JPS63282242A - Heat treating furnace - Google Patents
Heat treating furnaceInfo
- Publication number
- JPS63282242A JPS63282242A JP11472687A JP11472687A JPS63282242A JP S63282242 A JPS63282242 A JP S63282242A JP 11472687 A JP11472687 A JP 11472687A JP 11472687 A JP11472687 A JP 11472687A JP S63282242 A JPS63282242 A JP S63282242A
- Authority
- JP
- Japan
- Prior art keywords
- tube
- gas
- process tube
- work
- workpiece
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 claims abstract description 28
- 239000007789 gas Substances 0.000 claims abstract description 24
- 239000011261 inert gas Substances 0.000 claims abstract description 7
- 238000010438 heat treatment Methods 0.000 claims description 11
- 230000008595 infiltration Effects 0.000 abstract 2
- 238000001764 infiltration Methods 0.000 abstract 2
- 238000004140 cleaning Methods 0.000 description 6
- 239000011810 insulating material Substances 0.000 description 4
- 239000010453 quartz Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 238000004518 low pressure chemical vapour deposition Methods 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 238000005470 impregnation Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000003908 quality control method Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000002341 toxic gas Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は、ワークをガス雰囲気中に於いて熱処理してこ
れに洗浄等を施す熱処理炉に関する。DETAILED DESCRIPTION OF THE INVENTION (Industrial Application Field) The present invention relates to a heat treatment furnace for heat treating a workpiece in a gas atmosphere and cleaning the workpiece.
(従来の技術)
従来、例えば低圧CVDに使用されるSIC製治具類は
、遷移金属等の不純物の析出を防ぐために、その使用前
に又は使用後もある周期でHC1洗浄を施すを一般とす
る。(Prior Art) Conventionally, SIC jigs used in low-pressure CVD, for example, are generally subjected to HC1 cleaning before or at certain intervals after use to prevent the precipitation of impurities such as transition metals. do.
この洗浄には、第1図示のような、石英製プロセスチュ
ーブaの外周に断熱材すで覆われたヒータCを備え、該
断熱材すを介して外部へ延びるプロセスチューブaの後
端部に治具類を出し入れする蓋dを備えた外熱式の熱処
理炉が使用され、該プロセスチューブaの先端の排気口
eからその内部を真空排気すると共にHC1ガスを導入
し、加熱することにより治具類を洗浄している。For this cleaning, as shown in the first diagram, a heater C covered with a heat insulating material is provided on the outer periphery of a quartz process tube a, and a heater C is provided at the rear end of the process tube a extending outside through the heat insulating material. An external heating type heat treatment furnace equipped with a lid d for loading and unloading jigs is used. Washing utensils.
(発明が解決しようとする問題点)
プロセスチューブaの後端はシールリングfを介して蓋
dで閉じられるが、プロセスチューブaは石英製である
ので蓋dを強固に締付けするとチューブaが破損するこ
とがあり、多少とも弱い力でチューブaと蓋dを締付け
するためチューブa内の密閉性を保持することが難しく
、外部からチューブa内に空気が巻−込まれ治具類等の
ワークの処理時に於ける品質管理が難しい。(Problem to be solved by the invention) The rear end of the process tube a is closed with a lid d via a seal ring f, but since the process tube a is made of quartz, if the lid d is tightly tightened, the tube a will be damaged. Since tube a and lid d are tightened with a somewhat weak force, it is difficult to maintain the sealing inside tube a, and air may be drawn into tube a from the outside, causing damage to workpieces such as jigs. Quality control during processing is difficult.
また空気の巻込みを防ぐためにチューブa内を加圧する
ことも考えられるが、チューブaが破損したときその内
部の100℃ガス等が洩れ、周囲を汚染、腐蝕させる事
故を生ずる恐れがある。It is also conceivable to pressurize the inside of the tube a to prevent air from being entrained, but if the tube a is damaged, the 100° C. gas, etc. inside it may leak, causing an accident that contaminates and corrodes the surrounding area.
本発明はこうした従来の熱処理炉の難点の解消を図るこ
とを目的とするものである。It is an object of the present invention to overcome these drawbacks of conventional heat treatment furnaces.
(問題点を解決するための手段)
本発明では、プロセスチューブ内に処理されるべきワー
クを収容してその内部にHCfガス等のガスを導入し、
該プロセスチューブの外部に設けたヒータにより該ワー
クに熱処理を施すようにしたものに於いて、該プロセス
チューブの外周全体をN2ガス等の不活性ガスを導入す
る間隔を存して密閉構造の外タンクで覆うことにより前
記問題点を解決するようにした。(Means for solving the problem) In the present invention, a workpiece to be processed is housed in a process tube, and a gas such as HCf gas is introduced into the process tube.
In a device in which the workpiece is subjected to heat treatment using a heater installed outside the process tube, the entire outer periphery of the process tube is outside the sealed structure with an interval for introducing an inert gas such as N2 gas. The above problem was solved by covering it with a tank.
(作 用)
ワークを清浄する場合、プロセスチューブ内にワークを
収め、真空ポンプにより該プロセスチューブ内と外タン
ク内を例えば10’ Torr台に真空排気し、ヒータ
により加熱する。次で外タンク内へN2ガスを導入し、
プロセスチューブ内へI Cj!ガスと02ガスを導入
する。この時、外タンク内の圧力をプロセスチューブ内
よりも若干高い圧力に設定する。そして設定時間経過後
、加熱を停止し、プロセスチューブ内を真空排気後そこ
へN2ガスを導入する。処理済のワークは炉内を冷却し
た後外タンクを用いて取出される。(Function) When cleaning a workpiece, the workpiece is placed in a process tube, and the inside of the process tube and the outer tank are evacuated to, for example, 10' Torr by a vacuum pump, and heated by a heater. Next, introduce N2 gas into the outer tank,
I Cj into the process tube! Introduce gas and 02 gas. At this time, set the pressure inside the outer tank to a slightly higher pressure than inside the process tube. After the set time has elapsed, the heating is stopped, the inside of the process tube is evacuated, and then N2 gas is introduced therein. The processed workpieces are taken out using an outside tank after cooling the inside of the furnace.
(実施例)
本発明の実施例を図面第2図につき説明すると、同図に
於いて符号(1)は先端に真空ポンプに接続される排気
口(2)と後端に開閉自在の蓋(3)を備えた石英やS
iC製のプロセスチューブ、(4)は該チューブ(1)
内に収容したワーク、(5)は該チューブ(1)の外部
に設けたヒータを示し、該ワーク(4)は該チューブ<
1)内に導入したHC1ガス等のガス雰囲気に於いてヒ
ータ(5)により加熱されて洗浄等の熱処理が施される
。こうした構成は従来のものとほぼ同様であるが、本発
明に於いてはチューブ(1)の外周全体を例えばSUS
製の外タンク(6)で覆い、該チューブ(1)と外タン
ク(6)との間にN2ガス等の不活性ガスを導入する間
隔(7)を設けるようにした。(8)はフェルト状のグ
ラファイト製の断熱材、(9)は外タンク(6)の排気
口、(IGは外タンク(6)の蓋、11i)は断熱蓋で
ある。(Embodiment) An embodiment of the present invention will be explained with reference to FIG. 2. In the figure, reference numeral (1) indicates an exhaust port (2) connected to a vacuum pump at the tip and a lid (2) that can be opened and closed at the rear end. 3) Quartz and S
iC process tube, (4) is the tube (1)
The workpiece (5) is a heater provided outside the tube (1), and the workpiece (4) is housed inside the tube.
1) Heat treatment such as cleaning is performed by heating with a heater (5) in a gas atmosphere such as HC1 gas introduced into the chamber. This structure is almost the same as the conventional one, but in the present invention, the entire outer periphery of the tube (1) is made of, for example, SUS.
A space (7) for introducing an inert gas such as N2 gas was provided between the tube (1) and the outer tank (6). (8) is a felt-like graphite heat insulating material, (9) is an exhaust port of the outer tank (6), (IG is a lid of the outer tank (6), and 11i is a heat insulating lid.
図示のものに於い、ME (3) (IO(11)を開
き、プロセスチューブ(1)内へ低圧CVDで使用され
るSIC製治具類等のワーク(4)が収められると、チ
ューブ(1)内及び外タンク(6)内を夫々の排気D
(2) (9)から10°’ Torr台まで排気し、
ヒータ(5)を作動させて加熱を開始する。次で間隔(
7)へN2ガスを0.15kgr/c−・Gになるまで
導入した後チューブ(1)内へHC1ガスと02ガスの
混合ガスをO,1kgf’/cd−Gになるまで導入す
る。チューブ(1)内でワーク(2)は1200℃に加
熱され、約6時間後その加熱を停止し、チューブ(1)
内を真空排気した後N2ガスを導入する。そして炉内が
冷却されると蓋(3) GG 01)を開放し、清浄さ
れたワーク(2)を取出す。In the illustrated example, when the ME (3) (IO (11) is opened and the workpiece (4) such as SIC jigs used in low-pressure CVD is placed into the process tube (1), the tube ( 1) Exhaust the inside and outside tanks (6) respectively
(2) Exhaust from (9) to 10°' Torr level,
Activate the heater (5) to start heating. Interval with (
After introducing N2 gas to 7) until the concentration becomes 0.15 kgr/c-G, a mixed gas of HC1 gas and 02 gas is introduced into the tube (1) until the concentration reaches 0.1 kgf'/cd-G. The workpiece (2) is heated to 1200°C in the tube (1), and after about 6 hours, the heating is stopped and the workpiece (2) is heated to 1200°C.
After evacuating the inside, N2 gas is introduced. When the inside of the furnace is cooled, the lid (3) GG 01) is opened and the cleaned workpiece (2) is taken out.
尚、断熱材(8)及びヒータ(5)を外タンク(6)か
ら取外し、外タンク(6)の外部に設けたヒータでワー
ク(2)を加熱する構成とすることも可能である。Note that it is also possible to remove the heat insulating material (8) and the heater (5) from the outer tank (6) and heat the workpiece (2) with a heater provided outside the outer tank (6).
また本発明の炉を用いてワークの洗浄の他に、含浸処理
、薄膜形成処理等に使用することも出来る。In addition to cleaning workpieces, the furnace of the present invention can also be used for impregnation treatment, thin film formation treatment, etc.
(発明の効果)
以上のように、本発明によるときは、プロセスチューブ
の外周全体を不活性ガスの導入用の間隔を存して外タン
クで覆うようにしたので、外タンクにチューブ内の圧力
より若干高くなるよう不活性ガスを導入することで、チ
ューブの蓋が完全に密閉できなくともチューブ内のガス
の流出を防ぐことが出来、チューブ内の雰囲気を外部か
らの空気を巻込むことなく一定に保てるのでワークを一
定の品質に処理することが出来、また、プロセスチュー
ブ内のガスがチューブの破損で外部へ漏れる心配がなく
チューブ内で腐蝕性ガス、有毒ガスを用いることが出来
る等の効果がある。(Effects of the Invention) As described above, according to the present invention, since the entire outer periphery of the process tube is covered with the outer tank with an interval for introducing inert gas, the pressure inside the tube is transferred to the outer tank. By introducing inert gas at a slightly higher temperature, it is possible to prevent gas from leaking out of the tube even if the tube lid cannot be completely sealed. Because it can be kept constant, it is possible to process workpieces to a constant quality.Also, there is no fear that the gas inside the process tube will leak outside due to tube breakage, and corrosive gases and toxic gases can be used inside the tube. effective.
第1図は従来例の断面図、第2図は本発明の実施例の断
面図である。
(1)・・・プロセスチューブ (4)・・・ワーク
(5)・・・ヒータ (6)・・・外タン
ク(7)・・・間 隔
特 許 出 願 人 日本真空技術株式会社同
上 アイバック・ビーティーニー株式会社
代 理 人 北 村 欣
−外2名
第1図
ゝ(
第2図FIG. 1 is a sectional view of a conventional example, and FIG. 2 is a sectional view of an embodiment of the present invention. (1) Process tube (4) Workpiece (5) Heater (6) Outer tank (7) Interval Patent Applicant: Japan Vacuum Technology Co., Ltd.
Above: IBACK Beatney Co., Ltd. Representative: Kin Kitamura - 2 other people Figure 1 (Figure 2)
Claims (1)
その内部にHClガス等のガスを導入し、該プロセスチ
ューブの外部に設けたヒータにより該ワークに熱処理を
施すようにしたものに於いて、該プロセスチューブの外
周全体をN_2ガス等の不活性ガスを導入する間隔を存
して密閉構造の外タンクで覆ったことを特徴とする熱処
理炉。A workpiece to be processed is housed in a process tube, a gas such as HCl gas is introduced into the process tube, and the workpiece is heat-treated by a heater provided outside the process tube. A heat treatment furnace characterized in that the entire outer periphery of a process tube is covered with an outer tank having a closed structure with an interval for introducing an inert gas such as N_2 gas.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11472687A JPS63282242A (en) | 1987-05-13 | 1987-05-13 | Heat treating furnace |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11472687A JPS63282242A (en) | 1987-05-13 | 1987-05-13 | Heat treating furnace |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS63282242A true JPS63282242A (en) | 1988-11-18 |
Family
ID=14645087
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11472687A Pending JPS63282242A (en) | 1987-05-13 | 1987-05-13 | Heat treating furnace |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS63282242A (en) |
-
1987
- 1987-05-13 JP JP11472687A patent/JPS63282242A/en active Pending
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