JPS63234121A - Method and device for analyzing polarized light - Google Patents
Method and device for analyzing polarized lightInfo
- Publication number
- JPS63234121A JPS63234121A JP6581287A JP6581287A JPS63234121A JP S63234121 A JPS63234121 A JP S63234121A JP 6581287 A JP6581287 A JP 6581287A JP 6581287 A JP6581287 A JP 6581287A JP S63234121 A JPS63234121 A JP S63234121A
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- Prior art keywords
- wave
- light
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- beat
- incident
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Links
- 238000000034 method Methods 0.000 title description 4
- 239000013307 optical fiber Substances 0.000 claims description 17
- 230000010287 polarization Effects 0.000 claims description 9
- 238000006243 chemical reaction Methods 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 230000000694 effects Effects 0.000 description 4
- 230000008033 biological extinction Effects 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000000572 ellipsometry Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J4/00—Measuring polarisation of light
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- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Abstract
Description
【発明の詳細な説明】
（産業上の利用分野）
本発明は、試料の光学定数や試料表面の薄膜の厚さ等の
測定に用いられる偏光解析方法及び装置に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an ellipsometry method and apparatus used for measuring the optical constants of a sample, the thickness of a thin film on the sample surface, and the like.
（従来の技術）
偏光解析では、試料の反射光の偏光変化を表す量として
、試料入射面に垂直な振動ベクトルを有するＳ波と、試
料入射面に平行な振動ベクトルを有するＰ波との複素振
幅反射率比ｐを求め、ρをパラメータとして光学定数や
膜厚を演算するようにしている。(Prior art) In polarization analysis, the complex of an S wave with a vibration vector perpendicular to the sample incidence plane and a P wave with a vibration vector parallel to the sample incidence plane is used as a quantity representing the polarization change of reflected light from a sample. The amplitude reflectance ratio p is determined, and the optical constant and film thickness are calculated using ρ as a parameter.
ρは、試料表面のＰ波とＳ波の振幅反射率を夫々ｒ、
Ｉｒｌ 、試料に対する入射光と反射光とのそれぞれＰ
波とＳ波間の位相差を夫々ΔｉΔｒとして、
’；ｓ −ｅｘｐ （ｉ（Δｒ−Δｉ） ）ｒｌ
・ｔａｎ φ・ｅｉ Δ ・・・・・
・（１）（ｔ＝ ％／”Ｔ 、Δ＝Δｒ−Δｉ）で表わ
され、膜厚ｄは、入射角を０１、入射光の波長をλ、薄
膜の屈折率をｎ、として、次式から求められる。ρ is the amplitude reflectance of P wave and S wave on the sample surface, respectively.
Irl, P of the incident light and reflected light to the sample, respectively.
Letting the phase difference between the wave and the S wave as ΔiΔr, ';s −exp (i(Δr−Δi)) rl ・tan φ・ei Δ ・・・・・・
・(1) (t=%/”T, Δ=Δr−Δi), and the film thickness d is expressed as follows, where the angle of incidence is 01, the wavelength of the incident light is λ, and the refractive index of the thin film is n. It can be found from Eq.
・・・・・・（２）
Ａ
Ａ” ９ｒＩｐ ｉｔ ｒｚｓ −γｚｐ
？＋ｓ ’Ｆｚ＊百＝ ７’ＣＦｚｍ＋ＦＨ＠ ７１
ｐγｚｐ ）−γ１Ｆ７１ｓγｔｍ −７ｘｐＣ” １
）ｒ＋ｓ −ｒ＋ｐ
従来の偏光解析方法は、コリメータアームとテレスコー
プア６−ムとの２本のアームを有するエリプソメータを
用い、光源からの単色光をコリメータアームに取付けた
偏光子と補償板とを介して試料に入射し、反射光をテレ
スコープアームに取付けた検光子を介して光電素子から
成る検出器に入射させるようにし、偏光子と検光子とを
回転させて反射光のＰ波成分とＳ波成分の消光条件を計
測し、この消光条件から上記（１）式のｔａｎφとΔと
を求めるようにしている。・・・・・・(2) A A" 9rIp it rzs -γzp
? +s 'Fz*100= 7'CFzm+FH@71
pγzp)-γ1F71sγtm-7xpC" 1
) r+s -r+p The conventional polarization analysis method uses an ellipsometer that has two arms, a collimator arm and a telescope arm, and converts monochromatic light from a light source into a polarizer and a compensator attached to the collimator arm. The reflected light is made to enter a detector consisting of a photoelectric element via an analyzer attached to a telescope arm, and the P-wave component of the reflected light is detected by rotating the polarizer and analyzer. The extinction condition of the S wave component is measured, and tanφ and Δ in the above equation (1) are determined from this extinction condition.
（発明が解決しようとする問題点）
上記のものでは、偏光子と検光子とを回転させる可動部
が存在するため、振動等の機械的外乱による影響を受は
易く、更に保守性が悪くなり、又偏光子の方位と検光子
の方位との独立した２つのパラメータを変化させつつ消
光条件を求めるため、計測に時間がかかる問題がある。(Problems to be Solved by the Invention) In the above-mentioned device, since there is a movable part that rotates the polarizer and analyzer, it is easily affected by mechanical disturbances such as vibrations, and maintainability is further deteriorated. In addition, since the extinction condition is determined while changing two independent parameters: the orientation of the polarizer and the orientation of the analyzer, there is a problem in that the measurement takes time.
本発明は、光波検波に用いられるヘテロダイン干渉の技
術を利用し、検光子等の光学部品を動かすことなく偏光
解析を行い得るようにして、上記従来技術の問題点を解
決することをその目的とする。The purpose of the present invention is to solve the problems of the prior art described above by making it possible to perform polarization analysis without moving optical components such as an analyzer by using heterodyne interference technology used in optical wave detection. do.
（問題点を解決するための手段）
本願第１発明は、上記目的を達成する偏光解析方法を提
供するもので、試料入射面に垂直な振動ベクトルを有す
るＳ波と、試料入射面に平行な振動ベクトルを有し且つ
Ｓ波と周波数の異るＰ波とから成る２周波数直交直線偏
光を入射光とし、入射光のＳ波とＰ波とをヘテロダイン
干渉させたビート波と、反射光のＳ波とＰ波とをヘテロ
ダイン干渉させたビート波とに基いて試料におけるＳ波
とＰ波の複素振幅反射率比を求めるようにしたことを特
徴とする。(Means for Solving the Problems) The first invention of the present application provides a polarization analysis method that achieves the above object. The incident light is two-frequency orthogonal linearly polarized light that has a vibration vector and is composed of an S wave and a P wave with different frequencies, and a beat wave that is the result of heterodyne interference between the S wave and P wave of the incident light, and the S wave of the reflected light. The present invention is characterized in that the complex amplitude reflectance ratio of the S wave and the P wave in the sample is determined based on the beat wave obtained by heterodyne interference between the wave and the P wave.
本願第２発明は、上記第１発明の実施に用いる偏光解析
装置を提供するもので、試料入射面に垂直な振動ベクト
ルを有するＳ波と、試料入射面に平行な振動ベクトルを
有し且つＳ波と周波数の異るＰ波とから成る２周波数直
交直線偏光に変換を生じせしめる光源と光源からの光波
を試料に入射する光ファイバと、該光ファイバからの試
料に対する入射光の一部を４５＠方位の第１検光子と光
ファイバとを介して入射する第１光電変換器と、該試料
からの反射光を４５°方位の第２の検光子と光ファイバ
とを介して入射する第２光電変換器とを備えることを特
徴とする。The second invention of the present application provides an ellipsometry device used for carrying out the first invention, and which has an S wave having a vibration vector perpendicular to the sample entrance plane and an S wave having a vibration vector parallel to the sample entrance plane. A light source that causes conversion into two-frequency orthogonal linearly polarized light consisting of P waves and P waves of different frequencies, an optical fiber that inputs the light waves from the light source into the sample, and a part of the light incident on the sample from the optical fiber. A first photoelectric converter receives light reflected from the sample through a first analyzer and an optical fiber in the @ direction, and a second photoelectric converter receives reflected light from the sample through a second analyzer and an optical fiber in a 45° direction. It is characterized by comprising a photoelectric converter.
（作 用） 入射光のＳ波の振幅と周波数を夫々ａ＋ｆｌ。(for production) Let the amplitude and frequency of the S wave of the incident light be a+fl, respectively.
Ｐ波のそれをす、ｆ＊、Ｐ波とＳ波の位相差をΔｉとす
ると、入射光を４５°方位の第１検光子を通してヘテロ
ダイン干渉させたときのビート波の強度１．は、
１１＝ａ” ＋ｂ”＋２ａｂ ｃｏｓ（ａｃｔ＋Δｉ
） ・・・−（３）ω＝２π、（ｆ、−ｔｚ）
となる。Letting that of the P wave be f*, and the phase difference between the P wave and the S wave be Δi, the intensity of the beat wave when the incident light is subjected to heterodyne interference through the first analyzer oriented at 45 degrees is 1. is, 11=a"+b"+2ab cos(act+Δi
) ...-(3) ω=2π, (f, -tz).
又、振幅反射率ｒｌ＋ｒｌｌで反射された光は、光の入
射角に応じた試料固有の位相飛びを生じ、反射光のＳ波
とＰ波の振幅は夫々ｒ、ａ、 ｒｐｂとなり、Ｓ波と
Ｐ波の位相差をΔｒとすると、４５°方位の第２検光子
を通してヘテロダイン干渉させたときのビート波の強度
！、は、！、＝（ｒｌａ）” ＋ （ｒｏｂ）”＋ ２
ｒｌａ −ｒ、ｂ ｃｏｓ（ａｃｔ＋Δｒ ） ・・
・・・・・・（４）となる。In addition, the light reflected by the amplitude reflectance rl + rll causes a sample-specific phase jump depending on the incident angle of the light, and the amplitudes of the S wave and P wave of the reflected light are r, a, and rpb, respectively, and the S wave and If the phase difference of the P wave is Δr, then the intensity of the beat wave when it is subjected to heterodyne interference through a second analyzer oriented at 45°! ,teeth,! ,=(rla)"+(rob)"+2
rla −r, b cos(act+Δr)...
...(4).
入射光と反射光とのそれぞれより得られたビート波間の
位相差Δｒ−Δｌは、試料表面反射時に光波のＰ波、Ｓ
波間に生じた位相飛びがあられれ入射光のビート波と反
射光のビート波との位相差から上記（１）式のΔを求め
られる。The phase difference Δr−Δl between the beat waves obtained from the incident light and the reflected light, respectively, is the P wave and S wave of the light wave when reflected from the sample surface.
The phase jump occurring between the waves is caused by the phase difference between the beat wave of the incident light and the beat wave of the reflected light, and Δ in the above equation (1) can be determined.
又、（１）式のｔａｎφは、入射光と反射光のビート波
の変調度Ｍ、、Ｍ、を用いて、次式から求められる。Further, tanφ in equation (1) can be obtained from the following equation using the modulation degrees M, , M of the beat waves of the incident light and reflected light.
（復号はｒ、 ＞ ｒｐで＋ｒ ｒｓ ＜ｒ、で−を
取る）尚、ａ−ｂであれば、
ｌｒ
となるが、一般にはａとｂは不一致となり、（５）式に
よりｔａｎ φを求める。(For decoding, take r, +r for > rp, - for rs < r, etc.) If a-b, then lr, but generally a and b do not match, and tan φ is calculated using equation (5). .
以上の如く、入射光のビート波と反射光のビート波とに
基いてΔ、 ｔａｎφをもとめられるから、試料におけ
るＰ波とＳ波の複素振幅反射率比ρも求められる。As described above, since Δ and tanφ can be obtained based on the beat wave of the incident light and the beat wave of the reflected light, the complex amplitude reflectance ratio ρ of the P wave and the S wave in the sample can also be obtained.
（実施例）
第１図を参照して、（１）はＨｅ−Ｎｅレーザを示し、
該レーザ（１）からの波長６３３ｎ−のレーザ光をアイ
ソレータ（２）を介して直交２周波ＡＯモジュレータ（
３）に入射し、該モジユレータ（３）でレーザ光を所定
の周波数差例えばＩＭ）ｔｚの周波数差を持った２周波
数直交直線偏光に変換し、これを両端にセルフオフレン
ズ（４ａ）を取付けた偏波保持型の光ファイバ（４）を
介して試料（５）に入射するようにした。(Example) Referring to FIG. 1, (1) shows a He-Ne laser,
The laser beam with a wavelength of 633n- from the laser (1) is passed through the isolator (2) to the orthogonal two-frequency AO modulator (
3), the modulator (3) converts the laser light into two-frequency orthogonal linearly polarized light having a predetermined frequency difference, for example, IM)tz, and attaches self-off lenses (4a) to both ends of the laser light. The light was made to enter the sample (5) via a polarization-maintaining optical fiber (4).
ここで、該光ファイバ（４）は、２周波数直交直線偏光
の一方の偏光成分が試料（５）の入射面に垂直な振動ベ
クトルを有するＳ波、他方の偏光、成分が当該入射面に
平行な振動ベクトルを有するＰ波となるように方位を合
わせ、且つ試料（５）に対する光線の入射角が所定角度
θ、になるように設けるものとし、その投光端のセルフ
オフレンズ（４ａ）と試料（５）との間の光路にハーフ
ミラ−（６）を介設して、該ミラー（６）により入射光
の一部を反射し、これを４５°方位の第１検光子（７）
とバンドル型の光ファイバ（８）とを介して第１光電変
換器（９）に入射するようにした。 又、試料（５）か
らの反射光を４５＠方位の第２検光子０＠とバンドル型
の光ファイバ００とを介して第２光電変換器Ｑ２ｉに入
射するようにし、更に試料（５）と第２検光子Ｑｌとの
間の光路にハーフミラ−側を介設し、該ミラー側により
反射光の一部を反射して、この反射光を偏光ビームスプ
リフタ側によりＰ波とＳ波とに分離し、分離されたＰ波
とＳ波とを夫々光ファイバ０５）０５）を介して１対の
ディテクタＱ６）Ｑ６）に導き、該両ディテクタ０００
０からの信号を比較器Ｑ？）に入力して、反射光のＰ波
とＳ波の光量の大小を求めるようにした。Here, the optical fiber (4) is an S wave in which one polarization component of the two-frequency orthogonal linearly polarized light has a vibration vector perpendicular to the plane of incidence of the sample (5), and the other polarized light component is parallel to the plane of incidence of the sample (5). The direction of the light beam is adjusted so that the P wave has a vibration vector of A half mirror (6) is interposed in the optical path between the sample (5), a part of the incident light is reflected by the mirror (6), and the reflected light is passed to the first analyzer (7) at a 45° azimuth.
and a bundle-type optical fiber (8) to enter the first photoelectric converter (9). In addition, the reflected light from the sample (5) is made to enter the second photoelectric converter Q2i via the second analyzer 0@ with the 45@ direction and the bundle type optical fiber 00, and the light reflected from the sample (5) is A half mirror side is interposed in the optical path between the second analyzer Ql, a part of the reflected light is reflected by the mirror side, and this reflected light is converted into P waves and S waves by the polarizing beam splitter side. The separated P wave and S wave are respectively guided to a pair of detectors Q6)Q6) via optical fibers 05)05), and both detectors 000
Signal from 0 to comparator Q? ) to determine the magnitude of the light intensity of the P wave and S wave of the reflected light.
以上の構成によれば、第１検光子（７）を通して試料（
５）への入射光のＰ波とＳ波のへテロダイン干渉による
ビート波が形成されると共に、第２検光子Ｏのを通して
試料（５）からの反射光のＰ波とＳ波のへテロダイン干
渉によるビート波が形成され、入射光のビート波に応じ
た信号が第１光電変換器（９）と、反射光のビート波に
応じた信号が第２光電変換器０２１とから出力され、両
光電変換器（９）０２）からの信号を位相計Ｏ・に入力
する。第２図にｉ線で入射光のビート波形と、ｒ線で反
射光のビート波形との様子を示す。According to the above configuration, the sample (
5) A beat wave is formed by heterodyne interference between the P wave and S wave of the incident light, and the heterodyne interference of the P wave and S wave of the reflected light from the sample (5) passes through the second analyzer O. A beat wave is formed by the beat wave of the incident light, and a signal corresponding to the beat wave of the incident light is output from the first photoelectric converter (9), and a signal corresponding to the beat wave of the reflected light is output from the second photoelectric converter 021. The signal from the converter (9) 02) is input to the phase meter O. FIG. 2 shows the beat waveform of incident light on the i-line and the beat waveform of reflected light on the r-line.
入射光のビート波形は上記（３）式に従った波形に、又
反射光のビート波形は上記（４）式に従った波形になり
、両波形の位相差（位相計出力）から上記作用の項で説
明したようにΔを求めることができる。The beat waveform of the incident light is a waveform according to the above equation (3), and the beat waveform of the reflected light is a waveform according to the above equation (4), and the above effect can be calculated from the phase difference between the two waveforms (phase meter output). Δ can be determined as explained in section.
又、上記作用の項で説明したビート波の変調度Ｍｉ 、
Ｍｒは、第２図にＡｉ 、Ａｒで示すビート波形の交流
振幅と、Ｄｉ 、Ｄｒで示すビート波形の直流成分との
比Ａｉ／Ｄｉ 、Ａｒ／Ｄｒに対応し、両光電変換器（
９）Ｑ’ｂからの信号をコンピュータＯｇ）に入力して
ＭＬ、Ｍｒを求め、上記（５）式によるｔａｎφの演算
を行う。この場合、前記比較器面からの信号により、反
射光のＳ波振幅ｒ、ａとＰ波振幅ｒｐｂの大小を判別し
、上記作用の項で説明した（５）式中の復号を選択する
。Moreover, the modulation degree Mi of the beat wave explained in the above section of the effect,
Mr corresponds to the ratios Ai/Di and Ar/Dr of the AC amplitude of the beat waveform shown by Ai and Ar in FIG. 2 and the DC component of the beat waveform shown by Di and Dr, and
9) Input the signal from Q'b to the computer Og) to obtain ML and Mr, and calculate tanφ using the above equation (5). In this case, the magnitude of the S-wave amplitude r, a and the P-wave amplitude rpb of the reflected light is determined based on the signal from the comparator surface, and the decoding in equation (5) described in the above operation section is selected.
次表は、Ｓｉ基材に熱酸化法でＳｉ０ｇ膜を形成したＡ
、８２種の試料について行った測定結果を示す。同表の
ｄは、上記方法で求めたｔａｎφ、Δから上記（１）式
により得られるρに基き上記（２）に従って演算したＳ
ｉ０ｇ膜の膜厚、ｄ′は白色光干渉色でもとめた膜厚で
あり、両者の一致は良い。The following table shows A in which a Si0g film was formed on a Si base material using a thermal oxidation method.
, shows the results of measurements conducted on 82 types of samples. d in the same table is S calculated according to (2) above based on ρ obtained from equation (1) above from tanφ and Δ obtained by the above method.
The film thickness of the i0g film, d', is the film thickness determined by white light interference color, and the two agree well.
°（発明の効果）
以上の如く本発明によるときは、入射光として２周波数
直交直線偏光を用い、Ｐ波とＳ波のヘテロダイン干渉に
より、検光子等の光学部品を動かすことなく試料の偏光
解析を行い得られ、可動部が不要となって、保守性が良
（なると共に、振動等の機械的外乱による影響を受けに
くくなり、実時間で高情度の偏光解析を行うことが可能
となる。(Effects of the Invention) As described above, according to the present invention, polarization analysis of a sample is performed without moving optical parts such as an analyzer by using two-frequency orthogonal linearly polarized light as the incident light and by heterodyne interference of P waves and S waves. This eliminates the need for moving parts, improves maintainability, and makes it less susceptible to mechanical disturbances such as vibrations, making it possible to perform high-sensitivity polarization analysis in real time. .
又、第２発明によれば、２周波数直交直線偏光を生じせ
しめる光源からの光波を光ファイバを介して試料に入射
すると共に、入射光と反射光との各検光子を介しての各
光電変換器への伝送も光ファイバを用いて行うため、遠
隔測定が可能となると共に、光ファイバの可撓性により
設置性が良くなり、スパッタ装置の真空ベルジャ内等の
特殊な環境下での使用も可能となり、而も試料への投光
、受光部を光ファイバーで構成出来るため装置が小型軽
量化され、機械的外乱に一層強くなる等の効果を有する
。Further, according to the second invention, a light wave from a light source that generates two-frequency orthogonal linearly polarized light is incident on the sample via an optical fiber, and each photoelectric conversion of the incident light and reflected light is performed via each analyzer. Since the transmission to the equipment is also carried out using optical fiber, remote measurement is possible, and the flexibility of optical fiber makes it easy to install, making it suitable for use in special environments such as inside the vacuum bell jar of sputtering equipment. In addition, since the light projecting part to the sample and the light receiving part can be composed of optical fibers, the apparatus can be made smaller and lighter, and it has effects such as being more resistant to mechanical disturbances.
第１図は本発明装置の１例の線図、第２図は入射光と反
射光の夫々のビート波形を示す線図である。FIG. 1 is a diagram of an example of the apparatus of the present invention, and FIG. 2 is a diagram showing beat waveforms of incident light and reflected light, respectively.
Claims (1)
試料入射面に平行な振動ベクトルを有し且つＳ波と周波
数の異るＰ波とから成る２周波数直交直線偏光を入射光
とし、入射光のＳ波とＰ波とをヘテロダイン干渉させた
ビート波と、反射光のＳ波とＰ波とをヘテロダイン干渉
させたビート波とに基いて試料におけるＳ波とＰ波の複
素振幅反射率比を求めるようにしたことを特徴とする偏
光解析方法。 ２、試料入射面に垂直な振動ベクトルを有するＳ波と、
試料入射面に平行な振動ベクトルを有し且つＳ波と周波
数の異るＰ波とから成る２周波数直交直線偏光に変換を
生じせしめる光源と該光源からの光波を試料に入射する
光ファイバと、該光ファイバからの試料に対する入射光
の一部を４５°方位の第１検光子と光ファイバとを介し
て入射する第１光電変換器と、該試料からの反射光を４
５°方位の第２の検光子と光ファイバとを介して入射す
る第２光電変換器とを備えることを特徴とする偏光解析
装置。[Claims] 1. S wave having a vibration vector perpendicular to the sample incidence plane;
A beat wave is created by heterodyne interference between the S wave and P wave of the incident light, where the incident light is two-frequency orthogonal linearly polarized light that has a vibration vector parallel to the sample incidence plane and is composed of an S wave and a P wave with different frequencies. and a beat wave obtained by heterodyne interference between the S wave and the P wave of the reflected light. 2. S wave having a vibration vector perpendicular to the sample incidence plane,
a light source that has a vibration vector parallel to the sample incidence plane and that causes conversion into two-frequency orthogonal linearly polarized light consisting of an S wave and a P wave of different frequencies; an optical fiber that makes the light wave from the light source enter the sample; A first photoelectric converter makes a part of the light incident on the sample from the optical fiber enter the sample through the first analyzer and the optical fiber, and converts the reflected light from the sample into the first photoelectric converter.
A polarization analyzer comprising: a second analyzer oriented at 5°; and a second photoelectric converter that enters the light via an optical fiber.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6581287A JPS63234121A (en) | 1987-03-23 | 1987-03-23 | Method and device for analyzing polarized light |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6581287A JPS63234121A (en) | 1987-03-23 | 1987-03-23 | Method and device for analyzing polarized light |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63234121A true JPS63234121A (en) | 1988-09-29 |
| JPH0473738B2 JPH0473738B2 (en) | 1992-11-24 |
Family
ID=13297812
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6581287A Granted JPS63234121A (en) | 1987-03-23 | 1987-03-23 | Method and device for analyzing polarized light |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63234121A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06147984A (en) * | 1992-11-10 | 1994-05-27 | Moritetsukusu:Kk | Polarized light measuring method |
-
1987
- 1987-03-23 JP JP6581287A patent/JPS63234121A/en active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06147984A (en) * | 1992-11-10 | 1994-05-27 | Moritetsukusu:Kk | Polarized light measuring method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0473738B2 (en) | 1992-11-24 |
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