JPS63294699A - Plasma x-ray source - Google Patents
Plasma x-ray sourceInfo
- Publication number
- JPS63294699A JPS63294699A JP62130966A JP13096687A JPS63294699A JP S63294699 A JPS63294699 A JP S63294699A JP 62130966 A JP62130966 A JP 62130966A JP 13096687 A JP13096687 A JP 13096687A JP S63294699 A JPS63294699 A JP S63294699A
- Authority
- JP
- Japan
- Prior art keywords
- plasma
- switch
- starting pulse
- charging
- discharge
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000003990 capacitor Substances 0.000 claims abstract description 18
- 239000007921 spray Substances 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000004913 activation Effects 0.000 description 2
- 230000003111 delayed effect Effects 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000000605 extraction Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000005611 electricity Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
Landscapes
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【発明の詳細な説明】
（イ）産業上の利用分野
本発明は、半導体高密度集積回路の微細パターンの露光
等に使用されるプラズマＸ線源に係り、特には、プラズ
マＸ線の発生回路部分の改良に関する。Detailed Description of the Invention (a) Industrial Application Field The present invention relates to a plasma X-ray source used for exposure of fine patterns of semiconductor high-density integrated circuits, and particularly relates to a plasma X-ray generation circuit. Regarding improvement of parts.
（ロ）従来技術とその問題点
従来のこの種のプラズマＸ線源には、第３図に示すもの
がある。このプラズマＸ線源は、絶縁物でできた真空容
器２内に一対の電極４ａ、４ｂが対向配置されており、
一方側の電極４ａによってＡｒ等のプラズマガスが導入
されるガス流入室６と軟Ｘ線が発生されるＸ線発生室８
とが隔離形成されている。そして、一方側め電極４ａに
はプラズマガス噴出用のノズルｌＯが、他方側の電極に
はＸ線取り出し窓１２がそれぞれ設けられ、また、ガス
流入室内６には上記のノズルｌＯを開閉する高速開閉弁
１４が配置されている。さらに、この高速開閉弁１４に
ソレノイド１６で吸引駆動されるプランジャ１８が固定
されており、ソレノイド１６には弁駆動源２０が接続さ
れている。一方、両電極４ａ、４ｂにはプラズマ発生用
の高圧コンデンサ２２が放電スイッチ２４を介して並列
接続され、また、高圧コンデンサ２２には高圧電源２６
が接続されている。２８は放電スイッチ２４をオンオフ
させるために高圧パルスを発生する高圧パルス発生器、
３０は弁駆動源２０と高圧パルス発生器２８を各々起動
する起動パルスを発生する起動パルス発生器、３２は起
動パルス発生器３０からの起動パルスを所定時間遅延し
て高圧パルス発生器２８に与える遅延回路である。(b) Prior art and its problems A conventional plasma X-ray source of this type includes one shown in FIG. This plasma X-ray source has a pair of electrodes 4a and 4b arranged facing each other in a vacuum container 2 made of an insulator.
A gas inflow chamber 6 into which plasma gas such as Ar is introduced by an electrode 4a on one side and an X-ray generation chamber 8 in which soft X-rays are generated.
are formed in isolation. A nozzle lO for ejecting plasma gas is provided on one side electrode 4a, an X-ray extraction window 12 is provided on the other side electrode, and the gas inflow chamber 6 is provided with a high-speed opening and closing nozzle lO. An on-off valve 14 is arranged. Further, a plunger 18 that is driven by suction by a solenoid 16 is fixed to this high-speed opening/closing valve 14, and a valve driving source 20 is connected to the solenoid 16. On the other hand, a high voltage capacitor 22 for plasma generation is connected in parallel to both electrodes 4a and 4b via a discharge switch 24, and a high voltage power supply 26 is connected to the high voltage capacitor 22.
is connected. 28 is a high-voltage pulse generator that generates high-voltage pulses to turn on and off the discharge switch 24;
30 is a starting pulse generator that generates a starting pulse to start the valve drive source 20 and the high-pressure pulse generator 28, respectively; 32 is a starting pulse from the starting pulse generator 30 that is delayed by a predetermined time and is applied to the high-pressure pulse generator 28; It is a delay circuit.
したがって、このプラズマＸ線源では、高圧コンデンサ
２２が高圧電源２６で充電された後、起動パルス発生器
３０から起動パルスが発生され、この起動パルスが弁駆
動源２０に与えられる。この起動パルスに応答して弁駆
動源２０はソレノイド１６に電流を流して高速開閉弁１
４を短時間開く。これにより、ガス流入室６に充満され
ていたプラズマガスがノズル１０からＸ線発生室８内に
噴出され、真空中にガス柱が形成さ、れる。ガス柱形成
のタイミングに合わせて遅延回路３２で遅延された起動
パルスが高圧パルス発生器２８に与えられると、高圧パ
ルス発生器２８はこれに応答して高圧パルスを発生し、
放電スイッチ２４を通電状態にする。これにより、予め
充電されていた高圧コンデンサ２２の電荷がガス柱を介
して放電される。この放電により、両電極４ａ、４ｂ間
に放電プラズマが形成され、プラズマを流れる電流によ
る磁場の作用でプラズマが自己収束して高温プラズマが
形成され、その結果、高温プラズマから軟Ｘ線が放出さ
れる。Therefore, in this plasma X-ray source, after the high-voltage capacitor 22 is charged by the high-voltage power supply 26, a starting pulse is generated from the starting pulse generator 30, and this starting pulse is given to the valve drive source 20. In response to this activation pulse, the valve drive source 20 applies current to the solenoid 16 to control the high-speed opening/closing valve 1.
4 for a short time. As a result, the plasma gas filling the gas inflow chamber 6 is ejected from the nozzle 10 into the X-ray generation chamber 8, forming a gas column in the vacuum. When the activation pulse delayed by the delay circuit 32 in accordance with the timing of gas column formation is applied to the high-pressure pulse generator 28, the high-pressure pulse generator 28 generates a high-pressure pulse in response,
The discharge switch 24 is turned on. As a result, the electric charge of the high-voltage capacitor 22 that has been charged in advance is discharged through the gas column. Due to this discharge, discharge plasma is formed between both electrodes 4a and 4b, and the plasma self-converges due to the action of the magnetic field caused by the current flowing through the plasma, forming high-temperature plasma.As a result, soft X-rays are emitted from the high-temperature plasma. Ru.
ところで、従来の上記構成においては、放電スイッチ２
４には高圧パルスが与えられるたびに高圧コンデンサ２
２からの大電流が流れるので電極の消耗が激しく、取り
替え頻度が多くなる。また、放電スイッチ２４での消費
電力も多い等の不具合がある。By the way, in the above conventional configuration, the discharge switch 2
4 is connected to high voltage capacitor 2 every time a high voltage pulse is applied.
Since a large current flows from the electrode 2, the electrode wears out rapidly and must be replaced frequently. Further, there are problems such as a large amount of power consumed by the discharge switch 24.
本発明は、このような事情に鑑みてなされたものであっ
て、放電スイッチが無くてもプラズマガス柱形成のタイ
ミングに合わせて確実に高圧コンデンサの充電電荷が放
電されるようにすることを目的とする。The present invention has been made in view of the above circumstances, and an object of the present invention is to ensure that the charge in a high-voltage capacitor is discharged in accordance with the timing of plasma gas column formation even without a discharge switch. shall be.
（ハ）問題点を解決するための手段
本発明のプラズマＸ線源は、上記の目的を達成するため
に、放電プラズマ発生用の高圧コンデンサを充電する高
圧電源に電力を供給する商用電源線に該商用電源線をオ
ンオフする充電用スイッチを設け、かつ、プラズマガス
を噴出させる高速開閉弁の開閉タイミングを設定する起
動パルス発生器からの起動パルスに応答して上記充電用
スイッチをオンオフ動作させるスイッチ駆動源を備えた
構成としている。(c) Means for Solving the Problems In order to achieve the above object, the plasma A switch that is provided with a charging switch that turns on and off the commercial power line, and that turns on and off the charging switch in response to a starting pulse from a starting pulse generator that sets the opening/closing timing of a high-speed opening/closing valve that blows out plasma gas. The configuration includes a driving source.
（ニ）作用
上記構成において、起動パルス発生器から起動パルスが
出力されると、これに応答してスイッチ駆動源が充電ス
イッチをオンにするので、高圧電源に電力が供給されて
高圧電源が高圧コンデンサを充電する。高圧コンデンサ
の充電が完了した時点で充電スイッチがオフ状態となる
と同時に弁駆動源が起動されて高速開閉弁が短時間開か
れる。(d) Effect In the above configuration, when the starting pulse is output from the starting pulse generator, the switch drive source turns on the charging switch in response to this, so power is supplied to the high voltage power source and the high voltage power source is turned on. Charge the capacitor. When charging of the high-voltage capacitor is completed, the charging switch is turned off, and at the same time, the valve drive source is activated and the high-speed on-off valve is opened for a short time.
そして、プラズマガスが噴出されて両電極間にガス柱が
形成されると、両電極間が通電状態になるので、自動的
に高圧コンデンサの充電電荷の放電が開始される。した
がって、従来のような放電スイッチは不要となる。Then, when the plasma gas is ejected and a gas column is formed between the two electrodes, the two electrodes become energized, so that the charge in the high-voltage capacitor automatically starts discharging. Therefore, a conventional discharge switch is not required.
（ホ）実施例
第１図は本発明の実施例を示すプラズマＸ線源の構成図
であり、第３図に示した従来例と共通する部分には同一
の符号を付している。(e) Embodiment FIG. 1 is a block diagram of a plasma X-ray source showing an embodiment of the present invention, and parts common to the conventional example shown in FIG. 3 are given the same reference numerals.
第１図において、ｌはプラズマＸ線源の全体を示し、２
は真空容器、４ａ、４ｂは放電用の電極、６はガス流入
室、８はＸ線発生室、１０はプラズマガス噴出用のノズ
ル、１２はＸ線取り出し窓、１４は高速開閉弁、１６は
ソレノイド、１８はプランジャ、２０は弁駆動源、２２
は高圧コンデンサ、２６は高圧電源、３０は起動パルス
発生器であり、これらの構成は従来例の場合と同様であ
る。In FIG. 1, l indicates the entire plasma X-ray source, and 2
1 is a vacuum container, 4a and 4b are discharge electrodes, 6 is a gas inflow chamber, 8 is an X-ray generation chamber, 10 is a nozzle for plasma gas ejection, 12 is an X-ray extraction window, 14 is a high-speed opening/closing valve, and 16 is a Solenoid, 18 is a plunger, 20 is a valve driving source, 22
2 is a high voltage capacitor, 26 is a high voltage power supply, and 30 is a starting pulse generator, and these structures are the same as in the conventional example.
本発明のプラズマＸ線源１の特徴は、高圧電源２６に電
力を供給する商用電源線３５に該商用電源線をオンオフ
する充電用スイッチ３４を設け、かつ、起動パルス発生
器３０からの起動パルスに応答して充電用スイッチ３４
をオンオフ動作させるスイッチ駆動源３６を備えること
である。The plasma X-ray source 1 of the present invention is characterized in that a charging switch 34 is provided on the commercial power line 35 that supplies power to the high-voltage power supply 26 to turn the commercial power line on and off, and a starting pulse from the starting pulse generator 30 is provided. charging switch 34 in response to
A switch drive source 36 is provided to turn on and off the switch.
次に、上記構成のプラズマＸ線源ｌの軟Ｘ線を発生する
ための動作について、第２図に示すタイミングチャート
を参照して説明する。Next, the operation of the plasma X-ray source I having the above configuration for generating soft X-rays will be explained with reference to the timing chart shown in FIG.
真空容器２内のＸ線発生室８が図外の真空排気装置で十
分に排気されて両電極間４ａ、４ｂの絶縁耐圧が大きく
なり、また、ガス流入室６にはプラズマガスが充満され
た状態で、起動パルス発生器からハイレベルの起動パル
スが出力される（第２図の時刻１＋）。この起動パルス
の立ち上がりタイミングに応答してスイッチ駆動源３６
が起動され、充電スイッチ３４をオンにする。これによ
り、商用電源線３５から充電スイッチ３４を介して高圧
電源２６に電力が供給され、高圧電源２６が高圧コンデ
ンサ２２を充電する。高圧コンデンサ２２の充電が完了
した時点で起動パルスがローレベルになると（時刻ｔｚ
）、充電スイッチ３４がオフされると同時に弁駆動源２
０が起動されてソレノイド１６に電流を流し、高速開閉
弁１４が短時間（数ｌＯμｓｅｃ程度）開かれる。する
と、ガス流入室６に存在するプラズマガスがノズルｌＯ
からＸ線発生室８内に噴出されて両電極４ａ、４ｂ間に
ガス柱が形成される。このガス柱の形成と同時に両電極
４ａ、４ｂ間が通電状態になるため、自動的に高圧コン
デンサ２２の充電電荷の放電が開始される。The X-ray generation chamber 8 in the vacuum container 2 was sufficiently evacuated by a vacuum evacuation device (not shown), increasing the dielectric strength between the two electrodes 4a and 4b, and the gas inflow chamber 6 was filled with plasma gas. In this state, a high-level starting pulse is output from the starting pulse generator (time 1+ in FIG. 2). In response to the rising timing of this starting pulse, the switch driving source 36
is started and the charging switch 34 is turned on. As a result, power is supplied from the commercial power line 35 to the high voltage power supply 26 via the charging switch 34, and the high voltage power supply 26 charges the high voltage capacitor 22. When the starting pulse becomes low level when charging of the high voltage capacitor 22 is completed (time tz
), the valve driving source 2 is turned off at the same time as the charging switch 34 is turned off.
0 is activated, current flows through the solenoid 16, and the high-speed on-off valve 14 is opened for a short time (about several lOμsec). Then, the plasma gas present in the gas inflow chamber 6 flows into the nozzle lO
The gas is ejected into the X-ray generation chamber 8 to form a gas column between the electrodes 4a and 4b. Simultaneously with the formation of this gas column, electricity is brought between the electrodes 4a and 4b, so that the charge in the high-voltage capacitor 22 automatically starts discharging.
この放電により、高温プラズマが生成されて軟Ｘ線が発
生する。軟Ｘ線が発生すると直ちに高速開閉弁１４が閉
じる（時刻ｔａ）。Ｘ線発生室８は、真空排気装置で常
時排気されているので、高速開閉弁１４が閉じると直ち
にＸ線発生室８内に残存するプラズマガスが速やかに排
気される。そして、Ｘ線発生室８内の真空度が上がり、
両電極４ａ。This discharge generates high-temperature plasma and generates soft X-rays. Immediately after the soft X-rays are generated, the high-speed on-off valve 14 closes (time ta). Since the X-ray generation chamber 8 is constantly evacuated by a vacuum evacuation device, the plasma gas remaining in the X-ray generation chamber 8 is quickly exhausted as soon as the high-speed on-off valve 14 closes. Then, the degree of vacuum inside the X-ray generation chamber 8 increases,
Both electrodes 4a.
４ｂ間の絶縁耐圧が所定値に達すると、再び起動パルス
がハイレベルになり（時刻ｔ４）、上述した動作が繰り
返される。When the dielectric strength voltage between 4b reaches a predetermined value, the starting pulse becomes high level again (time t4), and the above-described operation is repeated.
（へ）効果
以上のように本発明によれば、放電スイッチが無くても
プラズマガス柱形成のタイミングに合わせて確実に高圧
コンデンサの充電電荷が放電されるので、従来のような
放電スイッチの電極消耗による交換作業等が不要となり
、信頼性が向上するばかりでなく、エネルギー効率も向
上し、さらに、Ｘ線出力の安定化を図ることができる。(F) Effect As described above, according to the present invention, the charge in the high-voltage capacitor is reliably discharged in accordance with the timing of plasma gas column formation even without a discharge switch. There is no need for replacement work due to wear and tear, which not only improves reliability but also improves energy efficiency, and further stabilizes X-ray output.
また、プラズマはガス柱の中央位置に発生する確率が高
くなるので、結果的にＸ線発生面積が小さくなり、半導
体高密度集積回路の微細パターンの露光に使用する場合
には、露光精度が向上する等の優れた効果が発揮される
。In addition, since plasma has a higher probability of being generated at the center of the gas column, the area where X-rays are generated becomes smaller, which improves exposure accuracy when used to expose fine patterns in semiconductor high-density integrated circuits. Excellent effects such as:
第１図は本発明の実施例を示すプラズマＸ線源の構成図
、第２図は同装置の動作状態を示すタイミングチャート
、第３図は従来のプラズマＸ線源の構成図である。
■・・・プラズマＸ線源、４ａ、４ｂ・・・電極、２０
・・・弁駆動源、２２・・・高圧コンデンサ、２６・・
・高圧電源、３０・・・起動パルス発生器、３４・・・
充電スイッチ、３５・・・商用電源線、３６・・・スイ
ッチ駆動源。FIG. 1 is a block diagram of a plasma X-ray source showing an embodiment of the present invention, FIG. 2 is a timing chart showing the operating state of the apparatus, and FIG. 3 is a block diagram of a conventional plasma X-ray source. ■...Plasma X-ray source, 4a, 4b...Electrode, 20
...Valve drive source, 22...High pressure capacitor, 26...
- High voltage power supply, 30... Starting pulse generator, 34...
Charging switch, 35...Commercial power line, 36...Switch drive source.
Claims (1)
高圧電源と、プラズマガス噴出用のノズルを開閉する高
速開閉弁を駆動する弁駆動源と、弁駆動源を起動する起
動パルスを発生する起動パルス発生器とを有するプラズ
マＸ線源において、前記高圧電源に電力を供給する商用
電源線に該商用電源線をオンオフする充電用スイッチを
設け、かつ、前記起動パルス発生器からの起動パルスに
応答して前記充電用スイッチをオンオフ動作させるスイ
ッチ駆動源を備えることを特徴とするプラズマＸ線源。(1) A high-voltage power supply that charges a high-voltage capacitor for generating discharge plasma, a valve drive source that drives a high-speed opening/closing valve that opens and closes a nozzle for ejecting plasma gas, and a startup pulse that generates a startup pulse that starts the valve drive source. In the plasma X-ray source having a generator, a charging switch for turning on and off the commercial power line for supplying power to the high-voltage power supply is provided, and the charging switch responds to a starting pulse from the starting pulse generator. A plasma X-ray source comprising a switch drive source that turns on and off the charging switch.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62130966A JPS63294699A (en) | 1987-05-27 | 1987-05-27 | Plasma x-ray source |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62130966A JPS63294699A (en) | 1987-05-27 | 1987-05-27 | Plasma x-ray source |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63294699A true JPS63294699A (en) | 1988-12-01 |
Family
ID=15046783
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62130966A Pending JPS63294699A (en) | 1987-05-27 | 1987-05-27 | Plasma x-ray source |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63294699A (en) |
-
1987
- 1987-05-27 JP JP62130966A patent/JPS63294699A/en active Pending
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