JPS63228101A - Antistatic non-reflection plate having stain resistance - Google Patents
Antistatic non-reflection plate having stain resistanceInfo
- Publication number
- JPS63228101A JPS63228101A JP62061808A JP6180887A JPS63228101A JP S63228101 A JPS63228101 A JP S63228101A JP 62061808 A JP62061808 A JP 62061808A JP 6180887 A JP6180887 A JP 6180887A JP S63228101 A JPS63228101 A JP S63228101A
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- film
- fluorine
- low refractive
- antistatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- -1 polytetrafluoroethylene Polymers 0.000 claims abstract description 10
- 229920006254 polymer film Polymers 0.000 claims abstract description 6
- 239000002344 surface layer Substances 0.000 claims abstract description 6
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910003437 indium oxide Inorganic materials 0.000 claims abstract description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 15
- 239000011737 fluorine Substances 0.000 claims description 15
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims description 13
- 230000003373 anti-fouling effect Effects 0.000 claims description 13
- 239000000758 substrate Substances 0.000 claims description 5
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 3
- 150000001343 alkyl silanes Chemical class 0.000 claims description 2
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 claims description 2
- 125000001153 fluoro group Chemical group F* 0.000 claims description 2
- 229920005597 polymer membrane Polymers 0.000 claims description 2
- 229920000131 polyvinylidene Polymers 0.000 claims description 2
- 229920002050 silicone resin Polymers 0.000 claims description 2
- 239000002216 antistatic agent Substances 0.000 claims 1
- UUAGAQFQZIEFAH-UHFFFAOYSA-N chlorotrifluoroethylene Chemical group FC(F)=C(F)Cl UUAGAQFQZIEFAH-UHFFFAOYSA-N 0.000 claims 1
- 229920000840 ethylene tetrafluoroethylene copolymer Polymers 0.000 claims 1
- 239000011787 zinc oxide Substances 0.000 claims 1
- 239000010410 layer Substances 0.000 abstract description 13
- 230000003287 optical effect Effects 0.000 abstract description 10
- 229920001343 polytetrafluoroethylene Polymers 0.000 abstract description 9
- 239000004810 polytetrafluoroethylene Substances 0.000 abstract description 9
- 238000000034 method Methods 0.000 abstract description 8
- 238000007740 vapor deposition Methods 0.000 abstract description 7
- 239000011521 glass Substances 0.000 abstract description 6
- 239000000428 dust Substances 0.000 abstract description 4
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 abstract description 4
- 229910001635 magnesium fluoride Inorganic materials 0.000 abstract description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 4
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 abstract description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 abstract description 2
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
- MMKQUGHLEMYQSG-UHFFFAOYSA-N oxygen(2-);praseodymium(3+) Chemical compound [O-2].[O-2].[O-2].[Pr+3].[Pr+3] MMKQUGHLEMYQSG-UHFFFAOYSA-N 0.000 abstract 1
- 229910003447 praseodymium oxide Inorganic materials 0.000 abstract 1
- 238000001556 precipitation Methods 0.000 abstract 1
- 238000001179 sorption measurement Methods 0.000 abstract 1
- 239000010408 film Substances 0.000 description 45
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 3
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- 229920001577 copolymer Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000003667 anti-reflective effect Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000012685 gas phase polymerization Methods 0.000 description 1
- HCDGVLDPFQMKDK-UHFFFAOYSA-N hexafluoropropylene Chemical group FC(F)=C(F)C(F)(F)F HCDGVLDPFQMKDK-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000002120 nanofilm Substances 0.000 description 1
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 1
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
Landscapes
- Optical Filters (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Laminated Bodies (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は表面が防汚性をもつ帯電防止無反射板に関する
。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an antistatic, non-reflective plate whose surface has antifouling properties.
従来、帯電防止無反射板としては、ガラス板等の透明基
板表面に、透明な高屈折率無機膜と低屈折率無機膜とを
交互に付着させ、高屈折率無機膜の７つに透明導電膜を
用いた帯電防止無反射板が特開昭ｊ／−／６１ｒｌｒタ
タにより知、られている。Conventionally, antistatic and non-reflective plates have been produced by alternately depositing transparent high refractive index inorganic films and low refractive index inorganic films on the surface of a transparent substrate such as a glass plate, and seven of the high refractive index inorganic films are coated with transparent conductive films. An antistatic non-reflective plate using a film is known from Japanese Patent Application Laid-open Shoj/-/61rlr Tata.
また、無反射板の表面の汚れを防止したものとして、透
明基板と同程度以上の屈折率を有するシラン化合物塗膜
等を該透明基板に付着し、該塗膜上にポリフルオロ化基
含有化合物からなる薄膜を形成した防汚性無反射板が特
開昭！ター／ ／ｊ１１１０号により知られている。In addition, to prevent stains on the surface of the non-reflective plate, a coating film of a silane compound having a refractive index equal to or higher than that of the transparent substrate is attached to the transparent substrate, and a polyfluorinated group-containing compound is applied onto the coating film. JP-A-Sho has developed an antifouling non-reflective plate with a thin film formed from . It is known from No. 1110.
しかしながら、無機透明膜を用いた帯電防止無反射板は
油性の汚れに対しては防汚効果がなく、有機透明膜を用
いた防汚性無反射板はほこりに対して防汚効果が少ない
。そして、シラン化合物塗膜とポリフルオロ化基含有化
合物薄膜を形成した無反射板は表面がフッ素系高分子特
有の表面エネルギーが低いことから、水、油等の付着を
さまたげる効果はあるが、シラン化合物塗膜等の樹脂膜
に高い屈折率を有するものが得られないため、無反射の
特性が劣るという欠点があった。However, the antistatic non-reflective plate using an inorganic transparent film has no antifouling effect against oil-based stains, and the antifouling non-reflective plate using an organic transparent film has little antifouling effect against dust. Anti-reflective plates with a silane compound coating film and a polyfluorinated group-containing compound thin film have a low surface energy characteristic of fluorine-based polymers, so they are effective in preventing the adhesion of water, oil, etc.; Since a resin film such as a compound coating film having a high refractive index cannot be obtained, there is a drawback that the non-reflection property is poor.
本発明は前記した従来の無反射板の有する欠点を一挙に
解決するためになされたものである。The present invention has been made in order to solve all the drawbacks of the conventional non-reflection plates mentioned above.
〔問題を解決するための手段〕
すなわち、本発明は透明な高屈折率膜と低屈折率膜とを
交互に重ね合せ、最表面層が低屈折率膜となる反射防止
膜であって、該高屈折率膜の少なくとも１つの膜に透明
導電膜を用いた反射防止膜を透明基板に付着した帯電防
止無反射板において、最表面層となる該低屈折率膜上に
含フッ素高分子膜を形成するか、該低屈折率を含フッ素
高分子膜に置換したことを特徴とする防汚性を有する帯
電防止無反射板である。[Means for Solving the Problem] That is, the present invention provides an antireflection film in which transparent high refractive index films and low refractive index films are alternately laminated so that the outermost surface layer is the low refractive index film. In an antistatic and non-reflective plate in which an antireflection film in which at least one of the high refractive index films is a transparent conductive film is attached to a transparent substrate, a fluorine-containing polymer film is formed on the low refractive index film that is the outermost layer. This is an antistatic, non-reflective plate having antifouling properties, characterized in that the low refractive index is replaced with a fluorine-containing polymer film.
本発明において、透明導電膜としては錫をドープした酸
化インジウム（工Ｔｏ）、酸化第二錫（Ｓｎ０２）、及
び酸化亜鉛（ＺｎＯ）の少なくともいずれか１種を主成
分とする膜を用いることができる。In the present invention, as the transparent conductive film, a film containing at least one of tin-doped indium oxide (TO), stannic oxide (Sn02), and zinc oxide (ZnO) as a main component can be used. can.
また、本発明において、含フッ素高分子膜としてポリビ
ニリデンフロラード（ＰＶＤＦ） 、ポリトリプルオロ
エチレン（ＰＴｒＦＥ）、ポリテトラフルオロエチレン
（ＰＴＦＥ） 、テトラブルオロエチレン−へキサフル
オロプロピレン共重合体（ＦＥＰ）、ヘキサフルオロプ
ロピレン（ＲＦＰ）、エチレン−テトラブルオロエチレ
ン共重合体、ポリクロロトリフルオロエチレン（ＰＯＴ
ＦＥ ）、７ツ素系シリコーン樹脂、含フッ素アルキル
シラン（（（！Ｆ’３）２０Ｆｏ（ＣＨ２）３ｓｉｃｔ
ｓ））及び含フッ素アルキルアセチレンのいずれかの膜
が用いられる。In addition, in the present invention, polyvinylidene fluorade (PVDF), polytrifluoroethylene (PTrFE), polytetrafluoroethylene (PTFE), tetrafluoroethylene-hexafluoropropylene copolymer (FEP) can be used as the fluorine-containing polymer membrane. ), hexafluoropropylene (RFP), ethylene-tetrofluoroethylene copolymer, polychlorotrifluoroethylene (POT
FE), 7-carbon silicone resin, fluorine-containing alkylsilane (((!F'3)20Fo(CH2)3sic
s)) or a fluorine-containing alkyl acetylene film.
本発明は、反射防止膜の高屈折率膜の少なくとも１つに
帯電防止のための透明導電膜を用い、且つ最表面層とな
る膜上に低屈折率で、且つ表面エネルギーの低い含フッ
素高分子膜を形成したものであるから、無反射板の表面
に帯電による集塵や水、油の吸着が生じにくくなる。The present invention uses a transparent conductive film for antistatic purposes as at least one of the high refractive index films of the antireflection film, and a fluorine-containing high-resolution film with a low refractive index and low surface energy is coated on the film serving as the outermost surface layer. Since a molecular film is formed, the surface of the non-reflective plate is less likely to collect dust due to electrical charge or adsorb water or oil.
〔実施例１〕 以下、本発明を図面に示した実施例について説明する。[Example 1] Embodiments of the present invention shown in the drawings will be described below.
屈折率へ！ｌであるガラス板（１）の表面に１屈折率が
八ｇ！で、且つ光学厚みがＯ２０り！・λ０（λ０に屈
折率が／、ＪＩで、且つ光学厚みがｏ、ｏｔｚ−λ０の
弗化マグネシウムの低屈折率膜（３）を蒸着法により形
成し、この低屈折率膜（３）上に屈折率が２．１０で、
且つ光学厚みがｏ、ｔｏｏ・λ０の酸化チタンと酸化ブ
ラ・セオジムの混合物からなる高屈折率膜（４）を蒸着
法により形成し、更にその上に光学厚みが０、／りｊ・
λ０の弗化マグネシウムの低屈折率膜（５）を蒸着し、
その上に屈折率が／、３ｊで、且つ光学厚みがＯ１μり
Ｏ・λ０のＰＴＦＥ層（６）を形成して防汚性を有する
帯電防止無反射板を得た。To the refractive index! The refractive index of 1 on the surface of the glass plate (1) is 8 g! And the optical thickness is O20!・A low refractive index film (3) of magnesium fluoride with a refractive index of λ0 (λ0 of /, JI and an optical thickness of o, otz-λ0 is formed by vapor deposition, and on this low refractive index film (3) has a refractive index of 2.10,
In addition, a high refractive index film (4) made of a mixture of titanium oxide and theodymium oxide with an optical thickness of o, too·λ0 is formed by vapor deposition, and furthermore, a high refractive index film (4) with an optical thickness of 0, too·λ0 is formed by a vapor deposition method.
A low refractive index film (5) of magnesium fluoride of λ0 is deposited,
A PTFE layer (6) having a refractive index of /, 3j and an optical thickness of O1μ to O·λ0 was formed thereon to obtain an antistatic and non-reflective plate having antifouling properties.
第１表にその膜構成を示した。Table 1 shows the membrane structure.
ＰＴＦＥ ＪＩ（６）は、エレクトロンビーム蒸着法の
はかＲＦスパッタ法又はプラズマ重合等の方法で形成で
きる。また、ＰＴＦＥ層（６）Ｋ代え溶媒に溶ける含フ
ッ素高分子を用いる場合にはディッピング法又はスピン
コード法も用いることができる。そして、得られた防汚
性を有する帯電防止無反射板はＰＴＦＥ層（６）が低屈
折率Ｍ（５）と共に無反射性能に寄与し、第２図に示す
如き反射率特性を示した。PTFE JI (6) can be formed by a method such as electron beam evaporation, RF sputtering, or plasma polymerization. Further, when a fluorine-containing polymer soluble in a solvent is used instead of K in the PTFE layer (6), a dipping method or a spin coding method can also be used. In the obtained antistatic and non-reflective plate having antifouling properties, the PTFE layer (6) together with the low refractive index M(5) contributed to the non-reflective performance, and exhibited reflectance characteristics as shown in FIG.
第 ／ 表
〔実施例λ〕
実施例１と同様にして第−表に示す如き、反射防止膜を
屈折率へ！／であるガラス板の表面に付着した。Table 1 [Example λ] In the same manner as in Example 1, the antireflection film was changed to have a refractive index as shown in Table 1! / adhered to the surface of the glass plate.
″ｊ 第 λ 表情１層
及び第４を層は蒸着法により形成し、第１層は気相重合
法により単分子膜を形成した。得られた防汚性を有する
帯電防止無反射板は第３図の反射率特性を示した。The first and fourth layers were formed by a vapor deposition method, and the first layer was formed into a monomolecular film by a gas phase polymerization method. Figure 3 shows the reflectance characteristics.
〔実施例３〕
第２層の５ｉ０２に代えａｇｙ２ とし、第１層の形成
にスピンコードを用いた他は実施例２と同様の方法で第
３表に示した反射防止膜を屈折率／、！／のガラス板の
表面に付着した。[Example 3] The antireflection film shown in Table 3 was prepared in the same manner as in Example 2, except that agy2 was used instead of 5i02 in the second layer and a spin code was used to form the first layer. ! / adhered to the surface of the glass plate.
第 ３ 表
得られた防汚性を有する帯電防止無反射板の反射率特性
を第μ図に示した。Table 3 The reflectance characteristics of the obtained antistatic and non-reflective plate having antifouling properties are shown in Figure μ.
第１層から第３層までは実施例／と同様の方法により、
第参層のボリトリフルオ田エチレン（ＰＴｒＦＥ）はジ
メチルアセトアミド（ＤＭＡ ）により溶液としてスピ
ンナーを使用して第μ表に示した反射防止膜を、屈折率
１．！／のガラス板の表面に付着した。From the first layer to the third layer, by the same method as in Example/
The third layer, polytrifluoroethylene (PTrFE), was made into a solution with dimethylacetamide (DMA) using a spinner to form an antireflection film as shown in Table μ, with a refractive index of 1. ! / adhered to the surface of the glass plate.
第 参 表
得られた防汚性を有する帯電防止無反射板の反射率特性
を第１図に示した。Table 1 Figure 1 shows the reflectance characteristics of the antistatic, non-reflective plate with antifouling properties obtained.
以上のように１本発明は、反射防止膜の高屈折率膜の少
なくとも１つに帯電防止のための透明導電膜を用い、且
つ最表面層となる低屈折率膜上に低屈折率で、且つ表面
エネルギーの低い含フッ素高分子膜を形成したものであ
るから、無反射板の表面に帯電による集塵や水、油の吸
着が生じにくくなるため、無反射性能を維持したまま、
表面の汚れるのを防止することができる。As described above, the present invention uses a transparent conductive film for antistatic charging as at least one of the high refractive index films of the antireflection film, and has a low refractive index film on the low refractive index film serving as the outermost surface layer. In addition, since it is made of a fluorine-containing polymer film with low surface energy, it is difficult for the surface of the non-reflective plate to collect dust due to electrical charge and adsorb water and oil, so it maintains its non-reflective performance.
It can prevent the surface from getting dirty.
図面は本発明の実施例を示すものであって、第１図は帯
電防止無反射板の縦断面図、第２図乃至第１図は夫々実
施例１乃至実施例弘で得られた帯電防止無反射板の反射
率特性を示すグラフである。
（１）ニガラス板、（２） ：電導性高屈折率膜、（３
） 、 （５） ：低屈折率膜、（４）：高屈折率膜、
（６） ： ＰＴＦＥ層
第１図
第２因The drawings show examples of the present invention, in which Fig. 1 is a longitudinal cross-sectional view of an antistatic non-reflective plate, and Figs. It is a graph showing reflectance characteristics of a non-reflection plate. (1) Niglass plate, (2) : Conductive high refractive index film, (3
), (5): low refractive index film, (4): high refractive index film,
(6): PTFE layer Figure 1 Factor 2
Claims (3)
せ、最表面層が低屈折率膜となる反射防止膜であって、
該高屈折率膜の少なくとも１つの膜に透明導電膜を用い
た反射防止膜を透明基板に付着した帯電防止無反射板に
おいて、最表面層となる該低屈折率膜上に含フッ素高分
子膜を形成するか、該低屈折率膜を含フッ素高分子膜に
置換したことを特徴とする防汚性を有する帯電防止無反
射板。(1) An anti-reflection film in which transparent high refractive index films and low refractive index films are alternately stacked, and the outermost surface layer is the low refractive index film,
In an antistatic and non-reflective plate in which an antireflection film using a transparent conductive film as at least one of the high refractive index films is attached to a transparent substrate, a fluorine-containing polymer film is provided on the low refractive index film as the outermost surface layer. 1. An antistatic, non-reflective plate having antifouling properties, characterized in that the low refractive index film is replaced with a fluorine-containing polymer film.
、酸化第二錫、及び酸化亜鉛の少なくともいずれか１種
を主成分とする膜である特許請求の範囲第１項に記載の
防汚性を有する帯電防止無反射板。(2) Antifouling properties according to claim 1, wherein the transparent conductive film is a film containing at least one of tin-doped indium oxide, stannic oxide, and zinc oxide as a main component. Antistatic, non-reflective plate with
ド、ポリトリフルオロエチレン、ポリテトラフルオロエ
チレン、テトラフルオロエチレン−ヘキサフルオロプロ
ピレン共重合体、ヘキサフルオロプロピレン、エチレン
−テトラフルオロエチレン共重合体、ポリクロロトリフ
ルオロエチレン、フッ素系シリコーン樹脂、含フッ素ア
ルキルシラン、及び含フッ素アルキルアセチレンのいず
れか１種の膜である特許請求の範囲第１項又は第２項に
記載の防汚性を有する帯電防止無反射板。(3) The fluorine-containing polymer membrane may be polyvinylidene fluorade, polytrifluoroethylene, polytetrafluoroethylene, tetrafluoroethylene-hexafluoropropylene copolymer, hexafluoropropylene, ethylene-tetrafluoroethylene copolymer, The antistatic agent having antifouling properties according to claim 1 or 2, which is a film of any one of chlorotrifluoroethylene, fluorine-based silicone resin, fluorine-containing alkylsilane, and fluorine-containing alkyl acetylene. Non-reflective plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62061808A JPS63228101A (en) | 1987-03-17 | 1987-03-17 | Antistatic non-reflection plate having stain resistance |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62061808A JPS63228101A (en) | 1987-03-17 | 1987-03-17 | Antistatic non-reflection plate having stain resistance |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS63228101A true JPS63228101A (en) | 1988-09-22 |
Family
ID=13181759
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62061808A Pending JPS63228101A (en) | 1987-03-17 | 1987-03-17 | Antistatic non-reflection plate having stain resistance |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63228101A (en) |
Cited By (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0564134A2 (en) * | 1992-03-31 | 1993-10-06 | Canon Kabushiki Kaisha | Anti-reflection coating |
| JPH0634801A (en) * | 1992-07-20 | 1994-02-10 | Fuji Photo Optical Co Ltd | Conductive antireflection film |
| JPH08234001A (en) * | 1995-02-24 | 1996-09-13 | Asahi Glass Co Ltd | Antireflection optical article |
| US5622784A (en) * | 1986-01-21 | 1997-04-22 | Seiko Epson Corporation | Synthetic resin ophthalmic lens having an inorganic coating |
| WO1997026566A1 (en) * | 1996-01-18 | 1997-07-24 | Toyo Metallizing Co., Ltd. | Plastic optical article having multi-layered antireflection film |
| US5759643A (en) * | 1987-01-16 | 1998-06-02 | Seiko Epson Corporation | Polarizing plate and method of production |
| US5783299A (en) * | 1986-01-21 | 1998-07-21 | Seiko Epson Corporation | Polarizer plate with anti-stain layer |
| US5851674A (en) * | 1997-07-30 | 1998-12-22 | Minnesota Mining And Manufacturing Company | Antisoiling coatings for antireflective surfaces and methods of preparation |
| WO1999042860A1 (en) * | 1998-02-19 | 1999-08-26 | Polaroid Corporation | Antireflection film |
| FR2817267A1 (en) * | 2000-11-28 | 2002-05-31 | Essilor Int | METHOD FOR DEPOSITING COLD ANTI-REFLECTIVE LAYER ON ORGANIC SUBSTRATE |
| US6632513B1 (en) | 1998-02-19 | 2003-10-14 | 3M Innovative Properties Company | Antireflection film |
| US6783704B1 (en) * | 1999-05-15 | 2004-08-31 | Merck Patent Gmbh | Method and agent for producing hydrophobic layers on fluoride layers |
| US6800378B2 (en) | 1998-02-19 | 2004-10-05 | 3M Innovative Properties Company | Antireflection films for use with displays |
| US6942924B2 (en) | 2001-10-31 | 2005-09-13 | Chemat Technology, Inc. | Radiation-curable anti-reflective coating system |
| US7351470B2 (en) | 1998-02-19 | 2008-04-01 | 3M Innovative Properties Company | Removable antireflection film |
| JP2014191186A (en) * | 2013-03-27 | 2014-10-06 | Hoya Corp | Spectacle plastic lens manufacturing method, and spectacle plastic lens obtained by said manufacturing method |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5794722A (en) * | 1980-12-03 | 1982-06-12 | Seiko Epson Corp | Liquid crystal display cell |
| JPS58167448A (en) * | 1982-03-30 | 1983-10-03 | Asahi Glass Co Ltd | Glass having low reflectance |
| JPS58211701A (en) * | 1982-06-04 | 1983-12-09 | Asahi Glass Co Ltd | Low reflectance glass |
| JPS59115840A (en) * | 1982-12-24 | 1984-07-04 | 旭硝子株式会社 | Low reflectivity coating |
| JPS61168899A (en) * | 1985-01-19 | 1986-07-30 | 日本板硝子株式会社 | Low reflectance antistatic plate |
| JPS6255601A (en) * | 1985-09-03 | 1987-03-11 | Nippon Sheet Glass Co Ltd | Antireflection optical parts |
-
1987
- 1987-03-17 JP JP62061808A patent/JPS63228101A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5794722A (en) * | 1980-12-03 | 1982-06-12 | Seiko Epson Corp | Liquid crystal display cell |
| JPS58167448A (en) * | 1982-03-30 | 1983-10-03 | Asahi Glass Co Ltd | Glass having low reflectance |
| JPS58211701A (en) * | 1982-06-04 | 1983-12-09 | Asahi Glass Co Ltd | Low reflectance glass |
| JPS59115840A (en) * | 1982-12-24 | 1984-07-04 | 旭硝子株式会社 | Low reflectivity coating |
| JPS61168899A (en) * | 1985-01-19 | 1986-07-30 | 日本板硝子株式会社 | Low reflectance antistatic plate |
| JPS6255601A (en) * | 1985-09-03 | 1987-03-11 | Nippon Sheet Glass Co Ltd | Antireflection optical parts |
Cited By (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5622784A (en) * | 1986-01-21 | 1997-04-22 | Seiko Epson Corporation | Synthetic resin ophthalmic lens having an inorganic coating |
| US5783299A (en) * | 1986-01-21 | 1998-07-21 | Seiko Epson Corporation | Polarizer plate with anti-stain layer |
| US5759643A (en) * | 1987-01-16 | 1998-06-02 | Seiko Epson Corporation | Polarizing plate and method of production |
| EP0564134A2 (en) * | 1992-03-31 | 1993-10-06 | Canon Kabushiki Kaisha | Anti-reflection coating |
| US5392156A (en) * | 1992-03-31 | 1995-02-21 | Canon Kabushiki Kaisha | Optical device |
| JPH0634801A (en) * | 1992-07-20 | 1994-02-10 | Fuji Photo Optical Co Ltd | Conductive antireflection film |
| JPH08234001A (en) * | 1995-02-24 | 1996-09-13 | Asahi Glass Co Ltd | Antireflection optical article |
| WO1997026566A1 (en) * | 1996-01-18 | 1997-07-24 | Toyo Metallizing Co., Ltd. | Plastic optical article having multi-layered antireflection film |
| US5851674A (en) * | 1997-07-30 | 1998-12-22 | Minnesota Mining And Manufacturing Company | Antisoiling coatings for antireflective surfaces and methods of preparation |
| US6800378B2 (en) | 1998-02-19 | 2004-10-05 | 3M Innovative Properties Company | Antireflection films for use with displays |
| US6464822B1 (en) | 1998-02-19 | 2002-10-15 | 3M Innovative Properties Company | Antireflection film |
| US6632513B1 (en) | 1998-02-19 | 2003-10-14 | 3M Innovative Properties Company | Antireflection film |
| WO1999042860A1 (en) * | 1998-02-19 | 1999-08-26 | Polaroid Corporation | Antireflection film |
| US6815056B2 (en) | 1998-02-19 | 2004-11-09 | 3M Innovative Properties Company | Antireflection film |
| US7351470B2 (en) | 1998-02-19 | 2008-04-01 | 3M Innovative Properties Company | Removable antireflection film |
| US6783704B1 (en) * | 1999-05-15 | 2004-08-31 | Merck Patent Gmbh | Method and agent for producing hydrophobic layers on fluoride layers |
| FR2817267A1 (en) * | 2000-11-28 | 2002-05-31 | Essilor Int | METHOD FOR DEPOSITING COLD ANTI-REFLECTIVE LAYER ON ORGANIC SUBSTRATE |
| WO2002044440A1 (en) * | 2000-11-28 | 2002-06-06 | Essilor International | Method for cold process deposition of an antiglare layer |
| AU2002222043B2 (en) * | 2000-11-28 | 2006-10-12 | Essilor International | Method for cold process deposition of an antiglare layer |
| US7175878B2 (en) | 2000-11-28 | 2007-02-13 | Essilor International | Cold antireflection layer deposition process |
| US6942924B2 (en) | 2001-10-31 | 2005-09-13 | Chemat Technology, Inc. | Radiation-curable anti-reflective coating system |
| JP2014191186A (en) * | 2013-03-27 | 2014-10-06 | Hoya Corp | Spectacle plastic lens manufacturing method, and spectacle plastic lens obtained by said manufacturing method |
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