋るのが少ないので、はとんど無視でき
る程度lこしか温度上昇しない。必要があれば、遮蔽板
9を置いて赤外線を遮蔽するようにしてもよい。このよ
うにシャドウマスク5が加熱された状態で、フレーム2
の上端2aのほぼ中央基こ全周にわたってシャドウマス
ク5を図示しない溶接機で連続して溶接する。第2図に
おいて、2点鎖線は溶接点を示している。Then, the shadow mask 5 is heated to about 150° C. from the upper surface of the shadow mask 5 by a panel heater 8 that emits far infrared rays. In this case, since the frame 2 has a large heat capacity and receives little direct infrared rays, the temperature rises by only a negligible amount. If necessary, a shielding plate 9 may be placed to shield infrared rays. With the shadow mask 5 heated in this way, the frame 2
The shadow mask 5 is continuously welded over the entire circumference from approximately the center of the upper end 2a using a welding machine (not shown). In FIG. 2, two-dot chain lines indicate welding points.
溶接終了後、シャドウマスク構体を取り出すと、シャド
ウマスク5の温度が下り、シャドウマスク5#こ張力が
かかる。その後、シャドウマスク5の周囲の余分な部分
は除去する。When the shadow mask structure is taken out after welding is completed, the temperature of the shadow mask 5 drops and tension is applied to the shadow mask 5#. After that, the excess portion around the shadow mask 5 is removed.
このように、フレーム2に内側方向の応力をかけた状態
で、加熱膨張させられたシャドウマスク5を固着するの
で、フレーム2は外側に拡がろうとする張力を有する。In this way, the heated and expanded shadow mask 5 is fixed while applying stress in the inward direction to the frame 2, so that the frame 2 has a tension that tends to expand outward.
このフレーム2の張力は、シャドウマスク5が冷却して
シャドウマスク5が内側lこたわもうさする張力を相殺
する。これlこより、シャドウマスク5には所定の均一
な張力が印加される。This tension in the frame 2 offsets the tension caused by the shadow mask 5 cooling and causing the shadow mask 5 to become stiff inside. As a result, a predetermined uniform tension is applied to the shadow mask 5.
上記実施例tこおいて、フレーム2は、例えば材質がク
ロムモリブデン鋼のSCM445で、断面の上側幅が5
1FIm、下側幅が10m、高さが10順、全体の大き
さは外径が横279朋、縦2101!Xに形成した。シ
ャドウマスク5は、例えば厚さ0.025玉の鋼板で、
周縁を除いて全面に孔径0.121尻の電子ビーム通過
孔5aがほぼ0.26 mmの間隔で整列して列の相互
の角度が60度をなすようEこ明けて形成した。またパ
ネルヒータ7は、1.5KWの400 x 300tm
のヒータを2枚並べて中央が少し盛り上るようにしてシ
ャドウマスク5から約70mx離れた所lこ配置した。In the above embodiment t, the frame 2 is made of, for example, SCM445 made of chromium molybdenum steel, and has an upper width of 5 mm in cross section.
1FIm, lower width 10m, height in order of 10, overall outer diameter is 279 mm horizontally and 2101 mm high! It was formed into an X. The shadow mask 5 is, for example, a steel plate with a thickness of 0.025 mm.
Electron beam passing holes 5a having a diameter of about 0.121 mm were formed over the entire surface except for the periphery so that they were aligned at intervals of approximately 0.26 mm and the rows were spaced at an angle of 60 degrees. Also, the panel heater 7 is 1.5KW 400 x 300tm
Two heaters were placed side by side and placed about 70 mx away from the shadow mask 5 so that the center was slightly raised.
このパネルヒータ7Iこより、加熱時間が数10秒でシ
ャドウマスク5を約150℃に加熱させることができる
。This panel heater 7I can heat the shadow mask 5 to about 150° C. in a heating time of several tens of seconds.
なお、フレーム2は前記したクロムモリブデン鋼、シャ
ドウマスク5は前記した通常の鋼板に限定されるもので
はない。特に熱膨張を小さくしたい時ハ、フレーム2及
びシャドウマスク5の材料として、ニッケルを36チ含
有するニッケル鋼(アンバー)等の低膨張率の材料を用
いてもよい。Note that the frame 2 is not limited to the aforementioned chromium molybdenum steel, and the shadow mask 5 is not limited to the aforementioned ordinary steel plate. In particular, when it is desired to reduce thermal expansion, the frame 2 and shadow mask 5 may be made of a material with a low expansion coefficient, such as nickel steel (amber) containing 36 nickel.
またフレーム2に42%ニッケルを含有する鉄ニツケル
合金を用い、シャドウマスク5Iこアンバーを用いると
、シャドウマスク5の動作温度範囲一40〜100℃程
度ではフレーム2の熱膨張係数が大きいので、シャドウ
マスク5Iこ更fこ望ましい方向で張力を加えることが
できる。このように、動作範囲内での熱膨張係数をフレ
ーム2の材料の方を少し太き目−こ選んだ組合せで材料
を選択するのは望ましいことである。しかし、フレーム
2とシャドウマスク5の熱膨張係数の差が大きくある場
合は、カラーブラウン管の製造工程でシャドウマスク構
体が450℃程度まで上った時Iこ、シャドウマスク材
料が降伏点を越えて、張力がゆるみ、変形することがあ
るので避けるべきである。Furthermore, if the frame 2 is made of iron-nickel alloy containing 42% nickel and the shadow mask 5I is made of umber, the thermal expansion coefficient of the frame 2 is large in the operating temperature range of the shadow mask 5 - 40 to 100 degrees Celsius. Tension can be applied to the mask 5I in a desired direction. In this way, it is desirable to select a combination of materials in which the material for the frame 2 has a slightly thicker coefficient of thermal expansion within the operating range. However, if there is a large difference in the coefficient of thermal expansion between the frame 2 and the shadow mask 5, when the shadow mask structure reaches a temperature of about 450°C during the color cathode ray tube manufacturing process, the shadow mask material may exceed its yield point. This should be avoided as it may loosen the tension and cause deformation.
本発明によれば、シャドウマスクの張力によるフレーム
の変形が防止されるので、シャドウマスクには安定した
均一な張力が印加される。According to the present invention, since deformation of the frame due to the tension of the shadow mask is prevented, stable and uniform tension is applied to the shadow mask.
第1図は本発明になるシャドウマスク構体の製造方法の
一実施例を示す断面図、第2図は第1図の方法によって
得られるシャドウマスク構体の斜視図である。
2・・・フV−ム、 3・・・ばね、 4・・
・押棒、5・・・シャドウマスク、 5a・・・電
子ビーム通過孔。
第1図
2:フレーム
第2図
2: フレーム
5:5ヤドウマスフ
50:g手ビー^電j邑ルFIG. 1 is a sectional view showing an embodiment of the method for manufacturing a shadow mask structure according to the present invention, and FIG. 2 is a perspective view of the shadow mask structure obtained by the method shown in FIG. 2...Fam, 3...Spring, 4...
- Push rod, 5...Shadow mask, 5a...Electron beam passage hole. Fig. 1 2: Frame Fig. 2 2: Frame 5: 5 Yadomasufu 50:
Claims (1)
シャドウマスクを張力を与えた状態でフレームに架張し
たシャドウマスク構体の製造方法において、前記フレー
ムに内側方向の応力をかけた状態で、張力が与えられた
前記シャドウマスクを前記フレームに固着することを特
徴とするシャドウマスク構体の製造方法。1. In a method for manufacturing a shadow mask structure in which a shadow mask having a large number of electron beam passage holes formed in a thin metal plate is stretched on a frame under tension, the frame is subjected to stress in an inward direction. . A method for manufacturing a shadow mask structure, characterized in that the shadow mask to which tension is applied is fixed to the frame.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62131118A JP2619391B2 (en) | 1987-05-29 | 1987-05-29 | Method of manufacturing shadow mask structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62131118A JP2619391B2 (en) | 1987-05-29 | 1987-05-29 | Method of manufacturing shadow mask structure |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS63298936A true JPS63298936A (en) | 1988-12-06 |
JP2619391B2 JP2619391B2 (en) | 1997-06-11 |
Family
ID=15050406
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62131118A Expired - Fee Related JP2619391B2 (en) | 1987-05-29 | 1987-05-29 | Method of manufacturing shadow mask structure |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2619391B2 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02204943A (en) * | 1989-02-01 | 1990-08-14 | Mitsubishi Electric Corp | Spread type shadow mask structure and manufacture thereof |
JPH06243780A (en) * | 1993-02-12 | 1994-09-02 | Nec Corp | Manufacture of grid device for color image receiving tube |
US6106353A (en) * | 1998-08-26 | 2000-08-22 | Matsushita Electronics Corporation | Method for manufacturing color cathode ray tube and manufacturing apparatus therefor |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62252031A (en) * | 1986-04-25 | 1987-11-02 | Sony Corp | Manufacture of color selection device for cathode-ray tube |
-
1987
- 1987-05-29 JP JP62131118A patent/JP2619391B2/en not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62252031A (en) * | 1986-04-25 | 1987-11-02 | Sony Corp | Manufacture of color selection device for cathode-ray tube |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02204943A (en) * | 1989-02-01 | 1990-08-14 | Mitsubishi Electric Corp | Spread type shadow mask structure and manufacture thereof |
JPH06243780A (en) * | 1993-02-12 | 1994-09-02 | Nec Corp | Manufacture of grid device for color image receiving tube |
US6106353A (en) * | 1998-08-26 | 2000-08-22 | Matsushita Electronics Corporation | Method for manufacturing color cathode ray tube and manufacturing apparatus therefor |
Also Published As
Publication number | Publication date |
---|---|
JP2619391B2 (en) | 1997-06-11 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |