JPS6324937B2 - - Google Patents
Info
- Publication number
- JPS6324937B2 JPS6324937B2 JP59217347A JP21734784A JPS6324937B2 JP S6324937 B2 JPS6324937 B2 JP S6324937B2 JP 59217347 A JP59217347 A JP 59217347A JP 21734784 A JP21734784 A JP 21734784A JP S6324937 B2 JPS6324937 B2 JP S6324937B2
- Authority
- JP
- Japan
- Prior art keywords
- base material
- quartz glass
- seed rod
- spherical portion
- porous quartz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 63
- 239000000463 material Substances 0.000 claims description 52
- 150000003377 silicon compounds Chemical class 0.000 claims description 6
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000010453 quartz Substances 0.000 description 5
- 229910004298 SiO 2 Inorganic materials 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000010419 fine particle Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- 238000004017 vitrification Methods 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010574 gas phase reaction Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- -1 photomask substrates Chemical compound 0.000 description 1
- 239000005373 porous glass Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- AIFMYMZGQVTROK-UHFFFAOYSA-N silicon tetrabromide Chemical compound Br[Si](Br)(Br)Br AIFMYMZGQVTROK-UHFFFAOYSA-N 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007858 starting material Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
- 239000005052 trichlorosilane Substances 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01486—Means for supporting, rotating or translating the preforms being formed, e.g. lathes
- C03B37/01493—Deposition substrates, e.g. targets, mandrels, start rods or tubes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1484—Means for supporting, rotating or translating the article being formed
- C03B19/1492—Deposition substrates, e.g. targets
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Description
【発明の詳細な説明】
「技術分野」
本発明は、珪素化合物を酸水素炎中で加水分解
して多孔質石英ガラス母材を形成する際に出発部
材として用いられる多孔質石英ガラス母材製造用
種棒に関する。Detailed Description of the Invention [Technical Field] The present invention relates to the production of a porous quartz glass base material used as a starting member when a silicon compound is hydrolyzed in an oxyhydrogen flame to form a porous quartz glass base material. Regarding seed sticks.
「従来技術およびその問題点」
従来より、合成石英ガラスを製造する方法の一
つとして、気相反応法により多孔質石英ガラス母
材を形成し、この母材を加熱してガラス化する方
法が採用されている。すなわち、四塩化珪素等の
珪素化合物を酸水素炎中で加水分解させ、鉛直に
懸下した石英製の種棒の下端部にシリカ微粒子を
付着、堆積させて多孔質石英ガラスを製造する。
そして、この多孔質石英ガラス母材を加熱炉に入
れ、ヒータで加熱して母材を焼結することにより
ガラス化する方法である。"Prior art and its problems" Conventionally, one method for producing synthetic quartz glass is to form a porous quartz glass base material by a gas phase reaction method, and then heat this base material to vitrify it. It has been adopted. That is, porous quartz glass is produced by hydrolyzing a silicon compound such as silicon tetrachloride in an oxyhydrogen flame, and depositing silica particles on the lower end of a vertically suspended quartz seed rod.
Then, this porous quartz glass base material is placed in a heating furnace and heated with a heater to sinter the base material, thereby vitrifying it.
この場合、多孔質石英ガラス母材を析出させる
出発部材としては、通常石英製の種棒が使用され
ている。この種石英製の種棒の改良されたものと
して、例えば特開昭57−135737号においては、棒
状の柄部の下端部に、多孔質石英ガラス母材の成
長形状とほぼ相似形とした略球形状部を有するも
のが提案されている。 In this case, a seed rod made of quartz is usually used as the starting member for depositing the porous quartz glass matrix. As an improved version of this seed rod made of quartz, for example, in JP-A-57-135737, the lower end of the rod-shaped handle has a shape that is almost similar to the growth shape of the porous quartz glass base material. A device having a spherical portion has been proposed.
ところで、フオトマスク基板などのように大型
の石英ガラスを製造しようとする場合、径の大き
な多孔質石英ガラス母材を形成する必要があり、
そのため種棒の拡径部もそれに合せて大きくしな
ければならない。しかし、従来、出発部材として
用いられる石英製の種棒は、中実であり、又、大
口径の多孔質石英ガラス母材を作るためには径が
大となるため、大口径の多孔質石英ガラス母材を
加熱してガラス化する際に、種棒と多孔質石英ガ
ラス母材との間の熱の伝導が不均一となり、種棒
の下端近傍の石英ガラス母材に気泡が生ずるとい
う欠点があつた。 By the way, when trying to manufacture large quartz glass such as photomask substrates, it is necessary to form a porous quartz glass base material with a large diameter.
Therefore, the enlarged diameter part of the seed rod must also be made larger accordingly. However, the quartz seed rod conventionally used as a starting material is solid, and the diameter must be large to make a large-diameter porous quartz glass base material. When the glass base material is heated and vitrified, the heat conduction between the seed rod and the porous quartz glass base material becomes uneven, and air bubbles are generated in the quartz glass base material near the lower end of the seed rod. It was hot.
又単に、多孔質石英ガラス母材の成長形状とほ
ぼ相似形の略球形状部を先端に設けた種棒を使用
した場合、特に径の大な多孔質石英ガラス母材
（例えば20〜25cm程度）を製造する場合、種棒の
形状が単に上記形状であると、シリカ微粒子の付
着が定常化する前に多孔質石英ガラス母材の形状
が乱れ、場合によつては母材が壊れてしまうとい
うことがあつた。 In addition, if you simply use a seed rod with a roughly spherical part at the tip that is almost similar to the growth shape of the porous quartz glass base material, it may be difficult to use a porous quartz glass base material with a particularly large diameter (for example, about 20 to 25 cm). ), if the shape of the seed rod is simply the shape described above, the shape of the porous quartz glass base material will be disturbed before the adhesion of silica particles becomes steady, and the base material may be broken in some cases. Something happened.
「発明の目的及び発明の概要」
本発明は、径が大きく、かつ形状の整つた多孔
質石英ガラス母材を形成することが容易であり、
かつ、この母材のガラス化の際に気泡が発生しな
いようにした石英ガラス製造用種棒を提供するこ
とを目的としたものであり、その要旨は、珪素化
合物を酸水素炎中で加水分解して出発部材にシリ
カ微粒子を付着、堆積せしめて多孔質石英ガラス
母材を形成し、この多孔質石英ガラス母材を形成
する際に前記出発部材として用いられる種棒にお
いて、種棒の柄部及び該柄部の下端部に形成され
た略球形状部を中空構造とし、かつ前記略球形状
部の横径の最大部が上記略球形状部の縦径の中央
部より下方に位置されて略球形状部の縦断面が下
広がり状の略円形となつていることを特徴とする
改良された多孔質石英ガラス母材製造用種棒に関
するものである。"Objective of the Invention and Summary of the Invention" The present invention enables easy formation of a porous quartz glass base material having a large diameter and a well-defined shape.
The purpose of this invention is to provide a seed rod for producing quartz glass that does not generate bubbles during vitrification of the base material, and its gist is to hydrolyze a silicon compound in an oxyhydrogen flame. silica particles are attached and deposited on the starting member to form a porous quartz glass base material, and in the seed rod used as the starting member when forming the porous quartz glass base material, the handle of the seed rod and the substantially spherical portion formed at the lower end of the handle has a hollow structure, and the maximum horizontal diameter of the substantially spherical portion is located below the center of the vertical diameter of the substantially spherical portion. This invention relates to an improved seed rod for producing a porous quartz glass base material, characterized in that the vertical cross section of the approximately spherical portion is approximately circular with a downwardly expanding shape.
［発明の構成］
本発明による多孔質石英ガラス母材製造用種棒
１は、例えば、第１図のように鉛直に懸下される
中空部４を有する柄部２の下端部にこの柄部２よ
りも径が大きく、かつ多孔質石英ガラス母材３の
成長形状とほぼ相似形をした中空部４を有する中
空構造の略球形状部５が形成されている。[Structure of the Invention] A seed rod 1 for producing a porous quartz glass base material according to the present invention has a handle 2 having a hollow part 4 suspended vertically as shown in FIG. A substantially spherical portion 5 having a hollow structure having a hollow portion 4 having a diameter larger than that of the porous quartz glass base material 2 and having a shape substantially similar to the growth shape of the porous quartz glass base material 3 is formed.
本発明の好ましい態様によれば多孔質石英ガラ
ス製造用種棒１の管状の柄部２の下端部に形成さ
れた中空構造の略球形状部５は、その横径が最大
径Ｄが上記略球形状部５の縦径H1の中央部より
下方に位置されて略球形状部５の縦断面が下広が
り状の略円形となつており、いわゆるいちじく形
状となつている。 According to a preferred embodiment of the present invention, the hollow approximately spherical portion 5 formed at the lower end of the tubular handle portion 2 of the seed rod 1 for producing porous quartz glass has a lateral diameter that is approximately equal to the maximum diameter D as described above. Located below the center of the longitudinal diameter H1 of the spherical portion 5, the vertical cross section of the approximately spherical portion 5 has a generally circular shape that expands downward, and has a so-called fig shape.
この多孔質石英ガラス母材３の更に好ましい態
様によれば、略球形状部５の横径の最大径Ｄと縦
径H1との比、即ちＤ／H1が0.91〜1.1の範囲にさ
れ、又、柄部２の径ｄと上記横径の最大径Ｄとの
比、即ちｄ／Ｄが0.3〜0.35にされる。 According to a more preferred embodiment of the porous quartz glass base material 3, the ratio of the maximum horizontal diameter D to the vertical diameter H1 of the substantially spherical portion 5, that is, D/H1 , is in the range of 0.91 to 1.1. Also, the ratio of the diameter d of the handle 2 to the maximum diameter D of the above-mentioned lateral diameter, ie, d/D, is set to 0.3 to 0.35.
種棒１の先端部の形状を上記したような略球形
状部とすると、SiO2微粉末の付着が定常化に達
する前に母材の形状が乱れ、壊れてしまうという
ことがなく、酸水素炎が種棒の略球形状部の外周
に沿つてスムーズに上昇し、付着強度が高く、か
つ形状の整つた大口径の多孔質石英ガラス母材を
得ることができる。 If the shape of the tip of the seed rod 1 is approximately spherical as described above, the shape of the base material will not be disturbed and broken before the adhesion of the SiO 2 fine powder reaches steady state, and the oxyhydrogen The flame rises smoothly along the outer periphery of the approximately spherical portion of the seed rod, making it possible to obtain a large-diameter porous quartz glass base material with high adhesion strength and a uniform shape.
又、中空構造の略球形状部５の肉厚は2.0mm〜
6.0mm程度が最適であり、又、横径の最大径Ｄは、
種棒の下方から向けられる多重管バーナーの口径
に対して1.2〜2.0倍とするのが最適である。 In addition, the wall thickness of the hollow approximately spherical portion 5 is 2.0 mm or more.
Approximately 6.0mm is optimal, and the maximum horizontal diameter D is
The optimum diameter is 1.2 to 2.0 times the diameter of the multi-tube burner directed from below the seed rod.
種棒１の材質は、付着させるSiO2と同一、又
はほぼ同一の膨脹係数を有し、又SiO2の付着力
の高い耐熱性材料であればよいものであるが、具
体的には石英ガラスからなるものが最適である。
かかる中空構造の種棒は、例えば石英ガラス粉末
を所定の型に入れて焼結することによつて製造で
きる。 The material of the seed rod 1 may be any heat-resistant material that has the same or almost the same coefficient of expansion as the SiO 2 to be attached and has a high adhesion to SiO 2 , but specifically quartz glass is suitable. The optimal one is one consisting of:
Such a seed rod having a hollow structure can be manufactured by, for example, placing quartz glass powder in a predetermined mold and sintering it.
［発明の実施例］
第１図に示すように、本発明の多孔質石英ガラ
ス種棒１として、管状の柄部２の下端部に、この
柄部よりも径の大きく、かつ多孔質石英ガラス母
材３の成長形状とほぼ相似形をした略球形状部５
が形成され、上記柄部２および略球形状部５の内
部はいずれも中空とされ、中空部４となつてお
り、略球形状部５の横径の最大径Ｄが上記略球形
状部５の縦形H1の中央部より下方に位置されて
略球形状部５の縦断面が下広がり状の略円形とな
つているものを用いた。この種棒１の各部の寸法
割合及び寸法は次の通りの範囲のものを用いた。[Embodiments of the Invention] As shown in FIG. 1, as a porous quartz glass seed rod 1 of the present invention, a porous quartz glass seed rod 1 having a diameter larger than that of the handle is attached to the lower end of a tubular handle 2. A substantially spherical portion 5 having a shape almost similar to the growth shape of the base material 3
The insides of the handle portion 2 and the approximately spherical portion 5 are both hollow, forming a hollow portion 4, and the maximum horizontal diameter D of the approximately spherical portion 5 is equal to the approximately spherical portion 5. The substantially spherical portion 5 was located below the center of the vertical shape H 1 and had a substantially circular vertical cross section expanding downward. The dimensional proportions and dimensions of each part of this seed rod 1 were within the following ranges.
Ｄ／H1≒0.9〜1.1
r1／H1≒0.5（r1：40〜55mm）
r2／H1≒0.38〜0.41（r2：30〜45mm）
Ｈ／H1≒4.0〜5.0
ｄ／Ｄ≒0.30〜0.35
略球形状部の肉厚≒2.0〜6.0mm
Ｄ≒75〜110mm、H1≒80〜120mm
この種棒１を用いて第１図に示すような装置に
より多孔質石英ガラス母材を形成した。D/H 1 ≒0.9-1.1 r 1 /H 1 ≒0.5 (r 1 : 40-55mm) r 2 /H 1 ≒0.38-0.41 (r 2 : 30-45mm) H/H 1 ≒4.0-5.0 d/ D≒0.30-0.35 Wall thickness of approximately spherical portion≒2.0-6.0mm D≒75-110mm, H 1 ≒80-120mm Using this seed rod 1, porous quartz glass mother The material was formed.
すなわち、ボンベ２１およびボンベ２２から水
素および酸素をフローコントローラ２３，２４を
通して多重管バーナ２５に供給する。また、四塩
化珪素、トリクロロシラン、四臭化珪素等の珪素
化合物のガスを、タンク２６からポンプ２７によ
り熱交換器２８を通して多重管バーナ２５に供給
する。 That is, hydrogen and oxygen are supplied from the cylinders 21 and 22 to the multi-tube burner 25 through flow controllers 23 and 24. Further, a gas of a silicon compound such as silicon tetrachloride, trichlorosilane, silicon tetrabromide, etc. is supplied from the tank 26 to the multi-tube burner 25 by a pump 27 through a heat exchanger 28 .
多重管バーナ２５は反応容器２９内において酸
水素炎を形成し、珪素化合物を加水分解してシリ
カ微粒子を生成する。このシリカ微粒子が石英製
の種棒１１のいちじく形状の拡径部１３に付着、
堆積して、多孔質石英ガラス母材３０が形成され
る。なお、反応によつて発生するHClはNaOH液
の貯槽３１から循環されるNaOH液と洗浄塔３
２で向流接触して吸収除去される。 The multi-tube burner 25 forms an oxyhydrogen flame in the reaction vessel 29 to hydrolyze the silicon compound to produce silica fine particles. These silica particles adhere to the fig-shaped enlarged diameter part 13 of the quartz seed rod 11,
Through the deposition, a porous quartz glass matrix 30 is formed. Note that HCl generated by the reaction is mixed with the NaOH solution circulated from the NaOH solution storage tank 31 and the washing tower 3.
2, it is absorbed and removed through countercurrent contact.
こうして得られた多孔質石英ガラス母材３０
は、直径約30cm、長さ約60cmであつた。 Porous quartz glass base material 30 thus obtained
The diameter was about 30cm and the length was about 60cm.
次に、この種棒１１に支持された多孔質石英ガ
ラス母材３０を加熱炉へ入れ、1400℃〜1600℃程
度に保たれた環状のヒータの中に、上記母材を回
転させながら上方から徐々に挿入して多孔質石英
ガラス母材を加熱し、下方から徐々にガラス化し
て直径約14cm、長さ30cmの円柱状石英ガラスイン
ゴツトを製造した。 Next, the porous quartz glass base material 30 supported by the seed rod 11 is placed in a heating furnace, and the base material is placed from above while rotating into an annular heater maintained at approximately 1400°C to 1600°C. The porous quartz glass base material was gradually inserted, heated, and gradually vitrified from below to produce a cylindrical quartz glass ingot with a diameter of about 14 cm and a length of 30 cm.
このようにして製造した多孔質石英ガラス母材
は、種棒との付着強度も充分で、型も整つてお
り、この母材をガラス化したものも種棒の下端か
ら約１cmの範囲に若干の気泡が見られたにすぎな
かつた。 The porous quartz glass base material produced in this way has sufficient adhesion strength to the seed rod and has a well-formed shape, and even when this base material is vitrified, there is a slight crack within about 1 cm from the lower end of the seed rod. Only air bubbles were visible.
なお、比較のため、第３図に示したように柄部
２の先端に中実の球形状部（Ｒ＝４cm）を設けた
種棒を用いて上記した方法と同様な方法により石
英ガラスを製造したところ、SiO2微粒子の付着
開始後しばらくの間定常化せず、一定形状の母材
が得られず、母材径がある程度大きくなると柄部
と球形状部の根元にクラツクが入りほとんどの場
合母材が崩れてしまつた。 For comparison, quartz glass was prepared in the same manner as described above using a seed rod with a solid spherical portion (R = 4 cm) at the tip of the handle 2 as shown in Fig. 3. When manufactured, it did not stabilize for a while after the SiO 2 fine particles started adhering, and a base material with a constant shape could not be obtained.When the diameter of the base material increased to a certain extent, cracks appeared at the base of the handle and spherical part, causing most of the problems. In this case, the base material collapsed.
「発明の効果」
以上のように、本発明の多孔質石英ガラス母材
製造用種棒によれば、柄部の下端部に形成された
多孔質石英ガラス母材の成長形状とほぼ相似形を
した略球形状部が中空となつて略球形状部の肉厚
が薄くなつているので、該略球形状部の熱容量が
中実の場合に比べて小さく、多孔質石英ガラス母
材のガラス化時、加熱された多孔質石英ガラス母
材と種棒の略球形状部の温度差を少なくすること
ができる。従つて多孔質ガラスにおいて種棒に接
する部分が外側部分のガラス化に著しく遅れるこ
となく、母材中の気体を未だガラス化されていな
い上方に追い出しつつガラス化することができる
ため、種棒の下端付近のガラス化部分に気泡が発
生するのを少なくすることができる。又、略球形
状部の横径の最大部が上記略球形状部の縦径に中
央部より下方に位置されて略球形状部に縦断面が
下広がり状の略円形となつて、いわゆるいちじく
状となつているので、酸水素炎が種棒の外周部に
そつて上昇し、形状の整つた大口径母材が合成で
きる。又、種棒は高価な石英ガラスから通常製造
されるが、中空構造となつているので材料費が安
くてすむという利点が発揮される。"Effects of the Invention" As described above, the seed rod for producing porous quartz glass base material of the present invention has a growth shape that is almost similar to the growth shape of the porous quartz glass base material formed at the lower end of the handle. Since the approximately spherical portion is hollow and the wall thickness of the approximately spherical portion is thinner, the heat capacity of the approximately spherical portion is smaller than that of a solid portion, and it is difficult to vitrify the porous quartz glass base material. At this time, the temperature difference between the heated porous quartz glass base material and the approximately spherical portion of the seed rod can be reduced. Therefore, the part of the porous glass that is in contact with the seed rod can be vitrified while expelling the gas in the base material upward, which has not yet been vitrified, without significantly delaying the vitrification of the outer part. It is possible to reduce the generation of air bubbles in the vitrified portion near the lower end. In addition, the maximum horizontal diameter of the approximately spherical portion is located below the center of the vertical diameter of the approximately spherical portion, and the vertical cross section of the approximately spherical portion has a downwardly expanding approximately circular shape, creating a so-called fig shape. Because of the shape, the oxyhydrogen flame rises along the outer periphery of the seed rod, making it possible to synthesize a large-diameter base material with a well-shaped shape. Further, although the seed rod is usually manufactured from expensive quartz glass, its hollow structure offers the advantage of lower material costs.
第１図は本発明の多孔質石英ガラス製造用種棒
の一具体例を示す断面図、第２図は多孔質石英ガ
ラス母材を形成するための装置を示す説明図、第
３図は比較例の多孔質石英ガラス母材製造用種棒
を示す断面図である。
１，１１：種棒、２：柄部、３，３０：多孔質
石英ガラス母材、４：中空部、５：略球形状部、
２５：多重管バーナ。
Fig. 1 is a sectional view showing a specific example of a seed rod for producing porous quartz glass according to the present invention, Fig. 2 is an explanatory view showing an apparatus for forming a porous quartz glass base material, and Fig. 3 is a comparison. FIG. 2 is a cross-sectional view showing an example seed rod for producing a porous quartz glass base material. 1, 11: seed rod, 2: handle, 3, 30: porous quartz glass base material, 4: hollow part, 5: approximately spherical part,
25: Multi-tube burner.
Claims (1)
部材にシリカ微粒子を付着、堆積せしめて多孔質
石英ガラス母材を形成し、この多孔質石英ガラス
母材を形成する際に前記出発部材として用いられ
る種棒において、種棒の柄部及び該柄部の下端部
に形成された略球形状部を中空構造とし、かつ前
記略球形状部の横径の最大部が上記略球形状部の
縦径の中央部より下方に位置されて略球形状部の
縦断面が下広がり状の略円形となつていることを
特徴とする改良された多孔質石英ガラス母材製造
用種棒。1. A silicon compound is hydrolyzed in an oxyhydrogen flame to adhere and deposit silica particles on a starting member to form a porous quartz glass base material, and when forming this porous quartz glass base material, as the starting member. In the seed rod used, the handle of the seed rod and the approximately spherical portion formed at the lower end of the handle have a hollow structure, and the maximum horizontal diameter of the approximately spherical portion is the same as that of the approximately spherical portion. An improved seed rod for producing a porous quartz glass base material, characterized in that the vertical cross section of the substantially spherical portion is located below the center of the longitudinal diameter and has a substantially circular shape that expands downward.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21734784A JPS6197140A (en) | 1984-10-18 | 1984-10-18 | Improved seed rod for preparing parent material for porous quartz glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21734784A JPS6197140A (en) | 1984-10-18 | 1984-10-18 | Improved seed rod for preparing parent material for porous quartz glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6197140A JPS6197140A (en) | 1986-05-15 |
| JPS6324937B2 true JPS6324937B2 (en) | 1988-05-23 |
Family
ID=16702748
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21734784A Granted JPS6197140A (en) | 1984-10-18 | 1984-10-18 | Improved seed rod for preparing parent material for porous quartz glass |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6197140A (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010098352A1 (en) | 2009-02-24 | 2010-09-02 | 旭硝子株式会社 | Process for producing porous quartz glass object, and optical member for euv lithography |
| WO2011021609A1 (en) | 2009-08-19 | 2011-02-24 | 旭硝子株式会社 | Tio2-containing silica glass, and optical member for euv lithography |
| WO2011068100A1 (en) | 2009-12-04 | 2011-06-09 | 旭硝子株式会社 | Method for producing silica-based glass substrate for imprint mold, and method for producing imprint mold |
| EP2399873A1 (en) | 2010-06-28 | 2011-12-28 | Asahi Glass Company, Limited | Method for producing glass body and method for producing optical member for EUV lithography |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57135737A (en) * | 1981-02-13 | 1982-08-21 | Showa Electric Wire & Cable Co Ltd | Starting material for manufacturing of optical fiber by v.a.d. process |
| JPS58135147A (en) * | 1982-02-08 | 1983-08-11 | Hitachi Ltd | Preparation of base material for optical fiber |
-
1984
- 1984-10-18 JP JP21734784A patent/JPS6197140A/en active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS57135737A (en) * | 1981-02-13 | 1982-08-21 | Showa Electric Wire & Cable Co Ltd | Starting material for manufacturing of optical fiber by v.a.d. process |
| JPS58135147A (en) * | 1982-02-08 | 1983-08-11 | Hitachi Ltd | Preparation of base material for optical fiber |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010098352A1 (en) | 2009-02-24 | 2010-09-02 | 旭硝子株式会社 | Process for producing porous quartz glass object, and optical member for euv lithography |
| WO2011021609A1 (en) | 2009-08-19 | 2011-02-24 | 旭硝子株式会社 | Tio2-containing silica glass, and optical member for euv lithography |
| WO2011068100A1 (en) | 2009-12-04 | 2011-06-09 | 旭硝子株式会社 | Method for producing silica-based glass substrate for imprint mold, and method for producing imprint mold |
| EP2399873A1 (en) | 2010-06-28 | 2011-12-28 | Asahi Glass Company, Limited | Method for producing glass body and method for producing optical member for EUV lithography |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6197140A (en) | 1986-05-15 |
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| LAPS | Cancellation because of no payment of annual fees |