JPS6323734A - Method and device for manufacturing fine particles - Google Patents
Method and device for manufacturing fine particlesInfo
- Publication number
- JPS6323734A JPS6323734A JP16730386A JP16730386A JPS6323734A JP S6323734 A JPS6323734 A JP S6323734A JP 16730386 A JP16730386 A JP 16730386A JP 16730386 A JP16730386 A JP 16730386A JP S6323734 A JPS6323734 A JP S6323734A
- Authority
- JP
- Japan
- Prior art keywords
- reactive gas
- fine particles
- inner tube
- tube
- gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000010419 fine particle Substances 0.000 title claims abstract description 51
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 238000000034 method Methods 0.000 title description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract description 4
- 239000011148 porous material Substances 0.000 abstract description 4
- XJDNKRIXUMDJCW-UHFFFAOYSA-J titanium tetrachloride Chemical compound Cl[Ti](Cl)(Cl)Cl XJDNKRIXUMDJCW-UHFFFAOYSA-J 0.000 abstract description 3
- 229910021529 ammonia Inorganic materials 0.000 abstract description 2
- 239000011800 void material Substances 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 73
- 238000006243 chemical reaction Methods 0.000 description 12
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical group CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 6
- 238000001816 cooling Methods 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 239000011261 inert gas Substances 0.000 description 4
- 238000011084 recovery Methods 0.000 description 4
- 238000005979 thermal decomposition reaction Methods 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 150000002894 organic compounds Chemical class 0.000 description 3
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 150000002484 inorganic compounds Chemical class 0.000 description 2
- 229910010272 inorganic material Inorganic materials 0.000 description 2
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 239000005049 silicon tetrachloride Substances 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000007380 fibre production Methods 0.000 description 1
- 238000005755 formation reaction Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- -1 metal alkoxide Chemical class 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 239000013307 optical fiber Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000011027 product recovery Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J4/00—Feed or outlet devices; Feed or outlet control devices
- B01J4/04—Feed or outlet devices; Feed or outlet control devices using osmotic pressure using membranes, porous plates
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J12/00—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor
- B01J12/02—Chemical processes in general for reacting gaseous media with gaseous media; Apparatus specially adapted therefor for obtaining at least one reaction product which, at normal temperature, is in the solid state
Abstract
Description
【発明の詳細な説明】
〔発明の技術分野〕
本発明は微粒子の製造方法とその装置に関し、より詳細
には回収率を向上せしめた微粒子の製造方法とその装置
に関する。DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a method for producing fine particles and an apparatus therefor, and more particularly to a method for producing fine particles and an apparatus therefor that improve the recovery rate.
光フアイバー製造用原料、高純度セラミックス用原料な
どを、有機化合物ガスあるいは無機化合物ガスの熱分解
反応、または異種類の有機化合物ガスあるいは無機化合
物ガスのガス反応によって微粒子の形状で製造する新し
い技術が、近年開発されつつある。A new technology for producing raw materials for optical fiber production, raw materials for high-purity ceramics, etc. in the form of fine particles by thermal decomposition reactions of organic compound gases or inorganic compound gases, or gas reactions of different types of organic compound gases or inorganic compound gases. , has been developed in recent years.
しかしながら、かかる製造技術を工業化する場合、生成
した微粒子の回収が問題になる。However, when such manufacturing technology is industrialized, recovery of the generated fine particles becomes a problem.
特に高温の微粒子は反応器、輸送管路での内外の温度差
に起因して管壁等に付着しやすく、歩留りの低下が怒念
される。In particular, high-temperature fine particles tend to adhere to pipe walls and the like due to temperature differences between the inside and outside of reactors and transport pipes, resulting in lower yields.
また、微粒子の製造技術には、前述の有機化合物ガスの
熱分解反゛応以外に、微粒子素材を高温プラズマガスに
より溶融、気化させた後に、冷却、凝縮させて微粒子を
製造する方法がある。In addition to the above-mentioned thermal decomposition reaction of organic compound gas, techniques for producing fine particles include a method of melting and vaporizing a fine particle material using high-temperature plasma gas, followed by cooling and condensation to produce fine particles.
しかしながら、この方法の工業化においても、反応器、
輸送管路の壁面における冷却、凝縮作用による微粒子の
付着のために、生成物回収率の低下が問題となる。However, even in the industrialization of this method, the reactor,
Due to the adhesion of fine particles on the walls of the transport pipe due to cooling and condensation, a reduction in product recovery rate becomes a problem.
本発明は、上記したような近年開発されつつある技術の
工業化において予測される問題点の解決方法とその装置
を提供することを目的とするものである。An object of the present invention is to provide a method and an apparatus for solving the problems expected in the industrialization of the technology that has been developed in recent years as described above.
上記目的を達成する本発明の微粒子の製造方法は、反応
性ガスＡ中に多孔質壁を通して反応性ガスＢを導入し、
前記反応性ガスＡと前記反応性ガスＢを反応させて微粒
子状生成物を形成させることを特徴とするものである。The method for producing fine particles of the present invention that achieves the above object includes introducing reactive gas B into reactive gas A through a porous wall,
The method is characterized in that the reactive gas A and the reactive gas B are reacted to form particulate products.
また、かかる製造方法の実施に使用される本発明の微粒
子の製造装置は、多孔質内管から間隙を置いて外管を設
けて二重管を形成し、前記内管には反応性ガスＡが導入
され、前記間隙には反応性ガスＢが前記反応性ガスＡよ
りも窩圧で供給されることを特徴とするものである。In addition, the apparatus for producing fine particles of the present invention used to carry out such a production method includes an outer tube provided with a gap from a porous inner tube to form a double tube, and the inner tube is provided with a reactive gas A. is introduced into the gap, and the reactive gas B is supplied to the gap at a pressure higher than that of the reactive gas A.
以下、本発明について詳述する。The present invention will be explained in detail below.
第１図および第２図は本発明の微粒子の製造装置の要部
概要を示す実施例であり、内管１から間隙を置いて外管
２が設けられて、二重管３が形成されている。FIG. 1 and FIG. 2 are embodiments showing an outline of the main parts of the apparatus for producing fine particles of the present invention, in which an outer tube 2 is provided with a gap from an inner tube 1 to form a double tube 3. There is.
二重管３は後述する微粒子形成反応の均一化の観点から
すれば、同心二重管であることが好ましい。The double tube 3 is preferably a concentric double tube from the viewpoint of making the fine particle formation reaction uniform, which will be described later.
なお、内管１は支持部材４によって外管内壁に支持され
ている。Note that the inner tube 1 is supported by a support member 4 on the inner wall of the outer tube.
内管１と外管２との間隙５は、後述するように反応性ガ
スＢの流通路であり、内管１の外径と外管２の内径を選
択することによって、適宜選定することができる。The gap 5 between the inner tube 1 and the outer tube 2 is a flow path for the reactive gas B, as described later, and can be appropriately selected by selecting the outer diameter of the inner tube 1 and the inner diameter of the outer tube 2. can.
ここで本発明においいては、内管１として多孔質管壁を
有する内管、たとえばセラミックス、金属の粉末焼結管
、金網の焼結管等が用いられる。Here, in the present invention, as the inner tube 1, an inner tube having a porous tube wall, such as a ceramic or metal powder sintered tube, a wire mesh sintered tube, or the like is used.
孔径は目的とする微粒子の種類、性状によっても異なる
が、通常では数μ〜数十μ、好ましくは数μ〜１０μで
あり、空孔率には特に制限はなく、反応性ガスＢの透過
量に応じて選択される。The pore size varies depending on the type and properties of the target fine particles, but is usually from several microns to several tens of microns, preferably from several microns to 10 microns, and there is no particular limit to the porosity, and it depends on the amount of permeation of reactive gas B. selected according to
かかる本発明の微粒子製造装置においては、内管１に反
応性ガスＡが供給され、一方、間隙５には反応性ガスＢ
が供給される。In the particle manufacturing apparatus of the present invention, reactive gas A is supplied to the inner tube 1, while reactive gas B is supplied to the gap 5.
is supplied.
この際、反応性ガスＢは、内管１管壁の多孔質孔径、空
孔率、また反応性ガスＡ流量との反応量論比にも依存す
るが、反応性ガスＡよりもわずかに高圧に保たれる。す
ると、反応性ガスＢは内管ｌの多孔質管壁を通過して内
管ｌ内に導入され、内管１内において反応性ガスＡと反
応性ガスＢが反応して微粒子が形成される。At this time, the pressure of reactive gas B is slightly higher than that of reactive gas A, although it depends on the porous pore diameter and porosity of the wall of the inner tube 1, as well as the reaction stoichiometric ratio with the flow rate of reactive gas A. is maintained. Then, reactive gas B passes through the porous wall of inner tube 1 and is introduced into inner tube 1, and reactive gas A and reactive gas B react within inner tube 1 to form fine particles. .
ここで反応性ガスＡとしては、たとえば四塩化チタン、
四塩化ケイ素、シラン（Ｓ ｉ Ｈ＃）等の蒸気を挙げ
ることができる。Here, as the reactive gas A, for example, titanium tetrachloride,
Vapors such as silicon tetrachloride and silane (S i H#) can be mentioned.
また、反応性ガスＢは反応性ガスＡと異種類であり、反
応性ガスＡとの反応によって微粒子の形成可能なガスで
あり、たとえばアンモニヤ、メタン等が用いられ、また
上記反応性ガスＡを反応性ガスＢとして、上記反応性ガ
スＢを反応性ガスＡとして使用することもできる。In addition, the reactive gas B is a different type from the reactive gas A, and is a gas that can form fine particles by reaction with the reactive gas A. For example, ammonia, methane, etc. are used, and the reactive gas A is As the reactive gas B, the above-mentioned reactive gas B can also be used as the reactive gas A.
あるいは、反応性ガスＡとして熱分解可能ガスを使用し
、反応性ガスＢとして不活性ガスを使用することにより
熱分解させて微粒子を形成させることもできる。Alternatively, by using a thermally decomposable gas as the reactive gas A and using an inert gas as the reactive gas B, the particles can be thermally decomposed to form fine particles.
かかる熱分解反応の場合には、反応性ガスＡとして４塩
化チタン、四塩化ケイ素等の金属ハロゲン化物蒸気、ま
たは金属アルコキシドの蒸気等が用いられ、不活性ガス
としては窒素、アルゴン等が用いられる。In the case of such a thermal decomposition reaction, metal halide vapor such as titanium tetrachloride or silicon tetrachloride, or metal alkoxide vapor is used as the reactive gas A, and nitrogen, argon, etc. are used as the inert gas. .
或いは、反応性ガスＡとして不活性ガスを用い、反応性
ガスＢとして上記反応性ガスＡを用いても良い。Alternatively, the reactive gas A may be an inert gas, and the reactive gas B may be the reactive gas A described above.
更に内管１内に導入される反応性ガスＡとして、微粒子
、たとえばセラミックス、金属微粒子等を含む反応性ガ
スＡ′を用いることもできる。Furthermore, as the reactive gas A introduced into the inner tube 1, it is also possible to use a reactive gas A' containing fine particles such as ceramics and metal fine particles.
この場合には反応性ガスＡ′ と反応性ガスＢとの反応
生成物を微粒子表面に形成させて、微粒子をコーティン
グすることができる。In this case, a reaction product of reactive gas A' and reactive gas B can be formed on the surface of the fine particles to coat the fine particles.
一般に反応性ガスＡと反応性ガスＢとの反応には高温状
態が必要であるが、高温状態の保持は製造装置である二
重管等を高周波炉内に設置するか、あらかじめ反応性ガ
スＡ、Ｂをプラズマ状態として導くことによって達成す
ることができる。Generally, a high temperature state is required for the reaction between reactive gas A and reactive gas B, but in order to maintain the high temperature state, it is necessary to install a manufacturing device such as a double tube in a high frequency furnace, or to react with reactive gas A in advance. , B in a plasma state.
内管１の管壁を通過して内管１内に導入された反応性ガ
スＢは、内管１内において反応性ガスＡと混合され、内
管１を流れる間に均一混合が促進されると共に反応性ガ
スＢとの反応によって微粒子が形成される。The reactive gas B introduced into the inner tube 1 through the wall of the inner tube 1 is mixed with the reactive gas A in the inner tube 1, and uniform mixing is promoted while flowing through the inner tube 1. At the same time, fine particles are formed by reaction with reactive gas B.
このように、高温ガス反応によって生成した微粒子は拡
散あるいは内管内外の温度差による熱力を受ける。In this way, the fine particles generated by the high-temperature gas reaction are subjected to thermal forces due to diffusion or temperature differences between the inside and outside of the inner tube.
特に高温反応で生成した微粒子は熱力の影響を大きく受
け、内管壁へ動こうとする。In particular, fine particles generated by high-temperature reactions are greatly affected by thermal forces and tend to move toward the inner tube wall.
従来の製造方法では、生成した微粒子がこの熱力によっ
て管壁に付着し、回収率が著しく低下して、工業化の欠
点となっていた。In the conventional production method, the generated fine particles adhere to the tube wall due to this thermal force, resulting in a significant decrease in recovery rate, which has been a drawback for industrialization.
ところが本発明では多孔質の内管壁から放出される反応
性ガスＢによって管壁への付着が著しく低減され、回収
率の向上がはかれるのである。However, in the present invention, the reactive gas B released from the porous inner tube wall significantly reduces adhesion to the tube wall, thereby improving the recovery rate.
また、反応性ガスＡ、Ｂ間の反応の制御は、内管壁の空
孔率、間隙５に導入する反応性ガスＢの圧力、すなわち
流量によって制御することができる。Further, the reaction between the reactive gases A and B can be controlled by the porosity of the inner tube wall and the pressure, that is, the flow rate, of the reactive gas B introduced into the gap 5.
間隙保持用の支持部材４は、一般には反応性ガスＢが自
由に通過できるようになっているが、場合によっては間
隙を気密に封する気密支持部材とすることもできる。The gap-maintaining support member 4 is generally designed to allow the reactive gas B to pass through freely, but in some cases it may be an airtight support member that airtightly seals the gap.
すなわち間隙５を気密支持部材によって複数の空間に区
分し、これら空間ごとにガス導入口を設け、多種類の反
応性ガスを内管１の多孔質管壁を経て内管１内に導入し
て順次連続的に反応させることができる。That is, the gap 5 is divided into a plurality of spaces by an airtight support member, a gas inlet is provided for each of these spaces, and various types of reactive gases are introduced into the inner pipe 1 through the porous pipe wall of the inner pipe 1. It is possible to react sequentially and continuously.
たとえば本発明によって製造された微粒子を別の装置に
導く場合、気密支持部材を使用した二重管によって不活
性ガスを反応性ガスＢとして導入すれば微粒子の管壁へ
の付着を防止しつつ輸送することができる。For example, when introducing the fine particles produced according to the present invention to another device, if an inert gas is introduced as the reactive gas B through a double pipe using an airtight support member, the fine particles can be transported while preventing them from adhering to the pipe wall. can do.
更に本発明により製造された微粒子を含むガスに、別種
の反応性ガスＣを間隙５から多孔質壁を経て内管１内に
導入して反応させることにより、微粒子表面に新しい物
質を管壁面への付着を防止しつつ形成させることができ
る。Furthermore, by introducing a different type of reactive gas C into the inner tube 1 from the gap 5 through the porous wall and reacting with the gas containing the fine particles produced according to the present invention, a new substance is transferred to the surface of the fine particles to the tube wall surface. can be formed while preventing the adhesion of
なお、本発明によって製造された微粒子の回収は、形成
された微粒子含有ガスを熱交換器等の冷却装置で冷却し
、熱力を利用して冷却装置の熱交換壁面に付着させるこ
とに行わなれる。The fine particles produced according to the present invention can be recovered by cooling the formed fine particle-containing gas with a cooling device such as a heat exchanger, and making the particles adhere to the heat exchange wall surface of the cooling device using thermal power.
更にまた、本発明の装置は微粒子を含む高温ガス中の含
塵濃度測定の際に、粒度測定装置のための希釈装置とし
ても使用することもできる。Furthermore, the device of the present invention can also be used as a diluter for a particle size measuring device when measuring the dust concentration in high temperature gas containing fine particles.
以上述べたように本発明の微粒子の製造方法および装置
によれば、多孔質内管の管壁を経て反応性ガスＢを反応
性ガスＡ中に導入することによって内管内壁面への付着
を防止しつつ微粒子を形成させることができ、従来の欠
点とされていた、付着による微粒子回収率の低下を防止
することができる。As described above, according to the method and apparatus for producing fine particles of the present invention, reactive gas B is introduced into reactive gas A through the wall of the porous inner tube, thereby preventing adhesion to the inner wall surface of the inner tube. It is possible to form fine particles while maintaining the temperature, and it is possible to prevent a decrease in the collection rate of fine particles due to adhesion, which has been considered a conventional drawback.
反応性ガスＡおよびＢとしては種々の選定が可能であり
、各種の微粒子を容易に製造することができる。Various selections can be made as the reactive gases A and B, and various types of fine particles can be easily produced.
また生成した微粒子を含むガスに、更に他種類の反応性
ガスを供給して、微粒子表面に更に他の生成物を形成さ
せることも可能である。It is also possible to further form other products on the surface of the fine particles by supplying another type of reactive gas to the gas containing the generated fine particles.
しかも本発明の微粒子製造装置は、多孔質内管および外
管からなる二重管のみを要部とするものであり、構造が
極めて簡単である。In addition, the fine particle manufacturing apparatus of the present invention has an extremely simple structure, with only a double tube consisting of a porous inner tube and an outer tube as the main part.
以下、本発明の実施例を述べる。Examples of the present invention will be described below.
実施例
下記反応式に従い、チタンテトライソプロポキシド蒸気
の熱分解による酸化チタン微粒子の製造を行なった。Example Titanium oxide fine particles were produced by thermal decomposition of titanium tetraisopropoxide vapor according to the following reaction formula.
Ｔｉ （ＱＣ：１Ｈ７） ＊−一→Ｔｉ０ｚ ＋ ４Ｃ
３１１６＋ ２１１□０反応条件は下記のようであった
。Ti (QC: 1H7) *-1 → Ti0z + 4C
3116+211□0 reaction conditions were as follows.
多孔質内管・・・管径１０鶴、孔径平均１０μｍ。Porous inner tube: tube diameter 10, average pore diameter 10 μm.
外管・・・管径２０ｍｍ。Outer tube...pipe diameter 20mm.
反応温度 ４００“Ｃ。Reaction temperature: 400"C.
チタンテトライソプロポキシドを窒素により１％以下に
うすめたものを反応性ガスＡとして上記内管に、流量２
０ｃｃ／ｓｅｃで供給した。Titanium tetraisopropoxide diluted to 1% or less with nitrogen was introduced into the inner tube as reactive gas A at a flow rate of 2.
It was supplied at a rate of 0 cc/sec.
一方、上記内管と外管との間隙に反応性ガスＢとしてＮ
２ガスを、平均０．２ （１／ｍｉｎ／ｃｎの流量、０
、１ ｋｇ／ａｄ以下の圧力で供給した。On the other hand, in the gap between the inner tube and the outer tube, N is used as reactive gas B.
2 gases at an average flow rate of 0.2 (flow rate of 1/min/cn, 0
, was supplied at a pressure of 1 kg/ad or less.
この結果、収率９０％以上でＴｉＯ□徽粒子を得た。As a result, TiO□hui particles were obtained with a yield of 90% or more.
内管内壁へのＴｉＯ□微粒子の付着は、はとんど見られ
なかった。Adhesion of TiO□ fine particles to the inner wall of the inner tube was hardly observed.
比較実施例
上記実施例において外管のみを用い、チタンテトライソ
プロポキシド蒸気中にＮ２ガスを供給してＴｉＯ□微粒
子を製造した。Comparative Example In the above example, only the outer tube was used and N2 gas was supplied into titanium tetraisopropoxide vapor to produce TiO□ fine particles.
反応条件は実施例と同様である。The reaction conditions are the same as in the examples.
この結果、管内壁への付着が著しく、得られたＴｉＯ□
微粒子は収率３０％にすぎなかった。As a result, the adhesion to the inner wall of the tube was significant, and the obtained TiO□
The yield of fine particles was only 30%.
第１図は本発明の微粒子製造装置の概要を示す部分切欠
側面図、第２図はその横断面図である。
１・・・多孔質内管、２・・・外管、５・・・間隙、Ａ
・・・反応性ガスＡ、Ｂ・・・反応性ガスＢ。FIG. 1 is a partially cutaway side view showing an outline of the apparatus for producing fine particles of the present invention, and FIG. 2 is a cross-sectional view thereof. 1...Porous inner tube, 2...Outer tube, 5...Gap, A
...Reactive gas A, B...Reactive gas B.
Claims (1)
導入し、前記反応性ガスＡと前記反応性ガスＢとを反応
させて微粒子状生成物を形成させることを特徴とする微
粒子の製造方法。 ２、多孔質管から間隙を置いて外管を設けて二重管を形
成し、前記内管には反応性ガスＡが導入され、前記間隙
には反応性ガスＢが前記反応性ガスＡよりも高圧で供給
されることを特徴とする微粒子の製造装置。[Claims] 1. Introducing reactive gas B into reactive gas A through a porous wall, and causing the reactive gas A and the reactive gas B to react to form particulate products. A method for producing fine particles characterized by: 2. An outer tube is provided with a gap from the porous tube to form a double tube, reactive gas A is introduced into the inner tube, and reactive gas B is introduced into the gap from the reactive gas A. A device for producing fine particles, which is characterized by being supplied at high pressure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16730386A JPS6323734A (en) | 1986-07-16 | 1986-07-16 | Method and device for manufacturing fine particles |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16730386A JPS6323734A (en) | 1986-07-16 | 1986-07-16 | Method and device for manufacturing fine particles |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6323734A true JPS6323734A (en) | 1988-02-01 |
| JPH0435215B2 JPH0435215B2 (en) | 1992-06-10 |
Family
ID=15847250
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16730386A Granted JPS6323734A (en) | 1986-07-16 | 1986-07-16 | Method and device for manufacturing fine particles |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6323734A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL1021252C2 (en) * | 2002-08-12 | 2004-02-13 | Univ Eindhoven Tech | Process for preparing particles with a defined size using a reaction of reactants in a reaction vessel. |
| WO2007144455A1 (en) * | 2006-06-14 | 2007-12-21 | Omg Finland Oy | Preparation of nanoparticles |
| WO2010121882A1 (en) * | 2009-04-23 | 2010-10-28 | Evonik Röhm Gmbh | Metering ring |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1994014530A1 (en) * | 1992-12-28 | 1994-07-07 | Kao Corporation | Method of manufacturing fine ceramic particles and apparatus therefor |
-
1986
- 1986-07-16 JP JP16730386A patent/JPS6323734A/en active Granted
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL1021252C2 (en) * | 2002-08-12 | 2004-02-13 | Univ Eindhoven Tech | Process for preparing particles with a defined size using a reaction of reactants in a reaction vessel. |
| WO2004014536A1 (en) * | 2002-08-12 | 2004-02-19 | Technische Universiteit Eindhoven | Method for preparing particles of a defined size in a reaction vessel |
| US7407639B2 (en) | 2002-08-12 | 2008-08-05 | Nederlandse Organisatie Voor Toegepast-Natuurwetenschappelijk Onderzoek Tno | Method for preparing particles of a defined size in a reaction vessel |
| WO2007144455A1 (en) * | 2006-06-14 | 2007-12-21 | Omg Finland Oy | Preparation of nanoparticles |
| WO2010121882A1 (en) * | 2009-04-23 | 2010-10-28 | Evonik Röhm Gmbh | Metering ring |
| US9169194B2 (en) | 2009-04-23 | 2015-10-27 | Evonik Röhm Gmbh | Metering ring |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0435215B2 (en) | 1992-06-10 |
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